Abstract: An obstacle avoidance method for a self-moving robot includes: receiving, by the self-moving robot, an operation instruction for ignoring a specified obstacle; detecting an obstacle of a same type as the specified obstacle in a region range labeled with the specified obstacle; and keeping cleaning without performing an obstacle avoidance operation on the obstacle of the same type.

Abstract: A system includes one or more processors that obtain sensor data; characterize the sensor data, obtaining one or more analysis results from the characterized sensor data, validate the one or more analysis results based on feedback data, based on the one or more analysis results and the validation thereof, create an operational design domain, and generate an operational protocol based on the operational design domain. The generating of the operational protocol includes translating the operational design domain into executable commands directed to an ego vehicle.

Abstract: A ranging method includes determining a first distance of the object to be measured relative to the self-mobile robot, where content in the first image comprises at least the object and a surface on which the object is located; selecting a point located on the object from the first image as a 5 reference point; determining initial parallax based on the first distance; and determining a region of interest from a second image collected by a second image collection apparatus, and determining a location of the reference point from the region of interest as a first target point; determining a second target point from the region of interest based on the first target point, and determining an actual parallax distance between the first image collection apparatus and the second image collection apparatus; and calculating depth information of the object based on the actual parallax distance.

Abstract: A control method of a multi-stage etching process and a processing device using the same are provided. The control method of the multi-stage etching process includes the following step S. A stack information of a plurality of hard mask layers is set. An etching target condition is set. Through a machine learning model, a parameter setting recipe of the hard mask layers is generated under the etching target condition. The machine learning model is trained based on the stack information of the hard mask layers, a plurality of process parameters and a process result.

Abstract: Disclosed are a method and apparatus for detecting a near-field object, a medium and an electronic device. In the present disclosure, the characteristics of an automatic exposure apparatus before and after light supplement of a light supplement lamp are used, two images are shot in the same direction before and after light supplement of the light supplement lamp, and whether the near-field object exists is determined through comparison of the two images. Without adding additional apparatuses, the task of discovering the near-field objects by a self-walking device is completed by using the existing apparatus, and the collision between the self-walking device and the near-field object is avoided.

Abstract: The present disclosure provides a method for displaying a pose of a robot in a three-dimensional map, an apparatus, a device, and a storage medium. The method includes: acquiring a three-dimensional map of a space in which the robot is located; acquiring a two-dimensional map constructed by the robot; matching the three-dimensional map with the two-dimensional may constructed by the robot to obtain a correspondence between the three-dimensional map and the two-dimensional map constructed by the robot; acquiring a nose of the robot on the two-dimensional map constructed by the robot; and displaying a pose of the robot in the three-dimensional map based on the pose of the robot on the two-dimensional map constructed by the robot and the correspondence between the three-dimensional map and the two-dimensional map constructed by the robot.

Abstract: A control method of a multi-stage etching process and a processing device using the same are provided. The control method of the multi-stage etching process includes the following step S. A stack information of a plurality of hard mask layers is set. An etching target condition is set. Through a machine learning model, a parameter setting recipe of the hard mask layers is generated under the etching target condition. The machine learning model is trained based on the stack information of the hard mask layers, a plurality of process parameters and a process result.

Abstract: An obstacle avoidance method for a self-moving robot includes: obtaining and recording, by the self-moving robot, information about an obstacle encountered during traveling, wherein the information about the obstacle includes type information and location information of the obstacle; and receiving, by the self-moving robot, an operation instruction for a specified obstacle, wherein the operation instruction is configured for instructing the self-moving robot, when detecting an obstacle of a same type as the specified obstacle in a region range labeled with the specified obstacle, not to perform an obstacle avoidance operation on the obstacle of the same type.

Abstract: A system includes one or more processors that obtaining data from one or more source. The data includes an ongoing or planned locomotive action and contextual information associated with the locomotive action. The processors also synchronize the data, generate an output comprising textual components, and convert the output. The processors may execute the locomotive action which may include a driving action.

Abstract: A system includes one or more processors that obtain a textual prompt, encode the textual prompt, and obtain candidate sequences of sensor data from different modalities, each sequence including a plurality of sequential frames, each of the candidate sequences being evaluated against the textual prompt based on a contrastive loss.

Abstract: A system includes one or more processors that obtain annotated frames of data. The annotated frames represent or are associated with a locomotive concept and include annotations. The system infers mappings between the annotated frames and concepts associated with locomotion of the vehicle. Each of the mappings correlates a subset of the annotated frames with a concept. The system receives a query for a particular concept, and retrieves, based on the mappings, a particular subset of the annotated frames correlated with the particular concept.

Abstract: A method for fabricating semiconductor device includes the steps of first providing a substrate having a first region and a second region, forming a first bottom barrier metal (BBM) layer on the first region and the second region, forming a first work function metal (WFM) layer on the first BBM layer on the first region and the second region, and then forming a diffusion barrier layer on the first WFM layer.

Abstract: The present invention relates to a process for preparing a catalyst, wherein the process comprises steps of: 1) providing a molecular sieve, adding an active metal promoter into the molecular sieve, and shaping the molecular sieve into a shaped body, 2) placing the shaped body in a fixed bed reactor, 3) dissolving a transition metal salt in a first valence state and a bidentate ligand into a solvent to prepare a solution, 4) passing the solution and ethylene through the fixed bed reactor charged with the shaped body, loading the transition metal onto the molecular sieve through ion exchange, and at the same time the transition metal in the first valence state at least partially being reduced into a transition metal salt in a second valence state by the active metal promoter, wherein the second valence state is lower than the first valence state, so as to obtain the catalyst.

Abstract: A method for fabricating semiconductor device includes the steps of first providing a substrate having a first region and a second region, forming a first bottom barrier metal (BBM) layer on the first region and the second region, forming a first work function metal (WFM) layer on the first BBM layer on the first region and the second region, and then forming a diffusion barrier layer on the first WFM layer.

Abstract: A method for fabricating semiconductor device includes the steps of first providing a substrate having a first region and a second region, forming a first bottom barrier metal (BBM) layer on the first region and the second region, forming a first work function metal (WFM) layer on the first BBM layer on the first region and the second region, and then forming a diffusion barrier layer on the first WFM layer.

Abstract: A method for fabricating semiconductor device includes the steps of first providing a substrate having a first region and a second region, forming a first bottom barrier metal (BBM) layer on the first region and the second region, forming a first work function metal (WFM) layer on the first BBM layer on the first region and the second region, and then forming a diffusion barrier layer on the first WFM layer.

Abstract: The present disclosure provides a photographic exposure method for a self-moving device. The method includes: detecting, based on a preset rule, brightness information of a target region in an image; adjusting a exposure parameter in response to the detected brightness information not meeting a preset condition; and performing, based on the adjusted exposure parameter, exposure in a localized region during image acquisition, the localized region including at least the target region.

Abstract: A method for mining feature information, an apparatus for mining feature information and an electronic device are disclosed. The method includes: determining a usage scenario of a target device; obtaining raw audio data including real scenario data, speech synthesis data, recorded audio data and other media data; generating target audio data of the usage scenario by simulating the usage scenario based on the raw audio data; and obtaining feature information of the usage scenario by performing feature extraction on the target audio data.

Abstract: An array substrate, a method for manufacturing an array substrate, a display panel and a display device are provided. The array substrate includes a substrate; an insulating layer arranged at a side of the substrate, where the insulating layer is provided with an opening, the insulating layer includes a first area and a second area, a thickness of the first area is less than a thickness of the second area, and the first area is arranged around at least a part of the opening; and a first conductive part arranged at a side of the insulating layer away from the substrate, where an orthographic projection of the first conductive part on the substrate and an orthographic projection of the first area on the substrate are at least partially overlapped.

Abstract: An information reading system includes an information reading device and a device-to-be-identified. The information reading device includes a first signal pin, a second signal pin, and a control module, and the device-to-be-identified includes a third signal pin and a ground pin. The control module is configured to, when recognizing that the device-to-be-identified is inserted, control the first signal pin to connect to the third signal pin of the device-to-be-identified, and control the second signal pin to connect to the ground pin, to form a first single-wire path, and attempt to read anti-counterfeiting information stored in the device-to-be-identified by using the first single-wire path.