Patents by Inventor Yi Yi

Yi Yi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11512984
    Abstract: A dynamic displacement error compensation system by which detection error information obtained based on calibration detection of first and second axes, is respectively made into first and second compensation tables for compensating displacement on the axes by using positional information of the axes as variables, the first compensation table is stored in a first driver of a first motor device for driving a first moving element to move linearly on the first axis, the second compensation table is stored in a second driver of a second motor device for driving a second moving element to move linearly on the second axis, the drivers simultaneously or successively obtain a first dynamic positional information of the first moving element on the first axis and a second dynamic positional information of the second moving element on the second axis, and the moving elements are respectively displaceably compensated according to the compensation tables.
    Type: Grant
    Filed: March 23, 2021
    Date of Patent: November 29, 2022
    Assignee: HIWIN MIKROSYSTEM CORP.
    Inventors: Kai-Ti Chen, Chun-Yi Yi, Wei-Te Chuang, Yen-Yu Chen
  • Patent number: 11459614
    Abstract: Disclosed herein is a method of performing polymerase chain reaction (PCR) to determine a repeating number of CGG sequence in fragile X mental retardation 1 (FMR1) gene. Also disclosed herein are a kit, and uses thereof in making a diagnosis of Fragile X syndrome (FXS) in a human subject based on the repeating number of the CGG sequence in a DNA sample isolated from the human subject. According to embodiments of the present disclosure, the kit comprises four primers, in which the first primer comprises a first polynucleotide sequence of SEQ ID NO: 1; the second primer comprises a second polynucleotide sequence of SEQ ID NO: 2; the third primer comprises a third polynucleotide sequence of SEQ ID NO: 3, and a non-human sequence disposed at and connected to the 5?-end of the third polynucleotide sequence; and the fourth primer comprises the non-human sequence.
    Type: Grant
    Filed: January 31, 2020
    Date of Patent: October 4, 2022
    Assignee: XIAMEN BIOFAST BIOTECHNOLOGY CO., LTD.
    Inventors: Yi-Yi Kuo, Yu-Chiao Hsiao, I-Fan Chiu, Lai-Ha Chung, Shu-Ju Lee
  • Publication number: 20220307869
    Abstract: A dynamic displacement error compensation system by which detection error information obtained based on calibration detection of first and second axes, is respectively made into first and second compensation tables for compensating displacement on the axes by using positional information of the axes as variables, the first compensation table is stored in a first driver of a first motor device for driving a first moving element to move linearly on the first axis, the second compensation table is stored in a second driver of a second motor device for driving a second moving element to move linearly on the second axis, the drivers simultaneously or successively obtain a first dynamic positional information of the first moving element on the first axis and a second dynamic positional information of the second moving element on the second axis, and the moving elements are respectively displaceably compensated according to the compensation tables.
    Type: Application
    Filed: March 23, 2021
    Publication date: September 29, 2022
    Inventors: Kai-Ti CHEN, Chun-Yi YI, Wei-Te CHUANG, Yen-Yu CHEN
  • Patent number: 11170997
    Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.
    Type: Grant
    Filed: April 10, 2020
    Date of Patent: November 9, 2021
    Assignee: Lam Research Corporation
    Inventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
  • Publication number: 20210277473
    Abstract: Disclosed herein is a kit for diagnosing spinal muscular atrophy (SMA) in a human subject based on the copy numbers of exons 7 and 8 of SMN1 gene and the copy numbers of exons 7 and 8 of SMN2 gene in a DNA sample isolated from the human subject. Also disclosed herein are methods of diagnosing SMA by use of the present kit, and methods of treating SMA based on the diagnostic result.
    Type: Application
    Filed: January 18, 2021
    Publication date: September 9, 2021
    Applicant: Origin Biotechnology Co., Ltd.
    Inventors: Yi-Yi KUO, I-Fan CHIU, Lai-Ha CHUNG, Shu-Ju LEE
  • Publication number: 20200399699
    Abstract: Disclosed herein is a method of performing polymerase chain reaction (PCR) to determine a repeating number of CGG sequence in fragile X mental retardation 1 (FMR1) gene. Also disclosed herein are a kit, and uses thereof in making a diagnosis of Fragile X syndrome (FXS) in a human subject based on the repeating number of the CGG sequence in a DNA sample isolated from the human subject. According to embodiments of the present disclosure, the kit comprises four primers, in which the first primer comprises a first polynucleotide sequence of SEQ ID NO: 1; the second primer comprises a second polynucleotide sequence of SEQ ID NO: 2; the third primer comprises a third polynucleotide sequence of SEQ ID NO: 3, and a non-human sequence disposed at and connected to the 5?-end of the third polynucleotide sequence; and the fourth primer comprises the non-human sequence.
    Type: Application
    Filed: January 31, 2020
    Publication date: December 24, 2020
    Applicant: Origin Biotechnology Co., Ltd.
    Inventors: Yi-Yi KUO, Yu-Chiao HSIAO, I-Fan CHIU, Lai-Ha CHUNG, Shu-Ju LEE
  • Publication number: 20200243326
    Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.
    Type: Application
    Filed: April 10, 2020
    Publication date: July 30, 2020
    Inventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
  • Patent number: 10658174
    Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: May 19, 2020
    Assignee: Lam Research Corporation
    Inventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
  • Publication number: 20200130235
    Abstract: The invention relates to an environmentally friendly fuel made of rubber and a manufacturing method thereof. The manufacturing method comprises the steps of pulverizing a rubber material into rubber powder; and mixing the rubber powder with a toxin elimination material to eliminate deleterious compositions such as chlorine and sulfur, wherein the toxin elimination material comprises a non-halogen flame retardant and a desulfurizing agent.
    Type: Application
    Filed: October 26, 2018
    Publication date: April 30, 2020
    Inventor: YI-YI CHEN
  • Publication number: 20200002635
    Abstract: An environmental-friendly fuel is provided which comprises 65 wt % to 95 wt % of a plurality of fine granules of recycled material mixed with 5 wt % to 35 wt % of a halogen-free flame retardant. The plurality of fine granules of recycled material are pulverized from waste polyurethane foamed material recovered from discarded objects.
    Type: Application
    Filed: June 29, 2018
    Publication date: January 2, 2020
    Inventor: YI-YI CHEN
  • Patent number: 10318275
    Abstract: A software update apparatus and method in a virtualized environment. The software update method performed by a software update apparatus in a virtualized environment includes monitoring an operation that is invoked when software is updated in a guest operating system area, creating a software profile by analyzing results of the monitoring, mounting a virtual disk image for a target virtual machine in a target directory in a virtual machine monitor area, and incorporating update information of at least one of a file and a registry that are specified in the software profile into the target directory in which the virtual disk image is mounted.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: June 11, 2019
    Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Sung-Jin Kim, Woomin Hwang, Byung-Joon Kim, Hyun-Yi Yi, Chul-Woo Lee, Hyoung-Chun Kim
  • Publication number: 20190157066
    Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.
    Type: Application
    Filed: November 21, 2017
    Publication date: May 23, 2019
    Inventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
  • Publication number: 20190016049
    Abstract: A 3D printer including two tanks, a powder spreading mechanism and a transport assembly is provided. A tank opening is defined on each tank, and an elevating mechanism is arranged in each tank. The powder spreading mechanism is able to move across the tank openings, one of the tanks contains powders for supplying the powders, and the powder spreading mechanism push the powders into the other tank. The transport assembly includes a carrying plate and a covering case, the carrying plate is arranged on the elevating mechanism in the tank for powder supplying, multiple insertion holes are defined at the carrying plate, a case opening is defined at the covering case, the covering case covers on the corresponding tank opening, multiple movable latches for correspondingly inserted in the respective insertion holes are arranged at the case opening, and the powders are allowed to be contained in the covering case.
    Type: Application
    Filed: August 21, 2017
    Publication date: January 17, 2019
    Inventors: Yi-Yi CHAO, Chih-Chieh HU
  • Patent number: 10102432
    Abstract: Disclosed is an image recognition method including: producing a distribution of first pixel value range by acquiring a distribution of pixel values of a plurality of pixels of a first selected block in a first surveillance image from previous M images; producing a distribution of second pixel value range by acquiring a distribution of pixel values of the pixels of the first selected block from previous N images, wherein N and M are positive integers, and N<M; obtaining a first varying parameter related to the first selected block according to the distribution of first pixel value range and the distribution of second pixel value range; and generating a first recognition signal when the first varying parameter is greater than a first threshold.
    Type: Grant
    Filed: December 9, 2016
    Date of Patent: October 16, 2018
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Denis Xynkin, Min-Hao Li, Yi-Yi Huang
  • Publication number: 20180246710
    Abstract: A software update apparatus and method in a virtualized environment. The software update method performed by a software update apparatus in a virtualized environment includes monitoring an operation that is invoked when software is updated in a guest operating system area, creating a software profile by analyzing results of the monitoring, mounting a virtual disk image for a target virtual machine in a target directory in a virtual machine monitor area, and incorporating update information of at least one of a file and a registry that are specified in the software profile into the target directory in which the virtual disk image is mounted.
    Type: Application
    Filed: July 21, 2017
    Publication date: August 30, 2018
    Inventors: Sung-Jin KIM, Woomin HWANG, Byung-Joon KIM, Hyun-Yi YI, Chul-Woo LEE, Hyoung-Chun KIM
  • Publication number: 20180177175
    Abstract: A vortex insect trap includes an insect trapping container, a fan and an insect-killing device. The insect trapping container internally defines an air flowing space, in which the insect-killing device is disposed. The air flowing space is enclosed in at least one flow-guiding wall surface and communicable with external environment via an air suck-in port and an air exit port of the vortex insect trap. The fan is mounted to the air exit port for sucking in external air via the air suck-in port and discharging air inside the air flowing space from the insect trapping container via the air exit port. When the fan operates, air sucked into the air flowing space flows along the flow-guiding wall surface to form a spiral air flow that flows toward a bottom of the air flowing space while carries insects sucked into the air flowing space to the insect-killing device.
    Type: Application
    Filed: July 26, 2017
    Publication date: June 28, 2018
    Applicant: INADAY'S BIOTECH CO., LTD.
    Inventor: Yi Yi TSAI
  • Publication number: 20180073081
    Abstract: The invention is directed to a method to predict prognostic results for diseases including acute myeloid leukemia (AML) by analyzing novel markers which comprises microRNA/mRNA (miRNA/mRNA) pairings. In particular, the miRNA/mRNA pairings are a kind of NPM1 mutation-modulated miRNA/mRNA regulation pairs.
    Type: Application
    Filed: September 13, 2016
    Publication date: March 15, 2018
    Inventors: Eric Y. Chuang, Mong-Hsun Tsai, Wen-Chien Chou, Liang-Chuan Lai, Hwei-Fang Tien, Yu-Chiao Chiu, Tzu-Pin Lu, Yen-Chun Liu, Yi-Yi Kuo, Hsin-An Hou, Yidong Chen
  • Patent number: 9891204
    Abstract: The present invention provides a heavy metal detecting device and the fabricating method thereof. The heavy metal detecting device includes a substrate and a nano-metal-particle array. The fabricating method of the heavy metal detecting device includes following steps of: (S1) preparing a substrate, cleaning the substrate with a first liquid, and drying the substrate with a first gas; (S2) soaking the substrate in a first solution; (S3) after soaking the substrate for a first period of time, cleaning and drying the substrate with the first liquid and the first gas respectively; (S4) soaking the substrate in a pre-synthesized nano-metal-particle solution; and (S5) after soaking the substrate for a second period of time, cleaning and drying the substrate with a second liquid and the first gas respectively. Compared to the prior arts, the heavy metal detecting device of the present invention has the advantages of simplicity and rapidity.
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: February 13, 2018
    Assignee: National Tsing Hua University
    Inventors: De-Hui Wan, Shih-Yu Tseng, Shang-Yi Yi
  • Patent number: 9792685
    Abstract: An image capturing device and a method for calibrating image deformation thereof are provided. The image capturing device has a first image sensor and a second image sensor and the method includes following steps. A plurality of image groups are captured through the first image sensor and the second image sensor. Each of the image groups includes a first image and a second image, and the image groups include a reference image group. Whether an image deformation occurs on a first reference image and a second reference image in the reference image group is detected. If it is detected that the image deformation occurs on the reference image group, a current calibration parameter is updated according to a plurality of feature point comparison values corresponding to the image groups. The current calibration parameter is used for performing an image rectification on each of the first images and the second images.
    Type: Grant
    Filed: June 25, 2014
    Date of Patent: October 17, 2017
    Assignee: Altek Semiconductor Corp.
    Inventors: Hong-Long Chou, Ming-Jiun Liaw, Yi-Yi Yu, I-Te Yu, Yu-Chih Wang, Che-Lun Chuang
  • Publication number: 20170212092
    Abstract: The present invention provides a heavy metal detecting device and the fabricating method thereof. The heavy metal detecting device comprises a substrate and a nano-metal-particle array. The fabricating method of the heavy metal detecting device comprises following steps of: (S1) preparing a substrate, cleaning the substrate with a first liquid, and drying the substrate with a first gas; (S2) soaking the substrate in a first solution; (S3) after soaking the substrate for a first period of time, cleaning and drying the substrate with the first liquid and the first gas respectively; (S4) soaking the substrate in a pre-synthesized nano-metal-particle solution; and (S5) after soaking the substrate for a second period of time, cleaning and drying the substrate with a second liquid and the first gas respectively. Compared to the prior arts, the heavy metal detecting device of the present invention has the advantages of simplicity and rapidity.
    Type: Application
    Filed: April 10, 2017
    Publication date: July 27, 2017
    Inventors: De-Hui WAN, Shih-Yu TSENG, Shang-Yi YI