Abstract: The present invention relates to a process of producing a polyimide-type copolymer, to a thin layer forming agent, to a liquid crystal alignment layer and to processes of producing thin layer formation agents and liquid crystal alignment layers. More specifically, this invention relates to a polyamic acid block copolymer, a polyimide block copolymer, a polyimide-polyamic acid block copolymer, a thin layer forming agent comprised of a polyimide-type block copolymer, and a liquid crystal alignment layer comprised of a polyimide-type block copolymer and processes of their production.

Abstract: A liquid crystal aligning agent, which contains (1) at least one polymer selected from a polyamic acid and an imidized polymer therefrom; (2) at least one first solvent selected from the group consisting of N-alkyl-2-pyrrolidones, lactones and 1,3-dialkyl-2-imidazolidinones; (3) at least one second solvent from (a) a phenyl ether solvent of the formula (I): ##STR1## and (b) an ester ether solvent of the formula (II) ##STR2## wherein R.sup.1 -R.sup.6, a, b and c are as defined herein.

Abstract: A liquid crystal-aligning agent comprising at least one of a polyamic acid obtained by reacting (A) a tetracarboxylic acid dianhydride consisting of 70 to 98 mole % of a dianhydride of a tetracarboxylic acid such as ##STR1## or the like, and 2 to 30 mole % of a dianhydride of a cyclobutanetetracarboxylic acid, and (B) a diamine compound, and a polymer obtained by imidizing the polyamic acid.

Abstract: An electroconductive elastomer-forming composition comprising (a) 100 parts by weight of a vinyl group-containing polydimethylsiloxane having a standard polystyrene-reduced molecular weight of 10,000-40,000, (b) 5-50 parts by weight of a hydrosilyl group-containing polydimethylsiloxane having a standard polystyrene-reduced molecular weight of 10,000-40,000 and (c) 30-1,000 parts by weight of electroconductive particles. Said composition can form a conductor of small thickness having good conductivity, excellent heat resistance and excellent durability.

Abstract: A resist pattern is formed by(a) forming a thick film of a positive photoresist on a substrate,(b) forming a light-shielding film directly on a surface of the thick film of the positive photoresist,(c) processing the light-shielding film into a pattern,(d) exposing the thick film of the positive photoresist to light, and(e) developing the exposed, thick film of the positive photoresist.According to this method, a thick, fine pattern of a photoresist can be accurately and advantageously formed.

Abstract: A liquid crystal aligning agent containing a polymer selected from the group consisting of a polyamic acid having a steroidal skeleton and an imidized product thereof; and a liquid crystal display device to which the liquid crystal aligning agent is applied.

Abstract: A curable composition comprising (a) an amic acid compound and/or an imide compound each containing a silicon atom having at least one hydrolyzable group and (b) an organosilane compound represented by the formula (I): ##STR1## wherein R.sup.1 -R.sub.6, which may be the same or different, are alkyl groups of 1-10 carbon atoms or aryl groups of 6-10 carbon atoms. Said composition is suitably used for the formation of a protective film for a transparent substrate or a color filter in liquid crystal display devices.