Yuichiro ENOMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
June 29, 2011
January 5, 2012
Yuichiro ENOMOTO, Shinji TARUTANI, Sou KAMIMURA, Kaoru IWATO, Keita KATO, Kana FUJII