OPTICAL INTEGRATOR, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
An optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source has a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface, and a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface. At least one first optical element out of the plurality of first optical elements, and another first optical element different from the at least one first optical element have their respective postures different from each other about an optical axis of the illumination optical system or about an axis parallel to the optical axis.
This application is a non-provisional application claiming the benefit of priority of the provisional applications Nos. 61/202,560 filed on Mar. 12, 2009 and 61/272,894 filed on Nov. 16, 2009, the entire contents of which are incorporated herein by reference.
BACKGROUND1. Filed
An embodiment according to the present invention relates to an optical integrator, illumination optical system, exposure apparatus, and device manufacturing method. More particularly, an embodiment according to the present invention relates to an optical integrator used in an illumination optical system of an exposure apparatus used in manufacturing devices such as semiconductor devices, imaging devices, liquid crystal display devices, and thin film magnetic heads by lithography.
2. Explanation of Related Art
The conventional exposure apparatus used in manufacturing the semiconductor devices and others is configured to project and transfer a circuit pattern formed on a mask (reticle), onto a photosensitive substrate (e.g., a wafer) through a projection optical system. The photosensitive substrate is coated with a resist, and the resist is exposed to light by projection exposure through the projection optical system, thereby forming a resist pattern corresponding to the mask pattern. The resolving power of exposure apparatus is dependent on the wavelength of exposure light and the numerical aperture of the projection optical system. Therefore, in order to improve the resolving power of exposure apparatus, it is necessary to decrease the wavelength of exposure light and increase the numerical aperture of the projection optical system.
In general, it is difficult in terms of optical design to increase the numerical aperture of the projection optical system beyond a certain value, and it is thus necessary to decrease the wavelength of exposure light to a shorter wavelength. Therefore, the technique of EUVL (Extreme UltraViolet Lithography) is drawing attention as a next-generation photolithography method of semiconductor patterning (exposure apparatus). The EUVL exposure apparatus uses the EUV (Extreme UltraViolet) light (radiation) having the wavelength in the range of about 5 to 20 nm. When the EUV light is used as exposure light, there is no available optical material that can transmit the light. For this reason, the EUVL exposure apparatus has to use a reflection type optical integrator, a reflection type mask, and a reflection type (catopric type) projection optical system.
In the general exposure apparatus, as well as the EUVL exposure apparatus, it is desirable to form a uniform and rotationally symmetric light intensity distribution (which will also be referred to hereinafter as “pupil intensity distribution”) on an illumination pupil of an illumination optical system. The applicant of the present application proposed the technology of forming an almost uniform and rotationally symmetric pupil intensity distribution on the illumination pupil, by devising a correspondence relation between a plurality of first optical elements in a first fly's eye optical system and a plurality of second optical elements in a second fly's eye optical system in the reflection type optical integrator (See U.S. Pat. Published Application No. 2007/0273859)
The optical integrator disclosed in U.S. Pat. Published Application No. 2007/0273859 is configured so that the plurality of first optical elements in the first fly's eye optical system and the plurality of second optical elements in the second fly's eye optical system are set in optical correspondence in a nearly random form.
SUMMARYIllumination fields formed on an illumination target surface by a plurality of beams obtained by wavefront division by the plurality of first optical elements are formed as deviating from a desired superimposed illumination region because of influence of various aberrations of the illumination optical system and (image rotation due to) projection or the like, so as to cause a light quantity loss due to so-called superposition errors of the illumination fields.
An embodiment according to the present invention has been accomplished in view of the foregoing problem and it is an object of embodiments according to the present invention to provide an optical integrator capable of keeping the light quantity loss small.
A first aspect of an embodiment according to the present invention provides an optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
wherein at least one first optical element out of the plurality of first optical elements, and another first optical element different from the at least one first optical element have respective postures different from each other about an optical axis of the illumination optical system or about an axis parallel to the optical axis.
A second aspect of an embodiment according to the present invention provides an optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
wherein at least one first optical element out of the plurality of first optical elements, and another first optical element different from the at least one first optical element have respective lengths along a predetermined direction different from each other.
A third aspect of an embodiment according to the present invention provides an optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
wherein at least one second optical element out of the plurality of second optical elements is arranged on a standard array surface of the plurality of second optical elements, and
wherein another second optical element different from the at least one second optical element out of the plurality of second optical elements is arranged with a required level difference from the standard array surface.
A fourth aspect of an embodiment according to the present invention provides an optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
wherein a size of the first fly's eye optical system and a distance between a center of an array surface of the plurality of first optical elements and a center of a standard array surface of the plurality of second optical elements are determined so that each illumination region formed on the illumination target surface by a beam traveling via each first optical element and corresponding second optical element becomes close to a desired superimposed illumination region.
A fifth aspect of an embodiment according to the present invention provides an optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target, surface in an optical path between the light source and the illumination target surface; and
a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
wherein a size D of the first fly's eye optical system and a distance K between a center of an array surface of the plurality of first optical elements and a center of a standard array surface of the plurality of second optical elements satisfy the following condition:
0.17<D/K<1.64.
A sixth aspect of an embodiment according to the present invention provides an optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
wherein at least either of postures and lengths of at least one first optical element out of the plurality of first optical elements and another first optical element different from the at least one first optical element, and at least either one of a distance between the at least one first optical element and the corresponding second optical element and a distance between the other first optical element and the corresponding second optical element are determined so as to reduce a superposition error between a first illumination region formed on the illumination target surface by a first beam traveling via the at least one first optical element and corresponding second optical element and a second illumination region formed on the illumination target surface by a second beam traveling via the other first optical element and corresponding second optical element.
A seventh aspect of an embodiment according to the present invention provides an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the illumination optical system comprising the optical integrator of the first aspect, the second aspect, the third aspect, the fourth aspect, the fifth aspect, or the sixth aspect.
An eighth aspect of an embodiment according to the present invention provides an exposure apparatus comprising the illumination optical system of the seventh aspect for illuminating a predetermined pattern, the exposure apparatus implementing exposure of the predetermined pattern on a photosensitive substrate.
A ninth aspect of an embodiment according to the present invention provides a device manufacturing method comprising:
implementing the exposure of the predetermined pattern on the photosensitive substrate, using the exposure apparatus of the eighth aspect;
developing the photosensitive substrate with the predetermined pattern transferred, and forming a mask layer in a shape corresponding to the predetermined pattern, on a surface of the photosensitive substrate; and
processing the surface of the photosensitive substrate through the mask layer.
A general architecture that implements the various features of the invention will now be described with reference to the drawings. The drawings and the associated descriptions are provided to illustrate embodiments of the invention and not to limit the scope of the invention.
Embodiments of the present invention will be described on the basis of the accompanying drawings.
Referring to
The mask M is held by a mask stage 5 movable along the Y-direction, in such a state that its pattern surface extends along the XY plane. Movement of the mask stage 5 is measured by a laser interferometer 6 having a well-known configuration. Light from the pattern on the mask M thus illuminated travels via a reflection type projection optical system PL to form an image of the mask pattern on the wafer W being a photosensitive substrate. Namely, for example, a static exposure region (effective exposure region) of an arcuate shape symmetric with respect to the Y-axis is formed on the wafer W, as described below.
The wafer W is held by a wafer stage 7 two-dimensionally movable along the X-direction and the Y-direction, in such a state that its exposure surface extends along the XY plane. Movement of the wafer stage 7 is measured by a laser interferometer 8 having a well-known configuration. As so configured, the pattern on the mask M is transferred onto a rectangular shot area on the wafer W by performing scanning exposure (scan photolithography) with movement of the mask stage 5 and the wafer stage 7 along the Y-direction, i.e., with movement of the mask M and the wafer W relative to the projection optical system PL along the Y-direction.
At this time, when the projection (transfer) magnification (lateral magnification) of the projection optical system PL is, for example, ¼, synchronous scanning is carried out while a moving speed of the wafer stage 7 is set to be quarter of a moving speed of the mask stage 5. By repeating the scanning exposure with two-dimensional step movement of the wafer stage 7 along the X-direction and the Y-direction, the pattern on the mask M is sequentially transferred onto each of shot areas on the wafer W.
Referring to
The gas target 13 is positioned at the first focus of the ellipsoidal reflecting mirror 15. Therefore, the EUV light emitted from the laser plasma light source 1 is focused at the second focus of the ellipsoidal reflecting mirror 15. On the other hand, the gas after the emission of light is suctioned through the duct 16 to be guided to the outside. The EUV light focused at the second focus of the ellipsoidal reflecting mirror 15 travels via a concave reflecting mirror 17 to become a flux of nearly parallel light to be guided to an optical integrator 18 consisting of a pair of fly's eye optical systems 18a and 18b. Configurations and actions of the first fly's eye optical system 18a and the second fly's eye optical system 18b will be described later.
In this manner, a substantial surface illuminant (pupil intensity distribution) having a predetermined shape is formed at a position near an exit surface of the optical integrator 18, i.e., near a reflecting surface of the second fly's eye optical system 18b (or at a position of an illumination pupil). Light from the substantial surface illuminant travels via a condenser optical system 19 composed of a convex reflecting mirror 19a and a concave reflecting mirror 19b, to emerge from the illumination optical system 2. The illumination pupil of the illumination optical system 2 is an entrance pupil of the projection optical system PL, or a position optically conjugate with the entrance pupil of the projection optical system PL.
The light emerging from the illumination optical system 2 is deflected by the plane reflecting mirror 4 and then travels through an arcuate aperture (light transmitting portion) of a field stop 21 arranged substantially in parallel and in proximity to the mask M, to form an arcuate illumination region on the mask M. As described above, the light source 1 (11-16), the illumination optical system 2 (17-19), the plane reflecting mirror 4, and the field stop 21 constitute an illumination system that illuminates the pattern on the mask M by Köhler illumination with the light from the pupil intensity distribution formed on the illumination pupil.
Light from the pattern on the mask M thus illuminated travels via the projection optical system PL to form an image of the mask pattern in an arcuate static exposure region on the wafer W. The projection optical system PL is composed of a first reflecting imaging optical system for forming an intermediate image of the pattern on the mask M, and a second reflecting imaging optical system for forming an image of the intermediate image of the mask pattern (secondary image of the pattern on the mask M) on the wafer W. The first reflecting imaging optical system is composed of four reflecting mirrors M1-M4 and the second reflecting imaging optical system is composed of two reflecting mirrors M5 and M6. The projection optical system PL is an optical system telecentric on the wafer side (image side).
In
The first fly's eye optical system 18a, as shown in
On the other hand, the second fly's eye optical system 18b, as shown in
A contour of the entrance surface of the first fly's eye optical system 18a is close to a circular shape because a sectional shape of a beam entering the optical integrator 18 (i.e., a beam entering the first fly's eye optical system 18a) is approximately circular, and it enhances illumination efficiency. A contour of the entrance surface of the second fly's eye optical system 18b is close to a circular shape because a contour of the pupil intensity distribution (substantial surface illuminant) formed on the illumination pupil near the exit surface of the optical integrator 18 (i.e., near the exit surface of the second fly's eye optical system 18b) is approximately circular.
In the present embodiment, the beam entering the optical integrator 18 is subjected to wavefront division by the plurality of first concave reflector elements 18aa in the first fly's eye optical system 18a. Beams reflected by the respective first concave reflector elements 18aa are incident to the corresponding second concave reflector elements 18ba in the second fly's eye optical system 18b. The beams reflected by the respective second concave reflector elements 18ba travel via the condenser optical system 19 as a waveguide optical system to illuminate an arcuate illumination region on the mask M in a superimposed manner.
The disadvantage of the conventional technology and each of techniques of an embodiment will be described below on the basis of an optical integrator having a configuration simpler than the configuration shown in
In proximity on the left side in the drawing to the group of first concave reflector elements 61a, a group of first concave reflector elements 61b having an arcuate contour are arrayed in the y-direction in the standard posture so that their arcuate sides are adjacent to each other. Furthermore, in proximity on the right side in the drawing to the group of first concave reflector elements 61a, a group of first concave reflector elements 61c having an arcuate contour are arrayed in the y-direction in the standard posture so that their arcuate sides are adjacent to each other.
In other words, as long as the rear optical system consisting of the optical integrator (including the plurality of first concave reflector elements 61a-61c) and the condenser optical system is in an aberration-free ideal state, the beams obtained by wavefront division by the plurality of first concave reflector elements 61a-61c arrayed in the standard posture in accordance with the conventional technology in the first fly's eye optical system form the desired arcuate superimposed illumination region while being almost perfectly superimposed on the illumination target surface. In practice, however, superposition errors of illumination fields are caused by various aberrations of the rear optical system, particularly, by influence of image rotation or rotational strain due to projection, as schematically shown in the lower part of
Referring to
According to a typical example, the arcuate illumination field 62b formed by each of beams traveling via the second group of first concave reflector elements 61b tends to be formed in such an orientation that the desired superimposed illumination region 60 is rotated counterclockwise (or clockwise) in
In this case, an overlapping illumination field 63 formed in common on the illumination target surface by the plurality of beams obtained by wavefront division by the plurality of first concave reflector elements 61a-61c has a distorted contour and an arcuate illumination region IR corresponding to the arcuate static exposure region ER has to be set in a relatively small area in the overlapping illumination field 63. This means that the field stop arranged in proximity to the mask M blocks light traveling toward the outside of the arcuate illumination region IR, out of the light wavefront-divided by the plurality of first concave reflector elements 61a-61c and traveling toward the mask M, and the blocked light does not contribute to illumination of the pattern on the mask M (and to scanning exposure on the wafer W eventually); that is, there occurs a light quantity loss due to the superposition errors of the illumination fields 62a-62c.
Since the reflectance of each of multilayer reflecting films used in the optical systems is relatively small, about 0.7, in the EUVL exposure apparatus, it is important to avoid reduction in throughput of scanning exposure by minimizing the light quantity loss caused by the superposition errors of illumination fields. An example of the first technique of an embodiment is to change the posture of the second group of first concave reflector elements 61b so that the orientation of the arcuate illumination field (illumination region) 62b formed on the illumination target surface by the beams traveling via the second group of first concave reflector elements 61b and the corresponding second concave reflector elements becomes closer to the orientation of the desired superimposed illumination region 60.
Similarly, the posture of the third group of first concave reflector elements 61c is also changed so that the orientation of the arcuate illumination field 62c formed on the illumination target surface by the beams traveling via the third group of first concave reflector elements 61c and the corresponding second concave reflector elements becomes closer to the orientation of the desired superimposed illumination region 60. Specifically, as shown in the upper part of
The first tilt posture is a posture obtained by rotating the standard posture by a required angle in a required direction, for example, about a required axis (the optical axis or an axis parallel to the optical axis) perpendicular to the array surface (xy plane) of the plurality of first concave reflector elements 61a-61c. On the other hand, the second tilt posture is a posture obtained by rotating the standard posture in a direction opposite to that of the first tilt posture and by the same angle as the angle of the first tilt posture, about the required axis perpendicular to the array surface. Namely, the first tilt posture and the second tilt posture are symmetric with respect to a straight line extending along the y-direction.
In this case, as schematically shown in the lower part of
In general, the first technique of an embodiment is to set at least one first optical element and another first optical element out of a plurality of first optical elements (corresponding to the first concave reflector elements 61a-61c) in the first fly's eye optical system, in mutually different postures about the optical axis of the illumination optical system or about an axis parallel to the optical axis. In other words, at least two first optical elements are set in mutually different postures about a predetermined axis. For example, the foregoing postures of the at least two first optical elements are determined so that orientations of illumination regions formed on the illumination target surface by beams traveling via the first optical elements and corresponding second optical elements become close to the orientation of the desired superimposed illumination region. For example, in a case where a first direction and a second direction perpendicular thereto are set for an illumination region, an orientation of the illumination region can be defined as a direction in which the length of the illumination region is larger. Where a first direction and a second direction perpendicular thereto are set for the desired superimposed illumination region, an orientation of the desired superimposed illumination region can be defined as a direction in which the length of the desired superimposed illumination region is larger. In other words, the postures of the at least two first optical elements are determined so as to make smaller the superposition error between the illumination regions formed on the illumination target surface by the beams traveling via the first optical elements and corresponding second optical elements.
In the case where the first fly's eye optical system is composed of the plurality of arcuate first concave reflector elements 61a-61c, as shown in the example of
It is also possible to individually set a required number of first concave reflector elements, out of the plurality of arcuate first concave reflector elements 61a-61c constituting the first fly's eye optical system, in required tilt postures (without always having to be limited to the postures along the array surface), different from the example of
When the first technique of an embodiment is applied to the present embodiment, an example of application can be to determine a required average posture along the array surface, for each group consisting of a plurality of first concave reflector elements 18aa arrayed in the y-direction. Specifically, in the six-group configuration shown in
Furthermore, the two groups located at the outermost positions along the x-direction are set in respective required tilt postures obtained by rotating the standard posture in opposite directions by an identical angle larger than the tilt angle of the adjacent groups. This is because the influence of image rotation or rotational strain due to projection becomes greater with distance from the center in the x-direction. The example schematically shown in
When the first technique of an embodiment is applied to the optical integrator 18 of the present embodiment, it is feasible to make small the superposition errors of the illumination fields formed on the pattern surface of the mask M by the plurality of beams obtained by wavefront division by the plurality of first concave reflector elements 18aa and, in turn, to make small the light quantity loss caused by the superposition errors of the illumination fields. As a consequence, the illumination optical system 2 of the present embodiment is able to illuminate the mask M under a required illumination condition with high luminous efficiency while keeping small the light quantity loss caused by the superposition errors of the illumination fields. Furthermore, the exposure apparatus of the present embodiment is able to perform excellent exposure under a good illumination condition, using the illumination optical system 2 which illuminates the pattern of the mask M under the required illumination condition with high luminous efficiency while suppressing the light quantity loss.
One first concave reflector element 61 as among the first group of first concave reflector elements 61a corresponds to a second concave reflector element 81ba in the second fly's eye optical system. Furthermore, one first concave reflector element 61ca among the third group of first concave reflector elements 61c corresponds to a second concave reflector element 81ca in the second fly's eye optical system. In general, in the configuration of the random method, the plurality of first concave reflector elements (first optical elements) in the first fly's eye optical system and the plurality of second concave reflector elements (second optical elements) in the second fly's eye optical system are in one-to-one correspondence according to such a relation that at least a pair of projected line segments intersect when a plurality of line segments connecting corresponding paired optical elements are projected onto a certain plane.
In this case, a magnification of an illumination field formed on the illumination target surface by a beam traveling via one first concave reflector element in the first fly's eye optical system and a corresponding second concave reflector element (length in a predetermined direction of the illumination field/length in a predetermined direction of a reflecting surface of the first concave reflector element), β, is represented by Eq (a) below, using a focal length fe of an element optical system consisting of the first concave reflector element and the corresponding second concave reflector element, and a focal length fc of the condenser optical system.
β=fc/fe (a)
Furthermore, the magnification β of the illumination field is also represented by Eq (b) below, using an optical path length L1 between the corresponding pair of optical elements, and an optical path length L2 from the second concave reflector element to the condenser optical system.
β=L2/L1 (b)
In a case where the second fly's eye optical system is configured to also function as the condenser optical system, by arraying the plurality of second concave reflector elements (second optical elements) along a predetermined curved surface, the optical path length L2 in Eq (b) above is replaced by an optical path length from the second concave reflector element to the illumination target surface.
In the conventional technology wherein the first fly's eye optical system is composed of the plurality of arcuate first concave reflector elements having the same size (standard size) as shown in the upper part of
For easier understanding of the description, it is assumed hereinafter that, as schematically shown in the lower part of
In this simple case, the overlapping illumination field 63 formed in common on the illumination target surface by the plurality of beams obtained by wavefront division by the plurality of first concave reflector elements 61a-61c is approximately coincident with the desired superimposed illumination region 60 and approximately coincident with the arcuate illumination region IR eventually. Of the light subjected to the wavefront division by the first concave reflector elements 61ba and 61ca and traveling toward the mask M, the light traveling toward the outside of the arcuate illumination region IR does not contribute to illumination of the pattern on the mask M (and eventually to the scanning exposure on the wafer W) and a light quantity loss is caused by the superposition errors of the illumination fields due to the magnification differences among the optical elements.
In practice, it is generally the case that the illumination fields formed via some first concave reflector elements become smaller than the desired superimposed illumination region 60, the illumination fields formed via some first concave reflector elements become approximately identical in size with the desired superimposed illumination region 60, and the illumination fields formed via some first concave reflector elements become larger than the desired superimposed illumination region 60. Therefore, the light quantity loss caused by the superposition errors of illumination fields due to the magnification differences among the optical elements is unignorable, particularly, in the configuration of the random method.
The second technique of an embodiment is to set at least one first optical element and another first optical element out of the plurality of first optical elements (corresponding to the first concave reflector elements 61a-61c) in the first fly's eye optical system so that their lengths along a predetermined direction are different from each other. In other words, at least two first optical elements are set so that their lengths in the predetermined direction are different from each other. The predetermined direction can be selected, for example, to be the y-direction in the upper part of
The lengths in the predetermined direction of the foregoing at least two first optical elements are determined so that lengths in the predetermined direction of illumination fields formed on the illumination target surface by beams traveling via the first optical elements and corresponding second optical element become close to the length in the predetermined direction of the desired superimposed illumination region. In other words, the lengths along the predetermined direction of the at least one first optical element and other first optical element are determined so as to make small the superposition errors of the illumination regions formed on the illumination target surface by the beams traveling via the first optical elements and the corresponding second optical elements. When the second technique of an embodiment is applied to the simple example shown in
In the upper part of
In the case where only the y-directional lengths of the first concave reflector elements are adjusted, two-dimensional array adjustment of the plurality of first concave reflector elements is simple and easy. In the example shown in
On the other hand, in cases where the x-directional lengths of the first concave reflector elements are adjusted or where the x-directional lengths and the y-directional lengths of the first concave reflector elements both are adjusted, the two-dimensional array adjustment of the plurality of first concave reflector elements becomes complicated. When the second technique of an embodiment is applied to the optical integrator 18 of the present embodiment, we can enjoy the same effect as in the case of application of the first technique.
The third technique of an embodiment is to arrange at least one second optical element out of the plurality of second optical elements in the second fly's eye optical system (second concave reflector elements 18ba in
The required level difference to be given to the specific second optical element is determined so that the size of the illumination field formed on the illumination target surface by a beam traveling via the first optical element corresponding to the second optical element, and via the second optical element becomes close to the size of the desired superimposed illumination region. In other words, the level difference between the aforementioned at least one second optical element and other second optical element, or a distance between the at least one first optical element and corresponding second optical element and a distance between the other first optical element and corresponding second optical element are determined so as to make smaller the superposition errors of the illumination regions formed on the illumination target surface by the beams traveling via the first optical elements and the corresponding second optical elements. When the third technique of an embodiment is applied to the simple example shown in
When the reflecting surface of the second concave reflector element 81aa is arranged with the required level difference from the standard array surface, an optical path length L1b between the first concave reflector element 61ba and the second concave reflector element 81aa and an optical path length L2b from the second concave reflector element 81aa to the illumination target surface are adjusted. Similarly, when the reflecting surface of the second concave reflector element 81ca is arranged with the required level difference from the standard array surface, an optical path length L1c between the first concave reflector element 61ca and the second concave reflector element 81ca and an optical path length L2c from the second concave reflector element 81ca to the illumination target surface are adjusted.
In contrast to it, the reflecting surface of the second concave reflector element 81ba is arranged on the standard array surface without any level difference, and therefore an optical path length L1a between the first concave reflector element 61aa and the second concave reflector element 81ba and an optical path length L2a from the second concave reflector element 81ba to the illumination target surface are not adjusted. As a result, as seen with reference to the aforementioned Eq (b), the magnification of the arcuate illumination field 62ba formed by the beam traveling via the first concave reflector element 61ba and the second concave reflector element 81aa and the magnification of the arcuate illumination field 62ca formed by the beam traveling via the first concave reflector element 61ca and the second concave reflector element 81 ca vary according to the level differences thus given.
On the other hand, the magnification of the arcuate illumination field 62aa formed by the beam traveling via the first concave reflector element 61aa and the second concave reflector element 81ba (i.e., the illumination field originally having the small superposition error relative to the desired arcuate superimposed illumination region 60) is invariant because the reflecting surface of the second concave reflector element 81ba is given no level difference. In this manner, as schematically shown in the lower part of
Namely, when the third technique of an embodiment is applied to the optical integrator 18 of the present embodiment, the same effect is also achieved as in the case of application of the first technique and in the case of application of the second technique. Furthermore, by applying one or more techniques selected from the first technique, the second technique, and the third technique of an embodiment to the optical integrator 18 of the present embodiment, it is feasible to keep small the superposition errors of the illumination fields formed on the illumination target surface by the plurality of beams obtained by wavefront division.
The fourth technique of an embodiment will be described below on the basis of an exposure apparatus of an inverse pupil type as shown in
In the exposure apparatus of the inverse pupil type shown in
The light emerging from the illumination optical system 2 travels via an oblique incidence mirror (plane reflecting mirror) 4 to form an arcuate illumination region on the mask M. Namely, the light traveling via the second fly's eye optical system 18b of the optical integrator 18 is guided to the pattern surface of the mask M as an illumination target surface, without traveling via any optical member having a power (e.g., an optical member like the condenser optical system 19 shown in
This substantial surface illuminant is formed at the position of the exit pupil of the illumination optical system 2 consisting of the pair of fly's eye optical systems 18a and 18b. The position of the exit pupil of the illumination optical system 2 (i.e., the position near the reflecting surface of the second fly's eye optical system 18b) is coincident with the position of the entrance pupil of the projection optical system PL. As described above, the projection optical system PL is the inverse pupil optical system having the entrance pupil at the position apart by a predetermined distance on the opposite side to the projection optical system PL with respect to the object plane where the mask M is arranged. In the exposure apparatus of the inverse pupil type, the number of reflections of the EUV light in the illumination optical system 2 is smaller than that in the exposure apparatus of the normal pupil type, and therefore the luminous efficiency is improved when compared with the exposure apparatus of the normal pupil type.
Prior to specific description of the fourth technique of an embodiment, consideration will be given to influence of a distance K between a center of the array surface of the plurality of first concave reflector elements (generally, first optical elements) 18aa in the first fly's eye optical system 18a and a center of the standard array surface of the plurality of second concave reflector elements (generally, second optical elements) 18ba in the second fly's eye optical system 18b, with reference to
For easier understanding of the description,
When an offset amount along the array surfaces between the first concave reflector element 61ac and the second concave reflector element 81ac (and, therefore, an offset amount between the first fly's eye optical system 18a and the second fly's eye optical system 18b), C, is constant, the angle of incidence of the light to the reflecting surface of the first concave reflector element 61ac and the angle of incidence of the light to the reflecting surface of the second concave reflector element 81ac are smaller in a configuration where the distance K is set to be relatively large as shown in
When the distance K is set large as described above, the angles of incidence of the light to the reflecting surfaces of the concave reflector elements 18aa, 18ba can be kept small, and it is thus feasible to secure large reflectance of multilayer reflecting films forming the reflecting surfaces of the concave reflector elements 18aa, 18ba. This is because film-forming steps of the multilayer reflecting films are carried out for each predetermined angular range. When the distance K is set large, the angles of incidence of light to the reflecting surfaces of the concave reflector elements 18aa, 18ba are kept small, whereby occurrence of aberration in the optical integrator 18 is kept small, so as to make small the superposition errors of illumination fields due to aberration.
When the distance K is set large as described above, various effects are achieved including improvement in reflectance, reduction in film-forming time, and reduction of superposition errors of illumination fields. However, when only the distance K were simply set large in practical design, various adverse effects could be caused. It is also possible to keep small the angles of incidence of light to the reflecting surfaces of the concave reflector elements 18aa, 18ba by setting the offset amount C small, but there is naturally a limit to setting the offset amount C small, in order to avoid interference between the incident beam to the first fly's eye optical system 18a and the second fly's eye optical system 18b and interference between the emerging beam from the second fly's eye optical system 18b and the first fly's eye optical system 18a.
In the case of the exposure apparatus of the inverse pupil type where there is no condenser optical system interposed between the optical integrator 18 and the mask M, as described in association with Eq (b), the magnification of the illumination field formed on the illumination target surface (pattern surface of the mask M) by a beam traveling via one first concave reflector element in the first fly's eye optical system and a corresponding second concave reflector element (length in the predetermined direction of the illumination field/length in the predetermined direction of the reflecting surface of the first concave reflector element), β, is represented by Eq (c) below, using an optical path length L1 between the corresponding pair of optical elements and an optical path length L3 from the second concave reflector element to the illumination target surface.
β=L3/L1 (c)
Specifically, with reference to
Therefore, the magnification β1 of the illumination field (illumination region) formed by the beam traveling via the first concave reflector element 61bc and corresponding second concave reflector element 81ac, the magnification β2 of the illumination field formed by the beam traveling via the first concave reflector element 61ac and corresponding second concave reflector element 81bc, and the magnification β3 of the illumination field formed by the beam traveling via the first concave reflector element 61cc and corresponding second concave reflector element 81cc are represented by Eqs (d1), (d2), and (d3), respectively, below.
β1=b1/a1 (d1)
β2=b2/a2 (d2)
β3=b3/a3 (d3)
It is seen with reference to Eqs (d1) to (d3) that, in order to keep small the so-called superposition errors of the illumination fields due to the magnification differences among the optical elements, it is important to keep small variation in bi/ai (i=1-3 in
As described previously, the entrance surface of the first fly's eye optical system 18a has the contour close to the circular shape in order to enhance the illumination efficiency because the sectional shape of the beam incident to the optical integrator 18 (i.e., the beam incident to the first fly's eye optical system 18a) is approximately circular. Therefore, when the length along the x-direction of the first fly's eye optical system 18a shown in
In the simplified model shown in
In this case, a1-a3 in Eqs (d1)-(d3) (ai in general) are approximated by the distance K, b1-b3 (bi in general) by the distance P, and β1-β3 (βi in general) by d/(D/s). As a consequence, an approximate expression represented by Formula (e1) below holds. The approximate expression (e1) can be modified to approximate expression (e2) below.
d/(D/s)≈P/K (e1)
D/K≈sd/P (e2)
If D/K in approximate expression (e2) is too smaller than sd/P, the actual length along the X-direction of the arcuate illumination region formed on the mask M becomes too smaller than the required length d and, in turn, the actual length along the X-direction of the arcuate static exposure region ER formed on the wafer W becomes too smaller than the required length, which will make implementation of required exposure itself impossible. On the other hand, when D/K is too larger than sd/P, the actual length along the X-direction of the illumination region becomes too larger than the required length d and, in turn, the actual length along the X-direction of the static exposure region ER becomes too larger than the required length, which will cause reduction of throughput due to an excess light quantity loss.
In practical typical design examples, the number s of divisions along the x-direction of the first fly's eye optical system 18a is, for example, approximately 5 to 7. The required length d along the X-direction of the arcuate illumination region is, for example, approximately 104 mm-130 mm in a case where the projection magnification of the projection optical system PL is ¼; it is, for example, approximately 156 mm-182 mm in a case where the projection magnification is ⅙; it is, for example, approximately 208 mm-234 mm in a case where the projection magnification is ⅛. The distance P from the center of the entrance surface of the second fly's eye optical system 18b to the center of the arcuate illumination region is, for example, approximately 1300 mm-3000 mm in the case where the projection magnification is ¼; it is, for example, approximately 1000 mm-3000 mm in the case where the projection magnification is ⅙ or ⅛. In cases where the projection magnification of the projection optical system PL, the number s of divisions, the length d, and the distance P are assumed to vary in these numerical ranges, values of D/K satisfying the relation of D/K=sd/P are given as shown in Table (1) below.
As shown in Table (1), when the projection magnification of the projection optical system PL, the number s of divisions, the length d, and the distance P in the practical typical design examples are assumed to vary within the aforementioned numerical ranges, it is seen that the values of D/K satisfying the relation of D/K=sd/P fall within the range of 0.17 to 1.64. This means that when the size D of the first fly's eye optical system 18a and the distance K between the center of the array surface of the plurality of first concave reflector elements (first optical elements) 18aa and the center of the standard array surface of the plurality of second concave reflector elements (second optical elements) 18ba satisfy Condition (1) below, the magnification differences among the optical elements can be kept small and, in turn, each illumination region formed by the beam traveling via each first concave reflector element 18aa and corresponding second concave reflector element 18ba can be made close to the desired superimposed illumination region. However, for example, when values of the length d vary over a wider range, the range of values of D/K satisfying the relation of D/K=sd/P will also vary.
0.17<D/K<1.64 (1)
For keeping the magnification differences among the optical elements smaller and, therefore, for making each illumination region closer to the desired superimposed illumination region, Condition (1A) below instead of Condition (1) may be satisfied and Condition (1B) below instead of Condition (1A) may be satisfied. Incidentally, when the projection magnification of the projection optical system PL is ¼, the range of Condition (1A) corresponds to the range of values of D/K satisfying the relation of D/K=sd/P. With the projection magnification of the projection optical system PL being ¼, P being approximately 1700 mm-2200 mm, and s being 5 or 6, the range of Condition (1B) corresponds to the range of values of D/K satisfying the relation of D/K=sd/P.
0.17<D/K<0.70 (1A)
0.24<D/K<0.46 (1B)
The fourth technique of an embodiment is to keep small the superposition errors of illumination fields due to the magnification differences among the optical elements and to make each illumination region close to the desired superimposed illumination region eventually when the size D of the first fly's eye optical system 18a and the center-center distance K between the two array surfaces satisfy Condition (1), (1A), or (1B). In other words, the fourth technique of an embodiment is to determine the size D of the first fly's eye optical system 18a and the center-center distance K between the two array surfaces so that each illumination region becomes close to the desired superimposed illumination region, thereby keeping small the superposition errors of illumination fields due to the magnification differences among the optical elements. When the distance K is set relatively large within the range satisfying Condition (1), (1A), or (1B), the additional effects are achieved including the improvement in reflectance, reduction in film-forming time, and reduction in superposition errors of illumination fields, as described with reference to
As described above, when the fourth technique of an embodiment is applied to the optical integrator 18 of the present embodiment, the same effect is also achieved as in the case of application of the first technique, in the case of application of the second technique, and in the case of application of the third technique. Furthermore, when one or more techniques selected from the first technique, second technique, third technique, and fourth technique of an embodiment are applied to the optical integrator 18 of the present embodiment, it is feasible to keep small the superposition errors of the illumination fields formed on the illumination target surface by the plurality of beams obtained by wavefront division.
Now, based on the exposure apparatus of the inverse pupil type shown in
The lengths of the illumination regions 65a, 65b, and 65c are represented by Eqs (f1) to (f6) below, using the magnifications β1 (=b1/a1), β2 (=b2/a2), and β3 (=b3/a3) between the optical elements, and influence factors A, B such as various aberrations of the illumination optical system and the image rotation due to projection.
Iax=Ex×β2+A (f1)
Ibx=Ex×β1+A (f2)
Icx=Ex×β3+A (f3)
Iay=Ey×β2+B (f4)
Iby=Ey×β1+B (f5)
Icy=Ey×β2+B (f6)
For keeping the superposition errors of illumination fields small, it is important to prevent the lengths of the respective illumination regions from varying among the first concave reflector elements. Then, the second technique of an embodiment proposed the adjustment of the lengths Ex and Ey for each first concave reflector element, in order to prevent the lengths of the respective illumination regions from varying among the first concave reflector elements. In this case, as described with reference to
For keeping the superposition errors of illumination fields small, it is important to keep small the variation in magnification βi among the optical elements. Then, the third technique of an embodiment proposed the provision of the required level differences among the second concave reflector elements, in order to prevent the variation in magnification β among the optical elements. The fourth technique of an embodiment proposed Condition (1), (1A), or (1B) to be satisfied, in order to prevent the variation in magnification β among the optical elements. In practice, these techniques may be optionally carried out in combination, in order to suppress the superposition errors of the illumination fields.
Furthermore, with reference to Eqs (f4) to (f6), for keeping small the variation in the Y-directional lengths of the respective illumination regions, it is important to keep small the variation in magnification βi among the optical elements and to keep small the variation in the y-directional lengths of the respective first concave reflector elements. Namely, in the second technique of an embodiment, variance t2 of the y-directional lengths of the plurality of first concave reflector elements 18aa, which is defined by ε(Ta−Ti)2/n, where Ti (i=1−n) is the y-directional length of each element out of the plurality of (n) first concave reflector elements (first optical elements) 18aa, Ta an average of the y-directional lengths of the n first concave reflector elements 18aa, and ε a summation from i=1 to i=n, may satisfy Condition (2) below.
0.05<t2<0.35 (2)
When the variance is larger than the upper limit of Condition (2), the variation of the y-directional lengths of the first concave reflector elements 18aa becomes too large, so as to result in increase in the superposition errors of the illumination fields and increase in the light quantity loss eventually. On the other hand, when the variance is smaller than the lower limit of Condition (2), the variation of the y-directional lengths of the first concave reflector elements 18aa becomes too small, so as to result in decrease in the offset amount between the first fly's eye optical system 18a and the second fly's eye optical system 18b and increase in the possibility of mechanical interference between the first fly's eye optical system 18a and the mask M.
For easier understanding, the description about the fourth technique of an embodiment and the description about Condition (2) were given based on the exposure apparatus of the inverse pupil type. It is, however, noted that the fourth technique of an embodiment and Condition (2) can also be applied similarly to the optical integrator used in the exposure apparatus of the normal pupil type, without having to be limited to the exposure apparatus of the inverse pupil type.
In the above description, the first concave reflector elements 18aa in the first fly's eye optical system 18a have the arcuate contour and the second concave reflector elements 18ba in the second fly's eye optical system 18b have the rectangular contour. However, without having to be limited to this example, various forms can be contemplated as to the contours of the reflectors and the positive and negative arrangement of the powers of the reflectors.
In the above description an embodiment was applied to the reflection type optical integrator, but, without having to be limited to it, an embodiment can also be applied, for example, to refraction type and diffraction type optical integrators. When an embodiment is applied to a refraction type optical integrator, the first fly's eye optical system and the second fly's eye optical system are constructed by arranging optical elements, e.g., microscopic lens elements in parallel. In this case, the first fly's eye optical system and the second fly's eye optical system may be formed in an integral form or in separate forms. The refraction type optical integrator with the first fly's eye optical system and the second fly's eye optical system formed in separate forms is disclosed, for example, in Japanese Patent Application Laid-open No. 8-272367 and U.S. Pat. No. 5,760,963 corresponding thereto or in Japanese Patent Application Laid-open No. 8-31736 and U.S. Pat. No. 5,594,526 corresponding thereto. The teachings of the U.S. Pat. Nos. 5,760,963 and 5,594,526 are incorporated by reference.
In the aforementioned embodiment, the mask can be replaced with a variable pattern forming device for forming a predetermined pattern based on predetermined electronic data. Use of this variable pattern forming device minimizes the effect on synchronization accuracy even if the pattern surface is set vertical. The variable pattern forming device can be, for example, a DMD (Digital Micromirror Device) including a plurality of reflective elements driven based on predetermined electronic data. The exposure apparatus with the DMD is disclosed, for example, in Japanese Patent Application Laid-open No. 2004-304135 or in International Publication WO2006/080285 and U.S Pat. Published Application No. 2007/0296936 corresponding thereto. The teachings of the U.S Pat. Published Application No. 2007/0296936 are incorporated by reference. Besides the non-emission type reflective spatial optical modulators like the DMD, it is also possible to use a transmissive spatial optical modulator or a self-emission type image display device. The variable pattern forming device may be used in the case where the pattern surface is set horizontal.
The exposure apparatus of the foregoing embodiment is manufactured by assembling various sub-systems containing their respective components as set forth in the scope of claims in the present application, so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. For ensuring these various accuracies, the following adjustments are carried out before and after the assembling: adjustment for achieving the optical accuracy for various optical systems; adjustment for achieving the mechanical accuracy for various mechanical systems; adjustment for achieving the electrical accuracy for various electrical systems. The assembling steps from the various sub-systems into the exposure apparatus include mechanical connections, wire connections of electric circuits, pipe connections of pneumatic circuits, etc. between the various sub-systems. It is needless to mention that there are assembling steps of the individual sub-systems, before the assembling steps from the various sub-systems into the exposure apparatus. After completion of the assembling steps from the various sub-systems into the exposure apparatus, overall adjustment is carried out to ensure various accuracies as the entire exposure apparatus. The manufacture of exposure apparatus is desirably performed in a clean room in which the temperature, cleanliness, etc. are controlled.
The following will describe a device manufacturing method using the exposure apparatus according to the above-described embodiment.
The resist pattern herein is a photoresist layer in which depressions and projections are formed in a shape corresponding to the pattern transferred by the exposure apparatus of the above embodiment and which the depressions penetrate throughout. Block S48 is to process the surface of the wafer W through this resist pattern. The processing carried out in block S48 includes, for example, at least either etching of the surface of the wafer W or deposition of a metal film or the like. In block S44, the exposure apparatus of the above embodiment performs the transfer of the pattern onto the wafer W coated with the photoresist, as a photosensitive substrate.
The above embodiment uses the laser plasma X-ray source as a light source for supplying the EUV light. Without having to be limited to this, however, it is also possible, for example, to adopt a synchrotron orbit radiation (SOR) as the EUV light.
The above embodiment is the application of an embodiment to the exposure apparatus having the light source to supply the EUV light. Without having to be limited to this, however, an embodiment is also applicable to exposure apparatus having a light source to supply any wavelength light other than the EUV light.
The aforementioned embodiment is the application of an embodiment to the illumination optical system of the EUVL exposure apparatus using the reflection type mask M, but, without having to be limited to this, an embodiment can also be applied to a generally-used illumination optical system which illuminates an illumination target surface on the basis of light from a light source.
According to one aspect of an embodiment, at least two first optical elements out of the plurality of first optical elements constituting the first fly's eye optical system are set so that the postures thereof about the optical axis of the illumination optical system or about the axis parallel to the optical axis are different from each other. For example, the postures of the at least two first optical elements are determined so that orientations of the illumination regions formed on the illumination target surface by beams traveling via the first optical elements and corresponding second optical elements become close to the orientation of the desired superimposed illumination region. As a result, the optical integrator according to one aspect of an embodiment is able to keep small the superposition errors of the illumination fields formed on the illumination target surface by the plurality of beams obtained by wavefront division by the plurality of first optical elements.
The illumination optical system according to an embodiment is able to illuminate the illumination target surface under the required illumination condition with high luminous efficiency while keeping small the light quantity loss due to the superposition errors of the illumination fields, using the optical integrator which keeps the superposition errors of the illumination fields small. The exposure apparatus according to an embodiment is able to manufacture devices with excellent performance by implementing excellent exposure under a good illumination condition, using the illumination optical system which illuminates a pattern on an illumination target surface under a required illumination condition with high luminous efficiency while suppressing the light quantity loss.
It should be noted that the embodiments given above were described for facilitating the understanding of the present invention but not for limiting the present invention. Therefore, the elements disclosed in the above embodiments are intended to embrace all design changes and equivalents belonging to the technical scope of the present invention.
The invention is not limited to the fore going embodiments but various changes and modifications of its components may be made without departing from the scope of the present invention. Also, the components disclosed in the embodiments may be assembled in any combination for embodying the present invention. For example, some of the components may be omitted from all components disclosed in the embodiments. Further, components in different embodiments may be appropriately combined.
Claims
1. An optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
- a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
- a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
- wherein a size of the first fly's eye optical system and a distance between a center of an array surface of the plurality of first optical elements and a center of a standard array surface of the plurality of second optical elements are determined so that each illumination region formed on the illumination target surface by a beam traveling via each first optical element and corresponding second optical element becomes close to a desired superimposed illumination region.
2. The optical integrator according to claim 1, wherein the size D of the first fly's eye optical system and the distance K between the center of the array surface of the plurality of first optical elements and the center of the standard array surface of the plurality of second optical elements satisfy the following condition:
- 0.17<D/K<1.64.
3. The optical integrator according to claim 2, satisfying the following condition:
- 0.17<D/K<0.70,
- instead of the condition of 0.17<D/K<1.64.
4. The optical integrator according to claim 3, satisfying the following condition:
- 0.24<D/K<0.46,
- instead of the condition of 0.17<D/K<0.70.
5. The optical integrator according to claim 1, wherein there is no optical member having a power in an optical path between the second fly's eye optical system and the illumination target surface.
6. The optical integrator according to claim 1, wherein the plurality of first optical elements and the plurality of second optical elements have a concave reflector form.
7. The optical integrator according to claim 1, wherein the first optical elements have an arcuate contour and the second optical elements have a rectangular contour.
8. An optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
- a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
- a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
- wherein a size D of the first fly's eye optical system and a distance K between a center of an array surface of the plurality of first optical elements and a center of a standard array surface of the plurality of second optical elements satisfy the following condition: 0.17<D/K<1.64.
9. The optical integrator according to claim 8, satisfying the following condition:
- 0.17<D/K<0.70,
- instead of the condition of 0.17<D/K<1.64.
10. The optical integrator according to claim 9, satisfying the following condition:
- 0.24<D/K<0.46,
- instead of the condition of 0.17<D/K<0.70.
11. The optical integrator according to claim 8, wherein there is no optical member having a power in an optical path between the second fly's eye optical system and the illumination target surface.
12. The optical integrator according to claim 8, wherein the plurality of first optical elements and the plurality of second optical elements have a concave reflector form.
13. The optical integrator according to claim 8, wherein the first optical elements have an arcuate contour and the second optical elements have a rectangular contour.
14. An optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
- a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
- a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
- wherein at least one first optical element out of the plurality of first optical elements, and another first optical element different from said at least one first optical element have respective lengths along a predetermined direction different from each other.
15. The optical integrator according to claim 14, wherein the plurality of first optical elements comprise a group of first optical elements arrayed in a first direction so that their arcuate sides are adjacent to each other, and
- wherein a variance t2 of lengths in the first direction of the plurality of first optical elements, which is defined by ε(Ta−Ti)2/n, where Ti (i=1−n) is a length in the first direction of each first optical element out of the plurality of (n) first optical elements, Ta is an average of lengths in the first direction of the n first optical elements, and ε is a summation from i=1 to i=n, satisfies the following condition: 0.05<e<0.35.
16. The optical integrator according to claim 14, wherein said at least one first optical element has a length adjusted from a standard length in the first direction of the plurality of first optical elements.
17. The optical integrator according to claim 15, wherein light traveling via the second fly's eye optical system is guided to the illumination target surface, without traveling via any optical member having a power.
18. The optical integrator according to claim 14, wherein said at least one first optical element and other first optical element have the respective lengths determined so that lengths in a predetermined direction of illumination regions formed on the illumination target surface by beams traveling via the first optical elements and corresponding second optical elements become close to a length in the predetermined direction of a desired superimposed illumination region.
19. The optical integrator according to claim 14, wherein the plurality of first optical elements and the plurality of second optical elements have a concave reflector form.
20. The optical integrator according to claim 19, wherein the first optical elements have an arcuate contour and the second optical elements have a rectangular contour.
21. The optical integrator according to claim 14, wherein at least one second optical element out of the plurality of second optical elements is arranged with a required level difference from a standard array surface of the plurality of second optical elements, in order to make a size of an illumination region formed on the illumination target surface by a beam traveling via the first optical element corresponding to said at least one second optical element and via said at least one second optical element, close to a size of a desired superimposed illumination region.
22. The optical integrator according to claim 14, wherein a size of the first fly's eye optical system and a distance between a center of an array surface of the plurality of first optical elements and a center of a standard array surface of the plurality of second optical elements are determined so that each illumination region formed on the illumination target surface by a beam traveling via each first optical element and corresponding second optical element becomes close to a desired superimposed illumination region.
23. An optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
- a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
- a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
- wherein at least one first optical element out of the plurality of first optical elements, and another first optical element different from said at least one first optical element have respective postures different from each other about an optical axis of the illumination optical system or about an axis parallel to the optical axis.
24. The optical integrator according to claim 23, wherein said at least one first optical element and other first optical element have the respective postures determined so that orientations of illumination regions formed on the illumination target surface by beams traveling via the first optical elements and corresponding second optical elements become close to an orientation of a desired superimposed illumination region.
25. The optical integrator according to claim 23, wherein the plurality of first optical elements and the plurality of second optical elements have a concave reflector form.
26. The optical integrator according to claim 25, wherein the first optical elements have an arcuate contour and the second optical elements have a rectangular contour.
27. The optical integrator according to claim 26, wherein said at least one first optical element and other first optical element have the respective postures different from each other along an array surface of the plurality of first optical elements.
28. The optical integrator according to claim 27, wherein the plurality of first optical elements comprise a first group of first optical elements arrayed in a first direction in a standard posture so that their arcuate sides are adjacent to each other, a second group of first optical elements arrayed in the first direction so that their arcuate sides are adjacent to each other, said second group of first optical elements being arranged adjacent on one side of the first group of first optical elements along a second direction perpendicular to the first direction, and a third group of first optical elements arrayed in the first direction so that their arcuate sides are adjacent to each other, said third group of first optical elements being arranged adjacent on the other side of the first group of first optical elements along the second direction, and
- wherein the second group of first optical elements are arranged in a first tilt posture and the third group of first optical elements are arranged in a second tilt posture different from the first tilt posture.
29. The optical integrator according to claim 28, wherein the first tilt posture and the second tilt posture are symmetric with respect to a straight line extending in the first direction.
30. The optical integrator according to claim 23, wherein at least one first optical element out of the plurality of first optical elements has a length adjusted from a standard length in a predetermined direction of the plurality of first optical elements, in order to make a length in a predetermined direction of an illumination region formed on the illumination target surface by a beam traveling via said at least one first optical element and corresponding second optical element, close to a length in the predetermined direction of a desired superimposed illumination region.
31. The optical integrator according to claim 30, wherein the first optical elements have an arcuate contour and the plurality of first optical elements comprise a group of first optical elements arrayed in a first direction so that their arcuate sides are adjacent to each other, and
- wherein said first optical element having the length adjusted has a length adjusted from a standard length in the first direction of the plurality of first optical elements.
32. The optical integrator according to claim 23, wherein at least one second optical element out of the plurality of second optical elements is arranged with a required level difference from a standard array surface of the plurality of second optical elements, in order to make a size of an illumination region formed on the illumination target surface by a beam traveling via the first optical element corresponding to said at least one second optical element and via said at least one second optical element, close to a size of a desired superimposed illumination region.
33. The optical integrator according to claim 23, wherein a size of the first fly's eye optical system and a distance between a center of an array surface of the plurality of first optical elements and a center of a standard array surface of the plurality of second optical elements are determined so that each illumination region formed on the illumination target surface by a beam traveling via each first optical element and corresponding second optical element becomes close to a desired superimposed illumination region.
34. An optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
- a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
- a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
- wherein at least one second optical element out of the plurality of second optical elements is arranged on a standard array surface of the plurality of second optical elements, and
- wherein another second optical element different from said at least one second optical element out of the plurality of second optical elements is arranged with a required level difference from the standard array surface.
35. The optical integrator according to claim 34, wherein the required level difference of said other second optical element is determined so that a size of an illumination region formed on the illumination target surface by a beam traveling via the first optical element corresponding to said second optical element and via said second optical element becomes close to a size of a desired superimposed illumination region.
36. The optical integrator according to claim 34, wherein the plurality of first optical elements and the plurality of second optical elements have a concave reflector form.
37. The optical integrator according to claim 36, wherein the first optical elements have an arcuate contour and the second optical elements have a rectangular contour.
38. The optical integrator according to claim 34, wherein a size of the first fly's eye optical system and a distance between a center of an array surface of the plurality of first optical elements and a center of the standard array surface of the plurality of second optical elements are determined so that each illumination region formed on the illumination target surface by a beam traveling via each first optical element and corresponding second optical element becomes close to a desired superimposed illumination region.
39. The optical integrator according to claim 1, wherein the plurality of first optical elements and the plurality of second optical elements are in one-to-one correspondence.
40. The optical integrator according to claim 39, wherein the plurality of first optical elements and the plurality of second optical elements are in one-to-one correspondence in accordance with such a relation that when a plurality of line segments connecting corresponding paired optical elements are projected onto a certain plane, at least a pair of projected line segments intersect.
41. The optical integrator according to claim 3, wherein the plurality of first optical elements and the plurality of second optical elements are in one-to-one correspondence.
42. The optical integrator according to claim 41, wherein the plurality of first optical elements and the plurality of second optical elements are in one-to-one correspondence in accordance with such a relation that when a plurality of line segments connecting corresponding paired optical elements are projected onto a certain plane, at least a pair of projected line segments intersect.
43. The optical integrator according to claim 14, wherein the plurality of first optical elements and the plurality of second optical elements are in one-to-one correspondence.
44. The optical integrator according to claim 43, wherein the plurality of first optical elements and the plurality of second optical elements are in one-to-one correspondence in accordance with such a relation that when a plurality of line segments connecting corresponding paired optical elements are projected onto a certain plane, at least a pair of projected line segments intersect.
45. The optical integrator according to claim 23, wherein the plurality of first optical elements and the plurality of second optical elements are in one-to-one correspondence.
46. The optical integrator according to claim 45, wherein the plurality of first optical elements and the plurality of second optical elements are in one-to-one correspondence in accordance with such a relation that when a plurality of line segments connecting corresponding paired optical elements are projected onto a certain plane, at least a pair of projected line segments intersect.
47. The optical integrator according to claim 34, wherein the plurality of first optical elements and the plurality of second optical elements are in one-to-one correspondence.
48. The optical integrator according to claim 47, wherein the plurality of first optical elements and the plurality of second optical elements are in one-to-one correspondence in accordance with such a relation that when a plurality of line segments connecting corresponding paired optical elements are projected onto a certain plane, at least a pair of projected line segments intersect.
49. An optical integrator used in an illumination optical system for illuminating an illumination target surface on the basis of light from a light source, the optical integrator comprising:
- a first fly's eye optical system having a plurality of first optical elements arranged in parallel at a position optically conjugate with the illumination target surface in an optical path between the light source and the illumination target surface; and
- a second fly's eye optical system having a plurality of second optical elements arranged in parallel so as to correspond to the plurality of first optical elements in an optical path between the first fly's eye optical system and the illumination target surface,
- wherein at least either of postures and lengths of at least one first optical element out of the plurality of first optical elements and another first optical element different from said at least one first optical element, and at least either one of a distance between said at least one first optical element and the corresponding second optical element and a distance between said other first optical element and the corresponding second optical element are determined so as to reduce a superposition error between a first illumination region formed on the illumination target surface by a first beam traveling via said at least one first optical element and corresponding second optical element and a second illumination region formed on the illumination target surface by a second beam traveling via said other first optical element and corresponding second optical element.
50. An illumination optical system for illuminating an illumination target surface on the basis of light from a light source, said illumination optical system comprising the optical integrator as set forth in claim 1.
51. The illumination optical system according to claim 50, further comprising a condenser optical system arranged in an optical path between the optical integrator and the illumination target surface and configured to make a plurality of beams traveling via the plurality of first optical elements, superimposed on the illumination target surface.
52. The illumination optical system according to claim 50, wherein there is no optical member having a power in the optical path between the optical integrator and the illumination target surface.
53. An illumination optical system for illuminating an illumination target surface on the basis of light from a light source, said illumination optical system comprising the optical integrator as set forth in claim 3.
54. An illumination optical system for illuminating an illumination target surface on the basis of light from a light source, said illumination optical system comprising the optical integrator as set forth in claim 14.
55. An illumination optical system for illuminating an illumination target surface on the basis of light from a light source, said illumination optical system comprising the optical integrator as set forth in claim 23.
56. An illumination optical system for illuminating an illumination target surface on the basis of light from a light source, said illumination optical system comprising the optical integrator as set forth in claim 34.
57. An illumination optical system for illuminating an illumination target surface on the basis of light from a light source, said illumination optical system comprising the optical integrator as set forth in claim 49.
58. An exposure apparatus comprising the illumination optical system as set forth in claim 50 for illuminating a predetermined pattern, said exposure apparatus implementing exposure of the predetermined pattern on a photosensitive substrate.
59. The exposure apparatus according to claim 58, comprising a projection optical system which forms an image of the predetermined pattern on the photosensitive substrate, wherein the predetermined pattern and the photosensitive substrate are moved relative to the projection optical system along a scanning direction, thereby implementing projection exposure of the predetermined pattern onto the photosensitive substrate.
60. The exposure apparatus according to claim 59, wherein a direction in which the plurality of first optical elements are arrayed so that their arcuate sides are adjacent to each other in the optical integrator, corresponds to the scanning direction.
61. The exposure apparatus according to claim 59, wherein the predetermined direction in which the length of said at least one first optical element in the optical integrator is adjusted, corresponds to the scanning direction.
62. An exposure apparatus comprising the illumination optical system as set forth in claim 53 for illuminating a predetermined pattern, said exposure apparatus implementing exposure of the predetermined pattern on a photosensitive substrate.
63. An exposure apparatus comprising the illumination optical system as set forth in claim 54 for illuminating a predetermined pattern, said exposure apparatus implementing exposure of the predetermined pattern on a photosensitive substrate.
64. An exposure apparatus comprising the illumination optical system as set forth in claim 55 for illuminating a predetermined pattern, said exposure apparatus implementing exposure of the predetermined pattern on a photosensitive substrate.
65. An exposure apparatus comprising the illumination optical system as set forth in claim 56 for illuminating a predetermined pattern, said exposure apparatus implementing exposure of the predetermined pattern on a photosensitive substrate.
66. A device manufacturing method comprising:
- implementing the exposure of the predetermined pattern on the photosensitive substrate, using the exposure apparatus as set forth in claim 58;
- developing the photosensitive substrate with the predetermined pattern transferred, and forming a mask layer in a shape corresponding to the predetermined pattern, on a surface of the photosensitive substrate; and
- processing the surface of the photosensitive substrate through the mask layer.
67. A device manufacturing method comprising:
- implementing the exposure of the predetermined pattern on the photosensitive substrate, using the exposure apparatus as set forth in claim 62;
- developing the photosensitive substrate with the predetermined pattern transferred, and forming a mask layer in a shape corresponding to the predetermined pattern, on a surface of the photosensitive substrate; and
- processing the surface of the photosensitive substrate through the mask layer.
68. A device manufacturing method comprising:
- implementing the exposure of the predetermined pattern on the photosensitive substrate, using the exposure apparatus as set forth in claim 63;
- developing the photosensitive substrate with the predetermined pattern transferred, and forming a mask layer in a shape corresponding to the predetermined pattern, on a surface of the photosensitive substrate; and
- processing the surface of the photosensitive substrate through the mask layer.
69. A device manufacturing method comprising:
- implementing the exposure of the predetermined pattern on the photosensitive substrate, using the exposure apparatus as set forth in claim 64;
- developing the photosensitive substrate with the predetermined pattern transferred, and forming a mask layer in a shape corresponding to the predetermined pattern, on a surface of the photosensitive substrate; and
- processing the surface of the photosensitive substrate through the mask layer.
70. A device manufacturing method comprising:
- implementing the exposure of the predetermined pattern on the photosensitive substrate, using the exposure apparatus as set forth in claim 65;
- developing the photosensitive substrate with the predetermined pattern transferred, and forming a mask layer in a shape corresponding to the predetermined pattern, on a surface of the photosensitive substrate; and
- processing the surface of the photosensitive substrate through the mask layer.
Type: Application
Filed: Feb 16, 2010
Publication Date: Sep 16, 2010
Patent Grant number: 8497977
Inventor: Yoshio KAWABE (Kumagaya-shi)
Application Number: 12/706,586
International Classification: G03B 27/54 (20060101); G02B 27/10 (20060101);
