Patents by Inventor Xuedong Liu

Xuedong Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230411110
    Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.
    Type: Application
    Filed: May 5, 2023
    Publication date: December 21, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Xuerang HU, Xuedong LIU, Weiming REN, Zhong-wei CHEN
  • Publication number: 20230377831
    Abstract: A method of operating a secondary imaging system of a charged particle beam apparatus may include using an anti-scanning mode. Excitation of a component of the secondary imaging system may be adjusted synchronously with a primary scanning deflection unit. Together with an anti-scanning deflection unit performing anti-scanning, a component of the secondary imaging system, such as a lens, may be adjusted in step. As scanning and anti-scanning is performed, excitation parameters of the component may also be constantly updated.
    Type: Application
    Filed: September 2, 2021
    Publication date: November 23, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Oleg KRUPIN, Weiming REN, Xuerang HU, Xuedong LIU
  • Publication number: 20230360877
    Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.
    Type: Application
    Filed: May 8, 2023
    Publication date: November 9, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Xuedong LIU, Qingpo XI, Youfei JIANG, Weiming REN, Xuerang HU, Zhongwei CHEN
  • Patent number: 11804356
    Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.
    Type: Grant
    Filed: March 28, 2022
    Date of Patent: October 31, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Xuerang Hu, Weiming Ren, Xuedong Liu, Zhong-wei Chen
  • Publication number: 20230305146
    Abstract: Disclosed is a linear array ultrasonic probe, of which a first conductive layer is arranged on an outer wall of a backing body facing an array element layer by means of a gold spraying, electroplating, or chemical plating process, and/or a second conductive layer is arranged on a negative end by means of a gold spraying, electroplating, or chemical plating process, so that a thickness of at least one of the first conductive layer and the second conductive layer can be made thinner, for example, the thickness a?5 micrometers.
    Type: Application
    Filed: March 28, 2022
    Publication date: September 28, 2023
    Inventors: Jinchi WANG, Nan CHEN, Fei WU, Ming TANG, Xuedong LIU
  • Publication number: 20230305126
    Abstract: Embodiments of the disclosure provide an ultrasound beamforming method and device. The method includes: obtaining channel data of a target tissue; and processing the channel data using at least two different ultrasound beamforming methods to obtain image data of the target tissue corresponding to the different ultrasound beamforming methods, where the at least two different ultrasound beamforming methods are different in at least one of principle, step, and parameter.
    Type: Application
    Filed: March 28, 2022
    Publication date: September 28, 2023
    Inventors: Chongchong GUO, Jing LIU, Bo YANG, Lei LI, Xuedong LIU, Muqing LIN, Qiang LIU
  • Publication number: 20230280293
    Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.
    Type: Application
    Filed: February 17, 2023
    Publication date: September 7, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Xuerang HU, Xinan LUO, Qingpo XI, Xuedong LIU, Weiming REN
  • Publication number: 20230282441
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Application
    Filed: January 23, 2023
    Publication date: September 7, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhongwei CHEN
  • Publication number: 20230274906
    Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
    Type: Application
    Filed: September 1, 2022
    Publication date: August 31, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Joost Jeroen OTTENS, Long MA, Youfei JIANG, Weihua YIN, Wei-Te LI, Xuedong LIU
  • Patent number: 11721521
    Abstract: The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.
    Type: Grant
    Filed: March 17, 2022
    Date of Patent: August 8, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen
  • Patent number: 11705304
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
    Type: Grant
    Filed: July 12, 2021
    Date of Patent: July 18, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Shuai Li, Weiming Ren, Xuedong Liu, Juying Dou, Xuerang Hu, Zhongwei Chen
  • Patent number: 11688580
    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
    Type: Grant
    Filed: June 21, 2021
    Date of Patent: June 27, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Xuedong Liu, Weiming Ren, Shuai Li, Zhongwei Chen
  • Patent number: 11676793
    Abstract: An electromagnetic compound lens may be configured to focus a charged particle beam. The compound lens may include an electrostatic lens provided on a secondary optical axis and a magnetic lens also provided on the secondary optical axis. The magnetic lens may include a permanent magnet. A charged particle optical system may include a beam separator configured to separate a plurality of beamlets of a primary charged particle beam generated by a source along a primary optical axis from secondary beams of secondary charged particles. The system may include a secondary imaging system configured to focus the secondary beams onto a detector along the secondary optical axis. The secondary imaging system may include the compound lens.
    Type: Grant
    Filed: November 8, 2019
    Date of Patent: June 13, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen
  • Patent number: 11676792
    Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: June 13, 2023
    Assignee: ASML Netherlands, B.V
    Inventors: Xuedong Liu, Qingpo Xi, Youfei Jiang, Weiming Ren, Xuerang Hu, Zhongwei Chen
  • Publication number: 20230178328
    Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.
    Type: Application
    Filed: March 18, 2021
    Publication date: June 8, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Yongxin WANG, Zhonghua DONG, Xiaoyu JI, Shahedul HOQUE, Weiming REN, Xuedong LIU, Guofan YE, Kuo-Chin CHIEN
  • Patent number: 11670477
    Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.
    Type: Grant
    Filed: October 2, 2018
    Date of Patent: June 6, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Xuerang Hu, Xuedong Liu, Weiming Ren, Zhong-wei Chen
  • Publication number: 20230170180
    Abstract: Apparatus and methods for adjusting beam condition of charged particles are disclosed. According to certain embodiments, the apparatus includes one or more first multipole lenses displaced above an aperture, the one or more first multipole lenses being configured to adjust a beam current of a charged-particle beam passing through the aperture. The apparatus also includes one or more second multipole lenses displaced below the aperture, the one or more second multipole lenses being configured to adjust at least one of a spot size and a spot shape of the beam.
    Type: Application
    Filed: January 30, 2023
    Publication date: June 1, 2023
    Applicant: ASML Netherlands B.V.
    Inventor: Xuedong LIU
  • Publication number: 20230107989
    Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.
    Type: Application
    Filed: December 9, 2022
    Publication date: April 6, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Christiaan OTTEN, Peter-Paul CRANS, Marc SMITS, Laura DEL TIN, Christan TEUNISSEN, Yang-Shan HUANG, Stijn Wilem Herman Karel STEENBRINK, Xuerang HU, Qingpo XI, Xinan LUO, Xuedong LIU
  • Patent number: 11614416
    Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.
    Type: Grant
    Filed: October 16, 2019
    Date of Patent: March 28, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Xuerang Hu, Xinan Luo, Qingpo Xi, Xuedong Liu, Weiming Ren
  • Patent number: 11594396
    Abstract: A multi-beam inspection apparatus supporting a plurality of operation modes is disclosed. The charged particle beam apparatus for inspecting a sample supporting a plurality of operation modes comprises a charged particle beam source configured to emit a charged particle beam along a primary optical axis, a movable aperture plate, movable between a first position and a second position, and a controller having circuitry and configured to change the configuration of the apparatus to switch between a first mode and a second mode. In the first mode, the movable aperture plate is positioned in the first position and is configured to allow a first charged particle beamlet derived from the charged particle beam to pass through. In the second mode, the movable aperture plate is positioned in the second position and is configured to allow the first charged particle beamlet and a second charged particle beamlet to pass through.
    Type: Grant
    Filed: March 30, 2020
    Date of Patent: February 28, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-Wei Chen