Illumination Systems Or Details Patents (Class 355/67)
  • Patent number: 11467501
    Abstract: There is provided a reflective image-forming optical system which is applicable to an exposure apparatus using, for example, EUV light and which is capable of increasing numerical aperture while enabling optical path separation of light fluxes. In a reflective imaging optical system (6) forming an image of a first plane (4) onto a second plane (7), the numerical aperture on a side of the second plane with respect to a first direction (X direction) on the second plane is greater than 1.1 times a numerical aperture on the side of the second plane with respect to a second direction (Y direction) crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop (AS) defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction (X direction) is greater than 1.1 times that in a minor axis direction (Y direction).
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: October 11, 2022
    Assignee: Nikon Corporation
    Inventor: Hideki Komatsuda
  • Patent number: 11459227
    Abstract: Disclosed is a hinged MEMS and/or NEMS device with out-of-plane movement including a first portion and a second portion that is hinged so as to be able to rotate with respect to the first portion about an axis of rotation contained in a first mean plane of the device. The device also includes a hinging element that connects the first portion and the second portion and that is stressed flexurally and a sensing element that extends between the first portion and the second portion and that deforms during the movement of the second portion. Finally, the device includes two blades that extend perpendicularly to the mean plane of the hinge device and parallel to the axis of rotation, the blades being placed between the hinging element and the sensing element and connecting the first portion and the second portion and being stressed torsionally during the movement of the second portion.
    Type: Grant
    Filed: November 9, 2017
    Date of Patent: October 4, 2022
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Loic Joet, Audrey Berthelot
  • Patent number: 11460782
    Abstract: A method for reducing apparatus performance variation. The method includes obtaining (i) a reference performance (e.g., CD) of a reference apparatus (e.g., a reference scanner), (ii) a set of initial leading degrees of freedom selected from a plurality of degrees of freedom of a plurality of pupil facet mirrors of an apparatus (e.g., to be matched scanner) that is selected to reproduce the reference performance, and (iii) exposure data related to one or more parameters (e.g., CD, overlay, focus, etc.) of the patterning process indicating a performance of the apparatus based on the set of initial leading degrees of freedom; and determining a matching pupil of the apparatus based on the set of initial leading degrees of freedom and the exposure data such that the matching pupil reduces a difference between the performance of the apparatus and the reference performance.
    Type: Grant
    Filed: August 12, 2019
    Date of Patent: October 4, 2022
    Assignee: ASML Netherlands B.V.
    Inventor: Anton Bernhard Van Oosten
  • Patent number: 11442352
    Abstract: The present invention provides a lighting system, including at least one light source, a depolarization element and a light homogenization element. The at least one light source is configured to provide at least one light beam. The depolarization element is disposed on a transmission path of the at least one light beam. The depolarization element includes a first optical element, and the first optical element is provided with a first optical axis. The light homogenization element is configured to allow the at least one light beam to pass to form an illuminating light beam. The incident direction where the at least one light beam is transmitted to the first optical element is not parallel to the first light axis. The depolarization element is located between the at least one light source and the light homogenization element. In addition, projection apparatus is also provided.
    Type: Grant
    Filed: July 12, 2020
    Date of Patent: September 13, 2022
    Assignee: Coretronic Corporation
    Inventors: Yao-Shun Lin, Hsuan-I Wu
  • Patent number: 11422148
    Abstract: Apparatus for generating a two-dimensional illumination pattern of light beams, including: controller; a micromirror array; illuminator; collector; and a microlens array; wherein the controller is configured for tilting the micromirrors such that in the Fourier plane of the collector, intensity maxima of light collected by the collector can be generated, wherein the intensity maxima are each allocated to one of the microlenses, wherein from the respectively generated intensity maximum one of the light beams is generated by the respectively allocated microlens.
    Type: Grant
    Filed: April 28, 2016
    Date of Patent: August 23, 2022
    Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
    Inventor: Christoph Skupsch
  • Patent number: 11397384
    Abstract: Embodiments of the present disclosure are related to systems and methods for autofocusing an imaging apparatus in real-time during substrate scanning to pattern a substrate that includes a photoresist formed over one or more patterned materials. Displays of varying sizes can be fabricated using digital photolithography systems. The digital photolithography systems discussed herein, which may be referred to as imaging systems, use one or more exposure sources, including solid state emitter devices, for operations including patterning photoresists. Signal classifiers are used to perform shape and pattern recognition to determine whether signals received during substrate scanning are from a top photoresist surface or from sub-surface layers. One or more parameters of the imaging apparatus can be adjusted or maintained based on the signal analysis.
    Type: Grant
    Filed: December 4, 2020
    Date of Patent: July 26, 2022
    Assignee: Applied Materials, Inc.
    Inventor: Rashid M. Sallak
  • Patent number: 11385553
    Abstract: A method of measuring overlay uses a plurality of asymmetry measurements from locations (LOI) on a pair of sub-targets (1032, 1034) formed on a substrate (W). For each sub-target, the plurality of asymmetry measurements are fitted to at least one expected relationship (1502, 1504) between asymmetry and overlay, based on a known bias variation deigned into the sub-targets. Continuous bias variation in one example is provided by varying the pitch of top and bottom gratings (P1/P2). Bias variations between the sub-targets of the pair are equal and opposite (P2/P1). Overlay (OV) is calculated based on a relative shift (xs) between the fitted relationships for the two sub-targets. The step of fitting asymmetry measurements to at least one expected relationship includes wholly or partially discounting measurements (1506, 1508, 1510) that deviate from the expected relationship and/or fall outside a particular segment of the fitted relationship.
    Type: Grant
    Filed: May 3, 2021
    Date of Patent: July 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar, Elliott Gerard McNamara, Arie Jeffrey Den Boef, Paul Christiaan Hinnen, Murat Bozkurt, Joost Jeroen Ottens, Kaustuve Bhattacharyya, Michael Kubis
  • Patent number: 11385557
    Abstract: A measurement device is equipped with a surface plate, a slider which holds a substrate and which is movable relative to the surface plate, a drive system that moves the slider, a first position measurement system which measures the slider's first position information relative to the surface plate, a measurement unit having a mark detection system that detects a mark on a substrate, a second position measurement system which measures a relative second position information between the mark detection system and substrate, and a controller which obtains the first position information from the first position measurement system and second position information from the second position measurement system while controlling the slider's movement by the drive system, and obtains position information of a plurality of marks based on detection signals of the mark detection system having detected marks on the substrate, the first position information, and the second position information.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: July 12, 2022
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 11366307
    Abstract: A defect detection system includes a programmable and reconfigurable digital micro-mirror device (DMD) and at least one optical element. The DMD includes a micro-mirror array with a plurality of micro-mirrors adjustable to achieve a first deflection state or a second deflection state. The DMD is configured to receive incoming light and reflect a first portion of the incoming light into a first light channel corresponding to the first deflection state and a second portion of the incoming light into a second light channel corresponding to the second deflection state. The at least one optical element is optically coupled to the first light channel and the second light channel. The at least one optical element is configured to deflect the first portion of the incoming light to a first imaging lens and a second portion of the incoming light to a second imaging lens.
    Type: Grant
    Filed: August 27, 2020
    Date of Patent: June 21, 2022
    Assignee: KLA Corporation
    Inventors: Hongxing Yuan, Tim Mahatdejkul, Bret Whiteside
  • Patent number: 11347151
    Abstract: A method of calculating electromagnetic scattering properties of a structure represented as a nominal structure and a structural perturbation, has the steps: 1008 numerically solving a volume integral equation comprising a nominal linear system 1004 to determine a nominal vector field being independent with respect to the structural perturbation; 1010 using a perturbed linear system 1006 to determine an approximation of a vector field perturbation arising from the structural perturbation, by solving a volume integral equation or an adjoint linear system. Matrix-vector multiplication of a nominal linear system matrix convolution operator may be restricted to sub-matrices; and 1012 calculating electromagnetic scattering properties of the structure using the determined nominal vector field and the determined approximation of the vector field perturbation.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: May 31, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Markus Gerardus Martinus Maria Van Kraaij, Maxim Pisarenco, Richard Quintanilha
  • Patent number: 11340532
    Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: May 24, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
  • Patent number: 11281114
    Abstract: A projection exposure apparatus for semiconductor lithography having a projection optical unit. The projection optical unit includes a sensor frame, a carrying frame, and a module. The module includes an optical element and actuators for positioning and orienting the optical element. The module is on the carrying frame, and the sensor frame is a reference for the positioning of the optical element. The module includes an infrastructure which includes interfaces for separating a module from the projection optical unit. A method exchanges the module of a projection optical unit of a projection exposure apparatus for semiconductor lithography, wherein the module includes an optical element, while the reference remains in the projection exposure apparatus.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: March 22, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jens Kugler, Mark Feygin, Stefan Xalter, Bernhard Gellrich, Stefan Hembacher
  • Patent number: 11269210
    Abstract: An optical assembly and a display apparatus are provided. The optical assembly includes a cover plate, an optical transparent adhesive, a polarizer, a display panel, and an antireflection coating. The antireflection coating is disposed at a location corresponding to a camera, and is configured to reduce the reflectivity of incident light entering the camera. The antireflection coating is disposed at the location corresponding to the camera, so as to reduce the reflectivity of the incident light entering the camera, thereby increasing a mount of admitted light of the camera.
    Type: Grant
    Filed: November 1, 2018
    Date of Patent: March 8, 2022
    Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Fancheng Liu
  • Patent number: 11260579
    Abstract: Three-dimensional objects are formed by photo-curing a liquid polymer by exposure to a radiation in a space between a sheet transparent to the radiation and a supporting plate. On a side of the sheet facing towards the photo-curing liquid polymer, a membrane is arranged. The membrane is transparent to the radiation and covered by a layer of liquid lubricant. The membrane is displaceable with respect to an area in which said liquid polymer is undergoing curing by exposure to the radiation, which radiation (e.g., at 410 nm) may be provided by a collimated light source composed of an array of light emitting diode (LED) sources, an array of baffles, and an array of lenses. The baffles limit beam widths of each individual LED source in the array of LED, and the array of lenses is located one focal length from said array of LED sources.
    Type: Grant
    Filed: January 25, 2017
    Date of Patent: March 1, 2022
    Assignee: NEXA3D Inc.
    Inventors: Gianni Zitelli, Avi N. Reichental, Luciano Tringali
  • Patent number: 11260532
    Abstract: A calibration device is provided. The calibration device includes a frame, a first optical sensing device, a second optical sensing device and a third optical sensing device. The frame includes a bottom plate and at least four sidewalls, wherein the sidewalls have a first grating hole, a second grating hole, a third grating hole and a fourth grating hole at a first height. The bottom plate has an image recognition pattern, a first measurement point, a second measurement point and a third measurement point.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: March 1, 2022
    Assignee: DELTA ELECTRONICS, INC.
    Inventors: Yuan-Kun Hsiao, Jian-Jang Lai, Ko-Yueh Chen
  • Patent number: 11249399
    Abstract: A photolithography method, a method of preparing a flexible substrate and a photoresist drying device are provided. The photolithography method includes: providing a base substrate on which a material layer to be etched is formed, in which the base substrate includes an intermediate region and a peripheral region surrounding the intermediate region; coating a layer of photoresist on the base substrate, in which the photoresist is coated in the intermediate region and the peripheral region, and is formed to cover the material layer to be etched; and drying the photoresist and simultaneously performing a first exposure process on the photoresist coated in the peripheral region.
    Type: Grant
    Filed: May 8, 2019
    Date of Patent: February 15, 2022
    Assignees: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Cheng Tang, Zebin Sun, Zhen Zhen, Hao Zhang, Shitao Zhang, Xinxing Fan, Xudong Zhang
  • Patent number: 11243470
    Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.
    Type: Grant
    Filed: August 21, 2017
    Date of Patent: February 8, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Nitish Kumar, Adrianus Johannes Hendrikus Schellekens, Sietse Thijmen Van Der Post, Ferry Zijp, Willem Maria Julia Marcel Coene, Peter Danny Van Voorst, Duygu Akbulut, Sarathi Roy
  • Patent number: 11226440
    Abstract: A method of forming patterned features on a substrate is provided. The method includes positioning a plurality of masks arranged in a mask layout over a substrate. The substrate is positioned in a first plane and the plurality of masks are positioned in a second plane, the plurality of masks in the mask layout have edges that each extend parallel to the first plane and parallel or perpendicular to an alignment feature on the substrate, the substrate includes a plurality of areas configured to be patterned by energy directed through the masks arranged in the mask layout. The method further includes directing energy towards the plurality of areas through the plurality of masks arranged in the mask layout over the substrate to form a plurality of patterned features in each of the plurality of areas.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: January 18, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Yongan Xu, Rutger Meyer Timmerman Thijssen, Jinrui Guo, Ludovic Godet
  • Patent number: 11226566
    Abstract: A method of measuring misregistration in the manufacture of semiconductor devices including providing a multilayered semiconductor device, using a scatterometry metrology tool to perform misregistration measurements at multiple sites on the multilayered semiconductor device, receiving raw misregistration data for each of the misregistration measurements, thereafter providing filtered misregistration data by removing outlying raw misregistration data points from the raw misregistration data for each of the misregistration measurements, using the filtered misregistration data to model misregistration for the multilayered semiconductor device, calculating correctables from the modeled misregistration for the multilayered semiconductor device, providing the correctables to the scatterometry metrology tool, thereafter recalibrating the scatterometry metrology tool based on the correctables and measuring misregistration using the scatterometry metrology tool following the recalibration.
    Type: Grant
    Filed: January 28, 2021
    Date of Patent: January 18, 2022
    Assignee: KLA-Tencor Corporation
    Inventors: Roie Volkovich, Ido Dolev
  • Patent number: 11202020
    Abstract: A lens system for a camera objective has a plurality of optical lenses that are arranged one after another along an optical axis and are configured for imaging in the visually perceivable spectral range. At least a part of the optical lenses has two types of lens faces that intersect a beam path of the camera objective. At least three of said lens faces are provided with a first anti-reflective coating which has a larger reflectance in at least one partial region of the visible spectral range than a second anti-reflective coating of the remaining lens faces. In addition, a camera objective including the lens system and a method for producing a lens system are provided.
    Type: Grant
    Filed: August 29, 2020
    Date of Patent: December 14, 2021
    Assignee: Carl Zeiss AG
    Inventor: Benjamin Voelker
  • Patent number: 11187996
    Abstract: The present application discloses an exposure method and an exposure device thereof. The method includes the following steps: confirming a position of a point to be exposed; capturing and confirming that the point to be exposed is successfully captured; adjusting a light source corresponding to the successfully captured point to be exposed to an adaptive position; and completing an exposure operation by an exposure machine.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: November 30, 2021
    Assignees: CHONGQING HKC OPTOELECTRONICS TECHNOLOGY CO., LTD., HKC CORPORATION LIMITED
    Inventor: Wei Ni
  • Patent number: 11187990
    Abstract: A mirror for a microlithographic projection exposure apparatus, and a method for operating a deformable mirror. In one aspect, a mirror includes an optical effective surface (11), a mirror substrate (12), a reflection layer stack (21) for reflecting electromagnetic radiation incident on the optical effective surface, and at least one piezoelectric layer (16) arranged between the mirror substrate and the reflection layer stack and to which an electric field for producing a locally variable deformation is able to be applied by a first electrode arrangement situated on the side of the piezoelectric layer (16) facing the reflection layer stack, and by a second electrode arrangement situated on the side of the piezoelectric layer facing the mirror substrate. The piezoelectric layer has a plurality of columns spatially separated from one another by column boundaries, wherein a mean column diameter of the columns is in the range of 0.1 ?m to 50 ?m.
    Type: Grant
    Filed: January 26, 2021
    Date of Patent: November 30, 2021
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Johannes Lippert, Toralf Gruner, Kerstin Hild, Philip Lucke, Mohammadreza Nematollahi
  • Patent number: 11181835
    Abstract: Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation. The wavelength dependent spatial filter may comprise a dichroic filter operable to substantially transmit scattered radiation within a first wavelength range and substantially block scattered radiation within a second wavelength range and at least one second filter operable to substantially block scattered radiation at least within the first wavelength range and the second wavelength range.
    Type: Grant
    Filed: April 13, 2018
    Date of Patent: November 23, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Sebastianus Adrianus Goorden, Johannes Antonius Gerardus Akkermans, Simon Reinald Huisman, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary
  • Patent number: 11175593
    Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
    Type: Grant
    Filed: April 3, 2019
    Date of Patent: November 16, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Simon Reinald Huisman, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Yuxiang Lin, Vu Quang Tran, Sebastianus Adrianus Goorden, Justin Lloyd Kreuzer, Christopher John Mason, Igor Matheus Petronella Aarts, Krishanu Shome, Irit Tzemah
  • Patent number: 11158484
    Abstract: An e-beam inspection tool is disclosed, the tool comprising, an electron optics system configured to generate an electron beam, an object table configured to hold a specimen, a positioning device configured to position the object table, the positioning device comprising an actuator, wherein the positioning device further comprises a heating device configured to generate a heat load and a heat load controller to control the generated heat load at least partly based on an actuator heat load generated in the actuator.
    Type: Grant
    Filed: February 28, 2020
    Date of Patent: October 26, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Dennis Herman Caspar Van Banning, Jeroen Gerard Gosen, Maarten Lambertus Henricus Ter Heerdt, Edwin Cornelis Kadijk
  • Patent number: 11143375
    Abstract: A sequential lighting device of a lamp for a vehicle, may implement sequential lighting with one light source, reducing the cost and simplifying the structure. Furthermore, the sequential lighting is implemented by the rotation of a light guide, forming a slim lamp form, and the smooth lighting feeling is implemented, improving merchantability.
    Type: Grant
    Filed: August 18, 2020
    Date of Patent: October 12, 2021
    Assignees: Hyundai Motor Company, Kia Corporation
    Inventors: Byoung Suk Ahn, Seung Sik Han, Sung Ho Park, Ki Hong Lee, Jung Wook Lim
  • Patent number: 11140765
    Abstract: A radiation source comprises: an emitter for emitting a fuel target towards a plasma formation region; a laser system for hitting the target with a laser beam to generating a plasma; a collector for collecting radiation emitted by the plasma; an imaging system configured to capture an image of the target; one or more markers at the collector and within a field of view of the imaging system; and a controller. The controller receives data representative of the image; and controls operation of the radiation source in dependence on the data.
    Type: Grant
    Filed: August 16, 2018
    Date of Patent: October 5, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Rilpho Ludovicus Donker, Han-Kwang Nienhuys
  • Patent number: 11119411
    Abstract: In a drive method for a spatial light modulator, out of a first boundary region and a second boundary region arranged adjacently in a Y-direction and extending in an X-direction, mirror elements arranged at a first pitch not resolved by a projection optical system, in the X-direction in the first boundary region are set in the phase 0, and the other mirror elements therein are set in the phase ?; mirror elements arranged at a second pitch not resolved by the projection optical system, in the X-direction in the second boundary region are set in the phase ?, and the other mirror elements therein are set in the phase 0.
    Type: Grant
    Filed: July 15, 2014
    Date of Patent: September 14, 2021
    Assignee: Nikon Corporation
    Inventors: Soichi Owa, Yoji Watanabe
  • Patent number: 11119413
    Abstract: An imaging optical unit includes a plurality of mirrors to guide imaging light along an imaging beam path. The plurality of mirrors includes a number of mirrors for grazing incidence (GI mirrors), which deflect a chief ray of a central object field point with an angle of incidence of more than 45°. At least two of the GI mirrors are in the imaging beam path as basic GI mirrors so that the deflection effect thereof adds up for the chief ray. At least one further GI mirror is arranged in the imaging beam path as a counter GI mirror so that the deflection effect thereof acts in subtractive fashion for the chief ray in relation to the deflection effect of the basic GI mirrors. This can yield an imaging optical unit having enhanced flexibility in relation to an installation space used for mirror bodies of the mirrors of the imaging optical unit.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: September 14, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johannes Ruoff, Susanne Beder, Hans-Juergen Rostalski, Alexander Wolf
  • Patent number: 11112543
    Abstract: The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (?EUV) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: September 7, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Boris Bittner, Norbert Wabra, Holger Schmidt, Ricarda Schoemer, Sonja Schneider
  • Patent number: 11101317
    Abstract: In a method of manufacturing an element array, prepared is an adhesive sheet in which elements are arranged in a predetermined array on an adhesive layer. A specific element among the arrayed elements is removed from the adhesive sheet by radiating a laser to the specific element. The arrayed elements are directly or indirectly transferred onto a mounting substrate.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: August 24, 2021
    Assignee: TDK CORPORATION
    Inventors: Toshinobu Miyagoshi, Seijiro Sunaga, Osamu Shindo, Yasuo Kato
  • Patent number: 11092897
    Abstract: When producing a mirror as an optical component for an optical system of a projection exposure apparatus for projection lithography, first, an average value of a global gravitational acceleration is determined. Next, a gravitational acceleration difference between the gravitational acceleration at the production location and the gravitational acceleration average value is determined. After a determination of a target surface shape of a reflection surface of the mirror, a mirror substrate is machined at the production location taking into consideration the gravitational acceleration difference in a manner such that, under the influence of the gravitational acceleration average value, a current surface shape of the reflection surface of the mirror substrate does not deviate from the target surface shape by more than a prescribed figure tolerance value (Pmax). The result is an optical element with a relatively small figure at a use location of the mirror.
    Type: Grant
    Filed: March 6, 2020
    Date of Patent: August 17, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Stefan Hembacher
  • Patent number: 11086240
    Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
    Type: Grant
    Filed: November 15, 2017
    Date of Patent: August 10, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Sebastianus Adrianus Goorden, Nitesh Pandey, Duygu Akbulut, Alessandro Polo, Simon Reinaid Huisman
  • Patent number: 11086055
    Abstract: A mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, having a mirror substrate (205), a reflection layer (220), which is configured to have a reflectivity of at least 50% for electromagnetic radiation of a predefined operating wavelength that is incident on the optically effective surface (200a) of the mirror at an angle of incidence of at least 65° relative to the respective surface normal, and a barrier layer system (210), which is arranged between the reflection layer and the mirror substrate and has a sequence of alternating layer plies composed of a first material and at least one second material. The barrier layer system reduces penetration of hydrogen atoms that would otherwise penetrate the mirror substrate by at least a factor of 10.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: August 10, 2021
    Assignee: CARL ZEISS SMT GMBH
    Inventor: Peter Huber
  • Patent number: 11079664
    Abstract: An optical system includes a light source, an illumination optical system, and an optical modulator. The lens array and the lens of the illumination optical system are arranged in that order from an upstream side of an optical path of light from the light source. The light shield is disposed at the upstream side relative to the lens in the optical path. The light shield blocks some rays incident within a range of an effective diameter of the lens. The illumination optical system emits the light to the optical modulator. The optical modulator emits the incident light to a first direction and a second direction different from the first direction. A center of an effective diameter of the lens array is offset from a center of the effective diameter of the lens to an opposite side of the light shield in a direction orthogonal to the optical axis.
    Type: Grant
    Filed: March 31, 2020
    Date of Patent: August 3, 2021
    Assignee: RICOH COMPANY, LTD.
    Inventors: Kei Adachi, Yukako Yamaguchi
  • Patent number: 11079692
    Abstract: A detection apparatus for detecting a plurality of marks arranged on a substrate is provided. The apparatus includes a stage which supports the substrate, a plurality of detectors arranged apart from each other and configured to detect different marks of the plurality of marks arranged on the substrate, and a processor. For each of predetermined combinations of the detectors, the processor inclines a reference member supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and aligns a reference mark arranged on the reference member with each detector, and the processor obtains a measurement offset value of each of the plurality of detectors based on measurement values each acquired by the alignment performed for each of the plurality of predetermined combinations.
    Type: Grant
    Filed: June 29, 2020
    Date of Patent: August 3, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Wataru Yamaguchi
  • Patent number: 11073768
    Abstract: A metrology system may include a controller coupled to a scanning metrology tool that images a sample in motion along a scan direction. The controller may receive an image of a metrology target on the sample from the scanning metrology tool, where the metrology target comprises a first measurement group including cells distributed along a transverse direction orthogonal to the scan direction, and a second measurement group separated from the first measurement group along the scan direction including cells distributed along the transverse direction. The controller may further generate at least a first metrology measurement based on at least one of the cells in the first measurement group, and generate at least a second metrology measurement based on at least one of the cells in the second measurement group.
    Type: Grant
    Filed: October 10, 2019
    Date of Patent: July 27, 2021
    Assignee: KLA Corporation
    Inventors: Andrew V. Hill, Amnon Manassen, Gilad Laredo, Yoel Feler, Mark Ghinovker, Vladimir Levinski
  • Patent number: 11066741
    Abstract: A method is disclosed to accurately estimate the thickness of each layer of a multilayer film. A first optical value difference between an actually measured optical value and a first theoretical optical value is obtained, and the first optical value difference is compared with a preset convergence condition. In a case where the first optical value difference does not satisfy the convergence condition, a second estimated thickness value of each layer expected to have an optical value difference smaller than the first optical value difference is set. A second optical value difference between an actually measured optical value and a second theoretical optical value is obtained, and the second optical value difference is compared with the convergence condition. Each step is repeated to obtain the estimated thickness value of each layer in which the difference between the actually measured optical value and the theoretical optical value satisfies the convergence condition.
    Type: Grant
    Filed: June 2, 2017
    Date of Patent: July 20, 2021
    Assignee: NITTO DENKO CORPORATION
    Inventors: Satoru Saki, Shunsuke Shuto
  • Patent number: 11054755
    Abstract: The disclosure relates to an optical module with first and second components, a supporting structure and an anticollision device. The first component is supported by the supporting structure and is arranged adjacent to and at a distance from the second component to form a gap. The supporting structure defines a path of relative movement, on which the first and second components move in relation to one another under the influence of a disturbance, a collision between collision regions of the first and second components occurring if the anticollision device is inactive. The anticollision device includes a first anticollision unit on the first component, which produces a first field, and a second anticollision unit on the second component, which is assigned to the first anticollision unit and produces a second field.
    Type: Grant
    Filed: February 7, 2019
    Date of Patent: July 6, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Joachim Hartjes, Alexander Wolf, Toralf Gruner
  • Patent number: 11048180
    Abstract: A component for use in a patterning device environment including a patterning device, wherein the component is treated to suppress EUV plasma-induced contaminant release and/or atomic hydrogen or other radicals induced defectivity. A conduit array comprising at least one conduit, wherein the at least one conduit has been treated to promote adhesion of a contaminant to the at least one conduit.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: June 29, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Andrey Nikipelov, Vadim Yevgenyevich Banine, Christian Gerardus Norbertus Hendricus Marie Cloin, Edwin Te Sligte, Marcus Adrianus Van De Kerkhof, Ferdinandus Martinus Jozef Henricus Van De Wetering
  • Patent number: 11042095
    Abstract: A correction mask for an optical beam homogenizer includes a lens array. The correction mask is configured to provide a shaped initial beam profile. A subset of a plurality of optical paths between the incoming light beam and the illumination plane is at least partially blocked by the correction mask to provide a further homogenized beam profile having a further reduced light intensity variance with respect to an initial homogenized beam profile. The mask includes a plurality of submasks arranged according to a mask grid layout matching the lens grid layout of the lens array. Each one of the submasks is designed with a specific submask pattern to shape the respective subarea of the initial beam profile passing a specific one of the lenslets.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: June 22, 2021
    Assignee: Kulicke and Soffa Industries, Inc.
    Inventors: Adrianus Johannes Petrus Maria Vermeer, Mikhail Yurievich Loktev, Derk Andre Kort
  • Patent number: 11036150
    Abstract: An extreme ultraviolet light generation apparatus includes: an optical base; and a chamber module replaceable from the optical base. The chamber module includes a chamber in which extreme ultraviolet light is generated, a condenser mirror disposed inside the chamber and configured to condense extreme ultraviolet light generated inside the chamber, a window configured to transmit, into the chamber, a laser beam introduced into the optical base, and having a function to seal up the chamber, and a laser beam condensation optical system configured to condense the laser beam having transmitted through the window.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: June 15, 2021
    Assignee: Gigaphoton Inc.
    Inventor: Katsuhiko Wakana
  • Patent number: 11029594
    Abstract: A method including obtaining a selected component of optical aberration of or for a lithography apparatus, under a processing condition; computing an approximate of a cost function, based on the selected component; and producing an adjustment of the lithography apparatus or a patterning process that uses the lithography apparatus, based on the approximate of the cost function.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Steven George Hansen, Kateryna Stanislavovna Lyakhova, Paulus Jacobus Maria Van Adrichem
  • Patent number: 11016390
    Abstract: A method includes generating extreme ultraviolet (EUV) light. The EUV light is gathered onto a first region of a first optical reflector by using a collector. A second region of the first optical reflector is free from incidence of the EUV light when the EUV light is reflected onto the first region. The EUV light is reflected to a reticle by using the first optical reflector, so as to impart the EUV light with a pattern. The first optical reflector is rotated such that the EUV light is reflected onto the second region in a first time period and the EUV light is reflected onto the first region in a second period. The first region is free from incidence of the EUV light in the first time period, and the second region is free from incidence of the EUV light in the second time period.
    Type: Grant
    Filed: September 12, 2020
    Date of Patent: May 25, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi-Hung Liao, Min-Cheng Wu
  • Patent number: 11016396
    Abstract: A method including illuminating a product test substrate with radiation from a component, wherein the product test substrate does not have a device pattern etched therein and yields a non-zero sensitivity when illuminated, the non-zero sensitivity representing a change in an optical response characteristic of the product test substrate with respect to a change in a characteristic of the radiation; measuring at least a part of the radiation redirected by the product test substrate to determine a parameter value; and taking an action with respect to the component based on the parameter value.
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: May 25, 2021
    Assignee: ASML Holding N.V
    Inventors: Leonardo Gabriel Montilla, Krishanu Shome
  • Patent number: 11003099
    Abstract: A method and apparatus are described for providing an accurate and robust measurement of a lithographic characteristic or metrology parameter. The method includes providing a range or a plurality of values for each of a plurality of metrology parameters of a metrology target, providing a constraint for each of the plurality of metrology parameters, and calculating, by a processor to optimize/modify these parameters within the range of the plurality of values, resulting in a plurality of metrology target designs having metrology parameters meeting the constraints.
    Type: Grant
    Filed: October 4, 2019
    Date of Patent: May 11, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Murat Bozkurt, Patrick Warnaar, Stefan Cornelis Theodorus Van Der Sanden
  • Patent number: 11003067
    Abstract: A droplet collection bucket includes a droplet collection tube, a level sensor positioned on the droplet collection tube, a gate valve configured to close a rear portion of the droplet collection tube, a gas supply configured to supply a gas into the rear portion of the droplet collection tube, a heating element wrapping around the droplet collection tube, and a drain tube connecting an interior of the droplet collection tube with an outside of the droplet collection tube.
    Type: Grant
    Filed: March 12, 2020
    Date of Patent: May 11, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi Yang, Hsin-Feng Chen, Li-Jui Chen
  • Patent number: 10996569
    Abstract: An overlay measurement method using a reference image is an effective method for an overlay measurement in a product circuit. However, there is a problem that it is not possible to obtain an ideal reference image in a process of prototyping.
    Type: Grant
    Filed: January 27, 2016
    Date of Patent: May 4, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yuji Takagi, Fumihiko Fukunaga, Yasunori Goto
  • Patent number: 10989601
    Abstract: A method of applying a reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with reduced effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: April 27, 2021
    Assignee: J.A. WOOLLAM CO., INC.
    Inventors: Martin M. Liphardt, Jeffrey S. Hale, Ping He, Galen L. Pfeiffer, Craig M. Herzinger
  • Patent number: 10990020
    Abstract: A method of determining a patterning process parameter from a metrology target, the method including: obtaining a plurality of values of diffraction radiation from the metrology target, each value of the plurality of values corresponding to a different illumination condition of a plurality of illumination conditions of illumination radiation for the target; and using the combination of values to determine a same value of the patterning process parameter for the target.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: April 27, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Narjes Javaheri, Mohammadreza Hajiahmadi, Olger Victor Zwier, Gonzalo Roberto Sanguinetti