Abstract: A lithography apparatus has a plurality of processing units configured to respectively perform patternings on a plurality of substrates that belong to a lot, and a controller configured to perform, based on specific information that specifies one of the plurality of substrates, determination of one of the plurality of processing units that processes the one of the plurality of substrates, and control the plurality of processing units such that the patternings are performed on the plurality of substrates respectively with the plurality of processing units in parallel based on recipe information corresponding to the lot.

Abstract: The present invention provides an imprint apparatus which performs an imprint process of dispensing an imprint material on a substrate and forming the imprint material dispensed on the substrate by using a mold, the apparatus comprising a dispensing unit configured to dispense an imprint material on the substrate, and including a tank which contains an imprint material, a dispenser which discharges the imprint material contained in the tank to the substrate, and a detection unit which detects a remaining amount of imprint material contained in the tank; and a control unit configured to perform control to supply an imprint material to the tank or exchange the dispensing unit based on a detection result obtained by the detection unit.

Abstract: The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate using a mold, comprising a supply unit including a plurality of orifices and configured to supply the imprint material on the substrate by discharging the imprint material from each orifice, and a control unit configured to control the discharge of the imprint material from each orifice in accordance with arrangement information showing an arrangement of the imprint material on the substrate, wherein the control unit updates the arrangement information to bring a product of an ideal volume of the imprint material discharged from each orifice in one-time discharge and the number of discharges of the imprint material supplied on the substrate from the supply unit closer to a total amount of the imprint material actually supplied on the substrate in accordance with the arrangement information.

Abstract: A lithography apparatus includes an original conveying path, a substrate conveying path, and a plurality of patterning devices each configured to perform patterning on a substrate using an original. The plurality of patterning devices are arranged in two rows. The substrate conveying path is provided between and along the two rows. The original conveying path is provided in each of two rows between and along which the two rows of the patterning devices are arranged.

Abstract: Provided is an application device capable of extracting an imprinting material in which impurities are mixed from a container of the application device and supplying new imprinting material to the container of the application device. An application device according to the present disclosure is used to supply an imprinting material to a substrate in an imprinting apparatus that forms a pattern on the imprinting material on the substrate by using a mold. The application device includes a container unit that contains the imprinting material, and an ejecting unit that is provided on the container unit and that ejects the imprinting material contained in the container unit toward the substrate. The application device is detachably attachable to the imprinting apparatus.

Abstract: An imprint apparatus includes a substrate holder configured to hold a substrate, wherein the substrate holder includes a plurality of holding areas arranged in a predetermined direction and wherein shapes of the plurality of holding areas are defined to be capable of holding a first substrate in a first external diameter and a second substrate in a second external diameter different from the first external diameter.

Abstract: An imprint method for forming a pattern on a substrate by using a mold includes carrying the substrate into an imprint apparatus, removing, after the substrate is carried into the imprint apparatus, a whole or a portion of foreign particles adhering to a pattern formed on the mold by bringing into contact the mold and an imprint material supplied to a member different from the substrate within the imprint apparatus, and curing the imprint material so as to form the pattern, and forming the pattern on the substrate that has carried into the imprint apparatus, by using the mold from which the foreign particles are removed.

Abstract: The present invention provides a mold including a pattern to be transferred to a resin coated on a substrate, by performing an imprint process, the mold comprising a first portion including a first surface which include a pattern portion provided with the pattern and a peripheral portion surrounding the pattern portion, and a second surface which is opposite to the first surface, and a second portion which surrounds the first portion and is thicker than the first portion, wherein a concave portion is formed by the second surface of the first portion and an inner surface of the second portion, and the concave portion is provided with a light-shielding portion in a region on an opposite side to the peripheral portion.

Abstract: An imprint method for transferring a pattern to an imprint material supplied to a plurality of shot areas on a substrate using a mold includes removing a foreign matter attached to a pattern of the mold in such a manner that the plurality of shot areas includes a part shot-area where a part of pattern of the mold can be formed and the mold is brought into contact with an imprint material supplied to the part shot-area to transfer the pattern of the mold to the substrate and transferring a pattern to the shot area excluding the part shot-area, among the plurality of shot areas, using the mold used in the removing the foreign matter.

Abstract: A motor apparatus includes a movable portion including a coil and a tooth-like salient pole and a platen opposed to the movable portion. The movable portion and the platen move relative to each other by using a magnetic field generated by supplying a current to the coil. The platen includes a base material having a surface on which convex portions and first concave portions are periodically arranged, a first thermally sprayed layer formed on the surface of the base material by thermal spraying such that second concave portions are formed inside the first concave portions, and a resin filled in the second concave portions.

Abstract: Disclosed is technology for holding a substrate and, specifically, an object holding apparatus including a chuck for holding an object, a holding unit for holding the chuck, a generating unit provided in the holding unit, for generating a field related to an attraction force, a member provided in the chuck and attracted by the generating unit in accordance with the field, and a supporting unit for supporting one of the generating unit and the member, for movement at least in a direction nearing the other and in a direction away from the other.

Abstract: The present invention provides a motor apparatus which includes a movable portion including a coil and a tooth-like salient pole, and a platen opposed to the movable portion, and moves the movable portion and the platen relative to each other by using a magnetic field generated by supplying a current to the coil, wherein the platen includes a base material having a surface on which convex portions and first concave portions are periodically arranged, a first thermally sprayed layer formed on the surface of the base material by thermal spraying such that second concave portions are formed inside the first concave portions, and a resin filled in the second concave portions.

Abstract: A substrate holding apparatus which contacts an undersurface of a substrate and holds the substrate, at least a portion of a top surface of the substrate being immersed in liquid. The apparatus includes a chuck unit for supporting the substrate, and a groove, arranged along an outer periphery of a substrate supporting surface of the chuck unit, for storing a fluorinated inert refrigerant, fluorinated oil or a gelatinous polymer material.

Abstract: An exposure apparatus for illuminating an original through an illumination system and for transferring a pattern of the original onto a substrate. The apparatus includes a movable element having a blade, the blade being provided in the illumination system and blocking at least a portion of illumination light, a stator configured to relatively move the movable element, and a resilient supporting member configured to resiliently support the stator without contacting the stator.

Abstract: An exposure apparatus illuminates a pattern on an original form, introduces light from the pattern to a plate, and exposes the plate. The exposure apparatus includes at least one optical element, and forcing member that applies a force to the at least one optical element in a non-contact manner.

Abstract: An exposure apparatus exposes a substrate to light via a reticle in a vacuum. A projection optical system projects a pattern of the reticle onto the substrate, a stage holds the substrate and moves, and first and second partitions define an exhaust space between a first space accommodating at least a part of the projection optical system and a stage space accommodating the stage. The first partition includes a first opening to make the light pass between the first space and the exhaust space, and the second partition includes a second opening to make the light pass between the exhaust space and the stage space. A first supply system supplies fluid into the stage space, and a first exhaust system recovers fluid from the stage space through the second opening and the exhaust space. A pressure in the exhaust space is lower than those in the first space and the stage space.

Abstract: A plane motor device that includes a stator unit, a movable unit movable along a plane above the stator unit, first and second coil units at one or both of the movable unit and the stator unit, in which coil units a current flows for driving the coil unit, and an enclosure partitioned into a plurality of separate regions. The enclosure encloses the first and second coil units in two respective regions of the plurality of separate regions. Each of the two regions has a cooling channel through which cooling refrigerant flows separately from the cooling channel of the other region.

Abstract: A stage apparatus includes a base having a reference surface, a moving unit which moves along the reference surface, a static bearing which is provided in the moving unit and which supports the moving unit such that the moving unit can move along the reference surface, and a temperature controller which is provided in the moving unit and which controls the temperature of gas supplied to the static bearing. In the stage apparatus, air fluctuation in the measurement area of interferometers due to gas exhausted from the static bearing and/or distortion caused by heat transmitted to a retainer of a target is suppressed, and the stage positioning accuracy is thereby increased.

Abstract: A substrate holding apparatus contacts an undersurface of a substrate and holds the substrate. At least a portion of a top surface of the substrate is to be immersed in liquid. The apparatus includes a chuck unit to attract the substrate and a preventing system to prevent the liquid from reaching the undersurface of the substrate.

Abstract: A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for radiation-cooling provided in positions away from an outer surface of the mirror. The radiation plates are provided so as to ensure a passage area for the exposure light incident on and reflected from the reflection surface of the mirror. Further, the respective radiation plates are temperature-controlled by cooling liquid flowing through cooling pipes. Thus the temperature rise of the mirror used in the reflection optical system of the exposure apparatus can be suppressed, and the accuracy of surface form of the mirror reflection surface can be maintained.