Patents by Inventor Yuichiro ENOMOTO

Yuichiro ENOMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10344177
    Abstract: Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.
    Type: Grant
    Filed: September 22, 2015
    Date of Patent: July 9, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Yuichiro Enomoto
  • Patent number: 10248019
    Abstract: A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: April 2, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Kaoru Iwato, Kana Fujii, Sou Kamimura, Yuichiro Enomoto, Keita Kato, Shuhei Yamaguchi
  • Patent number: 10175576
    Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. The curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: January 8, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Yuichiro Goto, Yuichiro Enomoto
  • Patent number: 10126653
    Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: November 13, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Kaoru Iwato, Shohei Kataoka, Shinji Tarutani, Sou Kamimura, Keita Kato, Yuichiro Enomoto, Kazuyoshi Mizutani, Toru Tsuchihashi, Kana Fujii
  • Patent number: 9897922
    Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: February 20, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato, Kana Fujii
  • Patent number: 9868846
    Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.
    Type: Grant
    Filed: January 9, 2014
    Date of Patent: January 16, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Yuichiro Enomoto, Kazuyuki Usuki, Tadashi Omatsu, Hirotaka Kitagawa
  • Patent number: 9862847
    Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.
    Type: Grant
    Filed: December 23, 2015
    Date of Patent: January 9, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Goto, Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Enomoto, Kenichi Kodama
  • Patent number: 9796803
    Abstract: An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: October 24, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Akiko Hattori, Yuichiro Enomoto
  • Patent number: 9709892
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa??1.5 when exposed to actinic rays or radiation.
    Type: Grant
    Filed: March 25, 2011
    Date of Patent: July 18, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Toru Tsuchihashi, Yuichiro Enomoto, Kana Fujii, Kazuyoshi Mizutani, Shinji Tarutani, Keita Kato
  • Patent number: 9663671
    Abstract: Provide is a curable composition for imprints, capable of effectively suppressing chipping of the cured pattern. A curable composition for imprints comprising (A) curable compound and (B) photo-polymerization initiator, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: May 30, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Kunihiko Kodama, Shinji Tarutani
  • Publication number: 20170102618
    Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 ?m or greater amount to a density of 30 particles/ml or less.
    Type: Application
    Filed: December 21, 2016
    Publication date: April 13, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Keita KATO, Sou KAMIMURA, Yuichiro ENOMOTO, Kaoru IWATO, Shohei KATAOKA, Shoichi SAITOH
  • Patent number: 9551935
    Abstract: Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and ?SP thereof represented by formula (1) below is 2.5 (MPa)1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent.
    Type: Grant
    Filed: March 25, 2011
    Date of Patent: January 24, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Keita Kato, Shinji Tarutani, Toru Tsuchihashi, Sou Kamimura, Yuichiro Enomoto, Kana Fujii, Kaoru Iwato, Shohei Kataoka, Kazuyoshi Mizutani
  • Publication number: 20160349620
    Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
    Type: Application
    Filed: August 12, 2016
    Publication date: December 1, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro ENOMOTO, Shinji TARUTANI, Sou KAMIMURA, Kaoru IWATO, Keita KATO, Kana FUJII
  • Patent number: 9507263
    Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms?number of oxygen atoms).
    Type: Grant
    Filed: April 4, 2014
    Date of Patent: November 29, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Shinji Tarutani, Yuichiro Enomoto, Tadashi Oomatsu, Takayuki Ito, Hirotaka Kitagawa, Akiko Hattori
  • Patent number: 9482958
    Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: November 1, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato, Kana Fujii
  • Publication number: 20160195814
    Abstract: There is provided a pattern formation method comprising: a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin of which, due to a polarity being increased by an action of an acid, solubility decreases with respect to a developer which includes an organic solvent; a step (2) of exposing the film to an actinic ray or radiation; a step (3) of forming a target process pattern by developing the film using a developer which includes an organic solvent; and a step (4) of obtaining a processed pattern by applying a processing agent which includes a compound (x) which has at least one of a primary amino group and a secondary amino group with respect to the target process pattern.
    Type: Application
    Filed: March 14, 2016
    Publication date: July 7, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro ENOMOTO, Ryosuke UEBA, Michihiro SHIRAKAWA, Hajime FURUTANI, Akiyoshi GOTO, Masafumi KOJIMA
  • Publication number: 20160122563
    Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.
    Type: Application
    Filed: December 23, 2015
    Publication date: May 5, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro Goto, Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Enomoto, Kenichi Kodama
  • Patent number: 9263289
    Abstract: Provided is an adhesion-promoting composition between a curable composition for imprints and a substrate, which excellent in adhesiveness and can control pattern failure. An adhesion-promoting composition used between a curable composition for imprints and a substrate, which comprises a compound having a molecular weight of 500 or larger and having a reactive group, and has a content of a compound, with a molecular weight of 200 or smaller, of more than 1% by mass and not more than 10% by mass of a total solid content.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: February 16, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Akiko Hattori, Hirotaka Kitagawa, Yuichiro Enomoto
  • Publication number: 20160026083
    Abstract: The present invention has an object to provide a pattern forming method, in which even when a pattern which is fine and has a high aspect ratio is formed, the collapse or peeling of the pattern is inhibited; a method for manufacturing an electronic device, including the pattern forming method; and an electronic device manufactured by the manufacturing method. The pattern forming method of the present invention includes an adhesion aiding layer forming step of forming an adhesion aiding layer containing a polymerizable group and having a light transmittance of 80% or more at a wavelength of 193 nm on a substrate; a resist film forming step of applying a radiation-sensitive resin composition onto the adhesion aiding layer to form a resist film; an exposing step of exposing the resist film; and a developing step of developing the exposed resist film to form a pattern.
    Type: Application
    Filed: October 2, 2015
    Publication date: January 28, 2016
    Applicant: FUJIFILM CORPORATION
    Inventors: Naohiro TANGO, Yuichiro ENOMOTO
  • Publication number: 20160009945
    Abstract: Provided is a composition capable of producing an underlying film which demonstrates a good adhesiveness between a substrate and a layer to be imprinted, showing a good in-plane uniformity of the thickness, and a small defect density. The composition includes a polymerizable compound, a first solvent, and a second solvent, the first solvent having a boiling point at 1 atm of 160° C. or higher, the second solvent having a boiling point at 1 atm of lower than 160° C., and the content of the polymerizable compound in the composition being less than 1% by mass.
    Type: Application
    Filed: September 25, 2015
    Publication date: January 14, 2016
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro ENOMOTO, Hirotaka KITAGAWA, Tadashi OOMATSU, Yuichiro GOTO