Patents by Inventor Yen-Hao Chen

Yen-Hao Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190229755
    Abstract: An antenna apparatus, an electronic apparatus and an antenna modification method are provided. The electronic apparatus includes a multiplexer and the antenna apparatus. The multiplexer combines a control signal and a first radio frequency (RF) signal to form a combination signal. The antenna apparatus includes a feeding portion, a de-multiplexer, a modification circuit and a radiation portion. The feeding portion receives the combination signal. The de-multiplexer separates the combination signal into the control signal and the first RF signal. The modification circuit receives the control signal and the first RF signal, and modifies an impedance. The first RF signal is influenced by the impedance to form a second RF signal. The radiation portion receives the second RF signal. Accordingly, merely single cable would be needed for feeding signals into the antenna apparatus.
    Type: Application
    Filed: January 21, 2019
    Publication date: July 25, 2019
    Applicant: COMPAL ELECTRONICS, INC.
    Inventors: Li-Chun Lee, Shih-Chia Liu, Yen-Hao Yu, Jhin-Ciang Chen, Chao-Lin Wu, Jui-Hung Lai
  • Patent number: 10354965
    Abstract: The present disclosure describes an bonding pad formation method that incorporates an tantalum (Ta) conductive layer to block mobile ionic charges generated during the aluminum-copper (AlCu) metal fill deposition. For example, the method includes forming one or more interconnect layers over a substrate and forming a dielectric over a top interconnect layer of the one or more interconnect layers. A first recess is formed in the dielectric to expose a line or a via from the top interconnect layer. A conductive layer is formed in the first recess to form a second recess that is smaller than the first recess. A barrier metal layer is formed in the second recess to form a third recess that is smaller than the second recess. A metal is formed to fill the third recess.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: July 16, 2019
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shih Wei Bih, Chun-Chih Lin, Sheng-Wei Yeh, Yen-Yu Chen, Chih-Wei Lin, Wen-Hao Cheng
  • Publication number: 20190212773
    Abstract: The application discloses a support device, mounted in a portable electronic device, including an upper-cover shell, a base shell, and a pivot. The support device includes a cam structure, a first rod member, a second rod member, and a support member. The cam structure is connected to the pivot. The first pivot portion and the second pivot are pivotally connected to the base shell. The first rod member is in contact with the cam structure, and includes a first slide portion. The second rod member includes a second slide portion, movably connected to the first slide portion. The support member penetrates through an opening of the base shell, where a top surface of the support member and the second rod member are in contact with each other.
    Type: Application
    Filed: November 30, 2018
    Publication date: July 11, 2019
    Inventors: Cheng-Shi JIANG, Yen-Chi KUO, Tzu-Ming YANG, Yu-Hao CHIU, Yu-Shu ZHENG, Jeng-Hong CHIU, Chih-Ming CHEN, Chih-Liang CHIANG
  • Patent number: 10219366
    Abstract: A multilayer printed circuit board includes an inner circuit layer, a first outer circuit layer, a second outer circuit layer, a via, and a layer of high dielectric dissipation solder resist ink. The first outer circuit layer includes a first trace for transmitting a high frequency signal. The inner circuit layer includes a second trace, and is formed between the first outer circuit layer and the second outer circuit layer. The via is formed from the first outer circuit layer to the second outer circuit layer, and is coupled to the first trace and the second trace. The second trace is coupled to the first trace through the via for transmitting the high frequency signal. The layer of high dielectric dissipation solder resist ink is formed on a terminal of the open stub of the via exposed outside of the second outer circuit layer.
    Type: Grant
    Filed: January 8, 2018
    Date of Patent: February 26, 2019
    Assignees: Inventec (Pudong) Technology Corp., Inventec Corporation
    Inventors: Chun-I Tseng, Mu-Chih Chuang, Wei-Fan Ting, Yen-Hao Chen
  • Publication number: 20180341175
    Abstract: Resist materials having enhanced sensitivity to radiation are disclosed herein, along with methods for lithography patterning that implement such resist materials. An exemplary resist material includes a polymer, a sensitizer, and a photo-acid generator (PAG). The sensitizer is configured to generate a secondary radiation in response to the radiation. The PAG is configured to generate acid in response to the radiation and the secondary radiation. The PAG includes a sulfonium cation having a first phenyl ring and a second phenyl ring, where the first phenyl ring is chemically bonded to the second phenyl ring.
    Type: Application
    Filed: August 6, 2018
    Publication date: November 29, 2018
    Inventors: Yen-Hao Chen, Wei-Han Lai, Chien-Wei Wang, Chin-Hsiang Lin
  • Publication number: 20180318836
    Abstract: The present disclosure relates to a microfluidic-based analyzer, including a drive module and a microfluidic disc. On the microfluidic disk, a capillary is connected between a mixing chamber and a waste chamber. More particularly, the capillary is connected to the mixing chamber through a first access on the first radius of the microfluidic disc, and the capillary is connected to the waste chamber through a second access on the second radius of the microfluidic disk. Specifically, a turn of the capillary is disposed between the first access and the second access, in which a folding is configured on a third radius of the microfluidic disc. Overall, the aforementioned microfluidic-based analyzer is able to be operated in different rotational speeds and is capable of evacuating the mixing chamber and enhancing the washing efficiency.
    Type: Application
    Filed: May 3, 2018
    Publication date: November 8, 2018
    Inventors: CHIH-HSIN SHIH, HO-CHIN WU, YEN-HAO CHEN
  • Patent number: 10042252
    Abstract: The present disclosure provides a method for lithography patterning in accordance with some embodiments. The method includes forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer, a sensitizer, and a photo-acid generator (PAG), wherein the PAG includes a first phenyl ring and a second phenyl ring both chemically bonded to a sulfur, the first and second phenyl rings being further chemically bonded with enhanced sensitivity; performing an exposing process to the photoresist layer; and developing the photoresist layer, thereby forming a patterned photoresist layer.
    Type: Grant
    Filed: January 23, 2017
    Date of Patent: August 7, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yen-Hao Chen, Wei-Han Lai, Chien-Wei Wang, Chin-Hsiang Lin
  • Publication number: 20180149971
    Abstract: The present disclosure provides a method for lithography patterning in accordance with some embodiments. The method includes forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer, a sensitizer, and a photo-acid generator (PAG), wherein the PAG includes a first phenyl ring and a second phenyl ring both chemically bonded to a sulfur, the first and second phenyl rings being further chemically bonded with enhanced sensitivity; performing an exposing process to the photoresist layer; and developing the photoresist layer, thereby forming a patterned photoresist layer.
    Type: Application
    Filed: January 23, 2017
    Publication date: May 31, 2018
    Inventors: Yen-Hao Chen, Wei-Han Lai, Chien-Wei Wang, Chin-Hsiang Lin
  • Patent number: 9983474
    Abstract: The present disclosure is directed to a photoresist and a method of performing a lithography process using the photoresist. The photoresist contains a polymer and a photo-acid generator. The photo-acid generator contains a sensitizer component, an acid generator component, and a bonding component that bonds the sensitizer component to the acid generator component. The bonding component may be either a single bond or a conjugated bond. The lithography process may be an EUV lithography process or an e-beam lithography process.
    Type: Grant
    Filed: September 11, 2015
    Date of Patent: May 29, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yen-Hao Chen, Chien-Wei Wang
  • Publication number: 20170307803
    Abstract: A display apparatus including an image unit, a light source module and a transparent plate is provided. The image unit has an image display surface which includes a first side and a second side opposite to the first side. The light source module is disposed at the first side of the image display surface, and adapted to serve as a front light source of the image unit to provide a light beam to the image display surface. The transparent plate is disposed above the image display surface.
    Type: Application
    Filed: March 3, 2017
    Publication date: October 26, 2017
    Applicant: Young Lighting Technology Inc.
    Inventors: Hsin-Hung Lee, Yen-Hao Chen, Chao-Chun Cheng, Chiao-Chih Yang, Huei-Tzu Lin
  • Publication number: 20170075216
    Abstract: The present disclosure is directed to a photoresist and a method of performing a lithography process using the photoresist. The photoresist contains a polymer and a photo-acid generator. The photo-acid generator contains a sensitizer component, an acid generator component, and a bonding component that bonds the sensitizer component to the acid generator component. The bonding component may be either a single bond or a conjugated bond. The lithography process may be an EUV lithography process or an e-beam lithography process.
    Type: Application
    Filed: September 11, 2015
    Publication date: March 16, 2017
    Inventors: Yen-Hao Chen, Chien-Wei Wang
  • Publication number: 20170017158
    Abstract: One of the broader forms of the present disclosure relates to a method of making a semiconductor device. The method includes exposing a photoresist layer to a radiation source and applying a hardening agent to the photoresist layer. Therefore after applying the hardening agent a first portion of the photoresist layer has a higher glass transition temperature, higher mechanical strength, than a second portion of the photoresist layer.
    Type: Application
    Filed: July 17, 2015
    Publication date: January 19, 2017
    Inventors: Ya-Ling Cheng, Ching-Yu Chang, Chien-Wei Wang, Yen-Hao Chen
  • Patent number: 9543147
    Abstract: A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating additive in order to form a floating additive region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating additive may comprise an additive group which will decompose along with a fluorine unit bonded to the additive group which will decompose. Additionally, adhesion between the middle layer and the photoresist may be increased by applying an adhesion promotion layer using either a deposition process or phase separation, or a cross-linking may be performed between the middle layer and the photoresist.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: January 10, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Yu Liu, Ching-Yu Chang, Chien-Chih Chen, Yen-Hao Chen
  • Patent number: 9188608
    Abstract: An analysis method for a signal time margin is provided. An input signal is received. The input signal is extracted to obtain a primary waveform, at least one first secondary waveform and at least one second secondary waveform of the input signal. The first secondary waveform and the second secondary waveform are respectively located before and after the primary waveform. Quantities of the first secondary waveform and the second secondary waveform are counted to respectively generate a first quantity and a second quantity. According to the first quantity, the primary waveform and the first secondary waveform, first bit combinations are generated, and according to the second quantity, the primary waveform and the second secondary waveform, second bit combinations are generated. The first and second bit combinations are integrated to generate third bit combinations. Signal analysis is performed on the third bit combinations to obtain a signal time margin.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: November 17, 2015
    Assignees: INVENTEC (PUDONG) TECHNOLOGY CORPORATION, INVENTEC CORPORATION
    Inventor: Yen-Hao Chen
  • Patent number: 8915637
    Abstract: A light source module including a light guide plate, a plurality of light emitting devices, and a plurality of first reflective devices is provided. The light guide plate has a plurality of through holes and a light emitting surface. The through holes pass through the light emitting surface. Each of the through holes has a first side wall and a second side wall opposite the first side wall. At least one of the light emitting devices is disposed in each of the through holes. Each of the light emitting devices is capable emitting a light beam. The light beam enters the light guide plate from the first side wall of the through hole which the light emitting device is disposed in and leaves the light guide plate from the light emitting surface. The first reflective devices are disposed on the second side walls of the through holes.
    Type: Grant
    Filed: March 20, 2013
    Date of Patent: December 23, 2014
    Assignee: Young Lighting Technology Inc.
    Inventors: Chiao-Chih Yang, Chao-Chun Cheng, Hsin-Hung Lee, Wei-Ching Wu, Yen-Hao Chen
  • Publication number: 20140117973
    Abstract: An analysis method for a signal time margin is provided. An input signal is received. The input signal is extracted to obtain a primary waveform, at least one first secondary waveform and at least one second secondary waveform of the input signal. The first secondary waveform and the second secondary waveform are respectively located before and after the primary waveform. Quantities of the first secondary waveform and the second secondary waveform are counted to respectively generate a first quantity and a second quantity. According to the first quantity, the primary waveform and the first secondary waveform, first bit combinations are generated, and according to the second quantity, the primary waveform and the second secondary waveform, second bit combinations are generated. The first and second bit combinations are integrated to generate third bit combinations. Signal analysis is performed on the third bit combinations to obtain a signal time margin.
    Type: Application
    Filed: March 8, 2013
    Publication date: May 1, 2014
    Applicants: INVENTEC CORPORATION, INVENTEC (PUDONG) TECHNOLOGY CORPORATION
    Inventor: Yen-Hao Chen
  • Publication number: 20130286685
    Abstract: A light source module including a light guide plate, a plurality of light emitting devices, and a plurality of first reflective devices is provided. The light guide plate has a plurality of through holes and a light emitting surface. The through holes pass through the light emitting surface. Each of the through holes has a first side wall and a second side wall opposite the first side wall. At least one of the light emitting devices is disposed in each of the through holes. Each of the light emitting devices is capable emitting a light beam. The light beam enters the light guide plate from the first side wall of the through hole which the light emitting device is disposed in and leaves the light guide plate from the light emitting surface. The first reflective devices are disposed on the second side walls of the through holes.
    Type: Application
    Filed: March 20, 2013
    Publication date: October 31, 2013
    Applicant: YOUNG LIGHTING TECHNOLOGY INC.
    Inventors: Chiao-Chih Yang, Chao-Chun Cheng, Hsin-Hung Lee, Wei-Ching Wu, Yen-Hao Chen
  • Patent number: 8050044
    Abstract: A power plane includes a first circuit region and a second circuit region. The length of the first circuit region or second circuit region is related to the noise frequency to be filtered out. The width of the first circuit region can be wider or narrower than the width of the second circuit region. While manufacturing the power plane, a predetermined length is decided according to the resonance frequency of an original power plane, then the proposed power plane is formed with the first circuit region and the second circuit region of a predetermined length, and making the width of the first circuit region wider or narrower than the width of the second circuit region, such that the noises with the resonance frequency can be mitigated.
    Type: Grant
    Filed: August 31, 2007
    Date of Patent: November 1, 2011
    Assignee: Inventec Corporation
    Inventor: Yen-Hao Chen
  • Patent number: D754147
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: April 19, 2016
    Assignee: Acer Incorporated
    Inventors: Yen-Hao Chen, Ching-Chih Chang, Zheng-Yan Lee, Shu-Han Wang, Pin-Hsun Huang
  • Patent number: D756406
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: May 17, 2016
    Assignee: Acer Incorporated
    Inventors: Yen-Hao Chen, Ching-Chih Chang, Zheng-Yan Lee, Shu-Han Wang, Pin-Hsun Huang