Abstract: An exposure apparatus for exposing a substrate to light via a reticle in a vacuum atmosphere includes a projection optical system configured to project a pattern of the reticle onto the substrate; a stage configured to hold one of the reticle and the substrate and to move; first and second partitions configured to define an exhaust space between a first space which accommodates at least a part of the projection optical system and a stage space which accommodates the stage, the first partition including a first opening configured to make the light pass between the first space and the exhaust space, and the second partition including a second opening configured to make the light pass between the exhaust space and the stage space; a first supply system configured to supply fluid into the stage space; and a first exhaust system configured to recover fluid from the stage space through the second opening and the exhaust space.

Abstract: This invention discloses an apparatus having a base and a movable body which is driven to move along the base. The apparatus includes a generator configured to generate a driving signal for the movable body, a temperature adjusting mechanism configured to adjust temperature of the base, and a controller configured to control a manipulated variable for the temperature control mechanism based on the generated driving signal.

Abstract: An exposure apparatus includes a reflective element for reflecting and introducing light from a light source to a plate, at least one first driver for providing the reflective element with a force and/or a displacement in at least one directions, and at least one second driver for providing the reflective element with a force and/or a displacement in at least one directions, wherein the first and second drives are connected in series to each other.

Abstract: An exposure apparatus includes a reflective element for reflecting and introducing light from a light source to a plate, at least one first driver for providing the reflective element with a force and/or a displacement in at least one directions, and at least one second driver for providing the reflective element with a force and/or a displacement in at least one directions, wherein the first and second drives are connected in series to each other.

Abstract: A stage device includes a plurality of bases positioned adjacent each other with a space therebetween, a plurality of stages movable along surfaces of the bases, and a plurality of gas bearings provided in each of the stages. The gas bearings extend in a direction in which the bases are adjacently arranged.

Abstract: Disclosed is an exposure apparatus for projecting, by exposure, a pattern of an original onto a substrate, the exposure apparatus including comprising a light blocking system for blocking at least a portion of exposure light, a driving system for moving the light blocking system, and a reaction force absorbing system for absorbing a drive reaction force of the driving system, wherein the driving system includes a stator, and wherein the reaction force absorbing system absorbs the reaction force by moving the stator of the driving system. With this structure, adverse influence of vibratory external disturbance to be caused by a drive reaction force as the blade of the light blocking system is driven, can be reduced significantly.

Abstract: An exposure apparatus illuminates a pattern on an original form, introduces light from the pattern to a plate, and exposes the plate. The exposure apparatus includes at least one optical element, and forcing member that applies a force to the at least one optical element in a non-contact manner.

Abstract: A stage apparatus includes a base, a stage movable on the base in first and second directions, a first member movable relative to the base in the first direction, and a second member movable relative to the base in the second direction. The first member is placed on the second member. With this arrangement, drive reaction-forces generated due to movement of the stage can be canceled by moving the first and second members, resulting in a smaller space needed for accommodating a canceling mechanism.

Abstract: An exposure apparatus for projecting a pattern of an original onto a substrate using exposure light includes a projection optical system to project the pattern onto the substrate; a shielding structure, having an opening through which the exposure light passes, to shield the projection optical system from an outside environment; and an attraction system, including at least one of a panel to generate an electric field and a cryogenic panel arranged to face a path of the exposure light passing through the opening, to attract contaminants.

Abstract: A positioning apparatus is disclosed. The positioning apparatus comprises first and second bases, and two moving elements which are guided by the first and second bases to move on the first and second bases. A distance is ensured between the first and second bases. When the two moving elements move between the first and second bases, both of a guide surface of the first base and a guide surface of the second bases are used.

Abstract: A stage device includes a movable stage, a base which supports the stage, and a mass body which moves to cancel a reaction force acting on the base as the stage moves. The base has a plurality of surfaces, and the stage and mass body are supported by different ones of the surfaces of the base. In addition, when the mass body is arranged in the base, the stage device can be more downsized.

Abstract: A moving element to be propelled across a stator includes a coil unit, including coils, for generating a force to propel the moving unit, and a cooling unit for cooling the coil unit. A thermal conductive member, arranged between the cooling unit and the coil unit, transmits heat away from the coil unit. In addition, a housing unit houses the coil unit, the cooling unit and the thermal conductive member.

Abstract: Disclosed is an exposure apparatus and a device manufacturing method using the same, wherein the exposure apparatus has an original stage being movable while carrying an original thereon, and a projection optical system for projecting a pattern of the original onto a substrate. The original stage includes a first holding portion for holding the original and having a first surface for positioning the original, and a second holding portion for holding the original and having a second surface to be contacted to the original. Here, the second surface is made elastically or resiliently deformable.

Abstract: An exposure apparatus includes a plurality of chambers which respectively have openings and are connected to each other to be able to communicate with each other through the opening, and a suppressing system which suppresses a gas from flowing into at least one of the plurality of chambers through the opening after disconnection of the plurality of chambers.

Abstract: Disclosed is an exposure apparatus which includes a light source, an illumination optical system for illuminating an original with light from the light source, a projection optical system for projecting a pattern of the original, illuminated by the illumination optical system, onto a substrate, a radiation member disposed to be opposed to a subject of temperature adjustment which corresponds to at least one of an optical element of the illumination optical system, an optical element of the projection optical system and the original, and a control system for controlling a temperature of the radiation member in accordance with a state of exposure of the subject of temperature adjustment.

Abstract: An exposure apparatus for projecting a pattern of an original onto a substrate using illumination light, includes a transfer system, having a channel, to transfer heat via the channel, and an optical element, upon which the illumination light enters, and in which a space, in which said channel is provided, is formed.

Abstract: A substrate holding apparatus contacts an undersurface of a substrate and holds the substrate. At least a portion of a top surface of the substrate is to be immersed in liquid. The apparatus includes a chuck unit to attract the substrate and a preventing system to prevent the liquid from reaching the undersurface of the substrate.

Abstract: Disclosed is technology for holding a substrate and, specifically, an object holding apparatus including a chuck for holding an object, a holding unit for holding the chuck, a generating unit provided in the holding unit, for generating a field related to an attraction force, a member provided in the chuck and attracted by the generating unit in accordance with the field, and a supporting unit for supporting one of the generating unit and the member, for movement at least in a direction nearing the other and in a direction away from the other.

Abstract: A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure light, and radiation plates for radiation-cooling provided in positions away from an outer surface of the mirror. The radiation plates are provided so as to ensure a passage area for the exposure light incident on and reflected from the reflection surface of the mirror. Further, the respective radiation plates are temperature-controlled by cooling liquid flowing through cooling pipes. Thus the temperature rise of the mirror used in the reflection optical system of the exposure apparatus can be suppressed, and the accuracy of surface form of the mirror reflection surface can be maintained.

Abstract: An exposure apparatus includes a first substrate stage which positions a substrate in a measurement area, a measurement unit which measures the positioned substrate, a second substrate stage which positions in an exposure area the substrate, measured by the measurement unit, based on the measurement result, while the substrate is immersed in a liquid, an exposure unit which exposes the substrate positioned by the second substrate stage to a pattern, and a control unit which controls parallel process of measurement by the first substrate stage and the measurement unit, and exposure by the second substrate stage and the exposure unit.