Abstract: The present invention discloses an array substrate for an active-matrix LCD device and a method of fabricating the same. The array substrate reduces the number of masks typically used in the fabrication process so that reliability is enhanced and the cost is reduced over the conventional device and method. Electric shorts caused by hillocks can be prevented or reduced by incorporating short-preventing sections between the gate line and an overlapping pixel electrode.

Abstract: A photo mask for patterning a lightning rod includes a shorting bar pattern and a plurality of pad patterns, an outer lightning rod pattern connected to the shorting bar pattern, an inner lightning rod pattern connected to the pad pattern, projections from each of the outer and inner lightning rod patterns, and a fine pattern in a “” shape connected between the projections, or a redundancy fine pattern connected between the pad patterns, or a plurality of the lightning rod patterns connected in series, thereby protecting the photo mask for patterning a lightning rod from damage from static electricity, and permitting patterning of an accurate lightning rod.

Abstract: A liquid crystal display device and a method of fabricating the same are disclosed in the present invention. More specifically, the method includes the steps forming a gate line on the first substrate sequentially forming a first insulating layer, an amorphous silicon layer, and a metal layer on the first substrate, patterning the metal layer to form a data line, forming a second insulating layer on the data line, patterning the second insulating layer and the amorphous silicon layer to form a passivation layer and an active layer, respectively, forming a pixel electrode at a pixel region defined by the gate and data lines, assembling the first substrate and the second substrate having a black matrix thereon, wherein the black matrix vertically overlaps at least one boundary line defined by different exposures during step-and-repeat exposure processes; and forming a liquid crystal layer between the first and second substrates.

Abstract: An array substrate for use in a liquid crystal display device is fabricated by the steps of forming a first metal layer on a substrate, patterning the first metal layer to form a gate line, a gate electrode, a gate pad, a first shorting bar, and a second shorting bar, forming a gate insulation layer, a pure amorphous silicon layer, a doped amorphous silicon layer and a second metal layer to cover the patterned first metal layer, patterning the second metal layer and the doped amorphous silicon layer to form first, second and third through-holes and first and second grooves to expose a portion of the pure amorphous silicon layer, the first and second grooves creating an isolated portions of the second metal layer, forming a passivation layer to cover the patterned second metal layer, forming a source electrode, a drain electrode, a data line, a data pad, an insulating segment, and first, second and third contact holes, and forming a pixel electrode, a first connector and a second connector of a transparent con

Abstract: The present invention discloses an array substrate for an active-matrix LCD device and a method of fabricating the same. The array substrate reduces the number of masks typically used in the fabrication process so that reliability is enhanced and the cost is reduced over the conventional device and method. Electric shorts caused by hillocks can be prevented or reduced by incorporating short-preventing sections between the gate line and an overlapping pixel electrode.

Abstract: A liquid crystal display is provided that includes a first substrate including a thin film transistor and a storage capacitor, a second substrate including a color filter layer with a recess at a location opposite to the storage capacitor, a common electrode on the color filter layer, and a liquid crystal layer between the first and second substrates. Spacers are provided between the first and second substrates to maintain a gap therebetween. In regions that include the storage capacitor, the recess compensates for a height difference in layers forming the capacitor on the first substrate to maintain a substantially uniform liquid crystal layer thickness over the whole region of the liquid crystal display, and thus provides a high quality picture.

Abstract: The present invention discloses a TFT array substrate (and method for making the same) having the large storage capacitance for use in a liquid crystal display device. In a four-mask process, the conventional storage capacitor of the TFT array substrate includes the capacitor electrodes and the insulation layer and semiconductor layer as a dielectric layer. However, the present invention includes the capacitor electrodes and the insulation layer as a dielectric layer so that the thickness of the dielectric layer becomes thinner. Therefore, much more electric charges can be stored in the storage capacitor. That means the liquid crystal display device can have a high picture quality and a high definition. Moreover, the present invention has a structure that can achieve the high manufacturing yield.

Abstract: A TFT array substrate has a PAI pattern, and the PAI pattern has an over-etched portion of the pure amorphous silicon layer. This over-etched portion prevents a short between the pixel electrode and the pure amorphous silicon layer (i.e., the active layer).

Abstract: An array substrate for use in a liquid crystal display device is fabricated by the steps of forming a first metal layer on a substrate, patterning the first metal layer to form a gate line, a gate electrode, a gate pad, a first shorting bar, and a second shorting bar, forming a gate insulation layer, a pure amorphous silicon layer, a doped amorphous silicon layer and a second metal layer to cover the patterned first metal layer, patterning the second metal layer and the doped amorphous silicon layer to form first, second and third through-holes and first and second grooves to expose a portion of the pure amorphous silicon layer, the first and second grooves creating an isolated portions of the second metal layer, forming a passivation layer to cover the patterned second metal layer, forming a source electrode, a drain electrode, a data line, a data pad, an insulating segment, and first, second and third contact holes, and forming a pixel electrode, a first connector and a second connector of a transparent con

Abstract: A method of fabricating a liquid crystal display device includes the steps of forming a gate electrode on a transparent substrate; forming a gate insulating film, an active layer and an ohmic contact layer on the transparent substrate to cover the gate electrode; forming a source electrode and a drain electrode on the ohmic contact layer and patterning the drain electrode to form an L-shaped portion and a plurality of protrusions; forming a protective layer on the source and drain electrodes such that side surfaces of the protective layer, the drain electrode, the ohmic contact layer and the active layer are exposed; and forming a pixel electrode on the protective layer to electrically contact the side surface of the drain electrode.

Abstract: A method of removing pattern defects in a liquid crystal display more particularly, a liquid crystal display having an IOP structure where a transparent conductive layer is formed on a passivation layer, removes pattern defects in active layers or data wires of an LCD simultaneously and quickly, without causing any damage on other parts of the LCD, by exposing pattern defects in the air, then carrying out an etching process in use of pixel electrodes and an etch-stop layer as an etch mask.

Abstract: An electrostatic damage preventing apparatus for a thin film transistor array of a liquid crystal display includes a horizontal ground voltage line disposed at a first perimeter portion of the thin film transistor array, a vertical ground voltage line disposed at a second perimeter portion of the thin film transistor array, and a first electrostatic damage-preventing switching device group including parallel connection of at least two electrostatic damage-preventing switching devices to divide and divert an electrostatic voltage applied over the horizontal ground voltage line.

Abstract: The present invention discloses a four-mask method of manufacturing an array substrate of a liquid crystal display device and the liquid crystal display device having the same array substrate.

Abstract: The present invention discloses an array substrate for an active-matrix LCD device and a method of fabricating the same. The array substrate reduces the number of masks used in the fabrication process so that reliability is enhanced and the cost is reduced over the conventional device and method.

Abstract: A liquid crystal display device and a method of fabricating the same are disclosed. The device, as disclosed, reduces the number of masks required to fabricate. Thus, cost is reduced and yield is increased. The device includes a plurality of gate lines, a plurality of data lines crossing the gate lines such that active regions are defined near the crossover points, thin film transistors are formed near the active regions, and a plurality of pixel electrodes are formed within regions defined by the adjacent gate and data lines. Also, pixel electrodes overlap gate lines and the two electrodes function as a storage capacitor.

Abstract: An array substrate for use in a liquid crystal display device is fabricated by the steps of forming a first metal layer on a substrate, patterning the first metal layer to form a gate line, a gate electrode, a gate pad, a first shorting bar, and a second shorting bar, forming a gate insulation layer, a pure amorphous silicon layer, a doped amorphous silicon layer and a second metal layer to cover the patterned first metal layer, patterning the second metal layer and the doped amorphous silicon layer to form first, second and third through-holes and first and second grooves to expose a portion of the pure amorphous silicon layer, the first and second grooves creating an isolated portions of the second metal layer, forming a passivation layer to cover the patterned second metal layer, forming a source electrode, a drain electrode, a data line, a data pad, an insulating segment, and first, second and third contact holes, and forming a pixel electrode, a first connector and a second connector of a transparent con

Abstract: A liquid crystal display, and a method of manufacturing thereof, includes providing a substrate; depositing sequentially a first metal layer and a first insulating layer on the substrate; patterning the first metal layer and the first insulating layer using a first mask to form a gate line and a first gate insulating layer; depositing sequentially a second gate insulating layer, a pure semiconductor layer, a doped semiconductor layer and a second metal layer over the whole substrate; patterning the second metal layer using a second mask to form a data line, source and drain electrodes, a capacitor electrode, the capacitor electrode overlapping a portion of the gae line; etching the doped semiconductor layer between the source and drain electrodes to form a channel region; depositing a third insulating layer over the whole substrate; patterning the third insulating layer using a third mask to form a passivation film, the passivation film having a smaller width than the data line and covering the source and dra

Abstract: A TFT array substrate has a PAI pattern, and the PAI pattern has an over-etched portion of the pure amorphous silicon layer. This over-etched portion prevents a short between the pixel electrode and the pure amorphous silicon layer (i.e., the active layer). The over-etched portion also enables the aperture ratio to increase.

Abstract: A method of removing pattern defects in a liquid crystal display more particularly, a liquid crystal display having an IOP structure where a transparent conductive layer is formed on a passivation layer, removes pattern defects in active layers or data wires of an LCD simultaneously and quickly, without causing any damage on other parts of the LCD, by exposing pattern defects in the air, then carrying out an etching process in use of pixel electrodes and an etch-stop layer as an etch mask.

Abstract: A liquid crystal display device includes a transparent substrate, a gate electrode disposed on the transparent substrate, a gate insulating film disposed on the transparent substrate and covering the gate electrode, an active layer disposed on the gate insulating film, an ohmic contact layer disposed on the active layer, a source electrode disposed on the ohmic contact layer and at one side of the gate electrode, a drain electrode disposed on the ohmic contact layer and at another side of the gate electrode, the drain electrode including an L-shaped portion and a plurality of protrusions, a protective layer disposed on the active layer covering upper surfaces of the source electrode and the drain electrode, and a pixel electrode disposed on the protective layer and electrically contacting a side surface of the drain electrode.