Patents by Inventor Yi-Hung Lin

Yi-Hung Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170256914
    Abstract: A light-emitting device is provided. The light-emitting device is configured to emit a radiation and comprises: a substrate; an epitaxial structure on the substrate and comprising a first DBR stack, a light-emitting stack and a second DBR stack and a contact layer in sequence; an electrode; a current blocking layer between the contact layer and the electrode; a first opening formed in the current blocking layer; and a second opening formed in the electrode and within the first opening; wherein a part of the electrode fills in the first opening and contacts the contact layer; and the light-emitting device is devoid of an oxidized layer and an ion implanted layer in the second DBR stack.
    Type: Application
    Filed: March 7, 2016
    Publication date: September 7, 2017
    Inventors: Tzu-Chieh HSU, Yi-Wen HUANG, Yi-Hung LIN, Chih-Chiang LU
  • Patent number: 9746310
    Abstract: A method for measuring an implant dosage distribution of a semiconductor sample is provided. The method includes generating a photomodulation effect in a three-dimensional structure of the semiconductor sample and measuring a reflection information of the three-dimensional structure. A geometry information of the three-dimensional structure of the semiconductor sample is obtained. The geometry information of the three-dimensional structure is converted into an estimated reflective data. The reflection information is compared with the estimated reflective data to determine the implant dosage distribution of the three-dimensional structure of the semiconductor sample.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: August 29, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ying-Chieh Hung, Yi-Hung Lin, Yu-Wei Chou
  • Publication number: 20170225029
    Abstract: A squat rack includes a frame, a tread unit, a lifting unit, a pulling unit and a connector. The tread unit includes two treads connected to and located on two sides of the frame for supporting a user's feet so that the frame is firmly kept on the ground by the user. The lifting unit is pivotally connected to the frame and located behind the user in operation. The pulling unit includes a middle portion pivotally connected to a front end of the frame. The connector pivotally connects a lower end of the pulling unit to the lifting unit so that the user can pull the pulling unit to cause the lifting unit to support the user's hips via the connector.
    Type: Application
    Filed: February 6, 2016
    Publication date: August 10, 2017
    Inventor: YI-HUNG LIN
  • Patent number: 9728641
    Abstract: A method of fabricating a semiconductor device. The method includes forming an isolation feature in a substrate, forming a first gate stack and a second gate stack over the substrate, forming a first recess cavity and a second recess cavity in the substrate, growing a first epitaxial (epi) material in the first recess cavity and a second epi material in the second recess cavity, and etching the first epi material and the second epi material. The first recess cavity is between the isolation feature and the first gate stack and the second recess cavity is between the first gate stack and the second gate stack. A topmost surface of the first epi material has a first crystal plane and a topmost surface of the second epi material has a second crystal plane. The topmost surface of the etched first epi material has a third crystal plane different from both the first crystal plane and the second crystal plane.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: August 8, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yen-Ru Lee, Ming-Hua Yu, Tze-Liang Lee, Chii-Horng Li, Pang-Yen Tsai, Lilly Su, Yi-Hung Lin, Yu-Hung Cheng
  • Publication number: 20170221739
    Abstract: A method for thickness measurement includes forming an implantation region in a semiconductor substrate. A semiconductor layer is formed on the implantation region of the semiconductor substrate. Modulated free carriers are generated in the implantation region of the semiconductor substrate. A probe beam is provided on the semiconductor layer and the implantation region of the semiconductor substrate with the modulated free carriers therein. The probe beam reflected from the semiconductor layer and the implantation region is detected to determine a thickness of the semiconductor layer.
    Type: Application
    Filed: January 29, 2016
    Publication date: August 3, 2017
    Inventors: Ying-Chieh HUNG, Ming-Hua YU, Yi-Hung LIN, Jet-Rung CHANG
  • Patent number: 9662536
    Abstract: A squat rack includes a frame, a lifting unit, a body support unit, an elastic unit and a tread unit. The frame includes a horizontal portion, a vertical portion connected to the horizontal portion, and a handle connected to the vertical portion. The lifting unit is pivotally connected to the frame. The body support unit is connected to an upper portion of the lifting unit. The elastic unit is provided between the frame and the lifting unit and adapted for raising the lifting unit from the frame. The tread unit is connected to the horizontal portion of the frame, between the handle and the body support unit in a horizontal direction. While exercising, a user can set his or her feet on the tread unit, hold the handle with his or her hands, and lean on the lifting unit to gain support from the elastic unit.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: May 30, 2017
    Assignee: ASIA REGENT CORPORATION
    Inventor: Yi-Hung Lin
  • Patent number: 9659925
    Abstract: A display panel includes a substrate, a first stacking unit, and a second stacking unit. The first stacking unit is disposed on the substrate and connected to a scan line. The first stacking unit includes a first conducting layer, a second conducting layer, at least one first through hole, and a first protruding portion. The first conducting layer is interposed between the second conducting layer and the substrate. The first through hole connects the first conducting layer and the second conducting layer. The position of the first protruding portion is relative to the position of the second protruding portion.
    Type: Grant
    Filed: April 4, 2016
    Date of Patent: May 23, 2017
    Assignee: INNOLUX CORPORATION
    Inventors: Yi-Ling Yu, Wei-Ching Cho, Hsia-Ching Chu, Peng-Cheng Huang, Yi-Hung Lin
  • Publication number: 20170131084
    Abstract: A method for measuring an implant dosage distribution of a semiconductor sample is provided. The method includes generating a photomodulation effect in a three-dimensional structure of the semiconductor sample and measuring a reflection information of the three-dimensional structure. A geometry information of the three-dimensional structure of the semiconductor sample is obtained. The geometry information of the three-dimensional structure is converted into a estimated reflective data. The reflection information is compared with the estimated reflective data to determine the implant dosage distribution of the three-dimensional structure of the semiconductor sample.
    Type: Application
    Filed: November 6, 2015
    Publication date: May 11, 2017
    Inventors: Ying-Chieh HUNG, Yi-Hung LIN, Yu-Wei CHOU
  • Patent number: 9647066
    Abstract: A FinFET device may include a dummy FinFET structure laterally adjacent an active FinFET structure to reduce stress imbalance and the effects of stress imbalance on the active FinFET structure. The FinFET device comprises an active FinFET comprising a plurality of semiconductor fins, and a dummy FinFET comprising a plurality of semiconductor fins. The active FinFET and the dummy FinFET are laterally spaced from each other by a spacing that is related to the fin pitch of the active FinFET.
    Type: Grant
    Filed: April 24, 2012
    Date of Patent: May 9, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chang-Shen Lu, Chih-Tang Peng, Tai-Chun Huang, Pei-Ren Jeng, Hao-Ming Lien, Yi-Hung Lin, Tze-Liang Lee, Syun-Ming Jang
  • Patent number: 9612056
    Abstract: An apparatus, a system and a method are disclosed. An exemplary apparatus includes a first portion configured to hold an overlying wafer. The first portion includes a central region and an edge region circumscribing the central region. The first portion further including an upper surface and a lower surface. The apparatus further includes a second portion extending beyond an outer radius of the wafer. The second portion including an upper surface and a lower surface. The lower surface of the first portion in the central region has a first reflective characteristic. The lower surface of the first portion in the edge region and the second portion have a second reflective characteristic.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: April 4, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Hung Lin, Li-Ting Wang, Tze-Liang Lee
  • Publication number: 20170088976
    Abstract: An IC fabrication system for facilitating improved thermal uniformity includes a chamber within which an IC process is performed on a substrate, a heating mechanism configured to heat the substrate, and a substrate-retaining device configured to retain the substrate in the chamber. The substrate-retaining device includes a contact surface configured to contact an edge of the retained substrate without the substrate-retaining device contacting a circumferential surface of the retained substrate. The substrate-retaining device includes a plurality of contact regions and a plurality of noncontact regions disposed at a perimeter, where the plurality of noncontact regions is interspersed with the plurality of contact regions. Each of the plurality of noncontact regions includes the contact surface.
    Type: Application
    Filed: December 12, 2016
    Publication date: March 30, 2017
    Inventors: Yi-Hung Lin, Jr-Hung Li, Chang-Shen Lu, Tze-Liang Lee, Chii-Horng Li
  • Publication number: 20170044516
    Abstract: The present disclosure provides a biochemistry reactive material, including a substrate and an enzyme composition immobilized on the substrate. The enzyme composition is selected from a group consisting of a first enzyme, a second enzyme, and a combination thereof. The first enzyme is used for eliminating a glycan residue of an electronegative low-density lipoprotein (electronegative LDL). The second enzyme is used for eliminating ceramide carried by an electronegative low-density lipoprotein. The biochemistry reactive material is capable of eliminating electronegative low-density lipoprotein.
    Type: Application
    Filed: December 30, 2015
    Publication date: February 16, 2017
    Applicant: Industrial Technology Research Institute
    Inventors: Pei-Yi Tsai, Chih-Hung CHEN, Yi-Hung LIN, Chih-Chieh HUANG, Hsin-Hsin SHEN, Liang-Yin KE, Chu-Huang CHEN
  • Publication number: 20170037889
    Abstract: A clamp device with resilience can be coupled to a slender bar. The slender bar includes a connection rod and a bar shaft which are connected to each other. The clamp device with resilience includes a clamping portion and a fixing portion. The clamping portion includes two clamping plates for containing the connection rod. The fixing portion is connected to the clamping portion and adapted to fix the bar shaft in place. Rotation of the connection rod causes the two clamping plates to abut against polygonal vertices of the connection rod and therefore move away from each other. Therefore, the connection rod rotates by a fixed angle on each instance.
    Type: Application
    Filed: August 3, 2015
    Publication date: February 9, 2017
    Inventors: THOMAS LOESCH, JOAKIM UIMONEN, ERIC YI HUNG LIN
  • Publication number: 20170032972
    Abstract: Various methods and structures formed by those methods are described. In accordance with a method, a first metal-containing layer is formed on a substrate. A second metal-containing layer is formed on the substrate. A material of the first metal-containing layer is different from a material of the second metal-containing layer. A chlorine-based treatment is performed on the first metal-containing layer and the second metal-containing layer. A third metal-containing layer is deposited on the first metal-containing layer and the second metal-containing layer using Atomic Layer Deposition (ALD).
    Type: Application
    Filed: July 31, 2015
    Publication date: February 2, 2017
    Inventors: Cheng-Yen Tsai, Da-Yuan Lee, JoJo Lee, Ming-Hsing Tsai, Hsueh Wen Tsau, Weng Chang, Ying-Chieh Hung, Yi-Hung Lin
  • Patent number: 9555539
    Abstract: A tool box contains: a holder, a cover, a first peripheral fence, and a second peripheral fence. The holder includes a first abutting rib extending upwardly from a top end of a peripheral wall thereof. The cover is used for covering the holder, and between the holder and the cover is defined an accommodating space to accommodate tools. The first peripheral fence is arranged around the peripheral wall of the holder. The second peripheral fence is arranged around an outer wall of the cover and includes a contacting face extending inwardly from a bottom end of the second peripheral fence to contact with the first abutting rib of the holder.
    Type: Grant
    Filed: May 29, 2015
    Date of Patent: January 31, 2017
    Assignee: I-N-B INTERNATIONAL INC.
    Inventor: Yi-Hung Lin
  • Patent number: 9517539
    Abstract: A substrate-retaining device with improved thermal uniformity is provided. In an exemplary embodiment, the substrate-retaining device includes a substantially circular first surface with a defined perimeter, a plurality of contact regions disposed at the perimeter, and a plurality of noncontact regions also disposed at the perimeter. The contact regions are interspersed with the noncontact regions. Within each of the noncontact regions, the first surface extends past where the first surface ends within each of the contact regions. In some such embodiments, each region of the plurality of contact regions includes a contact surface disposed above the first surface.
    Type: Grant
    Filed: August 28, 2014
    Date of Patent: December 13, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Hung Lin, Jr-Hung Li, Chang-Shen Lu, Tze-Liang Lee, Chii-Horng Li
  • Patent number: 9512648
    Abstract: A lockable tool box contains: a base, a top cover, a connection unit, and a locking unit. The connection unit is in connection with a first side of the base and a first side of the top cover. The locking unit includes a first fixing member, a second fixing member, a rotating seat, a movable cap, and a lock button. The first fixing member has an engaging slot and a retaining slot, wherein the retaining slot has a through orifice and a stop cliff; the second fixing member extends outwardly from the base, and the rotating seat is coupled with the second fixing member and is joined with the movable cap. The movable cap has an affix block and a trench, the lock button is slidably retained in the trench of and is moved between a locking position and an unlocking position, wherein the lock button has a protrusion.
    Type: Grant
    Filed: April 2, 2015
    Date of Patent: December 6, 2016
    Assignee: I-N-B INTERNATIONAL INC.
    Inventor: Yi-Hung Lin
  • Publication number: 20160346915
    Abstract: A tool box contains: a holder, a cover, a first peripheral fence, and a second peripheral fence. The holder includes a first abutting rib extending upwardly from a top end of a peripheral wall thereof. The cover is used for covering the holder, and between the holder and the cover is defined an accommodating space to accommodate tools. The first peripheral fence is arranged around the peripheral wall of the holder. The second peripheral fence is arranged around an outer wall of the cover and includes a contacting face extending inwardly from a bottom end of the second peripheral fence to contact with the first abutting rib of the holder.
    Type: Application
    Filed: May 29, 2015
    Publication date: December 1, 2016
    Inventor: Yi-Hung LIN
  • Publication number: 20160341674
    Abstract: This application relates to an apparatus and methods for enhancing the performance of X-ray reflectometry (XRR) when used in characterizing thin films and nanostructures supported on a flat substrate. In particular, this application is targeted for addressing the difficulties encountered when XRR is applied to samples with very limited sampling volume, i.e. a combination of small sampling area and miniscule sample thickness or structure height. Point focused X-ray with long wavelength, greater than that from a copper anode or 0.154 nm, is preferably used with appropriately controlled collimations on both incident and detection arms to enable the XRR measurements of samples with limited volumes.
    Type: Application
    Filed: May 20, 2016
    Publication date: November 24, 2016
    Inventors: Wen-Li WU, Yun-San Chien, Wei-En Fu, Shyh-Shin Ferng, Yi-Hung Lin
  • Patent number: D789086
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: June 13, 2017
    Assignee: I-N-B INTERNATIONAL INC.
    Inventor: Yi-Hung Lin