Patents by Inventor Yoshiaki Toyoda

Yoshiaki Toyoda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120299108
    Abstract: By connecting a protection diode (71) wherein p-anode layers (21) and n-cathode layers (22) are alternately formed in a polysilicon layer, and p-n junctions (74) that are in a reverse blocking state when there is a forward bias are alternately short circuited with a metal film (53), to a power semiconductor element (IGBT (72)), it is possible to achieve a balance between a high breakdown capability and a smaller chip area, a rise of breakdown voltage is suppressed even when a clamping voltage is repeatedly applied, and furthermore, it is possible to prevent destruction caused by a negative surge voltage input into a gate terminal (G).
    Type: Application
    Filed: January 28, 2011
    Publication date: November 29, 2012
    Applicant: FUJI ELECTRIC CO., LTD.
    Inventors: Yuichi Harada, Tatsuya Naito, Yoshiaki Toyoda
  • Patent number: 7777518
    Abstract: A buffer circuit is provided between a gate terminal of a pull-down transistor and a threshold circuit receiving a gate signal as an input signal. A voltage applied to an output terminal of a power semiconductor element from an external battery power supply is supplied to the buffer circuit through a resistive element. The buffer circuit converts the level of an on-signal output from the threshold circuit into a voltage higher than the threshold of the pull-down transistor, so that the pull-down transistor operates surely to turn off the power semiconductor element even when the level of the gate signal is low. Thus, there is provided a semiconductor integrated circuit device having a power semiconductor element which can be turned off by sure operation of a pull-down semiconductor element.
    Type: Grant
    Filed: May 26, 2009
    Date of Patent: August 17, 2010
    Assignee: Fuji Electric Systems Co., Ltd.
    Inventors: Yoshiaki Toyoda, Kenichi Ishii, Morio Iwamizu
  • Publication number: 20090289670
    Abstract: A buffer circuit is provided between a gate terminal of a pull-down transistor and a threshold circuit receiving a gate signal as an input signal. A voltage applied to an output terminal of a power semiconductor element from an external battery power supply is supplied to the buffer circuit through a resistive element. The buffer circuit converts the level of an on-signal output from the threshold circuit into a voltage higher than the threshold of the pull-down transistor, so that the pull-down transistor operates surely to turn off the power semiconductor element even when the level of the gate signal is low. Thus, there is provided a semiconductor integrated circuit device having a power semiconductor element which can be turned off by sure operation of a pull-down semiconductor element.
    Type: Application
    Filed: May 26, 2009
    Publication date: November 26, 2009
    Applicant: FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.
    Inventors: Yoshiaki TOYODA, Kenichi ISHII, Morio IWAMIZU
  • Patent number: 4810482
    Abstract: There is disclosed a process for producing silanes by reducing polyhalosilane with a mixture of alkyl aluminum hydride and trialkyl aluminum, in which a treatment for reducing the content of trialkyl aluminum in the mixture is lowered to 10 mol. % or less of alkyl aluminum hydride prior to the reduction reaction.As to methods for reducing the content of trialkyl aluminum in the mixture, there are provided, for example, distillation, recrystallization, separation by complex formation, pyrolysis of trialkyl aluminum and decomposition by hydrogenation of trialkyl aluminum.
    Type: Grant
    Filed: August 16, 1984
    Date of Patent: March 7, 1989
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Tetsuya Iwao, Yoshiaki Toyoda, Kazuo Wakimura, Nobuhiro Kitano, Masao Tanaka
  • Patent number: 4555583
    Abstract: Glyoxal may be produced with a high yield by bringing a gas, which has been formed by diluting ethylene glycol and molecular oxygen with an inert gas, into contact at a high temperature with a silver catalyst in the simultaneous presence of phosphorus or a phosphorus compound so as to effect the gas phase oxidation of the ethylene glycol.In the above process, it is possible to suppress the formation of glycolaldehyde, a reaction intermediate, and also to enhance the stability of the reaction by using silver powder having particle sizes of 1.times.10.sup.-3 mm or smaller as at least part of the silver catalyst.
    Type: Grant
    Filed: March 28, 1984
    Date of Patent: November 26, 1985
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Yoshiaki Toyoda, Kazuo Wakimura, Tadaharu Hase, Nobumasa Arashiba
  • Patent number: 4425255
    Abstract: A method for regenerating a catalyst containing molybdenum as an active component comprising subjecting a catalyst, which has been deactivated through the use for a reaction, with or without a molybdenum source added thereto, to a heat treatment in a reducing gas atmosphere under specific temperature conditions and then subjecting same to a further heat treatment in a gaseous atmosphere containing molecular oxygen and at specific temperature conditions.
    Type: Grant
    Filed: May 13, 1982
    Date of Patent: January 10, 1984
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Yoshiaki Toyoda, Yoshihiro Ikeda, Nobumasa Arashiba
  • Patent number: 4181489
    Abstract: Byproducts obtained in the preparation of phthalic anhydride are treated by heating the byproducts to a temperature sufficient to maintain the byproducts in a molten state and thereafter atomizing the molten byproducts with atomizing air having a temperature of at least 60.degree. C. for combustion. The byproducts may be low boiling point and/or high boiling point fractions obtained in the purification step by distillation of crude phthalic anhydride produced by the partial oxidation of ortho-xylene or naphthalene.
    Type: Grant
    Filed: November 21, 1977
    Date of Patent: January 1, 1980
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Yoshiaki Toyoda, Yoshiaki Teraji, Takaai Suzuki
  • Patent number: 4069660
    Abstract: A chemical reaction furnace system having a reaction furnace, a reaction gas exhaust flowpath, and a gas scrubbing device in the exhaust flowpath and having a capability of controlling the furnace top pressure is characterized by the provision of a turbine in the exhaust flowpath downstream from the scrubbing device and being operable to recover energy in the reaction gas, a gas bypass flowpath branched from the exhaust flowpath at a point thereof between the scrubbing device and the turbine and bypassing the turbine, turbine inlet pressure controlling means, and a septum bypass valve installed in the bypass flowpath and operating in response to control by the turbine inlet pressure controlling means to control the turbine inlet gas pressure.
    Type: Grant
    Filed: August 3, 1976
    Date of Patent: January 24, 1978
    Assignee: Kawasaki Jukogyo Kabushiki Kaisha
    Inventors: Masanobu Inubushi, Yoshiaki Toyoda