APPARATUS AND METHODS FOR USING A POLISHING TAPE CASSETTE
Methods and apparatus are provided for housing a polishing tape adapted to polish a substrate. The invention includes a cassette comprising a body portion; and a head portion, wherein the head portion includes: a pair of guide walls; one or more supply rollers positioned between the guide walls in the head portion; and wherein the guide walls are adapted to guide a polishing tape housed in the body over the one or more supply rollers. Numerous other aspects are provided.
Latest APPLIED MATERIALS, INC. Patents:
The present application claims priority to U.S. Provisional Patent Application No. 61/046,453, filed Apr. 21, 2008, and entitled, “APPARATUS AND METHODS FOR USING A POLISHING TAPE CASSETTE” (Attorney Docket No. 11533/L), which is hereby incorporated herein by reference in its entirety for all purposes.
CROSS-REFERENCE TO RELATED APPLICATIONSThe present application is also related to the following commonly-assigned, co-pending U.S. patent applications, each of which is hereby incorporated herein by reference in its entirety for all purposes:
U.S. patent application Ser. No. 11/299,295 filed on Dec. 9, 2005 and entitled “METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE” (Attorney Docket No. 10121);
U.S. patent application Ser. No. 11/298,555 filed on Dec. 9, 2005 and entitled “METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE” (Attorney Docket No. 10414);
U.S. patent application Ser. No. 11/693,695 filed on Mar. 29, 2007 and entitled “METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE” (Attorney Docket No. 10560);
U.S. Patent Application Ser. No. 60/939,351, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE USING AN INFLATABLE POLISHING WHEEL” (Attorney Docket No. 10674/L);
U.S. Patent Application Ser. No. 60/939,353, filed May 21, 2007, entitled “METHODS AND APPARATUS TO CONTROL SUBSTRATE BEVEL AND EDGE POLISHING PROFILES OF EPITAXIAL FILMS” (Attorney Docket No. 11417/L);
U.S. Patent Application Ser. No. 60/939,219, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE USING A SHAPED BACKING PAD” (Attorney Docket No. 11483/L);
U.S. Patent Application Ser. No. 60/939,342, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR REMOVAL OF FILMS AND FLAKES FROM THE EDGE OF BOTH SIDES OF A SUBSTRATE USING BACKING PADS” (Attorney Docket No. 11564/L);
U.S. Patent Application Ser. No. 60/939,350, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR USING A BEVEL POLISHING HEAD WITH AN EFFICIENT TAPE ROUTING ARRANGEMENT” (Attorney Docket No. 11565/L);
U.S. Patent Application Ser. No. 60/939,344, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR USING A ROLLING BACKING PAD FOR SUBSTRATE POLISHING” (Attorney Docket No. 11566/L);
U.S. Patent Application Ser. No. 60/939,333, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR HIGH PERFORMANCE SUBSTRATE BEVEL AND EDGE POLISHING IN SEMICONDUCTOR MANUFACTURE” (Attorney Docket No. 11809/L);
U.S. Patent Application Ser. No. 60/939,212, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR IDENTIFYING A SUBSTRATE EDGE PROFILE AND ADJUSTING THE PROCESSING OF THE SUBSTRATE ACCORDING TO THE IDENTIFIED EDGE PROFILE” (Attorney Docket No. 11695/L);
U.S. Patent Application Ser. No. 60/99,228, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE BY SUBSTRATE VIBRATION” (Attorney Docket No. 11952/L); and
U.S. Patent Application Ser. No. 60/939,209, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR CONTROLLING THE SIZE OF AN EDGE EXCLUSION ZONE OF A SUBSTRATE” (Attorney Docket No. 11987/L).
FIELD OF THE INVENTIONThe present invention relates generally to electronic device processing, and more particularly to methods and apparatus for using a polishing tape cassette.
BACKGROUND OF THE INVENTIONDuring electronic device manufacturing, undesirable materials may build up on the edge of a substrate. The materials may include dielectrics, photoresist and metals used in IC manufacture. Therefore, it may be desirable to clean or polish the bevel and outer edge of the substrate to remove these materials to prepare the substrate for electronic (e.g. semiconductor) device manufacturing. Typically an abrasive polishing tape is applied with some degree of force to polish bevels on the edge of the substrate. Generally contact between the abrasive polishing and portions of the substrate reserved for device fabrication (‘device region’) is avoided. Typically, a buffer zone or ‘edge exclusion zone,’ is provided between the device region and the edge of the substrate to protect the device region. Systems, methods and apparatus are needed for efficiently routing and aligning the abrasive tape.
SUMMARY OF THE INVENTIONIn some aspects of the invention, a cassette for housing a polishing tape adapted to polish a substrate. The cassette includes a body portion; and a head portion, wherein the head portion includes: a pair of guide walls; one or more supply rollers positioned between the guide walls in the head portion; and wherein the guide walls are adapted to guide a polishing tape housed in the body over the one or more supply rollers.
In another aspect of the invention, a system for polishing an edge of a substrate is provided. The system includes a substrate support adapted to support a substrate; a polishing head adapted to press a polishing tape against an edge of the substrate; and a cassette for housing the polishing tape, the cassette including: a body portion; and
a head portion, wherein the head portion includes: a pair of guide walls; one or more supply rollers positioned between the guide walls in the head portion; and wherein the guide walls are adapted to guide the polishing tape housed in the body over the one or more supply rollers.
In another aspect of the invention, a method is provided. The method includes providing a supply spool including a length of polishing tape; routing the length of polishing tape over a supply roller positioned between two walls in a head portion of a cassette; and providing a take-up spool adapted to receive the length of polishing tape from the supply roller, wherein the supply spool and take-up spool are housed in a body portion of the cassette.
Other features and aspects of the present invention will become more fully apparent from the following detailed description, the appended claims and the accompanying drawings.
The present invention provides improved methods and apparatus for cleaning and/or polishing an edge of a substrate, for example, before fabrication processes (e.g. deposition and etching processes), are performed. One method of cleaning and polishing a substrate edge (or notch) includes applying an abrasive film or tape (“polishing tape”) to the substrate edge, and moving the polishing tape relative to the substrate edge, while the substrate is fixed in a particular position. The force, or pressure, applied to the polishing tape while contacting the substrate edge, as well as the degree of contact between the polishing tape and the substrate edge, may contribute to polishing efficiency. Another factor that may contribute to polishing efficiency is the degree of movement of the polishing tape relative to the substrate edge. In some embodiments, the relative movement may be provided by advancing the polishing tape over a surface of the substrate edge. However, the degree of relative movement between the polishing tape and the substrate edge may be further increased by moving the substrate as the polishing tape is advanced over the surface of the substrate edge, thereby increasing the polishing efficiency and the cost-effectiveness thereof.
In some embodiments the polishing tape may be supplied to the substrate edge via a supply spool, while the used or worn polishing tape may be routed to a take-up spool. Both the supply spool and the take-up spool may be housed in a cassette. The cassette may also include one or more rotatable rollers, positioned between the supply and the take-up spools, to aide in routing or guiding/aligning the polishing tape through the cassette. In conventional tape routing systems, the rollers may be flange rollers or crown rollers, for example. In conventional systems using flange rollers, the flanges may prevent the polishing tape from migrating off of the rollers. In conventional systems using crown rollers, the crown roller is convex in shape and may have a center diameter that is the largest diameter, and the crown roller is symmetric from that center point. In conventional systems, the polishing tape may tend to stay centered over the larger center diameter of the crown rollers. However, the mechanical properties of the polishing tape (e.g., high level of flexibility) may make the use of crown and flange rollers problematic. For example, as the flanged roller rotates, the polishing tape may migrate towards one of the flanges. The migration may be due to the normal course of rotation or may be due to a misalignment between the supply spool and the supply roller, for example. When the polishing tape contacts the rotating flange, the polishing tape may bunch up along the rotating flange and subsequently, the polishing tape may fold or roll over itself, thereby impeding the polishing process. Also, the flexible nature of the polishing tape may cause the polishing tape to migrate from the largest center of the crown roller.
Therefore, the present invention provides apparatus and methods for effectively aligning and routing or guiding the polishing tape. The present invention provides a smooth flangeless supply roller having a constant diameter to aide in routing the polishing tape through the cassette, wherein the cassette includes a body portion and a head portion. The inventive supply roller may be positioned in the cassette such that the fixed walls of the cassette head act as guides to prevent the polishing tape from migrating off of the roller. The supply roller may also be the same width as the polishing tape to further prevent the migration of the polishing tape to an end of the roller. The relative motion between the supply roller and the fixed cassette walls may prevent the polishing tape from bunching and folding, even when there is a misalignment between the supply spool and the supply roller, for example. Thus, the cassette head walls may control the location of the polishing tape and allow a repeatable alignment of the polishing head.
Additionally, the present invention provides a method for replacing the used or worn polishing tape in the cassette. It may be beneficial to provide a method for quickly replacing the supply and take-up spools, to aide in efficient throughput while minimizing polishing tool downtime. As described above, the cassette may include two portions, the body which houses the spools, and the head which interfaces with the polishing tool, for example, and through which the polishing tape is routed. In some embodiments, in a first step, the spools may be disengaged from the motors. The motors may be used to index or advance the polishing tape. Then the cassette may be removed from the polishing tool. After removal, the cassette may be opened, and the polishing tape may be disengaged from the rollers in the cassette head. The spools and used polishing tape may then be removed from the cassette. The new supply spool with unused polishing tape and the new take-up spool may be installed in the cassette. The polishing tape may be threaded or routed from the supply spool, through the head and connected to the take-up spool. Then the cassette may be closed and placed back into the tool. While the used or spent cassette is being rebuilt, a fresh or new cassette having an unused polishing tape supply may be inserted into the polishing tool, such that downtime of the tool may be reduced. In another embodiment, the cassette having the used polishing tape may remain in the polishing tool, while the used spools may be replaced with new or unused spools.
Turning to
In one or more embodiments, the polishing tape 120 may be made from many different materials, such as aluminum oxide, silicon oxide, silicon carbide, etc. Other materials may also be used. In some embodiments, the abrasives used may range, for example, from about 0.5 microns up to about 3 microns in size, or 0.1 microns to 10 microns in size, although other sizes may be used. Different widths of polishing tape 120 ranging from about 0.55 inch to about 1.5 inches may be used, although other polishing tape widths may be used. In one or more embodiments, the polishing tape 120 may be about 0.002 to about 0.02 inches thick and withstand about 1 to 5 lbs. in tension. Other polishing tapes having different thicknesses and tensile strengths may be used.
Turning to
The supply and take-up spools 206, 208 may have a diameter of approximately 1 inch and be capable of holding about 500 inches of polishing tape 120, or may be a diameter of approximately 3 inches and be capable of holding about 30,000 inches of polishing tape 120. Other spool dimensions may be used. The spools 206, 208 may be constructed from materials such as polyurethane, polyvinyl difluoride (PVDF), etc. Other materials may also be used. In some embodiments the supply and take-up spools 206, 208 may be formed by selectively coupling two flanges (not shown) to a core (not shown), where the supply of polishing tape 120 is wound around the core, and each of the two flanges is coupled to opposite ends of the core.
Turning to
Turning to
In an alternate embodiment, the cassette 200 may remain coupled to the polishing tool 100 while the used polishing tape 120 is replaced with new polishing tape. For example, the cassette body cover 201 may be removed from the cassette 200, and one or more flanges 500, 502 (
It should be understood that the inventive edge polishing apparatus described herein may be employed in apparatuses other than those adapted for bevel and edge polishing and/or removal of films on substrates. Further, as will be apparent to those of ordinary skill in the art, the apparatus describe herein may be employed to polish and/or remove films on an edge of a substrate supported in any orientation (e.g., horizontal, vertical, diagonal, etc).
Further, it should be understood that although only examples of cleaning a round substrate are disclosed, the present invention could be modified to clean substrates having other shapes (e.g., a glass or polymer plate for flat panel displays). Further, although processing of a single substrate by the apparatus is shown above, in some embodiments, the apparatus may process a plurality of substrates concurrently.
The foregoing description discloses only exemplary embodiments of the invention. Modifications of the above disclosed apparatus and methods which fall within the scope of the invention will be readily apparent to those of ordinary skill in the art. Accordingly, while the present invention has been disclosed in connection with exemplary embodiments thereof, it should be understood that other embodiments may fall within the spirit and scope of the invention, as defined by the following claims.
Claims
1. A cassette for housing a polishing tape adapted to polish a substrate, the cassette comprising:
- a body portion; and
- a head portion, wherein the head portion includes: a pair of guide walls, and one or more supply rollers positioned between the guide walls in the head portion,
- wherein the guide walls are adapted to guide a polishing tape housed in the body over the one or more supply rollers.
2. The cassette of claim 1 further comprising:
- at least one supply spool positioned within the body portion and adapted to provide a length of polishing tape to the head portion.
3. The cassette of claim 2 further comprising:
- at least one take-up spool positioned within the body portion and adapted to receive a length of polishing tape from the head portion.
4. The cassette of claim 1 wherein the one or more supply rollers rotate relative to the guide walls.
5. The cassette of claim 1 wherein the one or more supply rollers are flangeless.
6. The cassette of claim 1 wherein the one or more supply rollers have a constant diameter.
7. The cassette of claim 1 wherein the head portion further includes one or more take-up rollers.
8. The cassette of claim 1 wherein the guide walls are adapted to align the polishing tape on the one or more supply rollers.
9. The cassette of claim 1 wherein a width of the one or more supply spools is substantially the same as a width of the polishing tape.
10. The cassette of claim 1 further comprising:
- a selectively removable cassette body cover.
11. A system for polishing an edge of a substrate comprising:
- a substrate support adapted to support a substrate;
- a polishing head adapted to press a polishing tape against an edge of the substrate; and
- a cassette for housing the polishing tape, the cassette comprising: a body portion; and a head portion, wherein the head portion includes: a pair of guide walls; one or more supply rollers positioned between the guide walls in the head portion; and wherein the guide walls are adapted to guide the polishing tape housed in the body over the one or more supply rollers.
12. The system of claim 11 further comprising:
- at least one supply spool positioned within the body portion and adapted to provide a length of polishing tape to the head portion.
13. The system of claim 12 further comprising:
- at least one take-up spool positioned within the body portion and adapted to receive a length of polishing tape from the head portion.
14. The system of claim 13 wherein at lest one of the supply and take-up spools are indexed to control the amount of polishing tape advanced therefrom.
15. The system of claim 13 wherein the polishing tape continuously advances.
16. The system of claim 11 wherein the one or more supply rollers rotate relative to the guide walls.
17. The system of claim 11 wherein the one or more supply rollers are flangeless.
18. The system of claim 11 wherein the one or more supply rollers have a constant diameter.
19. The system of claim 11 further comprising one or more spool drivers adapted to rotate the one or more supply and take-up spools.
20. A method comprising:
- providing a supply spool including a length of polishing tape;
- routing the length of polishing tape over a supply roller positioned between two walls in a head portion of a cassette; and
- providing a take-up spool adapted to receive the length of polishing tape from the supply roller, wherein the supply spool and take-up spool are housed in a body portion of the cassette.
21. The method of claim 20 further comprising:
- disengaging a spent supply spool from a spool driver before providing the supply spool including the length of polishing tape.
22. The method of claim 21 further comprising:
- re-purposing the spent supply spool as the take-up spool.
23. The method of claim 20 further comprising:
- adhering the length of polishing tape to an end of spent polishing tape.
24. The method of claim 23 further comprising:
- advancing the adhered length of polishing tape and spent polishing tape through the head portion of the cassette and to the take-up spool.
25. The method of claim 20 further comprising:
- installing the cassette on a polishing system.
Type: Application
Filed: Apr 21, 2009
Publication Date: Oct 22, 2009
Applicant: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Antoine P. Manens (Sunnyvale, CA), Gary C. Ettinger (Cupertino, CA), Paul D. Butterfield (San Jose, CA), Shou-Sung Chang (Stanford, CA), Ricardo Martinez (Manteca, CA), Eashwer Kollata (San Jose, CA), Robert A. Ewald (Aptos, CA), Kuldip Sumbria (Union City, CA)
Application Number: 12/427,504
International Classification: B24B 1/00 (20060101); B24D 17/00 (20060101);