Patents by Inventor Xuedong Liu

Xuedong Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210384008
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
    Type: Application
    Filed: July 12, 2021
    Publication date: December 9, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Shuai LI, Weiming REN, Xuedong LIU, Juying DOU, Xuerang HU, Zhongwei CHEN
  • Publication number: 20210319977
    Abstract: Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.
    Type: Application
    Filed: April 8, 2021
    Publication date: October 14, 2021
    Inventors: Xuedong LIU, Weimin ZHOU, Xiaoxue CHEN, Xiaoyu JI, Heng LI, Shahedul HOQUE, Zongyao LI, Shuhao LIU, Weiming REN
  • Publication number: 20210309702
    Abstract: The invention includes systems, methods, and compositions for designing secreted fusogenic ectosome vesicles, or gectosomes, that selectively encapsulate specific target proteins, nucleic acids and/or other small molecules in a predetermined manner. These engineered gectosomes can be used to deliver desired cargos to receipt cells in vitro, ex vivo, or in vivo and may further reprogram target cellular phenotypes in a dose-dependent manner, as well as perform genome editing functions, among others.
    Type: Application
    Filed: February 1, 2021
    Publication date: October 7, 2021
    Inventors: Xuedong Liu, Xiaojuan Zhang, Zeyu Liu, Quanbin Xu
  • Patent number: 11107657
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: May 4, 2020
    Date of Patent: August 31, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Publication number: 20210244686
    Abstract: The invention includes the use of cannabidiol (CBD), and cannabidiol analogs, as therapeutic compounds or formulations for the increase of lipid order in the cell membranes of a patient. This increase in membrane lipid order may cause downstream therapeutic effects that may ameliorate certain disease conditions such as cardio vascular disease, high-cholesterol and Alzheimer's disease.
    Type: Application
    Filed: June 24, 2019
    Publication date: August 12, 2021
    Inventors: Xuedong Liu, Douglas Chapnick, William Old
  • Publication number: 20210233736
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Application
    Filed: December 28, 2020
    Publication date: July 29, 2021
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhongwei CHEN
  • Publication number: 20210217582
    Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
    Type: Application
    Filed: June 7, 2019
    Publication date: July 15, 2021
    Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Joost Jeroen OTTENS, Long MA, Youfei JIANG, Weihua YIN, Wei-Te LI, Xuedong LIU
  • Patent number: 11062874
    Abstract: The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: July 13, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen
  • Patent number: 11062877
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
    Type: Grant
    Filed: January 3, 2020
    Date of Patent: July 13, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Shuai Li, Weiming Ren, Xuedong Liu, Juying Dou, Xuerang Hu, Zhongwei Chen
  • Publication number: 20210193437
    Abstract: Systems and methods of forming images of a sample using a multi-beam apparatus are disclosed. The method may include generating a plurality of secondary electron beams from a plurality of probe spots on the sample upon interaction with a plurality of primary electron beams. The method may further include adjusting an orientation of the plurality of primary electron beams interacting with the sample, directing the plurality of secondary electron beams away from the plurality of primary electron beams, compensating astigmatism aberrations of the plurality of directed secondary electron beams, focusing the plurality of directed secondary electron beams onto a focus plane, detecting the plurality of focused secondary electron beams by a charged-particle detector, and positioning a detection plane of the charged-particle detector at or close to the focus plane.
    Type: Application
    Filed: December 18, 2020
    Publication date: June 24, 2021
    Inventors: Weiming REN, Zizhou GONG, Xuerang HU, Xuedong LIU, Zhong-wei CHEN
  • Publication number: 20210193433
    Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.
    Type: Application
    Filed: October 19, 2020
    Publication date: June 24, 2021
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhongwei CHEN
  • Patent number: 11043354
    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
    Type: Grant
    Filed: February 24, 2020
    Date of Patent: June 22, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Xuedong Liu, Weiming Ren, Shuai Li, Zhongwei Chen
  • Publication number: 20210181181
    Abstract: Provided are FRET-based biosensor constructs, and multiplexed platforms or arrays of these biosensor constructs useful for screening candidate drug molecules for efficacy and/or specificity of drug activity. Optionally the biosensor constructs may be located on an inner membrane within a cell or engineered to be located on the cell's surface. The cells or cell lines displaying the biosensors on a cell surface may be arranged as an array of cells for high throughput evaluation of the efficacy and/or specificity of drug candidates, such as a library of candidate drug compounds.
    Type: Application
    Filed: December 14, 2018
    Publication date: June 17, 2021
    Inventors: Xuedong Liu, Douglas A. Chapnick, William Old, Tristan D. Mcclure-Begley, Eric Bunker
  • Publication number: 20210151280
    Abstract: An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro-structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.
    Type: Application
    Filed: December 28, 2020
    Publication date: May 20, 2021
    Inventors: Xuerang HU, Xuedong LIU, Zhong-Wei CHEN, Weiming REN
  • Publication number: 20210151291
    Abstract: The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.
    Type: Application
    Filed: January 11, 2021
    Publication date: May 20, 2021
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhong-wei CHEN
  • Publication number: 20210116398
    Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.
    Type: Application
    Filed: October 16, 2020
    Publication date: April 22, 2021
    Inventors: Weiming REN, Xuedong LIU, Zhong-wei CHEN, Xiaoyu JI, Xiaoxue CHEN, Weimin ZHOU, Frank Nan ZHANG
  • Patent number: 10892138
    Abstract: The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.
    Type: Grant
    Filed: March 7, 2019
    Date of Patent: January 12, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen
  • Patent number: 10879032
    Abstract: An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro-structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.
    Type: Grant
    Filed: May 1, 2019
    Date of Patent: December 29, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Xuerang Hu, Xuedong Liu, Zhong-wei Chen, Weiming Ren
  • Patent number: 10879031
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: December 29, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Publication number: 20200388464
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Application
    Filed: May 4, 2020
    Publication date: December 10, 2020
    Inventors: Weiming REN, Shuai LI, Xuedong LIU, Zhongwei CHEN