Patents by Inventor Yen-Hao Chen
Yen-Hao Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10867642Abstract: Systems and methods for processing commands at a random access memory. A series of commands are received to read data from the random access memory or to write data to the random access memory. The random access memory can process commands at a first rate when the series of commands matches a pattern, and at a second, slower, rate when the series of commands does not match the pattern. A determination is made as to whether the series of commands matches the pattern based on at least a current command and a prior command in the series of commands. A ready signal is asserted when said determining determines that the series of commands matches the pattern, where the random access memory is configured to receive and process commands faster than the second rate when the pattern is matched and the ready signal is asserted over a period of multiple commands.Type: GrantFiled: November 2, 2016Date of Patent: December 15, 2020Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Hsin-Cheng Chen, Jung-Rung Jiang, Yen-Hao Huang
-
Publication number: 20200388542Abstract: A method of forming a fin field effect transistor (finFET) on a substrate includes forming a fin structure on the substrate and forming a shallow trench isolation (STI) region on the substrate. First and second fin portions of the fin structure extend above a top surface of the STI region. The method further includes oxidizing the first fin portion to convert a first material of the first fin portion to a second material. The second material is different from the first material of the first fin portion and a material of the second fin portion. The method further includes forming an oxide layer on the oxidized first fin portion and the second fin portion and forming first and second polysilicon structures on the oxide layer.Type: ApplicationFiled: August 24, 2020Publication date: December 10, 2020Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Kuo-Cheng CHIANG, Chih-Hao WANG, Kuan-Lun CHENG, Yen-Ming CHEN
-
Patent number: 10854973Abstract: An antenna apparatus and an electronic apparatus are provided. The electronic apparatus includes the antenna apparatus. The antenna apparatus includes a radiator, a first and a second impedance control circuit. The radiator receives and transmits a radio frequency (RF) signal. The first impedance control circuit is electrically connected to the radiator and transmits the RF signal. The second impedance control circuit includes an impedance matching circuit and an inductor. The first end of the impedance matching circuit is electrically connected to the radiator. The impedance matching circuit adjusts the impedance matching of the radiator and transmits a sensing signal. The inductor is electrically connected to the second end of the impedance matching circuit. The inductor transmits a sensing signal, and blocks the RF signal. Accordingly, the structures of the antenna and the circuit can be simplified, and the influence between the RF signal and the sensing signal can be reduced.Type: GrantFiled: May 13, 2019Date of Patent: December 1, 2020Assignee: COMPAL ELECTRONICS, INC.Inventors: An-Yao Chou, Shih-Chia Liu, Yen-Hao Yu, Li-Chun Lee, Jhin-Ciang Chen, Chao-Lin Wu, Jui-Hung Lai
-
Patent number: 10833033Abstract: The present disclosure, in some embodiments, relates to a bump structure. The bump structure includes a conductive layer and a solder layer. The solder layer is disposed vertically below and laterally between portions of the conductive layer along a cross-section. The conductive layer is continuous between the portions.Type: GrantFiled: July 1, 2019Date of Patent: November 10, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chih-Horng Chang, Tin-Hao Kuo, Chen-Shien Chen, Yen-Liang Lin
-
Publication number: 20200310250Abstract: Various methods are disclosed herein for reducing (or eliminating) printability of mask defects during lithography processes. An exemplary method includes performing a first lithography exposing process and a second lithography exposing process using a mask to respectively image a first set of polygons oriented substantially along a first direction and a second set of polygons oriented substantially along a second direction on a target. During the first lithography exposing process, a phase distribution of light diffracted from the mask is dynamically modulated to defocus any mask defect oriented at least partially along both the first direction and a third direction that is different than the first direction. During the second lithography exposing process, the phase distribution of light diffracted from the mask is dynamically modulated to defocus any mask defect oriented at least partially along both the second direction and a fourth direction that is different than the third direction.Type: ApplicationFiled: June 12, 2020Publication date: October 1, 2020Inventors: Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Jeng-Horng Chen, Anthony Yen
-
Patent number: 10790321Abstract: The present disclosure relates to a CMOS image sensor, and an associated method of formation. In some embodiments, the CMOS image sensor comprises a floating diffusion region disposed at one side of a transfer gate within a substrate and a photo detecting column disposed at the other side of the transfer gate opposing to the floating diffusion region within the substrate. The photo detecting column comprises a doped sensing layer with a doping type opposite to that of the substrate. The photo detecting column and the substrate are in contact with each other at a junction interface comprising one or more recessed portions. By forming the junction interface with recessed portions, the junction interface is enlarged compared to a previous p-n junction interface without recessed portions, and thus a full well capacity of the photodiode structure is improved.Type: GrantFiled: June 25, 2018Date of Patent: September 29, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chia-Yu Wei, Hsin-Chi Chen, Kuo-Cheng Lee, Ping-Hao Lin, Hsun-Ying Huang, Yen-Liang Lin, Yu Ting Kao
-
Patent number: 10788906Abstract: A manufacturing method of the flexible panel is provided. Firstly, a carrier substrate is provided. Then, an adhesion layer is formed on the carrier substrate, a flexible substrate is formed on the adhesion layer, and a buffer layer is formed on the flexible substrate. Then, a device layer is formed on the flexible substrate. Next, a separating process is performed for separating the flexible substrate and the device layer from the carrier substrate. According to a relation between a thermal expansion coefficient of the flexible substrate and a thermal expansion coefficient of the carrier substrate, the manufacturing method of the flexible panel selects a pattern of the adhesion layer. The pattern of the adhesion layer includes a frame adhesion structure or a plane adhesion structure.Type: GrantFiled: September 29, 2017Date of Patent: September 29, 2020Assignees: HannStar Display (Nanjing) Corporation, HANNSTAR DISPLAY CORPORATIONInventors: Yen-Chung Chen, Wei-Chih Hsu, Chen-Hao Su
-
Publication number: 20200304133Abstract: A clock distribution circuit configured to output a clock signal includes a first circuit configured to use a reference clock signal to provide first and second reference signals, wherein the second reference signal indicates whether the first reference signal is locked with the reference clock signal; a second circuit configured to use the reference clock signal to provide an output signal and an indication signal indicative whether the output signal is locked with the reference clock signal; and a monitor circuit, coupled to the first and second circuits, and configured to use at least one of the first reference signal, the second reference signal, the output signal, and the indication signal to determine whether the second circuit is functioning correctly.Type: ApplicationFiled: June 5, 2020Publication date: September 24, 2020Inventors: Sandeep Kumar GOEL, Ji-Jan CHEN, Stanley JOHN, Yun-Han LEE, Yen-Hao HUANG
-
Patent number: 10766031Abstract: The present disclosure relates to a microfluidic-based analyzer, including a drive module and a microfluidic disc. On the microfluidic disk, a capillary is connected between a mixing chamber and a waste chamber. More particularly, the capillary is connected to the mixing chamber through a first access on the first radius of the microfluidic disc, and the capillary is connected to the waste chamber through a second access on the second radius of the microfluidic disk. Specifically, a turn of the capillary is disposed between the first access and the second access, in which a folding is configured on a third radius of the microfluidic disc. Overall, the aforementioned microfluidic-based analyzer is able to be operated in different rotational speeds and is capable of evacuating the mixing chamber and enhancing the washing efficiency.Type: GrantFiled: May 3, 2018Date of Patent: September 8, 2020Assignee: FENG CHIA UNIVERSITYInventors: Chih-Hsin Shih, Ho-Chin Wu, Yen-Hao Chen
-
Patent number: 10771107Abstract: A circuit device includes a positive phase signal line, a negative phase signal line and a single-ended signal line. The positive phase signal line includes a first positive-phase-signal-line terminal and a second positive-phase-signal-line terminal for transmitting a first signal. The negative phase signal line includes a first negative-phase-signal-line terminal and a second negative-phase-signal-line terminal for transmitting a second signal. The single-ended signal line is disposed between the positive phase signal line and the negative phase signal line, and includes a first single-ended signal line terminal and a second single-ended signal line terminal for transmitting a single-ended signal. The first signal of the positive phase signal line causes a first noise on the single-ended signal line. The second signal of the negative phase signal line causes a second noise on the single-ended signal line. The first noise and the second noise eliminate one another.Type: GrantFiled: December 17, 2018Date of Patent: September 8, 2020Assignees: Inventec (Pudong) Technology Corp., Inventec CorporationInventor: Yen-Hao Chen
-
Patent number: 10755983Abstract: A method of forming a fin field effect transistor (finFET) on a substrate includes forming a fin structure on the substrate and forming a shallow trench isolation (STI) region on the substrate. First and second fin portions of the fin structure extend above a top surface of the STI region. The method further includes oxidizing the first fin portion to convert a first material of the first fin portion to a second material. The second material is different from the first material of the first fin portion and a material of the second fin portion. The method further includes forming an oxide layer on the oxidized first fin portion and the second fin portion and forming first and second polysilicon structures on the oxide layer.Type: GrantFiled: November 29, 2018Date of Patent: August 25, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Kuo-Cheng Chiang, Chih-Hao Wang, Kuan-Lun Cheng, Yen-Ming Chen
-
Patent number: 10741926Abstract: A slot antenna structure for an electronic tag includes a dielectric layer, a conductor layer, a slot area and a capacitance adjustment unit. The electronic tag includes an identification chip. The conductor layer is disposed on the dielectric layer. The slot area is disposed in the conductor layer and includes an open slot, an open end and at least one closed slot. The open end is located at an edge of the conductor layer and extends inwardly to form the open slot for disposing the identification chip. The open slot has two sidewalls, and the two sidewalls have at least one turning point at a bottom portion of the open slot to form the closed slot. The capacitance adjustment unit is disposed on a surface of the dielectric layer different from the conductor layer to correspond to the slot area, thereby generating a capacitance effect.Type: GrantFiled: January 18, 2017Date of Patent: August 11, 2020Assignee: Compal Electronics, Inc.Inventors: Li-Chun Lee, Shih-Chia Liu, Yen-Hao Yu, Jhin-Ciang Chen, Chao-Lin Wu, Jui-Hung Lai
-
Patent number: 10732725Abstract: A method of interactive display based on gesture recognition includes determining a plurality of gestures corresponding to a plurality of images, interpreting a predetermined combination of gestures among the plurality of gestures as a command, and displaying a scene in response to the command.Type: GrantFiled: September 25, 2018Date of Patent: August 4, 2020Assignee: XRSpace CO., LTD.Inventors: Peter Chou, Feng-Seng Chu, Yen-Hung Lin, Shih-Hao Ke, Jui-Chieh Chen
-
Patent number: 10714394Abstract: A method of forming a fin field effect transistor (finFET) on a substrate includes forming a fin structure on the substrate and forming a shallow trench isolation (STI) region on the substrate. First and second fin portions of the fin structure extend above a top surface of the STI region. The method further includes oxidizing the first fin portion to convert a first material of the first fin portion to a second material. The second material is different from the first material of the first fin portion and a material of the second fin portion. The method further includes forming an oxide layer on the oxidized first fin portion and the second fin portion and forming first and second polysilicon structures on the oxide layer.Type: GrantFiled: September 28, 2017Date of Patent: July 14, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Kuo-Cheng Ching, Chih-Hao Wang, Kuan-Lun Cheng, Yen-Ming Chen
-
Patent number: 10684552Abstract: Various methods are disclosed herein for reducing (or eliminating) printability of mask defects during lithography processes. An exemplary method includes performing a first lithography exposing process and a second lithography exposing process using a mask to respectively image a first set of polygons oriented substantially along a first direction and a second set of polygons oriented substantially along a second direction on a target. During the first lithography exposing process, a phase distribution of light diffracted from the mask is dynamically modulated to defocus any mask defect oriented at least partially along both the first direction and a third direction that is different than the first direction. During the second lithography exposing process, the phase distribution of light diffracted from the mask is dynamically modulated to defocus any mask defect oriented at least partially along both the second direction and a fourth direction that is different than the third direction.Type: GrantFiled: May 4, 2018Date of Patent: June 16, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Jeng-Horng Chen, Anthony Yen
-
Patent number: 10680627Abstract: A clock distribution circuit configured to output a clock signal includes a first circuit configured to use a reference clock signal to provide first and second reference signals, wherein the second reference signal indicates whether the first reference signal is locked with the reference clock signal; a second circuit configured to use the reference clock signal to provide an output signal and an indication signal indicative whether the output signal is locked with the reference clock signal; and a monitor circuit, coupled to the first and second circuits, and configured to use at least one of the first reference signal, the second reference signal, the output signal, and the indication signal to determine whether the second circuit is functioning correctly.Type: GrantFiled: April 2, 2019Date of Patent: June 9, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Sandeep Kumar Goel, Ji-Jan Chen, Stanley John, Yun-Han Lee, Yen-Hao Huang
-
Patent number: 10678342Abstract: A method of virtual user interface interaction based on gesture recognition comprises detecting two hands in a plurality of images, recognizing each hand's gesture, projecting a virtual user interface on an open gesture hand when one hand is recognized with a point gesture and the other hand is recognized with an open gesture, tracking an index fingertip of the point gesture hand, determining whether the index fingertip of the point gesture hand is close to the open gesture hand within a predefined rule, interpreting a movement of the index fingertip of the point gesture hand as a click command when the index fingertip of the point gesture hand is close to the open gesture hand within the predefined rule, and in response to the click command, generating image data with a character object of the virtual user interface object.Type: GrantFiled: October 21, 2018Date of Patent: June 9, 2020Assignee: XRSpace CO., LTD.Inventors: Peter Chou, Feng-Seng Chu, Yen-Hung Lin, Shih-Hao Ke, Jui-Chieh Chen
-
Publication number: 20200163202Abstract: A noise suppression circuit device includes a baseboard, a decoupling capacitor set, a power bus structure, a band-stop filter unit and an electromagnetic band-gap structure. The decoupling capacitor set is disposed on the baseboard for isolating noise of a first frequency band. The power bus structure is disposed on the baseboard for isolating noise of a second frequency band. The band-stop filter unit is disposed on the baseboard for isolating at least a portion of noise of a third frequency band. The electromagnetic band-gap structure is disposed on the baseboard for isolating noise of a fourth frequency band.Type: ApplicationFiled: December 17, 2018Publication date: May 21, 2020Inventors: Yen-Hao Chen, Lin-Zong Zheng, Ding-Bing Lin, Min-Hung Hsieh
-
Publication number: 20200162126Abstract: A circuit device includes a positive phase signal line, a negative phase signal line and a single-ended signal line. The positive phase signal line includes a first positive-phase-signal-line terminal and a second positive-phase-signal-line terminal for transmitting a first signal. The negative phase signal line includes a first negative-phase-signal-line terminal and a second negative-phase-signal-line terminal for transmitting a second signal. The single-ended signal line is disposed between the positive phase signal line and the negative phase signal line, and includes a first single-ended signal line terminal and a second single-ended signal line terminal for transmitting a single-ended signal. The first signal of the positive phase signal line causes a first noise on the single-ended signal line. The second signal of the negative phase signal line causes a second noise on the single-ended signal line. The first noise and the second noise eliminate one another.Type: ApplicationFiled: December 17, 2018Publication date: May 21, 2020Inventor: Yen-Hao Chen
-
Publication number: 20200161764Abstract: A dual-band antenna is provided. The dual-band antenna includes a first antenna, a second antenna, and a grounding component. The first antenna has a first feed point for transceiving a first signal. The second antenna has a second feed point. The grounding component is electrically coupled to the first feed point and the second feed point, wherein the grounding component forms a first path and a second path between the first feed point and the second feed point, wherein a first path length of the first path and a second path length of the second path are integer multiples of a first wavelength of the first signal.Type: ApplicationFiled: November 13, 2019Publication date: May 21, 2020Applicant: COMPAL ELECTRONICS, INC.Inventors: Wen-Jiao Liao, Jhin-Ciang Chen, Shih-Chia Liu, Liang-Che Chou, Yen-Hao Yu, Li-Chun Lee