Patents by Inventor Yoshiaki Yamamoto

Yoshiaki Yamamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • VALVE DEVICE
    Publication number: 20130087730
    Abstract: A valve device includes a shaft, a valving element, a housing, a bearing part, and a breathing path. The shaft is driven in its axial direction. The valving element is displaced integrally with the shaft. The housing accommodates the valving element. The bearing part is provided for the housing, and includes a sliding hole, in which an end portion of the shaft is inserted and which supports the shaft slidably in the axial direction, thereby limiting a displacement direction of the shaft and the valving element to the axial direction. The breathing path communicates between a bottom part of the sliding hole and an inside of the housing.
    Type: Application
    Filed: September 14, 2012
    Publication date: April 11, 2013
    Applicant: DENSO CORPORATION
    Inventors: Naohito SEKO, Yoshiaki YAMAMOTO
  • Light exposure apparatus and manufacturing method of semiconductor device using the same
    Patent number: 8398725
    Abstract: When annealing of a semiconductor film is conducted using a plurality of lasers, each of the distances between laser irradiation regions is different. When a lithography step is conducted in accordance with a marker which is formed over a substrate in advance after the step, light-exposure is not correctly conducted to a portion crystallized by laser. By using a laser irradiation region obtained on a laser irradiation step as a marker, light-exposure is conducted by making a light-exposure position of a stepper coincide with a large grain size region in the laser irradiation region. A large grain size region and a poorly crystalline region are detected by utilizing a thing that scattering intensity of light is different between the large grain size region and the poorly crystalline region, thereby determining a light-exposure position.
    Type: Grant
    Filed: April 9, 2010
    Date of Patent: March 19, 2013
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Koichiro Tanaka, Yoshiaki Yamamoto
  • Solid lubricant and sliding member
    Patent number: 8304373
    Abstract: A solid lubricant for being embedded in pores or grooves formed at a sliding surface of a sliding member body, comprises 5 to 30% by volume of a polyethylene resin, 20 to 60% by volume of a hydrocarbon-based wax and 10 to 60% by volume of melamine cyanurate. Such a solid lubricant can exhibit sliding properties identical to or higher than those of lead-containing solid lubricants, even under high load conditions.
    Type: Grant
    Filed: November 20, 2003
    Date of Patent: November 6, 2012
    Assignee: Oiles Corporation
    Inventor: Yoshiaki Yamamoto
  • Semiconductor device and its manufacturing method
    Patent number: 8304313
    Abstract: It is an object of the present invention to provide laser irradiation apparatus and method which can decrease the proportion of the microcrystal region in the whole irradiated region and can irradiate a semiconductor film homogeneously with a laser beam. A low-intensity part of a laser beam emitted from a laser oscillator is blocked by a slit, the laser beam is deflected by a mirror, and the beam is shaped into a desired size by using two convex cylindrical lenses. Then, the laser beam is delivered to the irradiation surface.
    Type: Grant
    Filed: August 12, 2005
    Date of Patent: November 6, 2012
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Koichiro Tanaka, Atsuo Isobe, Yoshiaki Yamamoto
  • AIR INTAKE DEVICE
    Publication number: 20120255513
    Abstract: An air intake device includes a cooler and a surge tank accommodating the cooler. The air intake device is to be connected to a cylinder head of an engine. The cylinder head includes an intake port that accommodates an intake valve. The cooler has a refrigerant passage through which refrigerant flows and an air passage through which intake air flows. The surge tank has a connector connected to the cylinder head. The cooler has a protrusion protruding from the connector toward the intake valve.
    Type: Application
    Filed: March 22, 2012
    Publication date: October 11, 2012
    Applicant: DENSO CORPORATION
    Inventors: Masao INO, Osamu Sato, Yoshiaki Yamamoto
  • METHOD OF MANUFACTURING A SOLAR CELL MODULE AND APPARATUS OF MANUFACTURING A SOLAR CELL MODULE
    Publication number: 20120238048
    Abstract: A method of manufacturing a solar cell, which includes an edge deletion step using a laser beam, and a manufacturing apparatus which is used in such a method, the method and the apparatus being capable of preventing a shunt and cracks from being generated are provided. By radiating a first laser beam to a multilayer body, which includes a transparent electrode layer, a photoelectric conversion layer, and a back electrode layer sequentially formed on a transparent substrate, from a side of the transparent substrate, the photoelectric conversion layer and the back electrode layer in a first region are removed, and by radiating a second laser beam into the region such that the second laser beam is spaced from a peripheral rim of the region, the transparent electrode layer in a second region is removed.
    Type: Application
    Filed: August 30, 2010
    Publication date: September 20, 2012
    Inventors: Yoshiaki Yamamoto, Hitoshi Ikeda, Tomoki Ohnishi, Kouichi Tamagawa
  • Laser irradiation apparatus and method for manufacturing semiconductor device
    Patent number: 8222126
    Abstract: It is an object of the present invention to provide a laser irradiation apparatus being able to irradiate the irradiation object with the laser beam having homogeneous energy density without complicating the optical system. The laser irradiation apparatus of the present invention comprises a laser oscillator, an optical system for scanning repeatedly a beam spot of the laser beam emitted from the laser oscillator in a uniaxial direction over the surface of the irradiation object, and a position controlling means for moving the position of the irradiation object relative to the laser beam in a direction perpendicular to the uniaxial direction.
    Type: Grant
    Filed: August 9, 2010
    Date of Patent: July 17, 2012
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Koichiro Tanaka, Yoshiaki Yamamoto
  • Solid lubricant and sliding member
    Patent number: 8202825
    Abstract: There are provided a solid lubricant having an island-and-sea structure, which, with the sea phase strengthened, remains free of troubles such as chipping even in use under high load conditions, and a sliding member having the solid lubricant embedded therein. The solid lubricant comprises 1 to 10% by volume of a polyethylene resin, 20 to 60% by volume of a hydrocarbon-based wax, 10 to 60% by volume of melamine cyanurate, 5 to 15% by volume of a polyamide resin, and 2 to 10% by volume of a modified polyethylene resin. The sliding member has the solid lubricant embedded in pores or grooves formed in a sliding surface of the sliding member body.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: June 19, 2012
    Assignee: Oiles Corporation
    Inventor: Yoshiaki Yamamoto
  • Laser treatment apparatus, laser treatment method, and manufacturing method of semiconductor device
    Patent number: 8188402
    Abstract: The invention relates to a laser treatment apparatus including a laser oscillator, an interlock provided in the laser oscillator, a movable table which moves with a certain movement period, a timer, an interlock provided in the timer, a sensor which can detect movement of the movable table, and a computer, in which the timer starts measuring time when the sensor senses passage of the movable table, and when the movable table does not pass the sensor even after the movement period, conduction between contacts of the interlock provided in the timer is blocked to operate the interlock in the laser oscillator, thereby stopping laser output. The invention also relates to a laser treatment method using the laser treatment apparatus.
    Type: Grant
    Filed: May 22, 2008
    Date of Patent: May 29, 2012
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Koichiro Tanaka, Yoshiaki Yamamoto, Takatsugu Omata
  • PROCESSING SYSTEM, ROBOT, AND PRODUCT MANUFACTURING METHOD
    Publication number: 20120083920
    Abstract: A processing system according to embodiments has an article supplier which supplies an article; a first conveyor which conveys an object to be processed; a workbench which is provided on the downstream side of the first conveyor and places thereon the object to be processed, conveyed by the first conveyor; a robot which takes out the article from the article supplier and subjects the object to be processed, placed on the workbench, to an operation using the article according to a previously instructed operation movement; and a second conveyor which is provided on the downstream side of the workbench and conveys the object to be processed, which has been subjected to the operation by the robot.
    Type: Application
    Filed: October 4, 2011
    Publication date: April 5, 2012
    Applicant: Kabushiki Kaisha Yaskawa Denki
    Inventors: Takashi Suyama, Junichi Imatome, Toru Kajiwara, Yoshiaki Yamamoto
  • Production method of primary amines and catalysts for producing primary amines
    Patent number: 8119556
    Abstract: A method of producing a primary amine by the hydrogenation of a nitrile in the presence of a hydrogenation catalyst. The hydrogenation catalyst contains at least one metal selected from the group consisting of nickel, cobalt and iron. Before use in the hydrogenation of nitrile, the hydrogenation catalyst is pretreated with at least one treating agent selected from the group consisting of hydrocarbons, alcohols, ethers, esters and carbon monoxide at 150 to 500° C.
    Type: Grant
    Filed: July 14, 2010
    Date of Patent: February 21, 2012
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kazuhiko Amakawa, Yoshiaki Yamamoto
  • SOI SUBSTRATE AND MANUFACTURING METHOD THEREOF
    Publication number: 20110316082
    Abstract: An object is to provide an SOI substrate provided with a semiconductor layer which can be used practically even when a glass substrate is used as a base substrate. Another object is to provide a semiconductor device having high reliability using such an SOI substrate. An altered layer is formed on at least one surface of a glass substrate used as a base substrate of an SOI substrate to form the SOI substrate. The altered layer is formed on at least the one surface of the glass substrate by cleaning the glass substrate with solution including hydrochloric acid, sulfuric acid or nitric acid. The altered layer has a higher proportion of silicon oxide in its composition and a lower density than the glass substrate.
    Type: Application
    Filed: September 12, 2011
    Publication date: December 29, 2011
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Tetsuya KAKEHATA, Hideto OHNUMA, Yoshiaki YAMAMOTO, Kenichiro MAKINO
  • SOI substrate and manufacturing method thereof
    Patent number: 8030169
    Abstract: An object is to provide an SOI substrate provided with a semiconductor layer which can be used practically even when a glass substrate is used as a base substrate. Another object is to provide a semiconductor device having high reliability using such an SOI substrate. An altered layer is formed on at least one surface of a glass substrate used as a base substrate of an SOI substrate to form the SOI substrate. The altered layer is formed on at least the one surface of the glass substrate by cleaning the glass substrate with solution including hydrochloric acid, sulfuric acid or nitric acid. The altered layer has a higher proportion of silicon oxide in its composition and a lower density than the glass substrate.
    Type: Grant
    Filed: July 6, 2009
    Date of Patent: October 4, 2011
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Tetsuya Kakehata, Hideto Ohnuma, Yoshiaki Yamamoto, Kenichiro Makino
  • Laser irradiation method in which a distance between an irradiation object and an optical system is controlled by an autofocusing mechanism and method for manufacturing semiconductor device using the same
    Patent number: 8022380
    Abstract: The present invention is to provide a laser irradiation method for performing homogeneous laser irradiation to the irradiation object even when the thickness of the irradiation object is not even. In the case of irradiating the irradiation object having uneven thickness, the laser irradiation is performed while keeping the distance between the irradiation object and the lens for condensing the laser beam on the surface of the irradiation object constant by using an autofocusing mechanism. In particular, when the irradiation object is irradiated with the laser beam by moving the irradiation object relative to the laser beam in the first direction and the second direction of the beam spot formed on the irradiation surface, the distance between the irradiation object and the lens is controlled by the autofocusing mechanism before the irradiation object is moved in the first and second directions.
    Type: Grant
    Filed: August 4, 2010
    Date of Patent: September 20, 2011
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Koichiro Tanaka, Yoshiaki Yamamoto
  • Laser irradiation apparatus and laser irradiation method and method for manufacturing semiconductor device
    Patent number: 7929154
    Abstract: The present invention provides a laser irradiation apparatus and a laser irradiation method which can conduct irradiation of a laser beam accurately by correcting misalignment of an irradiation position of the laser beam from the predetermined position due to temperature change. A laser irradiation apparatus includes a laser oscillator emitting a laser beam; an XY stage provided with an irradiation object; an optical system which shapes the laser beam into a linear beam on a surface of the irradiation object provided on the XY stage; an illumination device which emits light to the surface of the irradiation object; and a camera for imaging reflected light of the light on the surface of the irradiation object, in which misalignment of an irradiation position of the linear beam detected from the reflected light imaged by the camera is corrected.
    Type: Grant
    Filed: December 18, 2006
    Date of Patent: April 19, 2011
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Koichiro Tanaka, Yoshiaki Yamamoto
  • LASER IRRADIATION METHOD AND LASER IRRADIATION APPARATUS
    Publication number: 20110024406
    Abstract: An object of the present invention is to provide a laser irradiation method and a laser irradiation apparatus for irradiating an irradiation surface with a linear beam having more homogeneous intensity by blocking a low-intensity part of the linear beam without forming the fringes due to the diffraction on the irradiation surface. In the laser irradiation, a laser beam emitted from a laser oscillator 101 passes through a slit 102 so as to block a low-intensity part of the laser beam, the traveling direction of the laser beam is bent by a mirror 103, and an image formed at the slit is projected to an irradiation surface 106 by a convex cylindrical lens 104.
    Type: Application
    Filed: October 7, 2010
    Publication date: February 3, 2011
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Koichiro TANAKA, Yoshiaki YAMAMOTO
  • EXHAUST GAS RECIRCULATION SYSTEM FOR INTERNAL COMBUSTION ENGINE
    Publication number: 20110011084
    Abstract: An EGR system includes an exhaust gas recirculation pipe recirculating exhaust gas flowing through an exhaust pipe into an intake pipe upstream of a compressor of a supercharger. A swirling flow generator generates a swirling flow of intake air and exhaust gas along an inner surface of the intake pipe in order to centrifugally separate foreign matters from the intake air and the exhaust gas. A foreign-matters-collecting chamber collects the centrifugally separated solid foreign matters therein. The separated solid foreign matters are discharged through a discharge opening and a discharge pipe.
    Type: Application
    Filed: July 14, 2010
    Publication date: January 20, 2011
    Applicant: DENSO CORPORATION
    Inventors: Etsugou Yanagida, Yoshitaka Nishio, Yoshiaki Yamamoto, Kiyoshi Ooshima
  • LASER IRRADIATION APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    Publication number: 20100323504
    Abstract: It is an object of the present invention to provide a laser irradiation apparatus being able to irradiate the irradiation object with the laser beam having homogeneous energy density without complicating the optical system. The laser irradiation apparatus of the present invention comprises a laser oscillator, an optical system for scanning repeatedly a beam spot of the laser beam emitted from the laser oscillator in a uniaxial direction over the surface of the irradiation object, and a position controlling means for moving the position of the irradiation object relative to the laser beam in a direction perpendicular to the uniaxial direction.
    Type: Application
    Filed: August 9, 2010
    Publication date: December 23, 2010
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Koichiro TANAKA, Yoshiaki YAMAMOTO
  • LASER IRRADIATION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20100304506
    Abstract: The present invention is to provide a laser irradiation method for performing homogeneous laser irradiation to the irradiation object even when the thickness of the irradiation object is not even. In the case of irradiating the irradiation object having uneven thickness, the laser irradiation is performed while keeping the distance between the irradiation object and the lens for condensing the laser beam on the surface of the irradiation object constant by using an autofocusing mechanism. In particular, when the irradiation object is irradiated with the laser beam by moving the irradiation object relative to the laser beam in the first direction and the second direction of the beam spot formed on the irradiation surface, the distance between the irradiation object and the lens is controlled by the autofocusing mechanism before the irradiation object is moved in the first and second directions.
    Type: Application
    Filed: August 4, 2010
    Publication date: December 2, 2010
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Koichiro TANAKA, Yoshiaki YAMAMOTO
  • Method of forming a coating layer on the surface of a molded product within a mold
    Patent number: 7837918
    Abstract: An in-mold coating method providing a mold having a specifically formed auxiliary cavity and an in-mold coating formation method which employs said mold, so that it is possible to prevent a coating material from leaking out of the mold, thereby shortening the molding formation cycle, and making it possible to manufacture a molded product having a stabilized quality. In addition, by using a mold having a specifically shaped sub-cavity, there is provided a still further in-mold coating formation method which can keep mold temperature at a relatively low value, cause the coating material to cure at a predetermined temperature and within a predetermined time period thereby shortening the molding formation cycle, improving the productivity, improving the physical properties of a coating layer, thus obtaining a good molded product.
    Type: Grant
    Filed: October 6, 2008
    Date of Patent: November 23, 2010
    Assignees: Dai Nippon Toryo Co., Ltd., Ube Machinery Corporation, Ltd.
    Inventors: Kenji Yonemochi, Yoshiaki Yamamoto, Kenji Oota, Toshio Arai, Etsuo Okahara, Kazuaki Kobayashi