Patents by Inventor Yi Yi
Yi Yi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11512984Abstract: A dynamic displacement error compensation system by which detection error information obtained based on calibration detection of first and second axes, is respectively made into first and second compensation tables for compensating displacement on the axes by using positional information of the axes as variables, the first compensation table is stored in a first driver of a first motor device for driving a first moving element to move linearly on the first axis, the second compensation table is stored in a second driver of a second motor device for driving a second moving element to move linearly on the second axis, the drivers simultaneously or successively obtain a first dynamic positional information of the first moving element on the first axis and a second dynamic positional information of the second moving element on the second axis, and the moving elements are respectively displaceably compensated according to the compensation tables.Type: GrantFiled: March 23, 2021Date of Patent: November 29, 2022Assignee: HIWIN MIKROSYSTEM CORP.Inventors: Kai-Ti Chen, Chun-Yi Yi, Wei-Te Chuang, Yen-Yu Chen
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Patent number: 11459614Abstract: Disclosed herein is a method of performing polymerase chain reaction (PCR) to determine a repeating number of CGG sequence in fragile X mental retardation 1 (FMR1) gene. Also disclosed herein are a kit, and uses thereof in making a diagnosis of Fragile X syndrome (FXS) in a human subject based on the repeating number of the CGG sequence in a DNA sample isolated from the human subject. According to embodiments of the present disclosure, the kit comprises four primers, in which the first primer comprises a first polynucleotide sequence of SEQ ID NO: 1; the second primer comprises a second polynucleotide sequence of SEQ ID NO: 2; the third primer comprises a third polynucleotide sequence of SEQ ID NO: 3, and a non-human sequence disposed at and connected to the 5?-end of the third polynucleotide sequence; and the fourth primer comprises the non-human sequence.Type: GrantFiled: January 31, 2020Date of Patent: October 4, 2022Assignee: XIAMEN BIOFAST BIOTECHNOLOGY CO., LTD.Inventors: Yi-Yi Kuo, Yu-Chiao Hsiao, I-Fan Chiu, Lai-Ha Chung, Shu-Ju Lee
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Publication number: 20220307869Abstract: A dynamic displacement error compensation system by which detection error information obtained based on calibration detection of first and second axes, is respectively made into first and second compensation tables for compensating displacement on the axes by using positional information of the axes as variables, the first compensation table is stored in a first driver of a first motor device for driving a first moving element to move linearly on the first axis, the second compensation table is stored in a second driver of a second motor device for driving a second moving element to move linearly on the second axis, the drivers simultaneously or successively obtain a first dynamic positional information of the first moving element on the first axis and a second dynamic positional information of the second moving element on the second axis, and the moving elements are respectively displaceably compensated according to the compensation tables.Type: ApplicationFiled: March 23, 2021Publication date: September 29, 2022Inventors: Kai-Ti CHEN, Chun-Yi YI, Wei-Te CHUANG, Yen-Yu CHEN
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Patent number: 11170997Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.Type: GrantFiled: April 10, 2020Date of Patent: November 9, 2021Assignee: Lam Research CorporationInventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
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Publication number: 20210277473Abstract: Disclosed herein is a kit for diagnosing spinal muscular atrophy (SMA) in a human subject based on the copy numbers of exons 7 and 8 of SMN1 gene and the copy numbers of exons 7 and 8 of SMN2 gene in a DNA sample isolated from the human subject. Also disclosed herein are methods of diagnosing SMA by use of the present kit, and methods of treating SMA based on the diagnostic result.Type: ApplicationFiled: January 18, 2021Publication date: September 9, 2021Applicant: Origin Biotechnology Co., Ltd.Inventors: Yi-Yi KUO, I-Fan CHIU, Lai-Ha CHUNG, Shu-Ju LEE
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Publication number: 20200399699Abstract: Disclosed herein is a method of performing polymerase chain reaction (PCR) to determine a repeating number of CGG sequence in fragile X mental retardation 1 (FMR1) gene. Also disclosed herein are a kit, and uses thereof in making a diagnosis of Fragile X syndrome (FXS) in a human subject based on the repeating number of the CGG sequence in a DNA sample isolated from the human subject. According to embodiments of the present disclosure, the kit comprises four primers, in which the first primer comprises a first polynucleotide sequence of SEQ ID NO: 1; the second primer comprises a second polynucleotide sequence of SEQ ID NO: 2; the third primer comprises a third polynucleotide sequence of SEQ ID NO: 3, and a non-human sequence disposed at and connected to the 5?-end of the third polynucleotide sequence; and the fourth primer comprises the non-human sequence.Type: ApplicationFiled: January 31, 2020Publication date: December 24, 2020Applicant: Origin Biotechnology Co., Ltd.Inventors: Yi-Yi KUO, Yu-Chiao HSIAO, I-Fan CHIU, Lai-Ha CHUNG, Shu-Ju LEE
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Publication number: 20200243326Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.Type: ApplicationFiled: April 10, 2020Publication date: July 30, 2020Inventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
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Patent number: 10658174Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.Type: GrantFiled: November 21, 2017Date of Patent: May 19, 2020Assignee: Lam Research CorporationInventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
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Publication number: 20200130235Abstract: The invention relates to an environmentally friendly fuel made of rubber and a manufacturing method thereof. The manufacturing method comprises the steps of pulverizing a rubber material into rubber powder; and mixing the rubber powder with a toxin elimination material to eliminate deleterious compositions such as chlorine and sulfur, wherein the toxin elimination material comprises a non-halogen flame retardant and a desulfurizing agent.Type: ApplicationFiled: October 26, 2018Publication date: April 30, 2020Inventor: YI-YI CHEN
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Publication number: 20200002635Abstract: An environmental-friendly fuel is provided which comprises 65 wt % to 95 wt % of a plurality of fine granules of recycled material mixed with 5 wt % to 35 wt % of a halogen-free flame retardant. The plurality of fine granules of recycled material are pulverized from waste polyurethane foamed material recovered from discarded objects.Type: ApplicationFiled: June 29, 2018Publication date: January 2, 2020Inventor: YI-YI CHEN
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Patent number: 10318275Abstract: A software update apparatus and method in a virtualized environment. The software update method performed by a software update apparatus in a virtualized environment includes monitoring an operation that is invoked when software is updated in a guest operating system area, creating a software profile by analyzing results of the monitoring, mounting a virtual disk image for a target virtual machine in a target directory in a virtual machine monitor area, and incorporating update information of at least one of a file and a registry that are specified in the software profile into the target directory in which the virtual disk image is mounted.Type: GrantFiled: July 21, 2017Date of Patent: June 11, 2019Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTEInventors: Sung-Jin Kim, Woomin Hwang, Byung-Joon Kim, Hyun-Yi Yi, Chul-Woo Lee, Hyoung-Chun Kim
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Publication number: 20190157066Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.Type: ApplicationFiled: November 21, 2017Publication date: May 23, 2019Inventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
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Publication number: 20190016049Abstract: A 3D printer including two tanks, a powder spreading mechanism and a transport assembly is provided. A tank opening is defined on each tank, and an elevating mechanism is arranged in each tank. The powder spreading mechanism is able to move across the tank openings, one of the tanks contains powders for supplying the powders, and the powder spreading mechanism push the powders into the other tank. The transport assembly includes a carrying plate and a covering case, the carrying plate is arranged on the elevating mechanism in the tank for powder supplying, multiple insertion holes are defined at the carrying plate, a case opening is defined at the covering case, the covering case covers on the corresponding tank opening, multiple movable latches for correspondingly inserted in the respective insertion holes are arranged at the case opening, and the powders are allowed to be contained in the covering case.Type: ApplicationFiled: August 21, 2017Publication date: January 17, 2019Inventors: Yi-Yi CHAO, Chih-Chieh HU
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Patent number: 10102432Abstract: Disclosed is an image recognition method including: producing a distribution of first pixel value range by acquiring a distribution of pixel values of a plurality of pixels of a first selected block in a first surveillance image from previous M images; producing a distribution of second pixel value range by acquiring a distribution of pixel values of the pixels of the first selected block from previous N images, wherein N and M are positive integers, and N<M; obtaining a first varying parameter related to the first selected block according to the distribution of first pixel value range and the distribution of second pixel value range; and generating a first recognition signal when the first varying parameter is greater than a first threshold.Type: GrantFiled: December 9, 2016Date of Patent: October 16, 2018Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Denis Xynkin, Min-Hao Li, Yi-Yi Huang
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Publication number: 20180246710Abstract: A software update apparatus and method in a virtualized environment. The software update method performed by a software update apparatus in a virtualized environment includes monitoring an operation that is invoked when software is updated in a guest operating system area, creating a software profile by analyzing results of the monitoring, mounting a virtual disk image for a target virtual machine in a target directory in a virtual machine monitor area, and incorporating update information of at least one of a file and a registry that are specified in the software profile into the target directory in which the virtual disk image is mounted.Type: ApplicationFiled: July 21, 2017Publication date: August 30, 2018Inventors: Sung-Jin KIM, Woomin HWANG, Byung-Joon KIM, Hyun-Yi YI, Chul-Woo LEE, Hyoung-Chun KIM
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Publication number: 20180177175Abstract: A vortex insect trap includes an insect trapping container, a fan and an insect-killing device. The insect trapping container internally defines an air flowing space, in which the insect-killing device is disposed. The air flowing space is enclosed in at least one flow-guiding wall surface and communicable with external environment via an air suck-in port and an air exit port of the vortex insect trap. The fan is mounted to the air exit port for sucking in external air via the air suck-in port and discharging air inside the air flowing space from the insect trapping container via the air exit port. When the fan operates, air sucked into the air flowing space flows along the flow-guiding wall surface to form a spiral air flow that flows toward a bottom of the air flowing space while carries insects sucked into the air flowing space to the insect-killing device.Type: ApplicationFiled: July 26, 2017Publication date: June 28, 2018Applicant: INADAY'S BIOTECH CO., LTD.Inventor: Yi Yi TSAI
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Publication number: 20180073081Abstract: The invention is directed to a method to predict prognostic results for diseases including acute myeloid leukemia (AML) by analyzing novel markers which comprises microRNA/mRNA (miRNA/mRNA) pairings. In particular, the miRNA/mRNA pairings are a kind of NPM1 mutation-modulated miRNA/mRNA regulation pairs.Type: ApplicationFiled: September 13, 2016Publication date: March 15, 2018Inventors: Eric Y. Chuang, Mong-Hsun Tsai, Wen-Chien Chou, Liang-Chuan Lai, Hwei-Fang Tien, Yu-Chiao Chiu, Tzu-Pin Lu, Yen-Chun Liu, Yi-Yi Kuo, Hsin-An Hou, Yidong Chen
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Patent number: 9891204Abstract: The present invention provides a heavy metal detecting device and the fabricating method thereof. The heavy metal detecting device includes a substrate and a nano-metal-particle array. The fabricating method of the heavy metal detecting device includes following steps of: (S1) preparing a substrate, cleaning the substrate with a first liquid, and drying the substrate with a first gas; (S2) soaking the substrate in a first solution; (S3) after soaking the substrate for a first period of time, cleaning and drying the substrate with the first liquid and the first gas respectively; (S4) soaking the substrate in a pre-synthesized nano-metal-particle solution; and (S5) after soaking the substrate for a second period of time, cleaning and drying the substrate with a second liquid and the first gas respectively. Compared to the prior arts, the heavy metal detecting device of the present invention has the advantages of simplicity and rapidity.Type: GrantFiled: April 10, 2017Date of Patent: February 13, 2018Assignee: National Tsing Hua UniversityInventors: De-Hui Wan, Shih-Yu Tseng, Shang-Yi Yi
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Patent number: 9792685Abstract: An image capturing device and a method for calibrating image deformation thereof are provided. The image capturing device has a first image sensor and a second image sensor and the method includes following steps. A plurality of image groups are captured through the first image sensor and the second image sensor. Each of the image groups includes a first image and a second image, and the image groups include a reference image group. Whether an image deformation occurs on a first reference image and a second reference image in the reference image group is detected. If it is detected that the image deformation occurs on the reference image group, a current calibration parameter is updated according to a plurality of feature point comparison values corresponding to the image groups. The current calibration parameter is used for performing an image rectification on each of the first images and the second images.Type: GrantFiled: June 25, 2014Date of Patent: October 17, 2017Assignee: Altek Semiconductor Corp.Inventors: Hong-Long Chou, Ming-Jiun Liaw, Yi-Yi Yu, I-Te Yu, Yu-Chih Wang, Che-Lun Chuang
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Publication number: 20170212092Abstract: The present invention provides a heavy metal detecting device and the fabricating method thereof. The heavy metal detecting device comprises a substrate and a nano-metal-particle array. The fabricating method of the heavy metal detecting device comprises following steps of: (S1) preparing a substrate, cleaning the substrate with a first liquid, and drying the substrate with a first gas; (S2) soaking the substrate in a first solution; (S3) after soaking the substrate for a first period of time, cleaning and drying the substrate with the first liquid and the first gas respectively; (S4) soaking the substrate in a pre-synthesized nano-metal-particle solution; and (S5) after soaking the substrate for a second period of time, cleaning and drying the substrate with a second liquid and the first gas respectively. Compared to the prior arts, the heavy metal detecting device of the present invention has the advantages of simplicity and rapidity.Type: ApplicationFiled: April 10, 2017Publication date: July 27, 2017Inventors: De-Hui WAN, Shih-Yu TSENG, Shang-Yi YI