Patents by Inventor Xuedong Liu

Xuedong Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200051779
    Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.
    Type: Application
    Filed: August 8, 2019
    Publication date: February 13, 2020
    Inventors: Weiming REN, Xuedong Liu, Xuerang Hu, Zong-wei Chen
  • Patent number: 10541110
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: January 21, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Shuai Li, Weiming Ren, Xuedong Liu, Juying Dou, Xuerang Hu, Zhongwei Chen
  • Patent number: 10508122
    Abstract: The present invention relates to novel hydroxamic acids which are specific histone deacetylase (HDAC) inhibitors and/or TTK/Mps1 kinase inhibitors, including pharmaceutically acceptable salts thereof, which are useful for modulating HDAC and/or TTK/Mps1 kinase activity, pharmaceutical compositions comprising these compounds, and processes for their preparation.
    Type: Grant
    Filed: July 19, 2017
    Date of Patent: December 17, 2019
    Assignee: The Regents of the University of Colorado, A Body Corporate
    Inventors: Xuedong Liu, Gan Zhang, Daniel Chuen-Fong Chan, Anthony D. Piscopio
  • Publication number: 20190358630
    Abstract: The invention relates to thermal shift assays implemented to uncover ligand protein binding interactions in whole cells or cell extracts. In particular embodiments, the invention provides improved methods and devices for performing thermal shift assays for determining both drug targets and drug mechanism of action. For example, the invention performs thermal shift assays in microfluidic devices and determines ligand-protein binding by relative protein abundance measurements.
    Type: Application
    Filed: May 22, 2019
    Publication date: November 28, 2019
    Inventors: William Old, Michael H. Stowell, Yung-Cheng Lee, Douglas A. Chapnick, Tristan D. McClure-Begley, Xuedong Liu, Kerri Ball, Biddut Bhattacharjee
  • Publication number: 20190341222
    Abstract: An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro-structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.
    Type: Application
    Filed: May 1, 2019
    Publication date: November 7, 2019
    Inventors: Xuerang HU, Xuedong LIU, Zhong-wei CHEN, Weiming REN
  • Publication number: 20190329757
    Abstract: The present disclosure provides a method and a device for controlling a motion of a vehicle, and a vehicle. A power system of the vehicle includes an engine, a first motor and a second motor, the method includes: receiving a cruise speed, a speed fluctuation quantity and a preset traveling mileage of the vehicle, and obtaining an upper speed bound and a lower speed bound of the vehicle based on the cruise speed and the speed fluctuation quantity; adjusting a current speed of the vehicle to the lower speed bound, and controlling the vehicle to enter a first cruise phase of a two-phase cruise mode; and controlling the vehicle to enter a second cruise phase of the two-phase cruise mode when the current speed of the vehicle is greater than or equal to the upper speed bound and a current traveling mileage is less than the preset traveling mileage.
    Type: Application
    Filed: July 11, 2019
    Publication date: October 31, 2019
    Inventors: Shengbo LI, Bo CHENG, Keqiang LI, Hongbo GAO, Qingfeng LIN, Xuedong LIU, Zhitao WANG, Ziyu LIN, Jianqiang WANG, Yugong LUO, Diange YANG
  • Publication number: 20190333732
    Abstract: The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.
    Type: Application
    Filed: December 22, 2017
    Publication date: October 31, 2019
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhong-wei CHEN
  • Publication number: 20190279844
    Abstract: The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.
    Type: Application
    Filed: March 7, 2019
    Publication date: September 12, 2019
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhong-wei CHEN
  • Publication number: 20190279842
    Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.
    Type: Application
    Filed: March 18, 2019
    Publication date: September 12, 2019
    Inventors: Weiming REN, Shuai LI, Xuedong LIU, Zhongwei CHEN, Jack JAU
  • Patent number: 10395886
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Grant
    Filed: July 21, 2016
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Publication number: 20190259573
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Application
    Filed: April 29, 2019
    Publication date: August 22, 2019
    Inventors: Weiming REN, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Publication number: 20190172677
    Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.
    Type: Application
    Filed: November 26, 2018
    Publication date: June 6, 2019
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhongwei CHEN
  • Patent number: 10276347
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: April 30, 2019
    Assignee: HERMES MICROVISION INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Patent number: 10236156
    Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: March 19, 2019
    Assignee: HERMES MICROVISION INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen, Jack Jau
  • Publication number: 20190074157
    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
    Type: Application
    Filed: October 29, 2018
    Publication date: March 7, 2019
    Inventors: Xuedong LIU, Weiming REN, Shuai LI, Zhongwei CHEN
  • Publication number: 20190057837
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Application
    Filed: October 22, 2018
    Publication date: February 21, 2019
    Inventors: Weiming REN, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Publication number: 20190035595
    Abstract: Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.
    Type: Application
    Filed: July 27, 2018
    Publication date: January 31, 2019
    Inventors: Weiming REN, Xuedong Liu, Xuerang Hu, Xinan Luo, Zhongwei Chen
  • Publication number: 20180350555
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
    Type: Application
    Filed: March 19, 2018
    Publication date: December 6, 2018
    Inventors: Shuai LI, Weiming REN, Xuedong LIU, Juying DOU, Xuerang HU, Zhongwei CHEN
  • Patent number: 10141160
    Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.
    Type: Grant
    Filed: November 30, 2016
    Date of Patent: November 27, 2018
    Assignee: HERMES MICROVISION, INC.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Patent number: RE47690
    Abstract: The present invention relates to novel hydroxamic acids which are specific histone deacetylase (HDAC) inhibitors and/or TTK/Mps1 kinase inhibitors, including pharmaceutically acceptable salts thereof, which are useful for modulating HDAC and/or TTK/Mps1 kinase activity, pharmaceutical compositions comprising these compounds, and processes for their preparation.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: November 5, 2019
    Assignee: The Regents of the University of Colorado, A Body Corporate
    Inventors: Xuedong Liu, Gan Zhang, Daniel Chuen-Fong Chan, Anthony D. Piscopio