Abstract: In one embodiment, the semiconductor device includes a non-volatile memory cell array, a write circuit configured to write to the non-volatile memory cell array, and a control circuit. The control circuit is configured to store at least one erase indicator. The erase indicator is associated with at least a portion of the non-volatile memory cell array and indicates a logic state. The control circuit is configured to control the write circuit to write the logic state indicated by the erase indicator in the non-volatile memory cell array during an erase operation of the associated portion of the non-volatile memory cell array.

Abstract: The present invention relates to a dispenser for supplying a disposable paper product of a roll type such as a toilet paper, a hand towel and etc. The dispenser comprises a main body casing which accommodates the paper product and has a rotating shaft supporting the paper product to be rotatable and a discharging part for discharging the paper product, and a wet type cutting unit which is located at the discharging part to provide liquid to a part of the paper product that is to be cut. According to the present invention, liquid is provided to an area of the paper product to be cut, so that the paper product can be easily cut with a relatively small force.

Abstract: Disclosed is a semiconductor memory device including a memory cell array having a plurality of variable resistance memory cells divided into first and second areas. An I/O circuit is configured to access the memory cell array under the control of control logic so as to access the first or second area in response to an external command. The I/O circuit accesses the first area using a memory cell unit and the second area using a page unit.

Abstract: Disclosed is a method of preventing coupling noises for a non-volatile semiconductor memory device. According to the method, if an edge of a write operation signal overlaps an activated period of a read operation signal a check result is generated. The write operation signal is modified based on the check result.

Abstract: A capacitor of a semiconductor device and a method for manufacturing the same includes a lower metal layer on and/or over a semiconductor substrate; an insulating layer formed on and/or over the lower metal layer with step difference; and an upper electrode on and/or over the insulating layer pattern, wherein a top corner of the upper electrode is rounded so that a curvature pattern is formed on the top corner of the upper electrode.

Abstract: A lateral double diffused metal oxide semiconductor (LDMOS) device and a method of manufacturing the same. A LDMOS device may include a high voltage well formed over a substrate, a reduced surface field region formed thereover which may be adjacent a body region, and/or an isolation layer. An isolation layer may include a predetermined area formed over a reduced surface field region, may be partially overlapped with a top surface of a substrate and/or may include an area formed adjacent a high voltage well. A low voltage well may be formed over a substrate. A gate electrode may extend from a predetermined top surface of a body region to a predetermined top surface of an isolation layer. A drain region may be formed over a low voltage well. A source region may be formed over a body region and may have at least a portion formed under a gate electrode.

Abstract: A nonvolatile memory device comprises a one-time-programmable (OTP) lock bit register. The nonvolatile memory device comprises a variable-resistance memory cell array comprising an OTP block that store data and a register that stores OTP lock state information indicating whether the data is changeable. The register comprises a variable memory cell. An initial value of the OTP lock state information is set to a program protection state.

Abstract: One embodiment includes a non-volatile memory cell array, and a read unit configured to disable read operation for the non-volatile memory cell array for a time period following writing of data in the non-volatile memory cell array.

Abstract: One embodiment includes a non-volatile memory cell array, and a read unit configured to disable read operation for the non-volatile memory cell array for a time period following writing of data in the non-volatile memory cell array.

Abstract: An embedded flash memory device and a method for fabricating the same which reduces the size of a memory device using logic CMOS fabricating processes and enhancing a coupling ratio of the memory device. The flash memory device includes a coupling oxide layer on an active area of a semiconductor substrate, a first control gate formed on and/or over the coupling oxide layer and a second control gate formed on and/or over and enclosing lateral sidewalls of the coupling oxide layer and the first control gate.

Abstract: In a method of discharging bit-lines for a non-volatile semiconductor memory device performing a read-while-write operation. The method include discharging a global write bit-line to a ground voltage based on a write command within a first period. the method also includes maintaining the discharged voltage of the global write bit-line in the ground voltage during a second period.

Abstract: Disclosed is a method of preventing coupling noises for a non-volatile semiconductor memory device. According to the method, if an edge of a write operation signal overlaps an activated period of a read operation signal a check result is generated. The write operation signal is modified based on the check result.

Abstract: A nonvolatile memory device includes global selection lines, local selection lines, a first selection circuit, and a second selection circuit. The local lines correspond respectively to the global selection lines. The first selection circuit is configured to connect to the global selection lines to select the global selection lines. The second selection circuit is connected between the global selection lines and the local selection lines and is configured to select the local selection lines. The first selection circuit is configured to select at least one global selection line, and the second selection circuit is configured to select the local selection lines corresponding to the selected global selection line while the at least one global selection line is continuously activated.

Abstract: A capacitor of a semiconductor device and a method for manufacturing the same includes a lower metal layer on and/or over a semiconductor substrate; an insulating layer formed on and/or over the lower metal layer with step difference; and an upper electrode on and/or over the insulating layer pattern, wherein a top corner of the upper electrode is rounded so that a curvature pattern is formed on the top corner of the upper electrode.

Abstract: Disclosed is a semiconductor memory device including a memory cell array having a plurality of variable resistance memory cells divided into first and second areas. An I/O circuit is configured to access the memory cell array under the control of control logic so as to access the first or second area in response to an external command. The I/O circuit accesses the first area using a memory cell unit and the second area using a page unit.

Abstract: A lateral double diffused metal oxide semiconductor (LDMOS) device and a method of manufacturing the same. A LDMOS device may include a high voltage well formed over a substrate, a reduced surface field region formed thereover which may be adjacent a body region, and/or an isolation layer. An isolation layer may include a predetermined area formed over a reduced surface field region, may be partially overlapped with a top surface of a substrate and/or may include an area formed adjacent a high voltage well. A low voltage well may be formed over a substrate. A gate electrode may extend from a predetermined top surface of a body region to a predetermined top surface of an isolation layer. A drain region may be formed over a low voltage well. A source region may be formed over a body region and may have at least a portion formed under a gate electrode.

Abstract: In one embodiment, the semiconductor device includes a non-volatile memory cell array, a write circuit configured to write to the non-volatile memory cell array, and a control circuit. The control circuit is configured to store at least one erase indicator. The erase indicator is associated with at least a portion of the non-volatile memory cell array and indicates a logic state. The control circuit is configured to control the write circuit to write the logic state indicated by the erase indicator in the non-volatile memory cell array during an erase operation of the associated portion of the non-volatile memory cell array.

Abstract: A method for manufacturing a lateral double diffused metal oxide semiconductor (LDMOS) device includes forming an oxide layer on a semiconductor substrate, forming first and second trenches by partially etching the oxide layer and the semiconductor substrate, forming a small trench overlapping with the second trench so that the second trench has a stepped structure, and depositing one or more dielectric layers so that the first trench forms a device isolation layer defining a semiconductor device region and the second trench having a stepped structure forms a drain extension device isolation layer. The breakdown voltage of the LDMOS device may be improved while reducing the on-resistance, thereby improving the operational reliability of the device.

Abstract: A method of manufacturing a non-volatile memory device includes the steps of: defining an active region on a semiconductor substrate; forming a charge storage layer on the active region; forming a first conductive pattern on the charge storage layer, wherein the first conductive pattern has a bottom portion larger in width than a top portion thereof, the first conductive pattern further having a sloping sidewall connecting the top and bottom portions; forming an oxide layer on the sidewall of the first conductive pattern; forming a conformal second conductive layer on the first conductive pattern and on the active region around the first conductive pattern; and patterning the first conductive pattern and the second conductive layer to form a pair of first electrodes and a pair of second electrodes, respectively.

Abstract: One embodiment includes a non-volatile memory cell array, and a read unit configured to disable read operation for the non-volatile memory cell array for a time period following writing of data in the non-volatile memory cell array.