Illumination Systems Or Details Patents (Class 355/67)
  • Patent number: 10365566
    Abstract: A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: July 30, 2019
    Assignee: Eulitha A.G.
    Inventors: Francis Clube, Harun Solak
  • Patent number: 10354959
    Abstract: A mark forming method includes: exposing a wafer with a mask image to form first and second resist marks that have different shapes than one another based on a portion of the mask image; applying a polymer layer that contains a block copolymer to the wafer by spin-coating; forming self-assembled regions in the applied polymer layer; selectively removing a portion of the self-assembled regions; and forming first and second wafer marks on the wafer using the first and second resist marks. This makes it possible to form the marks when forming circuit patterns using self-assembly of a block copolymer.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: July 16, 2019
    Assignee: NIKON CORPORATION
    Inventor: Yuji Shiba
  • Patent number: 10353294
    Abstract: An illumination optical system includes a fly's-eye lens having a back focal plane arranged on a pupil plane of the illumination optical system or in a vicinity of the pupil plane; a first spatial light modulator which is arranged on an incident side of the fly's-eye lens and which includes a plurality of first mirror elements; a first optical system arranged in an optical path between the first spatial light modulator and the fly's-eye lens; a second spatial light modulator arranged in an optical path between the first optical system and the fly's-eye lens and which includes a plurality of second mirror elements; and a polarizing element arranged in the optical path between the first spatial light modulator and the fly's-eye lens.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: July 16, 2019
    Assignee: NIKON CORPORATION
    Inventors: Norio Miyake, Kinya Kato
  • Patent number: 10332306
    Abstract: A system and method of determining data representing a mapping of optical signals described by image data of a reflecting surface of a structure to a three-dimensional surface geometry of the reflecting surface is provided. At least first, second and third light sources are provided, comprising a broadband point light source, a spectrally variable point light source and a movable linear broadband light source, respectively. First, second and third images are acquired, corresponding to each light source. Surface geometry data describing a three-dimensional surface geometry of the reflecting surface is acquired. Based on the image data and the surface geometry data, reflecting surface mapping data describing a mapping between the reflections described by the first image data, second image data and third image data, and the three-dimensional surface geometry of the reflecting surface is determined.
    Type: Grant
    Filed: July 13, 2018
    Date of Patent: June 25, 2019
    Assignee: X-Rite Switzerland GmbH
    Inventors: Adrian Kohlbrenner, Martin Rump, Beat Frick, Christopher Schwartz
  • Patent number: 10302845
    Abstract: Light-emitting quantum dot films, quantum dot lighting devices, and quantum dot-based backlight units are provided. Related compositions, components, and methods are also described. Improved quantum dot encapsulation and matrix materials are provided. Quantum dot films with protective barriers are described. High-efficiency, high brightness, and high-color purity quantum dot-based lighting devices are also included, as well as methods for improving efficiency and optical characteristics in quantum dot-based lighting devices.
    Type: Grant
    Filed: August 23, 2016
    Date of Patent: May 28, 2019
    Assignee: Nanosys, Inc.
    Inventors: Robert S. Dubrow, William P. Freeman, Ernest Lee, Paul Furuta
  • Patent number: 10303067
    Abstract: The disclosure relates to a cooler for use in a device in a vacuum, wherein the partial pressure of the cooling medium in the vacuum environment during the operation of the cooler is less than 10?3 mbar. The cooler includes a heat sink, wherein a cavity through which the cooling medium flows is formed in the heat sink, and wherein the heat sink includes a connection element which surrounds one end of the cavity through which the cooling medium flows. The cooler also includes a connecting piece for joining a coolant line to the cavity. The connecting piece includes a jacket secured on the connection element by a thermal connecting process. An intermediate layer is between the jacket and the connection element. The jacket exerts a force in the direction of the connection element so that the intermediate layer is under compressive stress in the radial direction during operation of the cooler.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: May 28, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Willi Anderl, Bernhard Weigl, Ann-Kathrin Wandner, Holger Kierey, Arno Schmittner, Markus Bauer, Marcus Schmelzeisen, Andreas Kolloch
  • Patent number: 10289008
    Abstract: An overlay measurement (OV) is based on asymmetry in a diffraction spectrum of target structures formed by a lithographic process. Stack difference between target structures can be perceived as grating imbalance (GI), and the accuracy of the overlay measurement may be degraded. A method of predicting GI sensitivity is performed using first and second images (45+, 45?) of the target structure using opposite diffraction orders. Regions (ROI) of the same images are used to measure overlay. Multiple local measurements of symmetry (S) and asymmetry (A) of intensity between the opposite diffraction orders are made, each local measurement of symmetry and asymmetry corresponding to a particular location on the target structure. Based on a statistical analysis of the local measurements of symmetry and asymmetry values, a prediction of sensitivity to grating imbalance is obtained. This can be used to select better measurement recipes, and/or to correct errors caused by grating imbalance.
    Type: Grant
    Filed: December 7, 2017
    Date of Patent: May 14, 2019
    Assignee: ASML Netherlands B.V.
    Inventor: Martin Jacobus Johan Jak
  • Patent number: 10281835
    Abstract: An exposure device according to an embodiment includes: a substrate in which light-emitting elements are mounted; an optical system which converges light emitted from the light-emitting elements; a holding member includes a holding member body which holds the substrate and the optical system, and a cut fringe projected from the holding member body; and a support member provided at a predetermined position in the holding member between the substrate and the optical system. The support member is formed of a cured agent attached to a shear surface of the cut fringe of the holding member, and the support member includes a contact surface with which the substrate is in contact.
    Type: Grant
    Filed: November 17, 2017
    Date of Patent: May 7, 2019
    Assignee: Oki Data Corporation
    Inventor: Satoshi Fuyuno
  • Patent number: 10274599
    Abstract: A Lidar system configured to have a wide field of view. The LIDAR system includes a substrate. The substrate is planar. An array of electronic laser scan transceiver chips are mounted to the substrate. An lenslet array is spaced apart from the array of electronic laser scans transceivers so as to increase the field of the array of electronic laser scan transceiver chips. A plurality of baffles extend between the array of electronic laser scan transceiver chips and the lenslet array so as to separate the electronic laser scan transceiver chips and the lenslets from each other. The baffles provide structural support for the lenslet array and are further configured to absorb scatter from the laser beams transmitted and received by respective electronic laser scan transceiver chips. Accordingly, the Lidar system increases the field of view of the individual electronic scan transceivers without complicating the manufacturing process relative to Lidar systems with convex substrates.
    Type: Grant
    Filed: June 1, 2016
    Date of Patent: April 30, 2019
    Assignee: TOYOTA MOTOR ENGINEERING & MANUFACTURING NORTH AMERICA, INC.
    Inventor: Paul Schmalenberg
  • Patent number: 10274845
    Abstract: An optical module, in particular for microlithography, includes an optical element and a support unit. The optical element has at least one optically utilized area, which defines a rotational axis of symmetry. To support the optical element the support unit has a plurality of more than three support elements. Each of the support elements in the area of a first end is connected with the optical element and in the area of a second end is connected with the support structure. The support unit is designed such that the degree of freedom of rotation of the optical element around the rotational axis of symmetry is restricted, while the position or orientation of the optical element in the other five degrees of freedom is spatially adjustable via the support unit.
    Type: Grant
    Filed: April 21, 2011
    Date of Patent: April 30, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Ivan Ivanov, Taoufik Mbarek, Mathias Huesing, Burkhard Corves
  • Patent number: 10268123
    Abstract: A photolithography method includes producing, from an optical source, a pulsed light beam; and scanning the pulsed light beam across a substrate of a lithography exposure apparatus to expose the substrate with the pulsed light beam including exposing each sub-area of the substrate with the pulsed light beam. A sub-area is a portion of a total area of the substrate. For each sub-area of the substrate, a lithography performance parameter associated with the sub-area of the substrate is received; the received lithography performance parameter is analyzed, and, based on the analysis, a first spectral feature of the pulsed light beam is modified and a second spectral feature of the pulsed light beam is maintained.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: April 23, 2019
    Assignee: Cymer, LLC
    Inventors: Eric Anders Mason, Omar Zurita, Gregory Allen Rechtsteiner, Willard Earl Conley
  • Patent number: 10261424
    Abstract: A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. The lithography apparatus further includes an actuator device configured to displace the optical component. In addition, the lithography apparatus includes a measurement device configured to determine a position of the optical component via a measurement signal having a measurement signal frequency. The measurement signal frequency is unequal to the repetition frequency, and the measurement signal frequency is unequal to integer multiples of the repetition frequency.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: April 16, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Udo Dinger, Markus Holz, Ulrich Bihr
  • Patent number: 10261425
    Abstract: The invention relates to a projection exposure apparatus for semiconductor lithography, comprising at least one manipulator for reducing image aberrations, wherein the manipulator has at least two optical elements that can be positioned relative to one another, wherein at least one of the optical elements is spatially dependent in terms of its effect on an optical wavefront passing therethrough such that a local phase change of a wavefront propagating in the optical system is produced in the case of a relative movement of the optical elements against one another. Here, the spatially dependent effect of the at least one optical element can be set in a reversible dynamic manner.
    Type: Grant
    Filed: August 27, 2015
    Date of Patent: April 16, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Alexander Wolf, Toralf Gruner, Boris Bittner, Norbert Wabra
  • Patent number: 10234767
    Abstract: Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: March 19, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Sebastianus Adrianus Goorden, Nitesh Pandey, Duygu Akbulut, Teunis Willem Tukker, Johannes Matheus Marie De Wit
  • Patent number: 10237961
    Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
    Type: Grant
    Filed: October 9, 2018
    Date of Patent: March 19, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Tsukasa Hori, Yutaka Shiraishi, Shinya Ikesaka, Takanobu Ishihara, Toshiro Umeki
  • Patent number: 10228623
    Abstract: There is provided a reflective image-forming optical system which is applicable to an exposure apparatus using, for example, EUV light and which is capable of increasing numerical aperture while enabling optical path separation of light fluxes. In a reflective imaging optical system (6) forming an image of a first plane (4) onto a second plane (7), the numerical aperture on a side of the second plane with respect to a first direction (X direction) on the second plane is greater than 1.1 times a numerical aperture on the side of the second plane with respect to a second direction (Y direction) crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop (AS) defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction (X direction) is greater than 1.1 times that in a minor axis direction (Y direction).
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: March 12, 2019
    Assignee: Nikon Corporation
    Inventor: Hideki Komatsuda
  • Patent number: 10222704
    Abstract: A method of operating an illumination system of a microlithographic projection exposure apparatus is provided. A set of illumination parameters that describe properties of a light bundle which converges at a point on a mask to be illuminated by the illumination system is first determined. Optical elements whose optical effect on the illumination parameters can be modified as a function of control commands are furthermore determined, as well as sensitivities with which the illumination parameters react to an adjustment of the optical elements, induced by the control commands. The control commands are then determined while taking the previously determined sensitivities into account, such that deviations of the illumination parameters from predetermined target illumination parameters satisfy a predetermined minimization criterion. These control commands are applied to the optical elements, before the mask is illuminated.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: March 5, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Oliver Natt, Frank Schlesener
  • Patent number: 10216091
    Abstract: A facet mirror for an illumination optical unit for projection lithography has a plurality of used facets, which in each case reflect an illumination light partial beam. The facet mirror has at least one change subunit having a plurality of change facets arranged jointly on a facet carrier, which change facets can be positioned alternatively at the used location of exactly one used facet. This results in a facet mirror with which different illumination geometries or illumination settings can be set operationally reliably and stably.
    Type: Grant
    Filed: February 17, 2017
    Date of Patent: February 26, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Deguenther, Michael Patra
  • Patent number: 10191384
    Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: calculating a discrete pupil profile based on a desired pupil profile; selecting a discrete change to the discrete pupil profile; and applying the selected discrete change to the discrete pupil profile. The methods according to various embodiments disclosed herein may reduce the computational cost of discrete optimization from O(an) to O(n) wherein a is constant and n is the number of knobs that can generate discrete change in the pupil profile.
    Type: Grant
    Filed: February 4, 2014
    Date of Patent: January 29, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Xiaofeng Liu, Rafael C. Howell
  • Patent number: 10191382
    Abstract: An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.
    Type: Grant
    Filed: April 26, 2018
    Date of Patent: January 29, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Erich Schubert, Alexander Kohl, Gerhard-Wilhelm Ziegler, Michael Patra, Markus Deguenther, Michael Layh
  • Patent number: 10181399
    Abstract: A method for manufacturing a semi-conducting material including a layer of nitride of a group 13 element comprising active areas for manufacturing electronic components, and inactive areas, the active and inactive areas extending on a front face of the layer of nitride, the method comprising steps consisting of: using a mask comprising a plurality of apertures each defining an active area pattern on the initial substrate, growing the layer of nitride, receiving a theoretical pattern pitch corresponding to a desired distance between two adjacent active area patterns on the front face of the layer of nitride, calculating at least one mask pitch different from the theoretical pattern pitch for compensating shifts in the active area patterns, the mask pitch corresponding to a distance between two adjacent apertures of the protective mask.
    Type: Grant
    Filed: July 27, 2015
    Date of Patent: January 15, 2019
    Assignee: Saint-Gobain Lumilog
    Inventors: Bernard Beaumont, Jean-Pierre Faurie
  • Patent number: 10175582
    Abstract: An optical element for transmitting radiation includes: a first surface region surrounding an optically used area of the optical element; and a second surface region that adjoins the first surface region. A circumferential edge is formed between the first and second surface regions. The optical element further includes a one-piece film which covers the first surface region, the edge and the second surface region. The film includes a hydrophobic material at least on its side facing away from the first and the second surface regions. An optical assembly includes at least one such optical element. A method produces such an optical element.
    Type: Grant
    Filed: May 25, 2017
    Date of Patent: January 8, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Roland Pilz, Thomas Petasch
  • Patent number: 10168619
    Abstract: The disclosure relates to an optical device for a lithography system, including an optical element, a supporting frame supporting the optical element, a sensor frame mechanically decoupled from the supporting frame, wherein a gap is provided between the supporting frame and the sensor frame, and a sensor assembly designed to determine a width of the gap in a contactless manner. The sensor assembly has a contact element and a contact surface. The contact element is designed to contact the contact surface to limit relative motion of the supporting frame relative to the sensor frame.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: January 1, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Ralf Zweering
  • Patent number: 10168615
    Abstract: Provided is an imprint apparatus that applies a resin to several locations on a substrate, brings the resin and a mold into contact, and transfers a contoured pattern formed in the mold to the resin, comprising: a controller that sets a principal axis direction according to the contoured pattern and determines the application positions of the resin based on the principal axis direction that has been set such that the distances between resin drops that have been applied so as to be separated in the principal axis direction is larger than the distances between resin drops that have been applied so as to be separated in a direction that is perpendicular to the principal axis direction; and a dispenser that applies the resin based on the application position that has been determined.
    Type: Grant
    Filed: June 20, 2014
    Date of Patent: January 1, 2019
    Assignees: CANON KABUSHIKI KAISHA, CANON NANOTECHNOLOGIES, INC., KABUSHIKI KAISHA TOSHIBA
    Inventors: Keiji Yamashita, Yutaka Watanabe, Takuya Kono, Masayuki Hatano, Ikuo Yoneda
  • Patent number: 10168603
    Abstract: An optical member driving apparatus includes an optical member for changing an optical path, a plurality of actuators each having a movable member which is controlled to move in one direction, a plurality of connecting members which connect edge portions of the optical member positioned on two axes orthogonal to each other and the movable members of the plurality of actuators, respectively, a position detector for detecting a moving amount of the movable member of each actuator and outputting a detection signal indicating the moving amount, and a controller for controlling movement of the movable member of each actuator based on the detection signal from the position detector so as to keep an intersection point of the two axes at constant position.
    Type: Grant
    Filed: June 24, 2016
    Date of Patent: January 1, 2019
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Takaaki Gyoten, Nobuyuki Kondo, Ken Mashitani
  • Patent number: 10168522
    Abstract: A pattern irradiation apparatus includes a light source unit, an objective that irradiates a sample plane with light emitted from the light source unit, a spatial light modulator of a phase modulation type that is arranged at a position conjugate with a pupil position of the objective and that modulates a phase of the light emitted from the light source unit, a light blocking member that is arranged in an optical path between the spatial light modulator and the objective and that is configured to block 0-order light generated by the spatial light modulator, and a control device that makes a correspondence between a focusing position of the 0-order light generated by the spatial light modulator and a position of the light blocking member.
    Type: Grant
    Filed: October 17, 2016
    Date of Patent: January 1, 2019
    Assignee: OLYMPUS CORPORATION
    Inventor: Shintaro Fujii
  • Patent number: 10151574
    Abstract: Methods and related equipment for dynamic on-axis in-situ interferometry where the reference surface is positioned in an vacuum chamber. The systems use a wavelength shifting, or a phase shifting interferometer that allows the freedom to eliminate the need to step the cavity length physically with the reference surface, allowing the reference surface to be placed inside the vacuum chamber.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: December 11, 2018
    Assignee: UChicago Argonne, LLC
    Inventors: Raymond P. Conley, Jun Qian, Mark J. Erdmann, Elina Kasman, Lahsen Assoufid, Scott J. Izzo
  • Patent number: 10146033
    Abstract: A projection optical unit images an object field in an image field. The projection optical unit includes a plurality of mirrors guides imaging light from the object field to the image field. At least two of the mirrors are arranged directly behind one another in the beam path of the imaging light for grazing incidence with an angle of incidence of the imaging light which is greater than 60°. This results in an imaging optical unit that can exhibit a well-corrected imageable field with, at the same time, a high imaging light throughput.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: December 4, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Markus Schwab
  • Patent number: 10146138
    Abstract: A method for producing an optical element includes: providing a substrate (102), applying a layer system (103), wherein an optically effective surface (101) is formed and wherein the layer system has a layer (104) that is thermally deformable for manipulating the geometric shape of the optically effective surface, and applying a temperature field to the optical element while at least regionally heating the thermally deformable layer to above a specified operating temperature of the optical system. The thermally deformable layer is configured such that a deformation that is induced when the temperature field is applied is at least partially maintained after the optical element has cooled. Also disclosed is an optical element (400) that has an optically effective surface (401), a substrate (402), and a layer system (403) that has a reflection layer system (406), which includes a shape-memory alloy.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: December 4, 2018
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Kerstin Hild, Franz-Josef Stickel, Robert Fichtl, Joachim Hartjes
  • Patent number: 10139604
    Abstract: Aspects are generally directed to a compact anamorphic objective lens assembly. In one example, the objective lens assembly includes a first anamorphic lens group including a first cylindrical lens having a surface optically powered in a first dimension and a second cylindrical lens having a surface optically powered in a second dimension orthogonal to the first dimension, the first anamorphic lens group being positioned to receive visible light along an optical path, a second anamorphic lens group positioned along the optical path to receive the visible light from the first anamorphic lens group, the second anamorphic lens group including a third cylindrical lens having a surface optically powered in the first dimension and a fourth cylindrical lens having a surface optically powered in the second dimension, and an aperture stop centered along the optical path and interposed between the first and second anamorphic lens groups.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: November 27, 2018
    Assignee: RAYTHEON COMPANY
    Inventor: Mark Noethen
  • Patent number: 10133182
    Abstract: An illumination optical assembly for a projection exposure apparatus includes a first facet element having a multiplicity of first facets, which are formed in each case by a multiplicity of displaceable individual mirrors, and a second facet element having a multiplicity of second facets. The displacement positions of the individual mirrors of the first facets are chosen in each case in so that, in the case of a predefined intensity distribution of an illumination radiation in an intermediate focus, the illumination radiation in the region of the facets of the second facet element has an intensity distribution with a maximum which is at most equal to a predefined maximum intensity or which is greater than a mean value of the intensity distribution by at most a predefined factor or absolute value.
    Type: Grant
    Filed: February 17, 2017
    Date of Patent: November 20, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Martin Endres, Stig Bieling
  • Patent number: 10120283
    Abstract: There is provided an illumination method for illuminating an illumination objective surface by using a light from a light source. The illumination method includes setting control amount for controlling a plurality of optical elements, to control a state of an incident light coming into each of the plurality of optical elements, the plurality of optical elements being arranged in parallel and being capable of controlling the state of the incident light; illuminating the illumination objective surface with the light from the light source via the plurality of optical elements; monitoring integrated energy of the light from the light source; and correcting the control amount for the plurality of optical elements on the basis of a result of the monitoring of the integrated energy.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: November 6, 2018
    Assignee: NIKON CORPORATION
    Inventor: Yasushi Mizuno
  • Patent number: 10116117
    Abstract: Emitter width of an LD is set greater than a diameter, of a core, in an entrance end surface of an optical fiber. An optical system provided between the LD and the optical fiber causes a diameter, of laser beam, in the entrance end surface of the optical fiber to become smaller than the diameter, of the core, in the entrance end surface of the optical fiber. The LD is configured so that a beam parameter product of the laser beam emitted from the LD shows a local minimal value which changes in accordance with the emitter width of the LD, and which is equal to or smaller than a beam parameter product of the optical fiber. The emitter width of the LD is set so that the beam parameter product of the laser beam emitted from the LD is equal to or smaller than that of the optical fiber.
    Type: Grant
    Filed: March 3, 2017
    Date of Patent: October 30, 2018
    Assignee: FUJIKURA LTD.
    Inventor: Shinichi Sakamoto
  • Patent number: 10078270
    Abstract: The disclosure provides an arrangement for an optical device including a component of the optical device and a support structure supporting the component. The support structure includes at least one locking device connected to the component and including a first fixation device and an associated second fixation device. The first fixation device and the second fixation device are adapted to be, in a movable state, movable with respect to each other along a first degree of freedom and a second degree of freedom into a final position. The first fixation device and the second fixation device are further adapted to be, in a locked state, fixed in the final position by at least one locking device contacting the first fixation device and the second fixation device.
    Type: Grant
    Filed: November 2, 2015
    Date of Patent: September 18, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Thomas Bischoff, Joachim Feucht, Jochen Wieland, Stefan Mueller
  • Patent number: 10073357
    Abstract: There is disclosed a method of measuring a process parameter for a manufacturing process involving lithography. In a disclosed arrangement the method comprises performing first and second measurements of overlay error in a region on a substrate, and obtaining a measure of the process parameter based on the first and second measurements of overlay error. The first measurement of overlay error is designed to be more sensitive to a perturbation in the process parameter than the second measurement of overlay error by a known amount.
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: September 11, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Arie Jeffrey Den Boef, Omer Abubaker Omer Adam, Te-Chih Huang, Youping Zhang
  • Patent number: 10067068
    Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an illumination system that utilizes illuminating radiation with a wavelength of 2-40 nm. The illumination system includes an optical element that splits the illuminating radiation into a first and a second illuminating radiation and induces a time delay to the first or the second illuminating radiation. A detector detects the radiation that has been scattered by a target structure. The inspection apparatus has a processing unit operable to control a time delay between the first scattered radiation and the second scattered radiation so as to optimize a property of the combined first and second scattered radiation.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: September 4, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Simon Gijsbert Josephus Mathijssen, Nan Lin, Sander Bas Roobol
  • Patent number: 10061204
    Abstract: A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface, wherein the mirror has a reflectivity of at least 0.5 for electromagnetic radiation which has a prescribed working wavelength and impinges on the optically effective surface at an angle of incidence based on the respective surface normal of at least 65°, wherein the mirror has at least one layer (160, 170, 320) which comprises a compound of an element of the second period and an element of the 4d transition group, wherein the mirror has a protective layer (430, 530, 630, 730) arranged on top in the direction of the optically effective surface, wherein the material of the layer (420, 510, 620, 705) arranged in each case underneath the protective layer in the direction of the optically effective surface has a lower absorption than the material of the protective layer (430, 530, 630, 730).
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: August 28, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Hartmut Enkisch
  • Patent number: 10042266
    Abstract: The present invention provides a determination method of determining a first prediction formula for predicting a fluctuation in optical characteristics of a projection optical system while a substrate is exposed on a first exposure condition, the method comprising obtaining a correlation coefficient between the first exposure condition and a second exposure condition corresponding to a second prediction formula for predicting the fluctuation in the optical characteristics, determining, when the correlation coefficient falls within an allowable range, the first prediction formula based on the second prediction formula without actually measuring the fluctuation in the optical characteristics, and determining, when the correlation coefficient falls outside the allowable range, the first prediction formula based on a result of actually measuring the fluctuation in the optical characteristics.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: August 7, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Koshiro Arahara
  • Patent number: 10044160
    Abstract: A pulsed light generating method for generating a pulsed light by cutting out a laser light outputted from a laser light source with an intensity modulation type electro optic modulator, wherein: the electro optic modulator is driven by use of a drive signal that changes a voltage applied to the electro optic modulator between a voltage lower than a reference voltage and a voltage higher than the reference voltage, the reference voltage being a voltage applied to the electro optic modulator at which a transmittance of the laser light transmitting through the electro optic modulator is local maximum.
    Type: Grant
    Filed: August 16, 2016
    Date of Patent: August 7, 2018
    Assignee: NIKON CORPORATION
    Inventors: Naoto Inaba, Akira Tokuhisa
  • Patent number: 10026215
    Abstract: A system and method of determining data representing a mapping of optical signals described by image data of a reflecting surface of a structure to a three-dimensional surface geometry of the reflecting surface is provided. At least first, second and third light sources are provided, comprising a broadband point light source, a spectrally variable point light source and a movable linear broadband light source, respectively. First, second and third images are acquired, corresponding to each light source. Surface geometry data describing a three-dimensional surface geometry of the reflecting surface is acquired. Based on the image data and the surface geometry data, reflecting surface mapping data describing a mapping between the reflections described by the first image data, second image data and third image data, and the three-dimensional surface geometry of the reflecting surface is determined.
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: July 17, 2018
    Assignee: X-Rite Switzerland GMBH
    Inventors: Adrian Kohlbrenner, Martin Rump, Beat Frick, Christopher Schwartz
  • Patent number: 10025203
    Abstract: The disclosure relates to a method and an arrangement for actuating an element in a system for microlithography. According to an aspect in at least one degree of freedom an actuator force is exerted on the element via at least two actuator components. The actuator components are driven independently of one another for generating the actuator force. Driving is effected so that a thermal power introduced into the system on account of the generation of the actuator force by the actuator components deviates from a predefined constant value by not more than 20%.
    Type: Grant
    Filed: October 3, 2016
    Date of Patent: July 17, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Gerald Rothenhoefer, Christian Kempter
  • Patent number: 10018917
    Abstract: An illumination optical unit for EUV projection lithography illuminates an object field, in which an object to be imaged is arrangeable. A first facet mirror of the illumination optical generates secondary light sources as images of an upstream light source. The first facet mirror includes mirrors which include a mirror surface smaller than 2 mm×2 mm. The first facet mirror is a distance |g| from the light source. The illumination optical unit includes a second facet mirror. The two facet mirrors are a distance b? from each other. The individual mirrors of the first facet mirror have a focal length f in a plane of incidence of the illumination light on the individual mirrors such that [0.1 b?g/(g?b?)]<f<[10 b?g/(g?b?)].
    Type: Grant
    Filed: February 17, 2017
    Date of Patent: July 10, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stig Bieling, Martin Endres, Markus Deguenther, Michael Patra, Johannes Wangler
  • Patent number: 10018803
    Abstract: An external facility is used to control positioning of multiple displaceable mirror elements of a multi-mirror arrangement. The external facility is to a multi-mirror arrangement via a data channel having a bandwidth of at least 1 kHz per controlled degree of freedom of displacement.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: July 10, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jan Horn, Markus Holz, Joerg Specht, Johannes Eisenmenger, Stefan Krone
  • Patent number: 10012910
    Abstract: Multi-beam pattern generators employing processors to vary delivered dose of writing beams according to photoresist thicknesses, and associated methods are disclosed. A pattern generator may write a pattern upon a substrate having a photoresist which is sensitive to the writing beams. The pattern may be written in respective writing cycles when the writing beams write at least a portion of the pattern at writing pixel locations. A beam actuator of the pattern generator may independently direct the writing beams to the writing pixels to deliver respective pixel doses during each writing cycle. Pixel doses delivered may be adjusted according to a thickness of the photoresist at various writing pixel locations according to one or more approaches, using one or more of: actuator dwell times, emitted pulse duration, emitted pulse frequency, and emitted pulse intensity. In this manner, additional dimensional control is provided for substrates having variable photoresist thicknesses.
    Type: Grant
    Filed: June 19, 2014
    Date of Patent: July 3, 2018
    Assignee: Applied Materials, Inc.
    Inventor: Christopher Dennis Bencher
  • Patent number: 9996013
    Abstract: An extreme ultraviolet lithography (EUVL) system is disclosed. The system includes an extreme ultraviolet (EUV) mask with three states having respective reflection coefficient is r1, r2 and r3, wherein r3 is a pre-specified value that is a function of r1 and r2. The system also includes a nearly on-axis illumination (ONI) with partial coherence ? less than 0.3 to expose the EUV mask to produce diffracted light and non-diffracted light. The system further includes a projection optics box (PUB) to remove a portion of the non-diffracted light and to collect and direct the diffracted light and the remaining non-diffracted light to expose a target.
    Type: Grant
    Filed: June 27, 2016
    Date of Patent: June 12, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yen-Cheng Lu, Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen
  • Patent number: 9996012
    Abstract: A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.
    Type: Grant
    Filed: July 5, 2016
    Date of Patent: June 12, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Udo Dinger, Martin Endres, Armin Werber, Norbert Muehlberger, Florian Bach
  • Patent number: 9996010
    Abstract: An illumination optical assembly for projection lithography serves for illuminating an object field, in which an object to be imaged is arrangeable. The object field has a scan length along an object displacement direction. The illumination optical assembly has two facet mirrors for the reflective guidance of illumination light towards the object field. Second facets of the second facet mirror serve for guiding a respective illumination light partial beam into the object field. The second facet mirror is a pupil distance from a pupil plane of the illumination optical assembly that is closest adjacent to the second facet mirror. The second facets are arranged in a grid, wherein at least one grid constant of the grid is predefined by the pupil distance and by the scan length. This results in an illumination optical assembly which achieves an illumination of predefined pupil sections that is relatively homogeneous.
    Type: Grant
    Filed: February 22, 2017
    Date of Patent: June 12, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Martin Endres
  • Patent number: 9991665
    Abstract: The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units.
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: June 5, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Umeda, Takeshi Asayama, Osamu Wakabayashi
  • Patent number: 9989866
    Abstract: A photolithography method includes producing, from an optical source, a pulsed light beam; and scanning the pulsed light beam across a substrate of a lithography exposure apparatus to expose the substrate with the pulsed light beam including exposing each sub-area of the substrate with the pulsed light beam. A sub-area is a portion of a total area of the substrate. For each sub-area of the substrate, a lithography performance parameter associated with the sub-area of the substrate is received; the received lithography performance parameter is analyzed, and, based on the analysis, a first spectral feature of the pulsed light beam is modified and a second spectral feature of the pulsed light beam is maintained.
    Type: Grant
    Filed: October 17, 2016
    Date of Patent: June 5, 2018
    Assignee: Cymer, LLC
    Inventors: Eric Anders Mason, Omar Zurita, Gregory Allen Rechtsteiner, Willard Earl Conley
  • Patent number: 9983482
    Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
    Type: Grant
    Filed: February 26, 2014
    Date of Patent: May 29, 2018
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbH
    Inventors: Erik Roelof Loopstra, Olav Waldemar Vladimir Frijns, Stig Bieling, Antonius Theodorus Wilhelmus Kempen, Ivo Vanderhallen, Nicolaas Ten Kate, Ruud Antonius Catharina Maria Beerens, Richard Henricus Adrianus Van Lieshout, Theodorus Petrus Maria Cadee, Sjoerd Nicolaas Lambertus Donders, Alexander Matthijs Struycken, Marcus Petrus Scheepers