Substrate transfer chamber
Embodiments of substrate transfer chambers are provided herein. In some embodiments, a substrate transfer chamber includes a body having an interior volume, wherein a bottom portion of the body includes a first opening; an adapter plate coupled to the bottom portion of the body to couple the substrate transfer chamber to a load lock chamber of a substrate processing system; wherein the adapter plate includes a second opening aligned with the first opening to fluidly couple the interior volume with an inner volume of the load lock chamber; a cassette support disposed in the interior volume to support a substrate cassette; and a lift actuator coupled to the cassette support to lower or raise the substrate cassette into or out of the load lock chamber.
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This application claims benefit of U.S. provisional patent application Ser. No. 62/078,399, filed Nov. 11, 2014, which is herein incorporated by reference in its entirety.
FIELDEmbodiments of the present disclosure generally relate to substrate processing equipment, and more specifically, methods and apparatus for handling a substrate.
BACKGROUNDDuring processing of a substrate in for example, microelectronic device fabrication, the substrate may be transferred to multiple chambers to perform various processes. The substrate is in a vacuum during processing and at atmospheric pressure during transfer. Oxidation forms on the substrates upon leaving the vacuum environment and returning to atmospheric pressure. As such, the substrate undergoes a degas and/or preclean procedure to remove any oxidation prior to any further processing, resulting in processing delays.
Therefore, the inventors have provided improved methods and apparatus for substrate transfer.
SUMMARYEmbodiments of substrate transfer chambers are provided herein. In some embodiments, a substrate transfer chamber includes a body having an interior volume, wherein a bottom portion of the body includes a first opening; an adapter plate coupled to the bottom portion of the body to couple the substrate transfer chamber to a load lock chamber of a substrate processing system; wherein the adapter plate includes a second opening aligned with the first opening to fluidly couple the interior volume with an inner volume of the load lock chamber; a cassette support disposed in the interior volume to support a substrate cassette; and a lift actuator coupled to the cassette support to lower or raise the substrate cassette into or out of the load lock chamber.
In some embodiments, a vacuum chamber includes a body having an interior volume, wherein a bottom portion of the body includes a first opening; an adapter plate coupled to the bottom portion of the body to couple the vacuum chamber to a load lock chamber of a substrate processing system; wherein the adapter plate includes a second opening aligned with the first opening to fluidly couple the interior volume with an inner volume of the load lock chamber; a cassette support disposed in the interior volume to support a substrate cassette; and a lift actuator coupled to the cassette support to lower or raise the substrate cassette into or out of the load lock chamber.
In some embodiments, a substrate processing system includes a central transfer chamber; one or more load lock chambers coupled to the central transfer chamber; and a substrate transfer chamber coupled to one of the one or more load lock chambers. The substrate transfer chamber includes a body having an interior volume, wherein a bottom portion of the body includes a first opening; an adapter plate coupled to the bottom portion of the body to couple the substrate transfer chamber to a load lock chamber of a substrate processing system; wherein the adapter plate includes a second opening aligned with the first opening to fluidly couple the interior volume with an inner volume of the load lock chamber; a cassette support disposed in the interior volume to support a substrate cassette; and a lift actuator coupled to the cassette support to lower or raise the substrate cassette into or out of the load lock chamber.
Other and further embodiments of the present disclosure are described below.
Embodiments of the present disclosure, briefly summarized above and discussed in greater detail below, can be understood by reference to the illustrative embodiments of the disclosure depicted in the appended drawings. However, the appended drawings illustrate only typical embodiments of the disclosure and are therefore not to be considered limiting of scope, for the disclosure may admit to other equally effective embodiments.
To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. The figures are not drawn to scale and may be simplified for clarity. Elements and features of one embodiment may be beneficially incorporated in other embodiments without further recitation.
DETAILED DESCRIPTIONEmbodiments of the present disclosure generally relate to methods and apparatus for transferring a substrate. Embodiments of the inventive apparatus may include a substrate transfer chamber that advantageously mounts directly to a load lock chamber of a substrate processing tool, thus minimizing any negative impact on the floor space occupied by the substrate processing tool and avoiding unnecessary and costly modification of existing processing systems. The inventive substrate cassette of the present disclosure advantageously allows for the transport of a substrate in a vacuum, thus avoiding any oxidation that may occur on the substrate when moving from a vacuum environment to atmosphere.
In some embodiments, the multi-chamber processing system 100 may generally comprise a vacuum-tight processing platform (processing platform 102), a factory interface 104, and a controller 140. The processing platform 102 may include a plurality of process chambers 190A-F and at least one load lock chamber 184 (two shown) that are coupled to a transfer chamber 188. A substrate transfer robot 106 (described below with respect to
The factory interface 104 is coupled to the transfer chamber 188 via the load lock chambers 184. In some embodiments, each of the load lock chambers 184 may include a first port 123 coupled to the factory interface 104 and a second port 125 coupled to the transfer chamber 188. The load lock chambers 184 may be coupled to a pressure control system which pumps down and vents the load lock chambers 184 to facilitate passing the substrate between the vacuum environment of the transfer chamber 188 and the substantially ambient (e.g., atmospheric) environment of the factory interface 104.
In some embodiments, the factory interface 104 comprises at least one docking station 183 and at least one factory interface robot 185 (one shown) to facilitate transfer of substrates from the factory interface 104 to the processing platform 102 for processing through the load lock chambers 184. The docking station 183 is configured to accept one or more (four shown) front opening unified pods (FOUPs) 187A-D. Optionally, one or more metrology stations (not shown) may be coupled to the factory interface 104 to facilitate measurement of the substrate from the FOUPs 187A-D. The factory interface robot 185 disposed in the factory interface 104 is capable of linear and rotational movement (arrows 182) to shuttle cassettes of substrates between the load lock chambers 184 and the one or more FOUPs 187A-D.
In some embodiments, the inventive substrate transfer chamber 200 is disposed on a load lock chamber 184 to facilitate transfer of a substrate to or from the processing platform 102 while keeping the substrate in a vacuum atmosphere at all times. The processing platform, and the substrate transfer chamber, may be configured to process and handle substrates of varying sizes, including round wafers (e.g., semiconductor wafers) such as 150 mm, 200 mm, 300 mm, 450 mm, or the like.
The substrate transfer chamber 200 further includes a cassette support 210 to support a substrate cassette 300 (described below with respect to
In some embodiments, the substrate transfer chamber 200 may optionally include a seal plate 250 having a shape corresponding to the lower surface of the substrate transfer chamber 200. The seal plate 250 may be placed on the lower surface of the chamber to block the opening 206 to allow the multi-chamber processing system 100 and the load lock chamber 184 to function normally without use of the substrate transfer chamber 200. The seal plate 250 may be secured to the lower surface via any conventional means such as, for example, screws or the like. A seal may be disposed between the seal plate 250 and the lower surface of the substrate transfer chamber 200 to prevent any vacuum leaks during normal operation of the load lock chamber 184.
The load lock chamber 184 includes a first opening 232, a second opening 234, a pedestal 236, and a lift hoop 238. The first opening 232 facilitates interfacing with the docking station 183 to allow the factory interface robot 185 to insert or remove a substrate from the load lock chamber 184. The second opening 234 facilitates interfacing with the processing platform 102 to allow the substrate transfer robot 106 to insert or remove a substrate from the load lock chamber 184. As shown in
The locking mechanism 306 may include a locking plate 308 disposed on the upper portion 302 and having a plurality of arms 310 extending from a center of the locking plate 308. Two of the plurality of arms 310 include upwardly extending tabs 312 that are perpendicular to the locking plate 308. A plurality of locking pins 313 extend through ends of the plurality of arms 310 and into a corresponding plurality of slots 314 formed in both the upper portion 302 and the lower portion 304. Each of the plurality of locking pins 313 includes a reduced diameter midsection whose diameter is less than a width of each slot 314 to allow the locking pin 313 to slide along the slot 314. Both ends of each locking pin 313 have a diameter that is greater than a width of the slot to prevent the locking pin 313 from passing through the slot 314. Each of the plurality of slots 314 includes an elongated portion 316 and a hole 318 at one end of the elongated portion 316. A thickness of the elongated portion 316 is less than a diameter of the hole 318.
In a locked position (e.g., when the upper portion 302 and the lower portion 304 are coupled), each locking pin 313 extends through the elongated portion 316. Because the ends of the locking pins 313 are too large to pass through the elongated portion 316, the upper portion 302 and the lower portion 304 are sandwiched together between the enlarged ends. In an unlocked position, each locking pin 313 extends through the hole 318. The ends of the locking pin 313 are sized to allow the locking pin 313 to pass through the holes 318. When each locking pin 313 extends through the hole 318, the upper and lower portions 302, 304 can be separated. To ensure that the locking plate 308 remains coupled to the upper portion 302, each of the plurality of arms 310 includes a protrusion 320 that extends beneath a corresponding tab 322 formed on the upper portion 302. As shown in
Referring to
In some embodiments, the upper portion 302 may include a load distribution plate 326 coupled to an upper surface of the upper portion 302 to evenly distribute a downwardly projecting force by the cassette support 210 pressing the upper portion 302 against the lower portion 304 for coupling. The load distribution plate 326 is coupled to the upper portion 302 via a plurality of fastening elements 330 (e.g., bolts, screws, or the like). In some embodiments, the upper portion 302 may further include a plurality of locating pins 328 to interface with a corresponding plurality of holes in the lower portion 304 to correctly align the upper and lower portions 302, 304 during coupling.
As shown in
In operation, the substrate cassette 300 is inserted onto the collar 212 of the substrate transfer chamber 200. When the door 208 is closed, the vacuum source 230 coupled to the load lock chamber 184 evacuates the interior volume 204 and the inner volume 205. The lift actuator 218 then lowers the substrate cassette 300 onto one of the lift hoop 238 (if the lift hoop 238 is raised) or the pedestal 236 (if the lift hoop 238 is lowered). If the substrate cassette 300 is lowered onto the raised lift hoop 238, the lift hoop 238 is lowered until the substrate cassette 300 rests on the pedestal 236. The locking device 220 is subsequently activated to rotate the locking mechanism 306 towards the unlocked position. Next, the lift actuator 218 lifts the upper portion 302 up, leaving the lower portion 304 resting on the pedestal 236. A substrate 502 is either placed in or removed from the substrate cassette 300. Subsequently, the lift actuator 218 lowers the upper portion 302 onto the lower portion 304 and forces the two portions together. The load distribution plate 326 ensures that the force is evenly distributed about the substrate cassette 300. The locking device 220 then rotates the locking mechanism towards the locked position, thus locking the upper and lower portions 302, 304 together. After the interior volume 204 and the inner volume 205 return to atmosphere, the lift actuator 218 lifts the substrate cassette 300 back up into the substrate transfer chamber 200 for removal.
The multi-cassette carrying case 600 further includes a plurality of cassette holders to hold one or more substrate cassettes 300. The cassette holders include a plurality of ledges 612 on opposite sides of the inner volume 704 to support one or more substrate cassettes 300. To ensure that the substrate cassettes 300 do not move during transport, the plurality of cassette holders may further include a plurality of snap locks 702 disposed at a rear portion of the inner volume 704. To place a substrate cassette 300 in the multi-cassette carrying case 600, the substrate cassette 300 is placed on a set of ledges 612 and pushed towards the corresponding snap lock 702. When the substrate cassette 300 contacts the snap lock 702, the substrate cassette 300 is pushed further so that the snap lock 702 deforms outwardly and subsequently latches onto the substrate cassette 300, thus locking the substrate cassette 300 in place.
In some embodiments, the multi-cassette carrying case 600 may include a vacuum port 616 and a vent port 618 to allow coupling of the multi-cassette carrying case to a vacuum source. In embodiments in which the inner volume 704 of the multi-cassette carrying case 600 is evacuated, the door 608 may include a seal around the periphery of the door to prevent any vacuum leaks during transport. In some embodiments, the multi-cassette carrying case 600 may also include a pressure monitoring device 620 to monitor and display a pressure of the inner volume 704. Alternatively or in combination, the vacuum port 616, vent port 618, or another port (not shown), may be coupled to a gas source, for example an inert gas source, to provide an inert gas to the interior of the multi-cassette carrying case.
Referring to
Returning to
While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope thereof.
Claims
1. A substrate transfer chamber, comprising:
- a body having an interior volume, wherein a bottom portion of the body includes a first opening;
- an adapter plate coupled to the bottom portion of the body to couple the substrate transfer chamber to a load lock chamber of a substrate processing system; wherein the adapter plate includes a second opening aligned with the first opening to fluidly couple the interior volume with an inner volume of the load lock chamber;
- a cassette support disposed above the adapter plate in the interior volume of the body to support a substrate cassette; and
- a lift actuator coupled to the cassette support to lower or raise the substrate cassette into or out of the load lock chamber, wherein the lift actuator is disposed above the adapter plate.
2. The substrate transfer chamber of claim 1, wherein the body further comprises a door to selectively seal off the interior volume.
3. A substrate transfer chamber, comprising:
- a body having an interior volume, wherein a bottom portion of the body includes a first opening;
- an adapter plate coupled to the bottom portion of the body to couple the substrate transfer chamber to a load lock chamber of a substrate processing system;
- wherein the adapter plate includes a second opening aligned with the first opening to fluidly couple the interior volume with an inner volume of the load lock chamber;
- a cassette support disposed in the interior volume to support a substrate cassette;
- a lift actuator coupled to the cassette support to lower or raise the substrate cassette into or out of the load lock chamber;
- a collar having protrusions to interface with a corresponding mounting apparatus on the substrate cassette to support the substrate cassette; and
- a locking device to lock and unlock a locking mechanism of the substrate cassette.
4. The substrate transfer chamber of claim 3, wherein the locking device includes a first piston actuator and a second piston actuator, wherein the first piston actuator is perpendicularly arranged to the second piston actuator so that the first piston actuator rotates the locking mechanism in a first direction and the second piston actuator rotates the locking mechanism in a second direction opposite the first direction.
5. The substrate transfer chamber of claim 4, wherein the locking device further comprises a protruding element onto which a latch of the locking mechanism latches onto to hold the substrate cassette on the cassette support.
6. The substrate transfer chamber of claim 2, wherein the door includes a seal disposed around a periphery of the door to prevent a vacuum leak from the interior volume.
7. The substrate transfer chamber of claim 1, further comprising:
- a seal plate configured to rest on the bottom portion to block the first opening to seal off the load lock chamber from the substrate transfer chamber.
8. The substrate transfer chamber of claim 1, wherein the adapter plate includes a first seal at a first interface between the adapter plate and the substrate transfer chamber and a second seal at a second interface between the adapter plate and the load lock chamber.
9. The substrate transfer chamber of claim 1, wherein the substrate transfer chamber is a vacuum chamber.
10. The substrate transfer chamber of claim 9, wherein the body further comprises a door to selectively seal off the interior volume.
11. The substrate transfer chamber of claim 3, wherein the substrate transfer chamber is a vacuum chamber.
12. The substrate transfer chamber of claim 4, wherein the substrate transfer chamber is a vacuum chamber.
13. The substrate transfer chamber of claim 5, wherein the substrate transfer chamber is a vacuum chamber.
14. The substrate transfer chamber of claim 10, wherein door includes a seal disposed around a periphery of the door to prevent a vacuum leak from the interior volume.
15. The substrate transfer chamber of claim 9, further comprising:
- a seal plate configured to rest on the bottom portion to block the first opening.
16. The substrate transfer chamber of claim 9, wherein the adapter plate includes a first seal at a first interface between the adapter plate and the vacuum chamber and a second seal at a second interface between the adapter plate and the load lock chamber.
17. A substrate processing system, comprising:
- a central transfer chamber;
- one or more load lock chambers coupled to the central transfer chamber; and
- the substrate transfer chamber of claim 1 coupled to one of the one or more load lock chambers.
18. The substrate processing system of claim 17, further comprising:
- a vacuum source coupled to the load lock chamber to evacuate the inner volume of the load lock chamber and the interior volume of the substrate transfer chamber.
19. The substrate processing system of claim 17, further comprising:
- a seal plate configured to rest on the bottom portion to block the first opening to seal off the load lock chamber from the substrate transfer chamber.
20. The substrate processing system of claim 17, wherein the adapter plate includes a first seal at a first interface between the adapter plate and the substrate transfer chamber and a second seal at a second interface between the adapter plate and the load lock chamber.
21. A substrate transfer chamber, comprising:
- a body having an interior volume, wherein a bottom portion of the body includes a first opening;
- an adapter plate coupled to the bottom portion of the body to couple the substrate transfer chamber to a load lock chamber of a substrate processing system;
- wherein the adapter plate includes a second opening aligned with the first opening to fluidly couple the interior volume with an inner volume of the load lock chamber;
- a cassette support disposed in the interior volume to support a substrate cassette, wherein the cassette support includes protrusions to interface with a corresponding mounting apparatus on the substrate cassette to support the substrate cassette; and
- a lift actuator coupled to the cassette support to lower or raise the substrate cassette into or out of the load lock chamber, wherein the lift actuator is disposed above the adapter plate.
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Type: Grant
Filed: Nov 5, 2015
Date of Patent: Jul 9, 2019
Patent Publication Number: 20160133494
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Sriskantharajah Thirunavukarasu (Singapore), Eng Sheng Peh (Singapore), Srinivas D. Nemani (Sunnyvale, CA), Arvind Sundarrajan (Singapore), Avinash Avula (Sacramento, CA), Ellie Y. Yieh (San Jose, CA)
Primary Examiner: Glenn F Myers
Application Number: 14/933,635
International Classification: H01L 21/673 (20060101); H01L 21/677 (20060101); H01L 21/67 (20060101);