Abstract: An exposure apparatus for exposing a substrate to light via a pattern of a reticle.

Abstract: A substrate holding apparatus contacts an undersurface of a substrate and holds the substrate. At least a portion of a top surface of the substrate is to be immersed in liquid. The apparatus includes a chuck unit to attract the substrate and a preventing system to prevent the liquid from reaching the undersurface of the substrate.

Abstract: A stage apparatus includes a base, a stage movable on the base in first and second directions, a first member movable relative to the base in the first direction, and a second member movable relative to the base in the second direction. The first member is placed on the second member. With this arrangement, drive reaction-forces generated due to movement of the stage can be canceled by moving the first and second members, resulting in a smaller space needed for accommodating a canceling mechanism.

Abstract: A stage device includes a plurality of bases positioned adjacent each other with a space therebetween, a plurality of stages movable along surfaces of the bases, and a plurality of gas bearings provided in each of the stages. The gas bearings extend in a direction in which the bases are adjacently arranged.

Abstract: An exposure apparatus includes a light source, an illumination optical system for illuminating an original with light from the light source, and a projection optical system for projecting a pattern of the original, illuminated by the illumination optical system, onto a substrate. In addition, a radiation member is disposed opposite to a subject of temperature adjustment which corresponds to at least one of an optical element of the illumination optical system, an optical element of the projection optical system and the original, and a control system controls a temperature of the radiation member in accordance with a state or exposure of the subject of temperature adjustment.

Abstract: This invention discloses an apparatus having a base and a movable body which is driven to move along the base. The apparatus includes a generator configured to generate a driving signal for the movable body, a temperature adjusting mechanism configured to adjust temperature of the base, and a controller configured to control a manipulated variable for the temperature control mechanism based on the generated driving signal.

Abstract: An exposure apparatus for illuminating an original through an illumination system and for transferring a pattern of the original onto a substrate. The apparatus includes a movable element having a blade, the blade being provided in the illumination system and blocking at least a portion of illumination light, a stator configured to relatively move the movable element, and a resilient supporting member configured to resiliently support the stator without contacting the stator.

Abstract: An exposure apparatus including a projecting optical system for projecting a pattern of the original onto a substrate, and an original stage being movable while carrying the original thereon. The original stage includes (i) a first holding portion for holding the original and having a first surface to be contacted to one surface of the original, the first holding portion being configured to position the original in a direction perpendicular to the surface, and (ii) a second holding portion for holding the original and having a second surface to be contacted to the surface, the second holding portion being elastically or resiliently deformable.

Abstract: A moving element to be propelled across a stator includes a coil unit, including coils, for generating a force to propel the moving unit, and a cooling unit for cooling the coil unit. A thermal conductive member, arranged between the cooling unit and the coil unit, transmits heat away from the coil unit. In addition, a housing unit houses the coil unit, the cooling unit and the thermal conductive member.

Abstract: A positioning apparatus including first and second bases, and two moving elements which are guided by the first and second bases to move on the first and second bases. The two moving elements are supported on the first and second bases by air bearings. A distance is ensured between the first and second bases, and when the two moving elements move between the first and second bases, both a guide surface of the first base and a guide surface of the second bases are used. Also, pneumatic pressures of the air bearings are increased to be higher than that in a case in which the moving elements move on the first and second bases.

Abstract: An exposure apparatus includes a reflective element for reflecting and introducing light from a light source to a plate, at least one first driver for providing the reflective element with a force and/or a displacement in at least one directions, and at least one second driver for providing the reflective element with a force and/or a displacement in at least one directions, wherein the first and second drives are connected in series to each other.

Abstract: An exposure apparatus for projecting, by exposure, a pattern of an original onto a substrate. The apparatus includes a light blocking device for blocking at least a portion of exposure light. The light blocking device includes two plate-like members which are disposed in a vertical direction with a clearance kept therebetween, and two plate-like members which are disposed in a horizontal direction with a clearance kept therebetween. The apparatus further includes a driving member for moving the light blocking device, wherein the driving member includes the stator, and a reaction force absorbing device for absorbing a drive reaction force of the driving member. The reaction force absorbing device absorbs the reaction force by moving the stator of the driving member.

Abstract: A support apparatus includes an optical element, a first support member that supports the optical element, and a second support member that contacts the optical element or the first support member and positions the optical element, wherein the optical element is removably attached to the second support member, or the optical element and the first support member are removably attached to the second support member.

Abstract: An exposure apparatus includes a projection device for projecting a pattern drawn on a surface of a master, a stage apparatus which moves at least a substrate of the master and a substrate relative to the projection device, and an exposure device for repeatedly exposing the substrate to the pattern of the master. A plurality of pipes connected to movable units of the stage apparatus are joined to each other at partial outer surfaces of the pipes and constitute an integrated pipe array. Electrical cables or signal line cables connected to the movable unit pass through hollow portions of some of the pipes serving as the integrated pipe array.

Abstract: Disclosed is technology for holding a substrate and, specifically, an object holding apparatus including a chuck for holding an object, a holding unit for holding the chuck, a generating unit provided in the holding unit, for generating a field related to an attraction force, a member provided in the chuck and attracted by the generating unit in accordance with the field, and a supporting unit for supporting one of the generating unit and the member, for movement at least in a direction nearing the other and in a direction away from the other.

Abstract: A stage device including a movable stage, a plate-like base which supports the stage, and a mass body which moves to cancel a reaction force acting on the base according to a movement of the movable stage. The plate-like base has a plurality of surfaces, and the stage and mass body are supported by different ones of the surfaces of the plate-like base.

Abstract: An object holding apparatus including a chuck for holding an object, a holder configured to hold the chuck, a generator provided in the holder and configured to generate a field related to an attraction force, a member provided in the chuck and configured to be attracted by the generator in accordance with the field, and a support configured to support one of the generator and the member. The support is configured to allow the one to move toward the other and away from the other, and the support includes a leaf spring.

Abstract: An exposure apparatus for projecting a pattern of an original onto a substrate using exposure light includes a projection optical system to project the pattern onto the substrate; a shielding structure, having an opening through which the exposure light passes, to shield the projection optical system from an outside environment; and an attraction system, including at least one of a panel to generate an electric field and a cryogenic panel arranged to face a path of the exposure light passing through the opening, to attract contaminants.

Abstract: An exposure apparatus illuminates a pattern on an original form, introduces light from the pattern to a plate, and exposes the plate. The exposure apparatus includes at least one optical element, and forcing member that applies a force to the at least one optical element in a non-contact manner.

Abstract: An exposure apparatus includes a plurality of chambers which respectively have openings and are connected to each other to be able to communicate with each other through the openings, and a suppressing system which suppresses a gas from flowing into at least one of the plurality of chambers through the openings after disconnection of the plurality of chambers. The one of the plurality of chambers has a projection, another one of the plurality of chambers has a recess, and the one chamber and the other chamber are connected to each other as the projection is fitted in the recess.