Abstract: An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surface (102), and a marker forming step of forming a marker (106a to 106d) for identifying or managing the substrate on each of at least a plurality of end faces among four end faces (104a to 104d) of the substrate. The four end faces are continuous with sides of the main surface, respectively.

Abstract: In a method of manufacturing a mask blank adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching of the light-shielding film which are formed in this order on a transparent substrate, when forming the etching mask film, shielding is performed using a shielding plate so as to prevent the etching mask film from being formed at least at a side surface of the substrate.

Abstract: An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surface (102), and a marker forming step of forming a marker (106a to 106d) for identifying or managing the substrate on each of at least a plurality of end faces among four end faces (104a to 104d) of the substrate. The four end faces are continuous with sides of the main surface, respectively.

Abstract: A photomask manufacturing method includes a defect information storage step of storing defect information of a mask blank, provided with an identification marker on an end face thereof, into an information storage device in correspondence to the identification marker, a placing orientation determination step of determining a placing orientation of the mask blank with respect to an exposure/writing apparatus, and an orientation correction step of performing rotation control of a rotating apparatus so that an orientation of the mask blank coincides with the determined placing orientation.

Abstract: A mask blank glass substrate is for use in manufacturing a mask blank. In the mask blank glass substrate, a marker expressing, by a plurality of pits, information for identifying or managing the mask blank glass substrate is formed on a surface of a region, having no influence on formation of a transfer pattern, of the mask blank glass substrate. Each of the pits forming the marker is a round hole with its edge portion being generally circular and a distance L1 between the edge portions of the adjacent pits is 50 ?m or more. The marker is formed, for example, on an end face of the mask blank glass substrate.

Abstract: Disclosed is a phase shift mask blank (11) that can prevent the occurrence of a loading effect. The phase shift mask blank (11) includes a phase shift film (5) containing silicon, a light-shielding film (2) made of a material resistant to etching of the phase shift film (5), and an etching mask film (3) made of an inorganic material resistant to etching of the light-shielding film (2), which are formed in this order on a substrate (1) transparent to exposure light. Assuming that the thickness of the phase shift film (5) is t1, the etching rate of the phase shift film (5) by dry etching with an etchant using the etching mask film (3) and the light-shielding film (2) as a mask is v1, the thickness of the etching mask film (3) is t2, and the etching rate of the etching mask film (3) by dry etching with the above etchant is v2, (t1/v1)?(t2/v2) is satisfied.

Abstract: It is provided a photomask blank that has good flatness when a light-shielding film is patterned and hence can provide a good mask pattern accuracy and a good pattern transfer accuracy, and a method of producing a photomask. A photomask blank of the present invention includes a light-shielding film containing at least chromium on a light-transmitting substrate. The light-shielding film is formed so as to cause a desired film stress in the direction opposite to that of a change in the film stress that is anticipated to be caused in the light-shielding film by heat treatment according to a resist film formed on the light-shielding film. A photomask is produced by patterning the light-shielding film of the photomask blank by dry etching.

Abstract: A plasticizer comprising an ester compound produced by a condensation reaction of an organic acid represented by Formula (1) with a polyhydric alcohol having at least 3 hydroxyl groups in the molecule,

Abstract: There are provided a photomask blank which is capable of preventing static buildup caused by electron beam pattern drawing for forming a resist pattern, a photomask blank which provides a good pattern accuracy through optimization of the dry etching rate along the depth direction of the shielding film, and a photomask blank which is capable of reducing the dry etching time by increasing the dry etching rate of the shielding film. The photomask blank of the present invention includes a translucent substrate having thereon a shielding film composed mainly of chromium and the shielding film contains hydrogen. The shielding film is formed in such a manner that the film formation rate of the layer at the surface side is lower than the film formation rate of the layer at the translucent substrate side of the shielding film. The dry etching rate of the shielding film is lower at the translucent substrate side than at the surface side.

Abstract: In a method of manufacturing a mask blank adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching of the light-shielding film which are formed in this order on a transparent substrate, when forming the etching mask film, shielding is performed using a shielding plate so as to prevent the etching mask film from being formed at least at a side surface of the substrate.

Abstract: A mask blank is formed on a transparent substrate with a light-shielding film of a material mainly containing chromium and is used for obtaining a photomask by forming the light-shielding film into a transfer pattern by lithography using an electron beam writing resist. The mask blank includes a mask layer formed on the light-shielding film for serving as an etching mask in etching that forms the light-shielding film into the transfer pattern. The mask layer is made of a material containing silicon. The mask blank further includes a chromium nitride-based film formed on the mask layer and containing at least chromium and nitrogen.

Abstract: An objective is to provide a cellulose ester film which can reduce a manufacturing burden and a facility burden caused by drying and recovering of a solvent used in the production process, a manufacturing method of the cellulose ester film and an optical film, and to specifically provide a polarizing plate employing the optical film as an excellent polarizing plate protective film exhibiting reduced fluctuation of retardation property in the width direction and a liquid crystal display employing the polarizing plate. Also disclosed is a cellulose ester film containing at least one compound having a phenol structure and a phosphite ester structure in a molecule.

Abstract: An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surface (102), and a marker forming step of forming a marker (106a to 106d) for identifying or managing the substrate on each of at least a plurality of end faces among four end faces (104a to 104d) of the substrate. The four end faces are continuous with sides of the main surface, respectively.

Abstract: In a photomask blank serving as a base member for producing a halftone-type phase shift mask in which a light-transmissive substrate is formed thereon with a light-semitransmissive phase shift pattern having a desired opening, a light-semitransmissive phase shift film, a chromium film, and an etching mask film are stacked in order on the light-transmissive substrate. The etching mask film is made of an inorganic-based material having a resistance against dry etching of the chromium film. The photomask blank further may has a resist film formed on the etching mask film.

Abstract: A transparent conductive film comprising at least a transparent plastic film, a gas barrier layer and a transparent conductive layer is characterized in that the refractive index thereof is so regulated as to decrease continuously or stepwise from the side having the transparent conductive layer to the other side. Also disclosed are a method for producing such a film efficiently, and an organic EL device which is characterized by comprising an organic electroluminescent element-forming layer on such a transparent conductive film and having a high luminance (namely emission luminance).

Abstract: A method for manufacturing a cellulose ester film comprising the steps of 1) mixing a cellulose ester exhibiting a water content of not greater than 3.0 weight %, at least one plasticizer selected from the groups A and B in an amount of one to thirty weight % of the cellulose ester, and at least one additive selected from the groups of C and D in an amount of 0.01 to 5 weight % of the cellulose ester to obtain a mixture, group A: ester plasticizers formed from a polyhydric alcohol and a monohydric carboxylic acid; group B: ester plasticizers formed from a polyhydric carboxylic acid and a monohydric alcohol; group C: hindered phenol anti-oxidants; group D: hindered amine light stabilizers, 2) heating to melt the mixture at a temperature (Tm) of between 150 and 300° C., and 3) forming a cellulose ester film with a melt casting method employing the melted mixture.

Abstract: A transparent resin film for an electronic display and its manufacturing method are disclosed, the transparent resin film having an ultraviolet light transmittance of not less than 50%, the ultraviolet light having a wavelength range of from 250 to 450 nm, and having a glass transition temperature of not less than 180° C., the glass transition temperature being measured according to thermal stress strain measurement (TMA).

Abstract: A film substrate of an electronic displaying element, an electronic optical element, a touch panel, or a solar battery is disclosed which is composed mainly of an organic polymer having water solubility of 0 to 5 g based on 100 g of 25° C. water and having acetone solubility of 25 to 100 g based on 100 g of 25° C. acetone and an inorganic condensation polymer of a reactive metal compound capable of being condensed.

Abstract: A transparent resin film for an electronic display and its manufacturing method are disclosed, the transparent resin film having an ultraviolet light transmittance of not less than 50%, the ultraviolet light having a wavelength range of from 250 to 450 nm, and having a glass transition temperature of not less than 180° C., the glass transition temperature being measured according to thermal stress strain measurement (TMA).

Abstract: An electroluminescent element is disclosed, comprising an electroluminescent material and a fluorescent substance emitting light having an emission maximum at the wavelength different from that of light emitted from the electroluminescent material upon absorption of the light emitted from the electroluminescent material. A color conversion filter is also disclosed, comprising a fluorescent substance emitting light having an emission maximum at the wavelengths of 400 to 700 nm upon absorption of the light emitted from the electroluminescent material.