Abstract: An information processing system, which determines a partial area used in an erectness determination which determines whether a determination target image is erect based on a determination feature in the partial area in an image having a predetermined format and a position of the partial area in a state in which the image having the predetermined format is erect, includes processor to receive input of a plurality of learning images having the predetermined format, extract area common to the plurality of learning images in an erect state as a candidate for the partial area, determine common area reliability indicative of a degree to which the candidate for the partial area is suitable as the partial area used in the erectness determination, and determine the partial area used in the erectness determination from the candidate for the partial area, based on the common area reliability.

Abstract: A protective element includes a fuse element, a movable member, a concave member, and a press. The fuse member includes, a first end, a second end, and a cut part positioned between the first end and the second end. The fuse element is energized in a first direction from the first end to the second end. The movable member and the concave member are disposed facing each other such that the cut part is interposed therebetween. The press applies a force to the movable member in a pressing direction in which a distance between the movable member and the concave member shortens. At a temperature at or above a softening temperature of the fuse element, the cut part is cut by the force of the press.

Abstract: A polishing method of polishing a substrate while preventing coarse particles from being discharged onto a polishing pad is disclosed. In this polishing method, a substrate is brought into sliding contact with a polishing pad while a polishing liquid, which has passed through a filter, is supplied onto the polishing pad. The polishing method includes: passing the polishing liquid through the filter while increasing a physical quantity of the polishing liquid until the physical quantity reaches a predetermined set value, the physical quantity being one of flow rate and pressure of the polishing liquid; and polishing the substrate W on the polishing pad while supplying the polishing liquid that has passed through the filter onto the polishing pad.

Abstract: A method for designing anti-reflective structure in which plurality of nanostructures formed of projected portions on substrate surface are provided at intervals equal to or less than visible light wavelength, in order to reduce chroma (?(a*2+b*2)) of reflected light with respect to white light to as close to zero as possible, average height of nanostructures from flat portion of substrate surface is 180 nm or greater and 290 nm or less; and filling rate of nanostructures, i.e., ratio of area of bottom surface of nanostructures to area of substrate surface in plan view of anti-reflective structure is defined, in terms of relationship between filling rate and chroma (?(a*2+b*2)) of reflected light from anti-reflective structure with respect to white light, so as to fall within range of ±5% of filling rate at which chroma takes on minimum value.

Abstract: A polishing method of polishing a substrate while preventing coarse particles from being discharged onto a polishing pad is disclosed. In this polishing method, a substrate is brought into sliding contact with a polishing pad while a polishing liquid, which has passed through a filter, is supplied onto the polishing pad. The polishing method includes: passing the polishing liquid through the filter while increasing a physical quantity of the polishing liquid until the physical quantity reaches a predetermined set value, the physical quantity being one of flow rate and pressure of the polishing liquid; and polishing the substrate W on the polishing pad while supplying the polishing liquid that has passed through the filter onto the polishing pad.

Abstract: An optical member, which includes: a first optical transparent layer having convex-concave shapes, and being transparent to visible light; a wavelength-selective reflective layer, which is formed on the convex-concave shapes of the first optical transparent layer, and is configured to selectively reflect certain wavelengths of infrared light; and a second optical transparent layer formed on the wavelength-selective reflective layer, wherein the wavelength-selective reflective layer includes at least an amorphous high-refractive-index layer, a metal layer, and a crystalline high-refractive-index layer in contact with the second optical transparent layer.

Abstract: An optical member, which includes: a first optical transparent layer having convex-concave shapes, and being transparent to visible light; a wavelength-selective reflective layer, which is formed on the convex-concave shapes of the first optical transparent layer, and is configured to selectively reflect certain wavelengths of infrared light; and a second optical transparent layer formed on the wavelength-selective reflective layer, wherein the wavelength-selective reflective layer includes at least an amorphous high-refractive-index layer, a metal layer, and a crystalline high-refractive-index layer in contact with the second optical transparent layer.

Abstract: A method for designing anti-reflective structure in which plurality of nanostructures formed of projected portions on substrate surface are provided at intervals equal to or less than visible light wavelength, in order to reduce chroma (?(a*2+b*2)) of reflected light with respect to white light to as close to zero as possible, average height of nanostructures from flat portion of substrate surface is 180 nm or greater and 290 nm or less; and filling rate of nanostructures, i.e., ratio of area of bottom surface of nanostructures to area of substrate surface in plan view of anti-reflective structure is defined, in terms of relationship between filling rate and chroma (?(a*2+b*2)) of reflected light from anti-reflective structure with respect to white light, so as to fall within range of ±5% of filling rate at which chroma takes on minimum value.

Abstract: A sensor apparatus includes a first member, a second member, and a detection mechanism. The second member is relatively movable in a first direction with respect to the first member. The detection mechanism includes an elastic member arranged between the first member and the second member, a support that is provided between the first member and the elastic member and forms an air layer between the first member and the elastic member, the air layer having a thickness changed by an elastic deformation of the elastic member, and an electrode pair that forms a plurality of capacitances including a capacitance component changed in accordance with a change of the thickness of the air layer. The detection mechanism outputs a detection signal on a movement amount of the second member in the first direction based on a change of a combined capacitance of the electrode pair.

Abstract: A conductive optical device includes: a base; a plurality of structures supported by the base, and arranged at a pitch that is equal to or shorter than a wavelength of visible light; and a transparent conductive layer provided on a surface-side of the structures, and having a shape that follows along a surface shape of the structures. The following relational expressions are satisfied: y??1.785x+3.238 y?0.686 where x is a refractive index and y is an aspect ratio, of each of the structures.

Abstract: A polishing method of polishing a substrate while preventing coarse particles from being discharged onto a polishing pad is disclosed. In this polishing method, a substrate is brought into sliding contact with a polishing pad while a polishing liquid, which has passed through a filter, is supplied onto the polishing pad. The polishing method includes: passing the polishing liquid through the filter while increasing a physical quantity of the polishing liquid until the physical quantity reaches a predetermined set value, the physical quantity being one of flow rate and pressure of the polishing liquid; and polishing the substrate W on the polishing pad while supplying the polishing liquid that has passed through the filter onto the polishing pad.

Abstract: A method dresses a polishing member with a diamond dresser having diamond particles arranged on a surface thereof. The method includes determining dressing conditions by performing a simulation of a distribution of a sliding distance of the diamond dresser on a surface of the polishing member, and dressing the polishing member with the diamond dresser under the determined dressing conditions. The simulation includes calculating the sliding distance corrected in accordance with a depth of the diamond particles thrusting into the polishing member.

Abstract: A steel plate quality assurance system according to a steel plate manufacturing line, and facilities thereof are provided.

Abstract: The present invention provides a steel plate quality assurance system and facilities thereof, wherein the steel plate quality assurance system measures, with a steel plate manufacturing line including a finishing mill of a steel plate manufacturing line, and accelerated cooling equipment disposed on the downstream side of the finishing mill in the advancing direction of the steel plate manufacturing line, temperature of at least the whole area of the upper surface of a steel plate, or the whole area of the lower surface of a steel plate to perform quality assurance, and includes temperature measurement means; temperature analysis means; and mechanical property determining means.

Abstract: A sensor apparatus includes: a display cover including an operation area that is pressed by an operator and a circumferential area located on the circumference of the operation area; a frame including an opening covered by the operation area and a fixing portion that fixes the circumferential area; a touch panel that is supported by the display cover to be positioned at the opening and detects a position at which the operator comes into contact with the operation area; and a pressure-sensitive sensor that is provided between the display cover and the frame, includes a first electrode and a second electrode opposed to the first electrode, and detects a pressing force with respect to the operation area based on a change of a capacitance between the first electrode and the second electrode that corresponds to a deflection amount of the display cover.

Abstract: A method dresses a polishing member with a diamond dresser having diamond particles arranged on a surface thereof. The method includes determining dressing conditions by performing a simulation of a distribution of a sliding distance of the diamond dresser on a surface of the polishing member, and dressing the polishing member with the diamond dresser under the determined dressing conditions. The simulation includes calculating the sliding distance corrected in accordance with a depth of the diamond particles thrusting into the polishing member.

Abstract: A sensor apparatus includes: a sensor panel that includes an input operation surface and is configured to detect positional coordinates of a detection object that comes into contact with the input operation surface; a casing; and a pressure-sensitive sensor that includes a first electrode fixed on the sensor panel side, a second electrode fixed on the casing side, and an elastic member that is provided between the sensor panel and the casing and elastically supports the sensor panel with respect to the casing, includes, between the first electrode and the second electrode, a first area formed with a first capacitance and a second area formed with a second capacitance larger than the first capacitance, and is configured to detect a pressing force input to the input operation surface as a change in a capacitance between the first electrode and the second electrode.

Abstract: A method dresses a polishing member with a diamond dresser having diamond particles arranged on a surface thereof. The method includes determining dressing conditions by performing a simulation of a distribution of a sliding distance of the diamond dresser on a surface of the polishing member, and dressing the polishing member with the diamond dresser under the determined dressing conditions. The simulation includes calculating the sliding distance corrected in accordance with a depth of the diamond particles thrusting into the polishing member.

Abstract: An optical recording medium includes: an inorganic recording layer; and a protective layer including a composite oxide containing an indium oxide provided on at least one surface of the inorganic recording layer, wherein the composite oxide is represented by the formula [(In2O3)1-X(A)X], wherein A is cerium oxide or gallium oxide and X satisfies a range of 0.15?X?0.75.

Abstract: A write-once optical recording medium includes an inorganic recording layer and a protective layer provided on at least one surface of the inorganic recording layer. This protective layer contains indium oxide and tin oxide as main components.