Patents by Inventor Yi Zou
Yi Zou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230400731Abstract: Disclosed is a display apparatus. The display apparatus includes: a display panel and a backlight module; where the backlight module includes: a back plane including a plane portion and an inclined portion surrounding the plane portion, where the inclined portion inclines toward a light emitting side of the backlight module, and the inclined portion and the plane portion are arranged at a configured angle; a light board, arranged on the plane portion of the back plane; a split reflector plate, including a main reflector plate and side reflector plates; where the main reflector plate is arranged on a side of the light board facing away from the back plane, the side reflector plates are arranged on a side of the inclined portion of the back plane facing the light board, and splicing positions of the plurality of side reflector plates do not overlap with corner positions of the inclined portion.Type: ApplicationFiled: August 29, 2023Publication date: December 14, 2023Inventors: Xiaodong CONG, Yu HAN, Yi ZOU, Ximin FENG, Guangjun YUAN, Zhirui ZHANG, Guangqing YANG
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Publication number: 20230401694Abstract: A method and apparatus for identifying locations to be inspected on a substrate is disclosed. A defect location prediction model is trained using a training dataset associated with other substrates to generate a prediction of defect or non-defect and a confidence score associated with the prediction for each of the locations based on process-related data associated with the substrates. Those of the locations determined by the defect location prediction model as having confidences scores satisfying a confidence threshold are added to a set of locations to be inspected by an inspection system. After the set of locations are inspected, the inspection results data is obtained, and the defect location prediction model is incrementally trained by using the inspection results data and process-related data for the set of locations as training data.Type: ApplicationFiled: November 2, 2021Publication date: December 14, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Chenxi LIN, Yi ZOU, Tanbir HASAN, Huina XU, Ren-Jay KOU, Nabeel Noor MOIN, Kourosh NAFISI
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Patent number: 11818528Abstract: Wireless earbuds may be provided with adjustable-shape housings. The housings may have bendable portions. Bendable metal members, hinges, or other flexible structures may be used in forming bendable structures for the earbuds. Electrical components may be covered by a layer of molded foam. A cover such as a fabric cover may be used to cover the molded foam. Spacer fabric or other soft material may be interposed between the fabric cover and the foam. The housing may be bent or otherwise adjusted between two or more states such as a normal, non-sleep, walking state in which the housing is expanded for normal operation while a user is sitting or walking and a sleep state in which the housing is bent to enhance comfort while sleeping. The wireless earbuds may have illumination systems, sensors, and other components.Type: GrantFiled: August 20, 2021Date of Patent: November 14, 2023Assignee: Apple Inc.Inventors: Yi Zou, Chad J. Miller, Daniel A. Podhajny, Joshua A. Hoover, Kristen L. Cretella, Nicholas R. Trincia, Seul Bi Kim, William Leith, Yue Chen
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Patent number: 11803127Abstract: A method for determining a root cause affecting yield in a process for manufacturing devices on a substrate, the method including: obtaining yield distribution data including a distribution of a yield parameter across the substrate or part thereof; obtaining sets of metrology data, each set including a spatial variation of a process parameter over the substrate or part thereof corresponding to a different layer of the substrate; comparing the yield distribution data and metrology data based on a similarity metric describing a spatial similarity between the yield distribution data and an individual set out of the sets of the metrology data; and determining a first similar set of metrology data out of the sets of metrology data, being the first set of metrology data in terms of processing order for the corresponding layers, which is determined to be similar to the yield distribution data.Type: GrantFiled: November 4, 2019Date of Patent: October 31, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Chenxi Lin, Cyrus Emil Tabery, Hakki Ergün Cekli, Simon Philip Spencer Hastings, Boris Menchtchikov, Yi Zou, Yana Cheng, Maxime Philippe Frederic Genin, Tzu-Chao Chen, Davit Harutyunyan, Youping Zhang
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Patent number: 11792575Abstract: An electronic device may be formed from acoustically permeable textile layers and voice coil layers. The voice coil layers may output sound through the textile layers. The textile layers and voice coil layers may be foldable or bent in one or more directions to allow the electronic device to be placed in expanded, collapsed, or folded configurations to allow for improved portability. Additionally, the textile layers and voice coil layers may be folded or bent to place the electronic device in cylindrical, conical, and other configurations to allow for improved sound output from the voice coil layers. The electronic device may also include light-emitting components between the textile layers that emit light through one of the textile layers to form indicators or images for a user of the device. The electronic device may have a plurality of sensors to allow user interactions to control the output of the electronic device.Type: GrantFiled: July 20, 2021Date of Patent: October 17, 2023Assignee: Apple Inc.Inventors: Yue Chen, Joshua A. Hoover, Daniel A. Podhajny, Nicholas R. Trincia, Seul Bi Kim, Chad J. Miller, Kristen L. Cretella, Yi Zou, William Leith
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Publication number: 20230319471Abstract: A wearable device can provide an audio module that is operable to provide audio output from a distance away from the ears of the user. For example, the wearable device can be worn on clothing of the user and direct audio waves to the ears of the user. Such audio waves can be focused by a parametric array of speakers that limit audibility by others. Thus, the privacy of the audio directed to the user can be maintained without requiring the user to wear audio headsets on, over, or in the ears of the user. The wearable device can further include microphones and/or connections to other devices that facilitate calibration of the audio module of the wearable device. The wearable device can further include user sensors that are configured to detect, measure, and/or track one or more properties of the user.Type: ApplicationFiled: June 9, 2023Publication date: October 5, 2023Inventors: Daniel A. PODHAJNY, Joshua A. HOOVER, Nicholas R. TRINCIA, Yue CHEN, Seul Bi KIM, Chad J. MILLER, Kristen L. CRETELLA, Yi ZOU, William LEITH
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Publication number: 20230273529Abstract: Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input includes one or more parameters used in the patterning process. The control output is generated with a trained machine learning mod& based on the control input, The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data, The training data includes 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.Type: ApplicationFiled: June 14, 2021Publication date: August 31, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Satej Subhash KHEDEKAR, Henricus Jozef CASTELIJNS, Anjan Prasad GANTAPARA, Stephen Henry BOND, Seyed Iman MOSSAVAT, Alexander YPMA, Gerald DICKER, Ewout Klaas STEINMEIER, Chaoqun GUO, Chenxi LIN, Hongwei CHEN, Zhaoze LI, Youping ZHANG, Yi ZOU, Koos VAN BERKEL, Joost Johan BOLDER, Arnaud HUBAUX, Andriy Vasyliovich HLOD, Juan Manuel GONZALEZ HUESCA, Frans Bernard AARDEN
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Patent number: 11734490Abstract: A method to determine a curvilinear pattern of a patterning device that includes obtaining (i) an initial image of the patterning device corresponding to a target pattern to be printed on a substrate subjected to a patterning process, and (ii) a process model configured to predict a pattern on the substrate from the initial image, generating, by a hardware computer system, an enhanced image from the initial image, generating, by the hardware computer system, a level set image using the enhanced image, and iteratively determining, by the hardware computer system, a curvilinear pattern for the patterning device based on the level set image, the process model, and a cost function, where the cost function (e.g., EPE) determines a difference between a predicted pattern and the target pattern, where the difference is iteratively reduced.Type: GrantFiled: December 29, 2021Date of Patent: August 22, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Quan Zhang, Been-Der Chen, Rafael C. Howell, Jing Su, Yi Zou, Yen-Wen Lu
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Patent number: 11716560Abstract: An accessory for wireless earbuds can include a first receiving portion defining a first cavity sized to receive and retain a first earbud and a second receiving portion defining a second cavity sized to receive and retain a second earbud. Each receiving portion can include a charging component to electrically couple with the respective earbud. The accessory can include a flexible portion connected to the first receiving portion and the second receiving portion, the flexible portion at least partially defining an internal volume, and a battery disposed in the internal volume and electrically coupled with the charging components.Type: GrantFiled: March 31, 2021Date of Patent: August 1, 2023Assignee: Apple Inc.Inventors: Kristen L. Cretella, Chad J. Miller, Daniel A. Podhajny, Joshua A. Hoover, Nicholas R. Trincia, Seul Bi Kim, William Leith, Yi Zou, Yue Chen
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Patent number: 11716567Abstract: A wearable device can provide an audio module that is operable to provide audio output from a distance away from the ears of the user. For example, the wearable device can be worn on clothing of the user and direct audio waves to the ears of the user. Such audio waves can be focused by a parametric array of speakers that limit audibility by others. Thus, the privacy of the audio directed to the user can be maintained without requiring the user to wear audio headsets on, over, or in the ears of the user. The wearable device can further include microphones and/or connections to other devices that facilitate calibration of the audio module of the wearable device. The wearable device can further include user sensors that are configured to detect, measure, and/or track one or more properties of the user.Type: GrantFiled: July 22, 2021Date of Patent: August 1, 2023Assignee: APPLE INC.Inventors: Daniel A. Podhajny, Joshua A. Hoover, Nicholas R. Trincia, Yue Chen, Seul Bi Kim, Chad J. Miller, Kristen L. Cretella, Yi Zou, William Leith
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Publication number: 20230236512Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.Type: ApplicationFiled: March 7, 2023Publication date: July 27, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Youping ZHANG, Maxime Philippe Frederic Genin, Cong Wu, Jing Su, Weixuan Hu, Yi Zou
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Patent number: 11692935Abstract: Disclosed is a transient-state THz spectrometer applied to cells and biological macromolecules, including a femtosecond laser amplifier. A femtosecond laser output by the femtosecond laser amplifier is divided into two beams of pump light and probe light after passing through a beam splitter of which a transmission-reflection ratio is 7:3, the pump light is focused to irradiate a gap between electrodes of a nonlinear photoconductive antenna and emit a terahertz wave after successively passing through a half wave plate, a silver-plated reflector and a first lens, the terahertz wave forms a terahertz wave collineation after successively passing through a second lens, a slab waveguide, a third lens and an ITO film, the terahertz wave collineation and the probe light form a probe light collineation of wavefront tilt which is perpendicularly incident on a ZnTe crystal and detected and recorded by using a CCD camera.Type: GrantFiled: January 13, 2021Date of Patent: July 4, 2023Assignee: XI'AN UNIVERSITY OF TECHNOLOGYInventors: Wei Shi, Lei Hou, Cheng Ma, Chengang Dong, Lei Yang, Jiaguang Han, Yanfeng Li, Chunmei Ouyang, Jianqiang Gu, Liguo Zhu, Zhaohui Zhai, Lianghui Du, Yi Zou
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Patent number: 11635699Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.Type: GrantFiled: December 4, 2019Date of Patent: April 25, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Youping Zhang, Maxime Philippe Frederic Genin, Cong Wu, Jing Su, Weixuan Hu, Yi Zou
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Publication number: 20230115358Abstract: An atomizer (1) and an electronic cigarette (100).Type: ApplicationFiled: June 5, 2020Publication date: April 13, 2023Inventors: YI ZOU, ZHONGLI XU, YONGHAI LI
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Publication number: 20230058188Abstract: Disclosed is a transient-state THz spectrometer applied to cells and biological macromolecules, including a femtosecond laser amplifier. A femtosecond laser output by the femtosecond laser amplifier is divided into two beams of pump light and probe light after passing through a beam splitter of which a transmission-reflection ratio is 7:3, the pump light is focused to irradiate a gap between electrodes of a nonlinear photoconductive antenna and emit a terahertz wave after successively passing through a half wave plate, a silver-plated reflector and a first lens, the terahertz wave forms a terahertz wave collineation after successively passing through a second lens, a slab waveguide, a third lens and an ITO film, the terahertz wave collineation and the probe light form a probe light collineation of wavefront tilt which is perpendicularly incident on a ZnTe crystal and detected and recorded by using a CCD camera.Type: ApplicationFiled: January 13, 2021Publication date: February 23, 2023Inventors: Wei SHI, Lei HOU, Cheng MA, Chengang DONG, Lei YANG, Jiaguang HAN, Yanfeng LI, Chunmei OUYANG, Jianqiang GU, Liguo ZHU, Zhaohui ZHAI, Lianghui DU, Yi ZOU
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Publication number: 20230013919Abstract: A method for calibrating a process model and training an inverse process model of a patterning process. The training method includes obtaining a first patterning device pattern from simulation of an inverse lithographic process that predicts a patterning device pattern based on a wafer target layout, receiving wafer data corresponding to a wafer exposed using the first patterning device pattern, and training an inverse process model configured to predict a second patterning device pattern using the wafer data related to the exposed wafer and the first patterning device pattern.Type: ApplicationFiled: September 22, 2022Publication date: January 19, 2023Applicant: ASML Netherlands B.V.Inventors: Marinus Aart Van Den Brink, Yu Cao, Yi Zou
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Patent number: 11550617Abstract: A method is described. The method includes performing the following with a storage end transaction agent within a storage sled of a rack mounted computing system: receiving a request to perform storage operations with one or more storage devices of the storage sled, the request specifying an all-or-nothing semantic for the storage operations; recognizing that all of the storage operations have successfully completed; after all of the storage operations have successfully completed, reporting to a CPU side transaction agent that sent the request that all of the storage operations have successfully completed.Type: GrantFiled: June 22, 2020Date of Patent: January 10, 2023Assignee: Intel CorporationInventors: Arun Raghunath, Yi Zou, Tushar Sudhakar Gohad, Anjaneya R. Chagam Reddy, Sujoy Sen
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Patent number: 11544440Abstract: A method for calibrating a process model and training an inverse process model of a patterning process. The training method includes obtaining a first patterning device pattern from simulation of an inverse lithographic process that predicts a patterning device pattern based on a wafer target layout, receiving wafer data corresponding to a wafer exposed using the first patterning device pattern, and training an inverse process model configured to predict a second patterning device pattern using the wafer data related to the exposed wafer and the first patterning device pattern.Type: GrantFiled: May 23, 2019Date of Patent: January 3, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Marinus Aart Van Den Brink, Yu Cao, Yi Zou
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Patent number: 11526448Abstract: An apparatus is described. The apparatus includes a memory controller to interface with a multi-level memory, where, an upper level of the multi-level memory is to act as a cache for a lower level of the multi-level memory. The memory controller has circuitry to determine: i) an original address of a slot in the upper level of memory from an address of a memory request in a direct mapped fashion; ii) a miss in the cache for the request because the slot is pinned with data from another address that competes with the address; iii) a partner slot of the slot in the cache in response to the miss; iv) whether there is a hit or miss in the partner slot in the cache for the request.Type: GrantFiled: September 27, 2019Date of Patent: December 13, 2022Assignee: Intel CorporationInventors: Zhe Wang, Alaa R. Alameldeen, Yi Zou, Gordon King
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Publication number: 20220389337Abstract: A method for recovering C2 components in a methane-containing industrial gas includes the steps of (1) cooling a compressed methane-containing industrial gas and performing gas-liquid separation; (2) absorbing C2 components in the gas phase by using an absorbent to obtain an absorption rich liquid; (3) returning the absorption rich liquid to the compression in step (1) or mixing the absorption rich liquid with the liquid phase obtained in step (1) to obtain a mixed liquid, and depressurizing the mixed liquid or the absorption rich liquid; (4) performing methane desorption on the depressurized stream to obtain a rich absorbent, or performing second gas-liquid separation on the depressurized stream, followed by methane desorption on the second liquid phase to obtain a rich absorbent; and (5) desorbing and separating the rich absorbent to obtain a lean absorbent and an enriched gas, and recycling and reusing the lean absorbent.Type: ApplicationFiled: September 24, 2020Publication date: December 8, 2022Inventors: Huawei SHAO, Dongfeng LI, Yi ZOU, Zhixin LIU, Chunfang LI, Liang GUO, Jingsheng ZHANG, Zhiyan HU