Abstract: A resin filler tube includes: a tubular body; a flange having a diameter greater than an outer diameter of the tubular body, a thickness greater than a thickness of the tubular body, and a predetermined width in an axial direction, and having a first axial end face forming a weld surface to be welded to an outer circumferential edge of an opening hole of a fuel tank; and a base-end-side reverse tapered portion which connects between an end of the tubular body on the fuel tank side and an end of an outer circumferential surface of the flange on a side opposite to the fuel tank side, and which is reversely tapered so as to increase a diameter toward the flange. The base-end-side reverse tapered portion has an inner diameter that is not less than an inner diameter of the tubular body over an entire range in the axial direction.

Abstract: According to a first aspect of the present invention, an imprint apparatus for contacting a mold with a resin applied to a substrate to perform patterning on the substrate is provided that comprises a dispenser configured to apply the resin to the substrate; and a resin supply unit configured to supply the resin to the dispenser, wherein the resin supply unit comprises a resin storage tank configured to store the resin; a pump configured to continuously circulate the resin between the resin storage tank and the dispenser, and a filter arranged at a flow path of circulated resin, configured to remove a foreign matter or a metal ion.

Abstract: The present invention provides an imprint apparatus which forms a pattern in an imprint material supplied onto a substrate using a mold, the apparatus comprising a supply unit including a plurality of orifices each of which discharges the imprint material toward the substrate and configured to supply the imprint material onto the substrate by discharge of the imprint material from each orifice, and a control unit configured to control the discharge of the imprint material from each orifice in accordance with distribution information indicating a distribution, on the substrate, of the imprint material that should be supplied onto the substrate, wherein the control unit updates, based on information on a discharge amount of the imprint material discharged from each orifice, the distribution information such that a thickness of the imprint material formed using the mold falls within an allowable range.

Abstract: A mold includes a pattern portion in which a pattern is formed, and a concave portion formed in the back surface of the pattern portion and having a size to include the pattern portion in a planar view. The edge of the pattern portion has an almost rectangular shape in the planar view. The concave portion has an almost rectangular shape with four rounded corners in the planar view. The shortest distance from each point on a side of the edge of the pattern portion to the edge of the concave portion is constant.

Abstract: Provided is an application device capable of extracting an imprinting material in which impurities are mixed from a container of the application device and supplying new imprinting material to the container of the application device. An application device according to the present disclosure is used to supply an imprinting material to a substrate in an imprinting apparatus that forms a pattern on the imprinting material on the substrate by using a mold. The application device includes a container unit that contains the imprinting material, and an ejecting unit that is provided on the container unit and that ejects the imprinting material contained in the container unit toward the substrate. The application device is detachably attachable to the imprinting apparatus.

Abstract: Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.

Abstract: An imprint apparatus includes a substrate holder including a plurality of chucking regions for chucking a substrate, and a controller that controls chucking forces of the chucking regions. The chucking regions include a first chucking region for chucking a periphery of a first substrate having a first diameter, a second chucking region for chucking a periphery of a second substrate having a second diameter larger than the first diameter, a third chucking region group divided into a plurality of regions inside the first chucking region, and a fourth chucking region group divided into a plurality of regions between the first chucking region and the second chucking region. The controller controls the chucking forces of each of the chucking regions.

Abstract: The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate using a mold, comprising a supply unit including a plurality of orifices and configured to supply the imprint material on the substrate by discharging the imprint material from each orifice, and a control unit configured to control the discharge of the imprint material from each orifice in accordance with arrangement information showing an arrangement of the imprint material on the substrate, wherein the control unit updates the arrangement information to bring a product of an ideal volume of the imprint material discharged from each orifice in one-time discharge and the number of discharges of the imprint material supplied on the substrate from the supply unit closer to a total amount of the imprint material actually supplied on the substrate in accordance with the arrangement information.

Abstract: An imprint method for forming a pattern on a substrate by using a mold includes carrying the substrate into an imprint apparatus, removing, after the substrate is carried into the imprint apparatus, a whole or a portion of foreign particles adhering to a pattern formed on the mold by bringing into contact the mold and an imprint material supplied to a member different from the substrate within the imprint apparatus, and curing the imprint material so as to form the pattern, and forming the pattern on the substrate that has carried into the imprint apparatus, by using the mold from which the foreign particles are removed.

Abstract: Provided is an application device capable of extracting an imprinting material in which impurities are mixed from a container of the application device and supplying new imprinting material to the container of the application device. An application device according to the present disclosure is used to supply an imprinting material to a substrate in an imprinting apparatus that forms a pattern on the imprinting material on the substrate by using a mold. The application device includes a container unit that contains the imprinting material, and an ejecting unit that is provided on the container unit and that ejects the imprinting material contained in the container unit toward the substrate. The application device is detachably attachable to the imprinting apparatus.

Abstract: Provided is an application device capable of extracting an imprinting material in which impurities are mixed from a container of the application device and supplying new imprinting material to the container of the application device. An application device according to the present disclosure is used to supply an imprinting material to a substrate in an imprinting apparatus that forms a pattern on the imprinting material on the substrate by using a mold. The application device includes a container unit that contains the imprinting material, and an ejecting unit that is provided on the container unit and that ejects the imprinting material contained in the container unit toward the substrate. The application device is detachably attachable to the imprinting apparatus.

Abstract: An imprint method for transferring a pattern to an imprint material supplied to a plurality of shot areas on a substrate using a mold includes removing a foreign matter attached to a pattern of the mold in such a manner that the plurality of shot areas includes a part shot-area where a part of pattern of the mold can be formed and the mold is brought into contact with an imprint material supplied to the part shot-area to transfer the pattern of the mold to the substrate and transferring a pattern to the shot area excluding the part shot-area, among the plurality of shot areas, using the mold used in the removing the foreign matter.

Abstract: A lithography apparatus has a plurality of processing units configured to respectively perform patternings on a plurality of substrates that belong to a lot, and a controller configured to perform, based on specific information that specifies one of the plurality of substrates, determination of one of the plurality of processing units that processes the one of the plurality of substrates, and control the plurality of processing units such that the patternings are performed on the plurality of substrates respectively with the plurality of processing units in parallel based on recipe information corresponding to the lot.

Abstract: A lithography apparatus includes an original conveying path, a substrate conveying path, and a plurality of patterning devices each configured to perform patterning on a substrate using an original. The plurality of patterning devices are arranged in two rows. The substrate conveying path is provided between and along the two rows. The original conveying path is provided in each of two rows between and along which the two rows of the patterning devices are arranged.

Abstract: An imprint apparatus according to an embodiment of the present invention includes a supply unit configured to supply an imprint material on a substrate, a pattern formation unit including a holder holding a mold, the pattern formation unit being configured to bring the mold in contact with the imprint material supplied by the supply unit to form a pattern, a prevention unit configured to supply a gas in a direction intersecting a direction along the substrate to prevent a foreign matter from attaching to the substrate, and a removal unit configured to locally supply a fluid to the substrate to remove a foreign matter on the substrate.

Abstract: An imprint apparatus includes a substrate holder including a plurality of chucking regions for chucking a substrate, and a controller that controls chucking forces of the chucking regions. The chucking regions include a first chucking region for chucking a periphery of a first substrate having a first diameter, a second chucking region for chucking a periphery of a second substrate having a second diameter larger than the first diameter, a third chucking region group divided into a plurality of regions inside the first chucking region, and a fourth chucking region group divided into a plurality of regions between the first chucking region and the second chucking region. The controller controls the chucking forces of each of the chucking regions.

Abstract: Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.

Abstract: The present invention provides an imprint apparatus which forms a pattern in an imprint material supplied onto a substrate using a mold, the apparatus comprising a supply unit including a plurality of orifices each of which discharges the imprint material toward the substrate and configured to supply the imprint material onto the substrate by discharge of the imprint material from each orifice, and a control unit configured to control the discharge of the imprint material from each orifice in accordance with distribution information indicating a distribution, on the substrate, of the imprint material that should be supplied onto the substrate, wherein the control unit updates, based on information on a discharge amount of the imprint material discharged from each orifice, the distribution information such that a thickness of the imprint material formed using the mold falls within an allowable range.

Abstract: According to a first aspect of the present invention, an imprint apparatus for contacting a mold with a resin applied to a substrate to perform patterning on the substrate is provided that comprises a dispenser configured to apply the resin to the substrate; and a resin supply unit configured to supply the resin to the dispenser, wherein the resin supply unit comprises a resin storage tank configured to store the resin; a pump configured to continuously circulate the resin between the resin storage tank and the dispenser, and a filter arranged at a flow path of circulated resin, configured to remove a foreign matter or a metal ion.

Abstract: A mold includes a pattern portion in which a pattern is formed, and a concave portion formed in the back surface of the pattern portion and having a size to include the pattern portion in a planar view. The edge of the pattern portion has an almost rectangular shape in the planar view. The concave portion has an almost rectangular shape with four rounded corners in the planar view. The shortest distance from each point on a side of the edge of the pattern portion to the edge of the concave portion is constant.