Abstract: In one embodiment, a system comprises a host processor and a storage system. The storage system comprises one or more storage devices, and each storage device comprises a non-volatile memory and a compute offload controller. The non-volatile memory stores data, and the compute offload controller performs compute tasks on the data based on compute offload commands from the host processor.

Abstract: A method of image template matching for multiple process layers of, for example, semiconductor substrate with an adaptive weight map is described. An image template is provided with a weight map, which is adaptively updated based during template matching based on the position of the image template on the image. A method of template matching a grouped pattern or artifacts in a composed template is described, wherein the pattern comprises deemphasized areas weighted less than the image templates. A method of generating an image template based on a synthetic image is described. The synthetic image can be generated based on process and image modeling. A method of selecting a grouped pattern or artifacts and generating a composed template is described. A method of per layer image template matching is described.

Abstract: A method for determining values of design variables of a lithographic process based on a predicted failure rate for printing a target pattern on a substrate using a lithographic apparatus. The method includes obtaining an image corresponding to a target pattern to be printed on a substrate using a lithographic apparatus, wherein the image is generated based on a set of values of design variables of the lithographic apparatus or a lithographic process; determining image properties, the image properties representative of a pattern printed on the substrate, the pattern corresponding to the target pattern; predicting a failure rate in printing the pattern on the substrate based on the image properties; and determining a specified value of a specified design variable based on the failure rate, the specified value to be used in the lithographic process to print the target pattern on the substrate.

Abstract: The present disclosure belongs to a sorting method, and specifically relates to an automatic floorboard sorting method. An automatic floorboard sorting method includes the following steps: step 1: a training stage: training an artificial intelligence so that defects of floorboards in a black-and-white image and a color image can be automatically identified by the artificial intelligence; step 2: a using stage: using the artificial intelligence obtained by training in step 1 to perform identification, and performing sampling inspection to continuously iteratively upgrade the artificial intelligence. The present invention has the outstanding effects that an effective identification algorithm is formed by artificial intelligence training, and the algorithm is then used to carry out intelligent identification, so that the identification efficiency is high; the identification effect is good; the marginal cost is low; and it is conductive to the quality control for a floorboard finished product.

Abstract: A method for calibrating a process model and training an inverse process model of a patterning process. The training method includes obtaining a first patterning device pattern from simulation of an inverse lithographic process that predicts a patterning device pattern based on a wafer target layout, receiving wafer data corresponding to a wafer exposed using the first patterning device pattern, and training an inverse process model configured to predict a second patterning device pattern using the wafer data related to the exposed wafer and the first patterning device pattern.

Abstract: A housing assembly includes a top panel provided with connection side members at opposite ends of the top panel, respectively, and extending downward, and a middle frame including two opposite side panels. An upper end of each of the side panels is connected to a corresponding one of the connection side members. A buckle structure and a screw lock structure are provided between the upper end of each of the side panels and the corresponding one of the connection side members.

Abstract: A method for recovering C2 components in a methane-containing industrial gas includes the steps of (1) cooling a compressed methane-containing industrial gas and performing gas-liquid separation; (2) absorbing C2 components in the gas phase by using an absorbent to obtain an absorption rich liquid; (3) returning the absorption rich liquid to the compression in step (1) or mixing the absorption rich liquid with the liquid phase obtained in step (1) to obtain a mixed liquid, and depressurizing the mixed liquid or the absorption rich liquid; (4) performing methane desorption on the depressurized stream to obtain a rich absorbent, or performing second gas-liquid separation on the depressurized stream, followed by methane desorption on the second liquid phase to obtain a rich absorbent; and (5) desorbing and separating the rich absorbent to obtain a lean absorbent and an enriched gas, and recycling and reusing the lean absorbent.

Abstract: A method for calibrating a process model and training an inverse process model of a patterning process. The training method includes obtaining a first patterning device pattern from simulation of an inverse lithographic process that predicts a patterning device pattern based on a wafer target layout, receiving wafer data corresponding to a wafer exposed using the first patterning device pattern, and training an inverse process model configured to predict a second patterning device pattern using the wafer data related to the exposed wafer and the first patterning device pattern.

Abstract: A method for predicting yield relating to a process of manufacturing semiconductor devices on a substrate, the method including: obtaining a trained first model which translates modeled parameters into a yield parameter, the modeled parameters including: a) a geometrical parameter associated with one or more selected from: a geometric characteristic, dimension or position of a device element manufactured by the process and b) a trained free parameter; obtaining process parameter data including data regarding a process parameter characterizing the process; converting the process parameter data into values of the geometrical parameter; and predicting the yield parameter using the trained first model and the values of the geometrical parameter.

Abstract: A method for analyzing a process, the method including obtaining a multi-dimensional probability density function representing an expected distribution of values for a plurality of process parameters; obtaining a performance function relating values of the process parameters to a performance metric of the process; and using the performance function to map the probability density function to a performance probability function having the process parameters as arguments.

Abstract: Disclosed is a display apparatus. The display apparatus includes: a display panel and a backlight module; where the backlight module includes: a back plane including a plane portion and an inclined portion surrounding the plane portion, where the inclined portion inclines toward a light emitting side of the backlight module, and the inclined portion and the plane portion are arranged at a configured angle; a light board, arranged on the plane portion of the back plane; a split reflector plate, including a main reflector plate and side reflector plates; where the main reflector plate is arranged on a side of the light board facing away from the back plane, the side reflector plates are arranged on a side of the inclined portion of the back plane facing the light board, and splicing positions of the plurality of side reflector plates do not overlap with corner positions of the inclined portion.

Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.

Abstract: A head-mounted device may include a housing with a display that displays images that are viewable from an eye box. A light seal may be coupled the housing and may block outside light from reaching the eye box. The light seal may include a seamless tube of knit fabric that forms an outermost layer of the light seal. A light-blocking fabric may line the inner surface of the seamless tube of knit fabric. The light-blocking fabric may include a dark-colored weft knit layer facing the eye box, a light-colored weft knit layer facing and matching a color of the seamless tube of knit fabric, and a middle layer joining the light-colored weft knit layer and the dark-colored weft knit layer. The dark-colored weft knit layer may ensure sufficient opacity without being visible through the seamless tube of knit fabric.

Abstract: A wearable device can provide an audio module that is operable to provide audio output from a distance away from the ears of the user. For example, the wearable device can be worn on clothing of the user and direct audio waves to the ears of the user. Such audio waves can be focused by a parametric array of speakers that limit audibility by others. Thus, the privacy of the audio directed to the user can be maintained without requiring the user to wear audio headsets on, over, or in the ears of the user. The wearable device can further include microphones and/or connections to other devices that facilitate calibration of the audio module of the wearable device. The wearable device can further include user sensors that are configured to detect, measure, and/or track one or more properties of the user.

Abstract: A method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method including: obtaining a set of pre-process metrology data; processing the set of pre-process metrology data by decomposing the pre-process metrology data into one or more components which: a) correlate to the performance metric; or b) are at least partially correctable by a control process which is part of the semiconductor manufacturing process; and applying a trained model to the processed set of pre-process metrology data to determine the correction for the semiconductor manufacturing process.

Abstract: A method and apparatus for training a defect location prediction model to predict a defect for a substrate location is disclosed. A number of datasets having data regarding process-related parameters for each location on a set of substrates is received. Some of the locations have partial datasets in which data regarding one or more process-related parameters is absent. The datasets are processed to generate multiple parameter groups having data for different sets of process-related parameters. For each parameter group, a sub-model of the defect location prediction model is created based on the corresponding set of process-related parameters and trained using data from the parameter group. A trained sub-model(s) may be selected based on process-related parameters available in a candidate dataset and a defect prediction may be generated for a location associated with the candidate dataset using the selected sub-model.

Abstract: The invention relates to the field of medicinal chemistry, and discloses a class of biphenyl derivatives with PD-1/PD-L1 inhibitory activity, and a preparation method and use thereof. The invention further discloses a composition containing the biphenyl derivatives with PD-1/PD-L1 inhibitory activity or pharmaceutically acceptable salts thereof and a pharmaceutically acceptable carrier, and applications of the composition in preparation of PD-1/PD-L1 inhibitors. The compounds of the invention are useful in the therapy used to treat tumors.

Abstract: Wireless earbuds may be provided with adjustable-shape housings. The housings may have bendable portions. Bendable metal members, hinges, or other flexible structures may be used in forming bendable structures for the earbuds. Electrical components may be covered by a layer of molded foam. A cover such as a fabric cover may be used to cover the molded foam. Spacer fabric or other soft material may be interposed between the fabric cover and the foam. The housing may be bent or otherwise adjusted between two or more states such as a normal, non-sleep, walking state in which the housing is expanded for normal operation while a user is sitting or walking and a sleep state in which the housing is bent to enhance comfort while sleeping. The wireless earbuds may have illumination systems, sensors, and other components.

Abstract: A method and apparatus for identifying locations to be inspected on a substrate is disclosed. A defect location prediction model is trained using a training dataset associated with other substrates to generate a prediction of defect or non-defect and a confidence score associated with the prediction for each of the locations based on process-related data associated with the substrates. Those of the locations determined by the defect location prediction model as having confidences scores satisfying a confidence threshold are added to a set of locations to be inspected by an inspection system. After the set of locations are inspected, the inspection results data is obtained, and the defect location prediction model is incrementally trained by using the inspection results data and process-related data for the set of locations as training data.

Abstract: Disclosed is a display apparatus. The display apparatus includes: a display panel and a backlight module; where the backlight module includes: a back plane including a plane portion and an inclined portion surrounding the plane portion, where the inclined portion inclines toward a light emitting side of the backlight module, and the inclined portion and the plane portion are arranged at a configured angle; a light board, arranged on the plane portion of the back plane; a split reflector plate, including a main reflector plate and side reflector plates; where the main reflector plate is arranged on a side of the light board facing away from the back plane, the side reflector plates are arranged on a side of the inclined portion of the back plane facing the light board, and splicing positions of the plurality of side reflector plates do not overlap with corner positions of the inclined portion.