Abstract: A semiconductor package including at least one functional die; at least one dummy die free of active circuit, wherein the dummy die comprises at least one metal-insulator-metal (MIM) capacitor; and a redistribution layer (RDL) structure interconnecting the MIM capacitor to the at least one functional die.

Abstract: A modified small interfering RNA (siRNA) molecule comprising phosphorothioate (PS) intemucleotide linkages in the antisense strand for reducing off-target effects and methods and uses thereof. The siRNAs targeting Hypoxia Inducible Factor 1 Subunit Alpha (HIF1a) with high specificity and silencing efficiency.

Abstract: A dummy gate structure is formed over a plurality of active regions. The dummy gate structure extends in a first horizontal direction in a planar top view. The active regions each extend in a second horizontal direction in the planar top view. The second horizontal direction is different from the first horizontal direction. A plurality of source/drain components is formed over the active regions. A dielectric structure is formed over the source/drain components. The dummy gate structure is then removed. A removal of the dummy gate structure exposes a first segment of each of the active regions. A thickness of the first segment of each of the active regions is reduced in the first horizontal direction.

Abstract: A method of manufacturing a resistor-transistor-logic circuit with GaN structures, including steps of forming a GaN layer, an AlGaN barrier layer and a p-type doped GaN capping layer on a substrate, patterning the p-type doped GaN capping layer into multiple p-type doped GaN capping patterns, wherein the GaN layer under parts of the p-type doped GaN capping patterns is converted into gate depletion regions, and the GaN layer not covered by the p-type doped GaN capping patterns in a resistor region functions as 2DEG resistors, forming a passivation layer on the GaN layer and the p-type doped GaN capping patterns, forming multiple sources and drains on the GaN layer, and forming multiple gates on the p-type doped GaN capping patterns, wherein the gates, sources and drains in a high-voltage device region constitute high-voltage HEMTs, and the gates, sources and drains in a low-voltage device region constitute low-voltage logic FETs.

Abstract: An integrated circuit includes a first-type active-region structure and a second-type active-region structure extending in a first direction and a first terminal-conductor and a second terminal-conductor extending in a second direction. The integrated circuit also includes a first power stub and a second power stub in a first metal layer and a first power line and a second power line in a second metal layer. The integrated circuit further includes a first via connector directly connected between the first power stub and the first terminal-conductor, a second via connector directly connected between the second power stub and the second terminal-conductor, a third via connector directly connected between the first power stub and the first power line, and a fourth via connector directly connected between the second power stub and the second power line.

Abstract: A MRAM circuit structure is provided in the present invention, with the unit cell composed of three transistors in series and four MTJs, wherein the junction between first transistor and third transistor is first node, the junction between second transistor and third transistor is second node, and the other ends of first transistor and third transistor are connected to a common source line. First MTJ is connected to second MTJ in series to form a first MTJ pair that connecting to the first node, and third MTJ is connected to fourth MTJ in series to form a second MTJ pair that connecting to the second node.

Abstract: A memory circuit includes a selection circuit, a column of memory cells, and an adder tree. The selection circuit is configured to receive input data elements, each input data element including a number of bits equal to H, and output a selected set of kth bits of the H bits of the input data elements. Each memory cell of the column of memory cells includes a first storage unit configured to store a first weight data element and a first multiplier configured to generate a first product data element based on the first weight data element and a first kth bit of the selected set of kth bits. The adder tree is configured to generate a summation data element based on each of the first product data elements.

Abstract: Some implementations described herein include operating components in a lithography system at variable speeds to reduce, minimize, and/or prevent particle generation due to rubbing of or collision between contact parts of the components. In some implementations, a component in a path of transfer of a semiconductor substrate in the lithography system is operated at a relatively high movement speed through a first portion of an actuation operation, and is operated at a reduced movement speed (e.g., a movement speed that is less than the high movement speed) through a second portion of the actuation operation in which contact parts of the component are to interact. The reduced movement speed reduces the likelihood of particle generation and/or release from the contact parts when the contact parts interact, while the high movement speed provides a high semiconductor substrate throughput in the lithography system.

Abstract: A method of establishing a cancer screening model is provided, including: providing a plurality of samples and a plurality of corresponding cancer states; analyzing these samples by a low-resolution mass spectrometer to obtain a plurality of mass spectral data, wherein the low-resolution mass spectrometer is undertaken a mass accuracy level above 5 ppm and a mass resolution (m/?m) below 10,000; inputting these mass spectral data into a machine learning algorithm to obtain a plurality of markers by a feature selection method; and using these markers and these cancer states by the machine learning algorithms to establish cancer screening model.

Abstract: A power supply device and an operation method thereof are provided. The power supply device includes a charge pump circuit and a power supply circuit. The power supply circuit supplies a first power voltage to the charge pump circuit. The charge pump circuit converts the first power voltage into a second power voltage so as to supply the second power voltage to an application circuit. The power supply circuit detects the second power voltage or an output current output by the charge pump circuit to obtain a detection result. The power supply circuit dynamically adjusts the first power voltage based on the detection result.

Abstract: A solution that allows the avatar corresponding to the target object tracked by the external tracking device can be properly displayed in the visual content that corresponds to the field of view of the virtual camera, even if the coordinate systems used by the host and the external tracking device are different.

Abstract: In an example, an electronic device may include a network interface device having a first transceiver to communicate via a short-range wireless communication protocol and a second transceiver to communicate via the short-range wireless communication protocol. Further, the electronic device may include a processor connected to the network interface device. During operation, the processor may receive a request to search a first device in accordance with the short-range wireless communication protocol. Further, the processor may search a first radio frequency channel via the first transceiver to detect the first device. Furthermore, the processor may search a second radio frequency channel via the second transceiver to detect the first device. The first radio frequency channel and the second radio frequency channel may be searched in parallel.

Abstract: A semiconductor device includes a bottom wafer, a top wafer bonded to the bottom wafer, a first dielectric layer, a second dielectric layer, a deep via conductor structure, and a connection pad. The top wafer includes a first interconnection structure. The first dielectric layer is disposed on the top wafer. The second dielectric layer is disposed on the first dielectric layer. The deep via conductor structure penetrates through the second dielectric layer and the first dielectric layer and is connected with the first interconnection structure. The connection pad is disposed on the second dielectric layer and the deep via conductor structure. A first portion of the second dielectric layer is sandwiched between the connection pad and the first dielectric layer. A second portion of the second dielectric layer is connected with the first portion, and a thickness of the second portion is less than a thickness of the first portion.

Abstract: Ruthenium of a metal gate (MG) and/or a middle end of line (MEOL) structure is annealed to reduce, or even eliminate, seams after the ruthenium is deposited. Because the annealing reduces (or removes) seams in deposited ruthenium, electrical performance is increased because resistivity of the MG and/or the MEOL structure is decreased. Additionally, for MGs, the annealing generates a more even deposition profile, which results in a timed etching process producing a uniform gate height. As a result, more of the MGs will be functional after etching, which increases yield during production of the electronic device.

Abstract: Systems and methods as described herein may take a variety of forms. In one example, systems and methods are provided for a circuit for powering a voltage regulator. A voltage regulator circuit has an output electrically coupled to a gate of an output driver transistor, the output driver transistor having a first terminal electrically coupled to a voltage source and a second terminal electrically coupled to a first terminal of a voltage divider, the voltage divider having an second terminal electrically coupled to ground, and the voltage divider having an output of a stepped down voltage. A power control circuitry transistor has a first terminal electrically coupled to the voltage source, the power control circuitry transistor having a second terminal electrically coupled to the gate terminal of the output driver transistor, and the power control circuitry transistor having a gate terminal electrically coupled to a status voltage signal.

Abstract: The present disclosure describes various non-planar semiconductor devices, such as fin field-effect transistors (finFETs) to provide an example, having one or more metal rail conductors and various methods for fabricating these non-planar semiconductor devices. In some situations, the one or more metal rail conductors can be electrically connected to gate, source, and/or drain regions of these various non-planar semiconductor devices. In these situations, the one or more metal rail conductors can be utilized to electrically connect the gate, the source, and/or the drain regions of various non-planar semiconductor devices to other gate, source, and/or drain regions of various non-planar semiconductor devices and/or other semiconductor devices. However, in other situations, the one or more metal rail conductors can be isolated from the gate, the source, and/or the drain regions these various non-planar semiconductor devices.

Abstract: A method for fabricating a semiconductor device includes the steps of first bonding a top wafer to a bottom wafer, in which the top wafer has a first metal interconnection including a first barrier layer exposing from a bottom surface of the top wafer. Next, a dielectric layer is formed on the bottom surface of the top wafer and then a second metal interconnection is formed in the dielectric layer and connected to the first metal interconnection, in which the second metal interconnection includes a second barrier layer and the first barrier layer and the second barrier layer include a H-shape altogether.

Abstract: The present disclosure provides a semiconductor device and a method of manufacturing the same. The semiconductor device includes a substrate, an active region on the substrate, and a first transistor having a gate structure, a source conductor, and a drain conductor disposed on the active region, wherein the drain conductor and the source conductor are disposed on opposite sides of the gate structure, and the source conductor is shorter than the drain conductor.

Abstract: An anchored cut-metal gate (CMG) plug, a semiconductor device including the anchored CMG plug and methods of forming the semiconductor device are disclosed herein. The method includes performing a series of etching processes to form a trench through a metal gate electrode, through an isolation region, and into a semiconductor substrate. The trench cuts-through and separates the metal gate electrode into a first metal gate and a second metal gate and forms a recess in the semiconductor substrate. Once the trench has been formed, a dielectric plug material is deposited into the trench to form a CMG plug that is anchored within the recess of the semiconductor substrate and separates the first and second metal gates. As such, the anchored CMG plug provides high levels of resistance to reduce leakage current within the semiconductor device during operation and allowing for improved V-trigger performance of the semiconductor device.