Abstract: A 4-mask method of manufacturing an array substrate. First and second masks form a gate line, a gate pad, a data line and a data pad. The data line has a protrusion near a crossing of the gate and data lines. A third mask forms a transparent electrode layer, a source electrode, a drain electrode, a pixel electrode, and exposes channel area. The transparent electrode layer has a similar shape as the data line and the data pad, but a smaller area than the data line and a greater area than the data pad. A second insulating layer is formed over the structure. A fourth mask patterns the second insulating layer to cover the gate line and the gate pad, the first and second insulating layer are patterned to form a gate pad contact hole, and the first insulating layer between the data line and the pixel electrode is patterned.

Abstract: A liquid crystal display is provided that includes a first substrate including a thin film transistor and a storage capacitor, a second substrate including a color filter layer with a recess at a location opposite to the storage capacitor, a common electrode on the color filter layer, and a liquid crystal layer between the first and second substrates. Spacers are provided between the first and second substrates to maintain a gap therebetween. In regions that include the storage capacitor, the recess compensates for a height difference in layers forming the capacitor on the first substrate to maintain a substantially uniform liquid crystal layer thickness over the whole region of the liquid crystal display, and thus provides a high quality picture.

Abstract: A TFT array substrate has a PAI pattern, and the PAI pattern has an over-etched portion of the pure amorphous silicon layer. This over-etched portion prevents a short between the pixel electrode and the pure amorphous silicon layer (i.e., the active layer). The over-etched portion also enables the aperture ratio to increase.

Abstract: A liquid crystal display device and a fabricating method thereof wherein four masks are used so as to reduce a process. In the device, a gate electrode is formed on a transparent substrate. A gate insulating film is formed on the transparent substrate to cover the gate electrode. An active layer is provided at a portion corresponding to the gate electrode on the gate insulating film. Source and drain electrodes are intervened by an ohmic contact layer on the active layer. A contact portion is connected to and extended from a portion of the drain electrode opposed to the source electrode and has an exposed side surface. A passivation layer is formed on the active layer in such a manner to cover the source and drain electrodes, but to expose the side surface of the contact portion. A pixel electrode is formed on the gate insulating film in such a manner to contact the exposed side surface of the contact portion.

Abstract: A liquid crystal display device includes dummy patterns formed between gate links and between data links. The gate links and data links are coated with a sealant to obtain the same height as a liquid crystal area at the opposite side thereof through the dummy patterns, providing a uniform cell gap.