Patents by Inventor Yun Wang

Yun Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210109388
    Abstract: A display system and a display control method of the display system are provided. The display system includes a display device, at least two layers of liquid crystal cells on a light-emitting side of the display device, and a controller device. The display device is configured to display a display picture; the at least two lavers of liquid crystal cells are configured to control an exit angle of light of the display picture; the controller device is configured to control positions and/or widths of light-transmitting regions and light-shielding regions of each layer of the liquid crystal cells to control a display mode of the display picture. The display system can control the positions and widths of the light-transmitting regions and the light-shielding regions formed on each liquid crystal cell according to actual needs, thereby realizing switching among various display modes.
    Type: Application
    Filed: April 1, 2019
    Publication date: April 15, 2021
    Inventors: Yang YOU, Yun QIU, Ruizhi YANG, Ruiyong WANG, Zhidong WANG, Zhenhua LV
  • Patent number: 10975081
    Abstract: Disclosed are substituted fused pyrazoles, for example substituted indazoles, that inhibit LRRK2 kinase activity, pharmaceutical compositions containing them and their use in the treatment of Parkinson's disease.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: April 13, 2021
    Assignee: GLAXOSMITHKLINE INTELLECTUAL PROPERTY DEVELOPMENT LIMITED
    Inventors: Xiao Ding, Yun Jin, Qian Liu, Feng Ren, Yingxia Sang, Luigi Piero Stasi, Zehong Wan, Hailong Wang, Weiqiang Xing, Yang Zhan, Baowei Zhao
  • Patent number: 10973807
    Abstract: The present invention provides a pharmaceutical composition containing a pyrrolo-fused six-membered heterocyclic compound or a pharmaceutically acceptable salt of the compound. Specifically, the invention provides a pharmaceutical composition containing 5-(2-diethylamino-ethyl)-2-(5-fluoro-2-oxo-1,2-dihydro-indol-3-ylidene-methyl)-3-methyl-1,5,6,7-tetrahydro-pyrrolo[3,2-c]pyridin-4-one or a pharmaceutically acceptable salt thereof, and at least one water soluble filler. The pharmaceutical composition of the invention features a rapid dissolution and good stability.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: April 13, 2021
    Assignee: Jiangsu Hengrui Medicine Co., Ltd.
    Inventors: Yun Lu, Xinhua Zhang, Chenyang Wang, Tonghui Liu
  • Patent number: 10970860
    Abstract: A character-tracking system is provided. The system includes a plurality of cameras, a first computing server, a second computing server, and a third computing server. The cameras are configured to capture scene images of a scene with different shooting ranges. The first computing server performs body tracking on a body region in the scene image to generate character data. The third computation server obtains a body region block from each scene image according to the character data for facial recognition to obtain user identity. The first computing server further performs person re-identification on different body regions to link the body regions with its person tag belonging to the same user. The first computing server further represents the linked body regions and their person tags with a corresponding user identity.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: April 6, 2021
    Assignee: WISTRON CORP.
    Inventors: Po-Shen Lin, Shih-Wei Wang, Yi-Yun Hsieh
  • Patent number: 10966964
    Abstract: The present invention provides a method for preparing a pharmaceutical composition containing a pyrrolo-fused six-membered heterocyclic compound or a pharmaceutically acceptable salt thereof. Specifically, the invention provides a preparation method of a pharmaceutical composition, the method containing: mixing 5-(2-diethylamino-ethyl)-2-(5-fluoro-2-oxo-1,2-dihydro-indol-3-ylidene-methyl)-3-methyl-1,5,6,7-tetrahydro-pyrrolo[3,2-c]pyridin-4-one or a pharmaceutically acceptable salt thereof with at least one filler, and then granulating the mixture. The pharmaceutical composition of the invention features a rapid dissolution and good stability.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: April 6, 2021
    Assignee: Jiangsu Hengrui Medicine Co., Ltd.
    Inventors: Yun Lu, Xinhua Zhang, Chenyang Wang, Tonghui Liu
  • Publication number: 20210098594
    Abstract: A semiconductor structure includes a fin protruding from a substrate, a first and a second metal gate stacks disposed over the fin, and a dielectric feature defining a sidewall of each of the first and the second metal gate stacks. Furthermore, the dielectric feature includes a two-layer structure, where sidewalls of the first layer are defined by the second layer, and where the first and the second layers have different compositions.
    Type: Application
    Filed: September 30, 2019
    Publication date: April 1, 2021
    Inventors: Chun-Han Chen, Chen-Ming Lee, Fu-Kai Yang, Mei-Yun Wang
  • Publication number: 20210098376
    Abstract: Vias, along with methods for fabricating vias, are disclosed that exhibit reduced capacitance and resistance. An exemplary interconnect structure includes a first source/drain contact and a second source/drain contact disposed in a dielectric layer. The first source/drain contact physically contacts a first source/drain feature and the second source/drain contact physically contacts a second source/drain feature. A first via having a first via layer configuration, a second via having a second via layer configuration, and a third via having a third via layer configuration are disposed in the dielectric layer. The first via and the second via extend into and physically contact the first source/drain contact and the second source/drain contact, respectively. A first thickness of the first via and a second thickness of the second via are the same. The third via physically contacts a gate structure, which is disposed between the first source/drain contact and the second source/drain contact.
    Type: Application
    Filed: August 4, 2020
    Publication date: April 1, 2021
    Inventors: Shih-Che Lin, Po-Yu Huang, Chao-Hsun Wang, Kuo-Yi Chao, Mei-Yun Wang, Feng-Yu Chang, Rueijer Lin, Wei-Jung Lin, Chen-Yuan Kao
  • Publication number: 20210098295
    Abstract: A method includes receiving a structure having a dielectric layer over a conductive feature; etching a hole through the dielectric layer and exposing the conductive feature; depositing a first metal into the hole and in direct contact with the dielectric layer and the conductive feature; depositing a second metal over the first metal; and annealing the structure including the first and the second metals.
    Type: Application
    Filed: October 1, 2019
    Publication date: April 1, 2021
    Inventors: Sung-Li Wang, Hung-Yi Huang, Yu-Yun Peng, Mrunal A. Khaderbad, Chia-Hung Chu, Shuen-Shin Liang, Keng-Chu Lin
  • Patent number: 10964030
    Abstract: A method and device that estimate a pose of a device and the device are disclosed. The method may include generating inertial measurement unit (IMU) data of the device, determining a first pose of the device a first time point based on the IMU data, generating a current predicted motion state array based on the IMU data, and estimating an M-th predicted pose of the device at an M-th time point after the first time point based on the current predicted motion state array, where M denotes a natural number greater than 1.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: March 30, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Guangwei Wang, Tianhao Gao, Chun Wang, GeeYoung Sung, Hong-Seok Lee, Lin Ma, Minsu Ahn, Qiang Wang, Sunghoon Hong, Yun-Tae Kim, Zhihua Liu
  • Patent number: 10964262
    Abstract: Techniques for reducing image artifacts on a display s may include receiving image data, such that the image data includes pixel luminance data for a frame of image data. The technique may also include determining an emission duration for a pixel of the plurality of pixels during a sub-frame of the frame of image data based on the pixel luminance data. The technique may also include determining an emission duration extension to apply to the emission duration associated with the sub-frame based on a luminance baseline associated with the sub-frame, a luminance level associated with the sub-frame, and a time period associated with the sub-frame. The technique may then involve sending an emission signal to the pixel, such that the emission signal is configured to cause the pixel to emit light for a duration that correspond to the emission duration and the emission duration extension.
    Type: Grant
    Filed: May 16, 2019
    Date of Patent: March 30, 2021
    Assignee: Apple Inc.
    Inventors: Chin-Wei Lin, Shinya Ono, Yun Wang
  • Patent number: 10962749
    Abstract: An optical lens includes, in order along a direction, an aperture stop and a lens group with a positive refractive power. The aperture stop is disposed at an outermost side of all lenses of the optical lens, and the lens group has at least four lenses. At least one of the four lenses is an aspheric lens, and each of the four lenses has a clear aperture of smaller than 14 mm.
    Type: Grant
    Filed: July 18, 2018
    Date of Patent: March 30, 2021
    Assignee: Young Optics Inc.
    Inventors: Kai-Yun Chen, Pei-Ching Liu, Kuo-Chuan Wang
  • Publication number: 20210090943
    Abstract: A semiconductor device includes a gate structure disposed over a substrate, and a first dielectric layer disposed over the substrate, including and over the gate structure. A first metal feature is disposed in the first dielectric layer, including an upper portion having a first width and a lower portion having a second width that is different than the first width. A dielectric spacer is disposed along the lower portion of the first metal feature, wherein the upper portion of the first metal feature is disposed over the dielectric spacer. A second dielectric layer is disposed over the first dielectric layer, including over the first metal feature and a second metal feature extends through the second dielectric layer to physically contact with the first metal feature. A third metal feature extends through the second dielectric layer and the first dielectric layer to physically contact the gate structure.
    Type: Application
    Filed: December 7, 2020
    Publication date: March 25, 2021
    Inventors: Chao-Hsun Wang, Hsien-Cheng Wang, Mei-Yun Wang
  • Publication number: 20210091190
    Abstract: A source/drain is disposed over a substrate. A source/drain contact is disposed over the source/drain. A first via is disposed over the source/drain contact. The first via has a laterally-protruding bottom portion and a top portion that is disposed over the laterally-protruding bottom portion.
    Type: Application
    Filed: June 11, 2020
    Publication date: March 25, 2021
    Inventors: Po-Yu Huang, Shih-Che Lin, Chao-Hsun Wang, Kuo-Yi Chao, Mei-Yun Wang
  • Publication number: 20210089504
    Abstract: A database is selected from a plurality of databases included in the distributed database cluster. A shard map of the database is acquired, wherein the shard map includes a distribution of a plurality of shards on the plurality of nodes, and one or more nodes of the plurality of nodes each includes at least one shard of an old version of the database to be upgraded to a new version. A sustainable serviceability of the database corresponding to each of the one or more nodes is predicted according to the shard map based on the assumption that the at least one shard of each of the one or more nodes has been upgraded from the old version to the new version.
    Type: Application
    Filed: September 25, 2019
    Publication date: March 25, 2021
    Inventors: Jing Jing Liu, Yun Zheng, Jing Wang, Zan Zhou, Peng Hui Jiang
  • Publication number: 20210088915
    Abstract: A method for manufacturing a structure on a substrate includes projecting an image of a reference pattern onto a substrate having a first patterned layer, the first patterned layer including first alignment marks and first overlay measurement marks, and the reference pattern including second alignment marks and second overlay measurement marks, aligning, based on the first alignment marks and the second alignment marks, the first patterned layer to the image of the reference pattern, obtaining a pre-overlay mapping of the first overlay measurement marks and the second overlay measurement marks, and determining compensation data indicative of information of the pre-overlay mapping of the first overlay measurement marks and the second overlay measurement marks.
    Type: Application
    Filed: December 7, 2020
    Publication date: March 25, 2021
    Inventors: Wen-Yun WANG, Hua-Tai LIN, Chia-Chu LIU
  • Publication number: 20210091914
    Abstract: A bandwidth part processing method includes receiving, by a terminal, a first information and a second information from a network device. The first information indicates that at least one default bandwidth part (BWP) corresponds to at least two active BWPs, the second information indicates that the at least two active BWPs correspond to at least one first timer, and the at least one first timer is useable by the terminal to perform deactivation processing on at least one of the at least two active BWPs. The method further includes performing, by the terminal, deactivation processing on the at least one of the at least two active BWPs, and activation processing on a BWP in the at least one default BWP based on the first and second information, or performing deactivation processing on the at least one of the at least two active BWPs based on the first and second information.
    Type: Application
    Filed: January 10, 2019
    Publication date: March 25, 2021
    Inventors: Yifan XUE, Chuting YAO, Yiru KUANG, Da WANG, Yun LIU, Jian WANG
  • Patent number: 10957604
    Abstract: In an embodiment, a method includes: forming a first fin extending from a substrate; forming a second fin extending from the substrate, the second fin being spaced apart from the first fin by a first distance; forming a metal gate stack over the first fin and the second fin; depositing a first inter-layer dielectric over the metal gate stack; and forming a gate contact extending through the first inter-layer dielectric to physically contact the metal gate stack, the gate contact being laterally disposed between the first fin and the second fin, the gate contact being spaced apart from the first fin by a second distance, where the second distance is less than a second predetermined threshold when the first distance is greater than or equal to a first predetermined threshold.
    Type: Grant
    Filed: September 11, 2019
    Date of Patent: March 23, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shih-Chieh Wu, Pang-Chi Wu, Kuo-Yi Chao, Mei-Yun Wang, Hsien-Huang Liao, Tung-Heng Hsieh, Bao-Ru Young
  • Patent number: 10954838
    Abstract: An emissions control system for a motor vehicle that includes an internal combustion engine includes a first selective catalytic reduction (SCR) device and a reductant injector, The system further includes a model-based controller that is configured to calculate a target amount of reductant to inject to maintain a predetermined ratio between an amount of NH3 and an amount of NOx at the outlet of the first SCR device, and to send a command for receipt by the reductant injector to inject the calculated amount of reductant. The model-based controller is further configured to send a command for receipt by an engine controller to influence NOx production by the engine by modifying an engine operating parameter, based on a calculated target amount of NOx at the inlet of the first SCR device.
    Type: Grant
    Filed: October 5, 2018
    Date of Patent: March 23, 2021
    Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: Yue-Yun Wang, Giuseppe Mazzara Bologna, Vincenzo Alfieri
  • Publication number: 20210079437
    Abstract: The disclosure discloses a method to elevate the amount of steviol glycosides remained in the recrystallization mother liquor of Stevia extract, and belongs to the field of modification and extraction of natural compounds. The disclosure adopts lactase for highly specific catalytic hydrolysis of stevioside to convert stevioside into rubusoside which usually can only be obtained from leaves of Rubus suavissimus S. Lee; and meanwhile, after stevioside in the mother liquor glycosides is converted, since the polarity difference between rubusoside and rebaudioside A is far larger than the polarity difference between stevioside and rebaudioside A, rebaudioside A is more easily separated out of the mother liquor glycosides. A technology provided by the disclosure is also applicable to value increment of mixed steviol glycosides containing stevioside and is beneficial for separating out rebaudioside A from the mixed steviol glycosides.
    Type: Application
    Filed: November 27, 2020
    Publication date: March 18, 2021
    Inventors: Yongmei XIA, Zhuoyu ZHOU, Ye FAN, Xueyi HU, Yun FANG, Xiang LIU, Haijun WANG, Jing WU, Fei XU
  • Publication number: 20210082349
    Abstract: An electronic device comprises a controller. The controller is configured to provide a first signal to a display of the electronic device to turn off the display. The controller is also configured to provide a second signal to the display to alter a gate source voltage of a drive transistor coupled to a light emitting diode (LED) of a pixel of the display while the display is turned off.
    Type: Application
    Filed: March 27, 2018
    Publication date: March 18, 2021
    Inventors: Junhua Tan, Kingsuk Brahma, Jie Won Ryu, Shengkui Gao, Shiping Shen, Majid Gharghi, Hyunwoo Nho, Injae Hwang, Kavinaath Murugan, Sun-II Chang, Chin-Wei Lin, Hyunsoo Kim, Rui Zhang, Jesse Aaron Richmond, Yun Wang, Hung Sheng Lin