Patents by Inventor Yuichi Sato

Yuichi Sato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150310814
    Abstract: A display device disclosed includes a liquid crystal panel (6), and an image optimization circuit (4) for switching, in accordance with an update frequency of image data, between (i) a first mode in which a liquid crystal driver (7) is driven at a first driving frequency and (ii) a second mode in which the liquid crystal driver (7) is driven at a second driving frequency lower than the first driving frequency. The display device can therefore be used even in a case where a transmission path for image data is limited and optimally display high-resolution image data with reduced electric power consumption.
    Type: Application
    Filed: November 14, 2013
    Publication date: October 29, 2015
    Inventors: Tetsuya UMEKIDA, Kenji MAEDA, Tatsuo WATANABE, Masayuki NATSUMI, Yuichi SATO, Kazuya TAKAYAMA
  • Publication number: 20150311074
    Abstract: An oxide semiconductor film is formed over a substrate. A sacrifice film is formed to such a thickness that the local maximum of the concentration distribution of an injected substance injected into the oxide semiconductor film in the depth direction of the oxide semiconductor film is located in a region from an interface between the substrate and the oxide semiconductor film to a surface of the oxide semiconductor film. Oxygen ions are injected as the injected substance into the oxide semiconductor film through the sacrifice film at such an acceleration voltage that the local maximum of the concentration distribution of the injected substance in the depth direction of the oxide semiconductor film is located in the region, and then the sacrifice film is removed. Further, a semiconductor device is manufactured using the oxide semiconductor film.
    Type: Application
    Filed: June 9, 2015
    Publication date: October 29, 2015
    Inventors: Daigo ITO, Yuichi SATO, Kosei NODA
  • Patent number: 9172654
    Abstract: A transfer device increments a value of a phase ID at predetermined time intervals, and registers a packet ID of a transmitted data packet and a phase ID on a determination table in an associated manner. When having received a response packet from a receiving-side transfer device, the transfer device determines an unarrived packet on the basis of received packet IDs contained in the received response packet and packet IDs of transmitted data packets. Then, the transfer device determines whether a data packet corresponding to the unarrived packet is lost or on-the-fly from a relationship between a phase ID of the unarrived packet and the maximum phase contained in the received response packet, and retransmits the corresponding data packet only if it is lost.
    Type: Grant
    Filed: July 3, 2013
    Date of Patent: October 27, 2015
    Assignee: FUJITSU LIMITED
    Inventors: Shinichi Sazawa, Yuichi Sato, Hiroaki Kameyama, Daichi Shimada
  • Patent number: 9171943
    Abstract: To provide a semiconductor device including an oxide semiconductor which is capable of having stable electric characteristics and achieving high reliability, by a dehydration or dehydrogenation treatment performed on a base insulating layer provided in contact with an oxide semiconductor layer, the water and hydrogen contents of the base insulating layer can be decreased, and by an oxygen doping treatment subsequently performed, oxygen which can be eliminated together with the water and hydrogen is supplied to the base insulating layer. By formation of the oxide semiconductor layer in contact with the base insulating layer whose water and hydrogen contents are decreased and whose oxygen content is increased, oxygen can be supplied to the oxide semiconductor layer while entry of the water and hydrogen into the oxide semiconductor layer is suppressed.
    Type: Grant
    Filed: December 26, 2014
    Date of Patent: October 27, 2015
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Naoto Yamade, Junichi Koezuka, Miki Suzuki, Yuichi Sato
  • Publication number: 20150301647
    Abstract: An input device includes a touch panel including a touch sensor that detects an operation by an operator, and a display. The input device executes information processing based on information input on the touch sensor. The touch sensor is capable of changing a detection output to the information processing means, in accordance with a position of an object at a distance from the touch sensor. The input device also determines whether an operation on the touch sensor is performed with an operator's right hand or left hand, based on a distribution of the detection output from the touch sensor.
    Type: Application
    Filed: October 15, 2013
    Publication date: October 22, 2015
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Yuichi SATO, Kenji MAEDA, Tatsuo WATANABE, Kazuya TAKAYAMA, Masayuki NATSUMI, Tetsuya UMEKIDA
  • Publication number: 20150286756
    Abstract: A thermal fluid analysis method, includes: calculating, by a computer, a first component of a new first sample different from a plurality of second samples; setting a second component obtained by unitizing the first component to a first base; adding the first base to a plurality of second bases of the plurality of second samples when the first component is greater than a threshold value; and correcting a low-dimensional model that expresses a plurality samples with superposition of a plurality of bases by using the first base and the plurality of second bases.
    Type: Application
    Filed: March 18, 2015
    Publication date: October 8, 2015
    Applicant: FUJITSU LIMITED
    Inventors: Sachio KOBAYASHI, Hiroki KOBAYASHI, Masayoshi HASHIMA, Yuichi SATO, Hiroshi IKEDA
  • Publication number: 20150264797
    Abstract: An electronic apparatus includes a first substrate, an electronic component mounted on a first surface of the first substrate, a plurality of first lands on a second surface of the first substrate that is opposite the first surface, the first lands electrically connected to the electronic component and arranged at a first interval, and a plurality of second lands on the second surface of the first substrate and surrounding the first lands, the second lands arranged at a second interval that is smaller than the first interval.
    Type: Application
    Filed: July 29, 2014
    Publication date: September 17, 2015
    Inventors: Akihiko HAPPOYA, Yuichi SATO, Daigo SUZUKI
  • Patent number: 9112036
    Abstract: A transistor using an oxide semiconductor, which has good on-state characteristics is provided. A high-performance semiconductor device including the transistor capable of high-speed response and high-speed operation is provided. In a manufacturing method of the transistor including the oxide semiconductor film including a channel formation region, an insulating film including a metal element is formed over the oxide semiconductor film, and low-resistance regions in which a dopant added through the insulating film by an implantation method is included are formed in the oxide semiconductor film. The channel formation region is positioned between the low-resistance regions in the channel length direction.
    Type: Grant
    Filed: May 29, 2012
    Date of Patent: August 18, 2015
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Junichi Koezuka, Shinji Ohno, Yuichi Sato, Shunpei Yamazaki
  • Patent number: 9098656
    Abstract: In the event of modifying analysis condition, after the simulation of a first time step carried out when the analysis condition is modified finishes and before the simulation of a second time step next after the first step starts, the modified analysis condition is referred and the simulation based on the modified analysis condition is carried out in the next time step.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: August 4, 2015
    Assignee: FUJITSU LIMITED
    Inventors: Sachio Kobayashi, Yuichi Sato, Hiroki Kobayashi, Hideki Abe, Masayoshi Hashima
  • Patent number: 9098651
    Abstract: A prior simulation of a velocity field and a temperature field is carried out, and snapshot data of the velocity field and that of the temperature field are collected during the prior simulation. Then principal component analysis on the collected snapshot data obtains velocity-field and temperature field dimension transformation matrixes, on the based on which the analysis models of the velocity field and temperature field having respective first degrees of freedom are converted into reduced degree-of-freedom models. Consequently, a simulation of the velocity field and the temperature field is carried out using models having respective reduced degrees of freedom (i.e., second degrees of freedom).
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: August 4, 2015
    Assignee: FUJITSU LIMITED
    Inventors: Sachio Kobayashi, Hiroki Kobayashi, Hideki Abe, Masayoshi Hashima, Yuichi Sato
  • Patent number: 9093280
    Abstract: A semiconductor device has 3n, 3n+1, and 3n+2 connector lines that are formed together. The 3n+1 connector line is located between the 3n connector line and the 3n+2 connector line. The first fringe pattern pad is located at the terminus of the 3n connector line and is formed with a wider space than the width of the 3n connector line. The second fringe pattern pad is located at the terminus of the 3n+1 connector line and is formed with a wider width than the width of the 3n+1 connector line. The third fringe pattern pad is located at the terminus of the 3n+2 connector line and is formed with a wider width than the width of the 3n+2 connector line. The second fringe pattern pad is positioned closer to a memory array as compared with the terminus of each connector line with the first and third fringe pattern pads.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: July 28, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yuichi Sato, Satoshi Nagashima
  • Patent number: 9079780
    Abstract: The present invention provides an alkali metal salt of fluorosulfonyl imide having favorable heat resistance and a reduced content of specific impurities and a water content, and provides a method for producing an alkali metal salt of fluorosulfonyl imide, which is capable of easily removing a solvent from a reaction solution. An alkali metal salt of fluorosulfonyl imide of the present invention is represented by the following general formula (I) and has a mass loss rate of 2% or less when the alkali metal salt of fluorosulfonyl imide is kept at 100° C. for 8 hours under an air current. A method for producing an alkali metal salt of fluorosulfonyl imide of the present invention comprises a step of concentrating a solution of the alkali metal salt of fluorosulfonyl imide by bubbling a gas into a reaction solution containing the alkali metal salt of fluorosulfonyl imide, and/or concentrating a solution of the alkali metal salt of fluorosulfonyl imide by thin layer distillation.
    Type: Grant
    Filed: May 27, 2011
    Date of Patent: July 14, 2015
    Assignee: NIPPON SHOKUBAI CO., LTD.
    Inventors: Yuichi Sato, Shimpei Sato, Yasunori Okumura
  • Publication number: 20150187950
    Abstract: A transistor with stable electric characteristics is provided. An aluminum oxide film containing boron is formed in order to prevent hydrogen from diffusing into an oxide semiconductor film.
    Type: Application
    Filed: December 18, 2014
    Publication date: July 2, 2015
    Inventors: Yuichi Sato, Naoto Yamade
  • Publication number: 20150185956
    Abstract: A touch panel driving device includes: a noise detection section (43) that detects the presence or absence of at least external noise of an input operation performed on a touch panel (30); and a liquid crystal drive parameter setting section (51) that, in a case where the presence of external noise has been detected by the noise detection section (43), executes a process for reducing the external noise by adjusting a cycle or duration of a 1H period.
    Type: Application
    Filed: August 12, 2013
    Publication date: July 2, 2015
    Inventors: Kazuya Takayama, Kenji Maeda, Masayuki Natsumi, Tatsuo Watanabe, Yuichi Sato, Tetsuya Umekida
  • Publication number: 20150140730
    Abstract: A highly reliable semiconductor device is manufactured by giving stable electric characteristics to a transistor in which an oxide semiconductor film is used. In a transistor using an oxide semiconductor film for an active layer, a microvoid is provided in a source region and a drain region adjacent to a channel region. By providing a microvoid in the source region and the drain region formed in an oxide semiconductor film, hydrogen contained in the channel region of an oxide semiconductor film can be captured in the microvoid.
    Type: Application
    Filed: December 15, 2014
    Publication date: May 21, 2015
    Inventors: Junichi KOEZUKA, Yuichi SATO, Shinji OHNO
  • Publication number: 20150140733
    Abstract: To provide a semiconductor device including an oxide semiconductor which is capable of having stable electric characteristics and achieving high reliability, by a dehydration or dehydrogenation treatment performed on a base insulating layer provided in contact with an oxide semiconductor layer, the water and hydrogen contents of the base insulating layer can be decreased, and by an oxygen doping treatment subsequently performed, oxygen which can be eliminated together with the water and hydrogen is supplied to the base insulating layer. By formation of the oxide semiconductor layer in contact with the base insulating layer whose water and hydrogen contents are decreased and whose oxygen content is increased, oxygen can be supplied to the oxide semiconductor layer while entry of the water and hydrogen into the oxide semiconductor layer is suppressed.
    Type: Application
    Filed: December 26, 2014
    Publication date: May 21, 2015
    Inventors: Naoto YAMADE, Junichi KOEZUKA, Miki SUZUKI, Yuichi SATO
  • Patent number: 9035304
    Abstract: The contact resistance between an oxide semiconductor film and a metal film is reduced. A transistor that uses an oxide semiconductor film and has excellent on-state characteristics is provided. A semiconductor device capable of high-speed operation is provided. In a transistor that uses an oxide semiconductor film, the oxide semiconductor film is subjected to nitrogen plasma treatment. Thus, part of oxygen included in the oxide semiconductor film is replaced with nitrogen, so that an oxynitride region is formed. A metal film is formed in contact with the oxynitride region. The oxynitride region has lower resistance than the other region of the oxide semiconductor film. In addition, the oxynitride region is unlikely to form high-resistance metal oxide at the interface with the contacting metal film.
    Type: Grant
    Filed: August 5, 2014
    Date of Patent: May 19, 2015
    Inventors: Junichi Koezuka, Shinji Ohno, Yuichi Sato, Sachiaki Tezuka, Tomokazu Yokoi, Yusuke Shino
  • Patent number: 9006735
    Abstract: To provide an oxide semiconductor film including a low-resistance region, which can be applied to a transistor. To provide a transistor including the oxide semiconductor film, which can perform at high speed. To provide a high-performance semiconductor device including the transistor including the oxide semiconductor film, which can perform at high speed, with high yield. A film having a reducing property is formed over the oxide semiconductor film. Next, part of oxygen atoms are transferred from the oxide semiconductor film to the film having a reducing property. Next, an impurity is added to the oxide semiconductor film through the film having a reducing property and then, the film having a reducing property is removed, so that a low-resistance region is formed in the oxide semiconductor film.
    Type: Grant
    Filed: March 27, 2014
    Date of Patent: April 14, 2015
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Shinji Ohno, Yuichi Sato, Junichi Koezuka, Sachiaki Tezuka
  • Publication number: 20150086466
    Abstract: The present invention provides an alkali metal salt of fluorosulfonyl imide having favorable heat resistance and a reduced content of specific impurities and a water content, and provides a method for producing an alkali metal salt of fluorosulfonyl imide, which is capable of easily removing a solvent from a reaction solution. An alkali metal salt of fluorosulfonyl imide of the present invention is represented by the following general formula (I) and has a mass loss rate of 2% or less when the alkali metal salt of fluorosulfonyl imide is kept at 100° C. for 8 hours under an air current. A method for producing an alkali metal salt of fluorosulfonyl imide of the present invention comprises a step of concentrating a solution of the alkali metal salt of fluorosulfonyl imide by bubbling a gas into a reaction solution containing the alkali metal salt of fluorosulfonyl imide, and/or concentrating a solution of the alkali metal salt of fluorosulfonyl imide by thin layer distillation.
    Type: Application
    Filed: December 4, 2014
    Publication date: March 26, 2015
    Inventors: Yuichi SATO, Shimpei SATO, Yasunori OKUMURA
  • Publication number: 20150059179
    Abstract: In an electromagnetic control valve configured to cancel out forces acting on a valve body by differential pressure using a diaphragm, pressure tightness and durability of the diaphragm are improved. A needle-shaped projection is formed on a lower end of a piston section of a valve rod that is a drive shaft. An insertion hole is formed in the center of a diaphragm guide. The center of the diaphragm is stuck on the needle-shaped projection to make it pass through it. The needle-shaped projection is inserted into the insertion hole in the diaphragm guide. An end of the needle-shaped projection is spot-welded. The diaphragm is stuck with the needle-shaped projection to fix it to the valve rod without cutting a base fabric of the diagram. A needle-shaped projection may be formed on the diaphragm guide and an insertion hole may be formed in the valve rod.
    Type: Application
    Filed: April 18, 2013
    Publication date: March 5, 2015
    Applicant: Kabushiki Kaisha Saginomiya Seisakusho
    Inventors: Kazuhiko Osawa, Ichiro Okawara, Motoyasu Ishiguro, Yuichi Sato