Patents by Inventor Yuichiro ENOMOTO

Yuichiro ENOMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8753802
    Abstract: A pattern forming method comprising: (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains: (A) a resin, (B) a nonionic compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent, and (D) a solvent.
    Type: Grant
    Filed: October 22, 2012
    Date of Patent: June 17, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Keita Kato, Shinji Tarutani, Sou Kamimura, Yuichiro Enomoto, Kaoru Iwato
  • Publication number: 20140154471
    Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.
    Type: Application
    Filed: January 9, 2014
    Publication date: June 5, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Kunihiko KODAMA, Yuichiro ENOMOTO, Kazuyuki USUKI, Tadashi OMATSU, Hirotaka KITAGAWA
  • Publication number: 20140127629
    Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 ?m or greater amount to a density of 30 particles/ml or less.
    Type: Application
    Filed: January 13, 2014
    Publication date: May 8, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Keita KATO, Sou KAMIMURA, Yuichiro ENOMOTO, Kaoru IWATO, Shohei KATAOKA, Shoichi SAITOH
  • Patent number: 8663907
    Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 ?m or greater amount to a density of 30 particles/ml or less.
    Type: Grant
    Filed: August 24, 2011
    Date of Patent: March 4, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Keita Kato, Sou Kamimura, Yuichiro Enomoto, Kaoru Iwato, Shohei Kataoka, Shoichi Saitoh
  • Publication number: 20130113082
    Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, (c) developing the exposed film with a developer containing an organic solvent, and (d) rinsing the developed film with a rinse liquid containing an organic solvent, which rinse liquid has a specific gravity larger than that of the developer.
    Type: Application
    Filed: August 26, 2011
    Publication date: May 9, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Keita Kato, Kana Fujii
  • Publication number: 20130101812
    Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an ester and a ketone having 7 or more carbon atoms.
    Type: Application
    Filed: September 16, 2011
    Publication date: April 25, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Sou Kamimura, Tsukasa Yamanaka, Yuichiro Enomoto, Keita Kato
  • Publication number: 20130052431
    Abstract: Provided is a curable composition for imprints capable of ensuring good patternability after repetitive transfer of pattern, and less causative of defects. The curable composition for imprints comprising a polymerizable compound (A), a photo-polymerization initiator (B) and a non-polymerizable compound (C); the non-polymerizable compound (C) dissolving into the curable composition for imprints in an exothermic manner.
    Type: Application
    Filed: August 24, 2012
    Publication date: February 28, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro ENOMOTO, Kunihiko KODAMA, Shinji TARUTANI, Hirotaka KITAGAWA, Tadashi OOMATSU
  • Publication number: 20130017377
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa?1.5 when exposed to actinic rays or radiation.
    Type: Application
    Filed: March 25, 2011
    Publication date: January 17, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Shohei Kataoka, Kaoru Iwato, Sou Kamimura, Toru Tsuchihashi, Yuichiro Enomoto, Kana Fujii, Kazuyoshi Mizutani, Shinji Tarutani, Keita Kato
  • Publication number: 20130011785
    Abstract: Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and ?SP thereof represented by formula (1) below is 2.5 (MPa)1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent.
    Type: Application
    Filed: March 25, 2011
    Publication date: January 10, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Keita Kato, Shinji Tarutani, Toru Tsuchihashi, Sou Kamimura, Yuichiro Enomoto, Kana Fujii, Kaoru Iwato, Shohei Kataoka, Kazuyoshi Mizutani
  • Publication number: 20120321855
    Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.
    Type: Application
    Filed: February 24, 2011
    Publication date: December 20, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Kaoru Iwato, Shohei Kataoka, Shinji Tarutani, Sou Kamimura, Keita Kato, Yuichiro Enomoto, Kazuyoshi Mizutani, Toru Tsuchihashi, Kana Fujii
  • Publication number: 20120322007
    Abstract: A pattern forming method comprising (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer containing an organic solvent, wherein the resist composition contains (A) a resin, (B) a compound capable of generating a specific acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent, and (D) a solvent.
    Type: Application
    Filed: February 18, 2011
    Publication date: December 20, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Keita Kato, Shinji Tarutani, Sou Kamimura, Yuichiro Enomoto, Kaoru Iwato
  • Publication number: 20120288691
    Abstract: A pattern forming method comprising (i) a step of forming a film from a chemical amplification resist composition (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the chemical amplification resist composition contains (A) a resin containing a repeating unit having two or more hydroxyl groups, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent and (D) a solvent; a pattern formed by the pattern forming method; a chemical amplification resist composition used in the pattern forming method; and a resist film formed using the chemical amplification resist composition.
    Type: Application
    Filed: January 13, 2011
    Publication date: November 15, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Kaoru Iwato, Shinji Tarutani, Yuichiro Enomoto, Sou Kamimura, Keita Kato
  • Publication number: 20120282548
    Abstract: Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.
    Type: Application
    Filed: January 7, 2011
    Publication date: November 8, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro Enomoto, Shinji Tarutani, Sou Kamimura, Kaoru Iwato, Keita Kato, Akinori Shibuya
  • Publication number: 20120207943
    Abstract: Provided is a method of producing a curable composition for imprints including (A) a polymerizable monomer, (B) a polymerization initiator, and (C) a solvent which is capable of effectively suppressing lifting or separation of patterns, excellent in coatability, and excellent in time-dependent stability. The method of producing a curable composition for imprints comprises preparing one species of liquid (D) which contains at least either one of the polymerizable monomer (A) and the polymerization initiator (B), passing the liquid (D) through a filter, and then adding the solvent (C).
    Type: Application
    Filed: February 10, 2012
    Publication date: August 16, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro ENOMOTO, Kunihiko KODAMA, Shinji TARUTANI
  • Publication number: 20120148957
    Abstract: A pattern forming method includes: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using an organic solvent-containing developer, wherein the chemical amplification resist composition contains: (A) a resin substantially insoluble in alkali; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a crosslinking agent; and (D) a solvent, a negative chemical amplification resist composition used in the method, and a resist film formed from the negative chemical amplification resist composition.
    Type: Application
    Filed: October 5, 2010
    Publication date: June 14, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro Enomoto, Sou Kamimura, Shinji Tarutani, Keita Kato, Kaoru Iwato
  • Publication number: 20120076948
    Abstract: Provided is a method for producing a curable composition for imprints which excellent in patternability. Applied is a method for producing a curable composition for imprints, which comprises passing a curable composition comprising a polymerizable monomer (A) and a polymerizable initiator (B) through a filter having an effective filter area of 200 cm2 or more at least one time.
    Type: Application
    Filed: September 21, 2011
    Publication date: March 29, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro ENOMOTO, Kunihiko KODAMA, Shinji TARUTANI
  • Publication number: 20120077131
    Abstract: According to one embodiment, a method of forming a pattern includes the step of applying an actinic-ray- or radiation-sensitive resin composition on a substrate so as to form a film, the step of selectively exposing the film through a mask and the step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation-sensitive resin composition contains a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased, a photoacid generator (B) that when exposed to actinic rays or radiation, generates an acid containing a fluorine atom and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8 to 20 mass % based on the total solids of the composition.
    Type: Application
    Filed: June 3, 2010
    Publication date: March 29, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro Enomoto, Shinji Tarutani, Akinori Shibuya, Shuhei Yamaguchi
  • Publication number: 20120058427
    Abstract: A pattern forming method, including: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using a developer containing an organic solvent, wherein the chemical amplification resist composition contains: (A) a resin capable of decreasing a solubility of the resin (A) in the developer containing an organic solvent by an action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a basic, compound or ammonium salt compound whose basicity decreases upon irradiation with an actinic ray or radiation, and a resist composition used for the pattern forming method and a resist film formed from the resist composition are provided.
    Type: Application
    Filed: June 14, 2010
    Publication date: March 8, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro Enomoto, Sou Kamimura, Shinji Tarutani
  • Publication number: 20120052449
    Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 ?m or greater amount to a density of 30 particles/ml or less.
    Type: Application
    Filed: August 24, 2011
    Publication date: March 1, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Keita KATO, Sou KAMIMURA, Yuichiro ENOMOTO, Kaoru IWATO, Shohei KATAOKA, Shoichi SAITOH
  • Publication number: 20120028196
    Abstract: An embodiment of the method of forming a pattern, comprises (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) processing the exposed film with an organic processing liquid, wherein the processing liquid contains an organic solvent whose normal boiling point is 175° C. or higher, the organic solvent being contained in the processing liquid in a content of less than 30 mass %.
    Type: Application
    Filed: July 27, 2011
    Publication date: February 2, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Sou KAMIMURA, Kaoru IWATO, Yuichiro ENOMOTO, Shohei KATAOKA, Keita KATO, Shoichi SAITOH