Illumination Systems Or Details Patents (Class 355/67)
  • Patent number: 11119411
    Abstract: In a drive method for a spatial light modulator, out of a first boundary region and a second boundary region arranged adjacently in a Y-direction and extending in an X-direction, mirror elements arranged at a first pitch not resolved by a projection optical system, in the X-direction in the first boundary region are set in the phase 0, and the other mirror elements therein are set in the phase ?; mirror elements arranged at a second pitch not resolved by the projection optical system, in the X-direction in the second boundary region are set in the phase ?, and the other mirror elements therein are set in the phase 0.
    Type: Grant
    Filed: July 15, 2014
    Date of Patent: September 14, 2021
    Assignee: Nikon Corporation
    Inventors: Soichi Owa, Yoji Watanabe
  • Patent number: 11119413
    Abstract: An imaging optical unit includes a plurality of mirrors to guide imaging light along an imaging beam path. The plurality of mirrors includes a number of mirrors for grazing incidence (GI mirrors), which deflect a chief ray of a central object field point with an angle of incidence of more than 45°. At least two of the GI mirrors are in the imaging beam path as basic GI mirrors so that the deflection effect thereof adds up for the chief ray. At least one further GI mirror is arranged in the imaging beam path as a counter GI mirror so that the deflection effect thereof acts in subtractive fashion for the chief ray in relation to the deflection effect of the basic GI mirrors. This can yield an imaging optical unit having enhanced flexibility in relation to an installation space used for mirror bodies of the mirrors of the imaging optical unit.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: September 14, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johannes Ruoff, Susanne Beder, Hans-Juergen Rostalski, Alexander Wolf
  • Patent number: 11112543
    Abstract: The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (?EUV) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: September 7, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Boris Bittner, Norbert Wabra, Holger Schmidt, Ricarda Schoemer, Sonja Schneider
  • Patent number: 11101317
    Abstract: In a method of manufacturing an element array, prepared is an adhesive sheet in which elements are arranged in a predetermined array on an adhesive layer. A specific element among the arrayed elements is removed from the adhesive sheet by radiating a laser to the specific element. The arrayed elements are directly or indirectly transferred onto a mounting substrate.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: August 24, 2021
    Assignee: TDK CORPORATION
    Inventors: Toshinobu Miyagoshi, Seijiro Sunaga, Osamu Shindo, Yasuo Kato
  • Patent number: 11092897
    Abstract: When producing a mirror as an optical component for an optical system of a projection exposure apparatus for projection lithography, first, an average value of a global gravitational acceleration is determined. Next, a gravitational acceleration difference between the gravitational acceleration at the production location and the gravitational acceleration average value is determined. After a determination of a target surface shape of a reflection surface of the mirror, a mirror substrate is machined at the production location taking into consideration the gravitational acceleration difference in a manner such that, under the influence of the gravitational acceleration average value, a current surface shape of the reflection surface of the mirror substrate does not deviate from the target surface shape by more than a prescribed figure tolerance value (Pmax). The result is an optical element with a relatively small figure at a use location of the mirror.
    Type: Grant
    Filed: March 6, 2020
    Date of Patent: August 17, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Stefan Hembacher
  • Patent number: 11086240
    Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
    Type: Grant
    Filed: November 15, 2017
    Date of Patent: August 10, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Sebastianus Adrianus Goorden, Nitesh Pandey, Duygu Akbulut, Alessandro Polo, Simon Reinaid Huisman
  • Patent number: 11086055
    Abstract: A mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, having a mirror substrate (205), a reflection layer (220), which is configured to have a reflectivity of at least 50% for electromagnetic radiation of a predefined operating wavelength that is incident on the optically effective surface (200a) of the mirror at an angle of incidence of at least 65° relative to the respective surface normal, and a barrier layer system (210), which is arranged between the reflection layer and the mirror substrate and has a sequence of alternating layer plies composed of a first material and at least one second material. The barrier layer system reduces penetration of hydrogen atoms that would otherwise penetrate the mirror substrate by at least a factor of 10.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: August 10, 2021
    Assignee: CARL ZEISS SMT GMBH
    Inventor: Peter Huber
  • Patent number: 11079664
    Abstract: An optical system includes a light source, an illumination optical system, and an optical modulator. The lens array and the lens of the illumination optical system are arranged in that order from an upstream side of an optical path of light from the light source. The light shield is disposed at the upstream side relative to the lens in the optical path. The light shield blocks some rays incident within a range of an effective diameter of the lens. The illumination optical system emits the light to the optical modulator. The optical modulator emits the incident light to a first direction and a second direction different from the first direction. A center of an effective diameter of the lens array is offset from a center of the effective diameter of the lens to an opposite side of the light shield in a direction orthogonal to the optical axis.
    Type: Grant
    Filed: March 31, 2020
    Date of Patent: August 3, 2021
    Assignee: RICOH COMPANY, LTD.
    Inventors: Kei Adachi, Yukako Yamaguchi
  • Patent number: 11079692
    Abstract: A detection apparatus for detecting a plurality of marks arranged on a substrate is provided. The apparatus includes a stage which supports the substrate, a plurality of detectors arranged apart from each other and configured to detect different marks of the plurality of marks arranged on the substrate, and a processor. For each of predetermined combinations of the detectors, the processor inclines a reference member supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and aligns a reference mark arranged on the reference member with each detector, and the processor obtains a measurement offset value of each of the plurality of detectors based on measurement values each acquired by the alignment performed for each of the plurality of predetermined combinations.
    Type: Grant
    Filed: June 29, 2020
    Date of Patent: August 3, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Wataru Yamaguchi
  • Patent number: 11073768
    Abstract: A metrology system may include a controller coupled to a scanning metrology tool that images a sample in motion along a scan direction. The controller may receive an image of a metrology target on the sample from the scanning metrology tool, where the metrology target comprises a first measurement group including cells distributed along a transverse direction orthogonal to the scan direction, and a second measurement group separated from the first measurement group along the scan direction including cells distributed along the transverse direction. The controller may further generate at least a first metrology measurement based on at least one of the cells in the first measurement group, and generate at least a second metrology measurement based on at least one of the cells in the second measurement group.
    Type: Grant
    Filed: October 10, 2019
    Date of Patent: July 27, 2021
    Assignee: KLA Corporation
    Inventors: Andrew V. Hill, Amnon Manassen, Gilad Laredo, Yoel Feler, Mark Ghinovker, Vladimir Levinski
  • Patent number: 11066741
    Abstract: A method is disclosed to accurately estimate the thickness of each layer of a multilayer film. A first optical value difference between an actually measured optical value and a first theoretical optical value is obtained, and the first optical value difference is compared with a preset convergence condition. In a case where the first optical value difference does not satisfy the convergence condition, a second estimated thickness value of each layer expected to have an optical value difference smaller than the first optical value difference is set. A second optical value difference between an actually measured optical value and a second theoretical optical value is obtained, and the second optical value difference is compared with the convergence condition. Each step is repeated to obtain the estimated thickness value of each layer in which the difference between the actually measured optical value and the theoretical optical value satisfies the convergence condition.
    Type: Grant
    Filed: June 2, 2017
    Date of Patent: July 20, 2021
    Assignee: NITTO DENKO CORPORATION
    Inventors: Satoru Saki, Shunsuke Shuto
  • Patent number: 11054755
    Abstract: The disclosure relates to an optical module with first and second components, a supporting structure and an anticollision device. The first component is supported by the supporting structure and is arranged adjacent to and at a distance from the second component to form a gap. The supporting structure defines a path of relative movement, on which the first and second components move in relation to one another under the influence of a disturbance, a collision between collision regions of the first and second components occurring if the anticollision device is inactive. The anticollision device includes a first anticollision unit on the first component, which produces a first field, and a second anticollision unit on the second component, which is assigned to the first anticollision unit and produces a second field.
    Type: Grant
    Filed: February 7, 2019
    Date of Patent: July 6, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Joachim Hartjes, Alexander Wolf, Toralf Gruner
  • Patent number: 11048180
    Abstract: A component for use in a patterning device environment including a patterning device, wherein the component is treated to suppress EUV plasma-induced contaminant release and/or atomic hydrogen or other radicals induced defectivity. A conduit array comprising at least one conduit, wherein the at least one conduit has been treated to promote adhesion of a contaminant to the at least one conduit.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: June 29, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Andrey Nikipelov, Vadim Yevgenyevich Banine, Christian Gerardus Norbertus Hendricus Marie Cloin, Edwin Te Sligte, Marcus Adrianus Van De Kerkhof, Ferdinandus Martinus Jozef Henricus Van De Wetering
  • Patent number: 11042095
    Abstract: A correction mask for an optical beam homogenizer includes a lens array. The correction mask is configured to provide a shaped initial beam profile. A subset of a plurality of optical paths between the incoming light beam and the illumination plane is at least partially blocked by the correction mask to provide a further homogenized beam profile having a further reduced light intensity variance with respect to an initial homogenized beam profile. The mask includes a plurality of submasks arranged according to a mask grid layout matching the lens grid layout of the lens array. Each one of the submasks is designed with a specific submask pattern to shape the respective subarea of the initial beam profile passing a specific one of the lenslets.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: June 22, 2021
    Assignee: Kulicke and Soffa Industries, Inc.
    Inventors: Adrianus Johannes Petrus Maria Vermeer, Mikhail Yurievich Loktev, Derk Andre Kort
  • Patent number: 11036150
    Abstract: An extreme ultraviolet light generation apparatus includes: an optical base; and a chamber module replaceable from the optical base. The chamber module includes a chamber in which extreme ultraviolet light is generated, a condenser mirror disposed inside the chamber and configured to condense extreme ultraviolet light generated inside the chamber, a window configured to transmit, into the chamber, a laser beam introduced into the optical base, and having a function to seal up the chamber, and a laser beam condensation optical system configured to condense the laser beam having transmitted through the window.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: June 15, 2021
    Assignee: Gigaphoton Inc.
    Inventor: Katsuhiko Wakana
  • Patent number: 11029594
    Abstract: A method including obtaining a selected component of optical aberration of or for a lithography apparatus, under a processing condition; computing an approximate of a cost function, based on the selected component; and producing an adjustment of the lithography apparatus or a patterning process that uses the lithography apparatus, based on the approximate of the cost function.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Steven George Hansen, Kateryna Stanislavovna Lyakhova, Paulus Jacobus Maria Van Adrichem
  • Patent number: 11016390
    Abstract: A method includes generating extreme ultraviolet (EUV) light. The EUV light is gathered onto a first region of a first optical reflector by using a collector. A second region of the first optical reflector is free from incidence of the EUV light when the EUV light is reflected onto the first region. The EUV light is reflected to a reticle by using the first optical reflector, so as to impart the EUV light with a pattern. The first optical reflector is rotated such that the EUV light is reflected onto the second region in a first time period and the EUV light is reflected onto the first region in a second period. The first region is free from incidence of the EUV light in the first time period, and the second region is free from incidence of the EUV light in the second time period.
    Type: Grant
    Filed: September 12, 2020
    Date of Patent: May 25, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi-Hung Liao, Min-Cheng Wu
  • Patent number: 11016396
    Abstract: A method including illuminating a product test substrate with radiation from a component, wherein the product test substrate does not have a device pattern etched therein and yields a non-zero sensitivity when illuminated, the non-zero sensitivity representing a change in an optical response characteristic of the product test substrate with respect to a change in a characteristic of the radiation; measuring at least a part of the radiation redirected by the product test substrate to determine a parameter value; and taking an action with respect to the component based on the parameter value.
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: May 25, 2021
    Assignee: ASML Holding N.V
    Inventors: Leonardo Gabriel Montilla, Krishanu Shome
  • Patent number: 11003067
    Abstract: A droplet collection bucket includes a droplet collection tube, a level sensor positioned on the droplet collection tube, a gate valve configured to close a rear portion of the droplet collection tube, a gas supply configured to supply a gas into the rear portion of the droplet collection tube, a heating element wrapping around the droplet collection tube, and a drain tube connecting an interior of the droplet collection tube with an outside of the droplet collection tube.
    Type: Grant
    Filed: March 12, 2020
    Date of Patent: May 11, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi Yang, Hsin-Feng Chen, Li-Jui Chen
  • Patent number: 11003099
    Abstract: A method and apparatus are described for providing an accurate and robust measurement of a lithographic characteristic or metrology parameter. The method includes providing a range or a plurality of values for each of a plurality of metrology parameters of a metrology target, providing a constraint for each of the plurality of metrology parameters, and calculating, by a processor to optimize/modify these parameters within the range of the plurality of values, resulting in a plurality of metrology target designs having metrology parameters meeting the constraints.
    Type: Grant
    Filed: October 4, 2019
    Date of Patent: May 11, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Murat Bozkurt, Patrick Warnaar, Stefan Cornelis Theodorus Van Der Sanden
  • Patent number: 10996569
    Abstract: An overlay measurement method using a reference image is an effective method for an overlay measurement in a product circuit. However, there is a problem that it is not possible to obtain an ideal reference image in a process of prototyping.
    Type: Grant
    Filed: January 27, 2016
    Date of Patent: May 4, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yuji Takagi, Fumihiko Fukunaga, Yasunori Goto
  • Patent number: 10990020
    Abstract: A method of determining a patterning process parameter from a metrology target, the method including: obtaining a plurality of values of diffraction radiation from the metrology target, each value of the plurality of values corresponding to a different illumination condition of a plurality of illumination conditions of illumination radiation for the target; and using the combination of values to determine a same value of the patterning process parameter for the target.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: April 27, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Narjes Javaheri, Mohammadreza Hajiahmadi, Olger Victor Zwier, Gonzalo Roberto Sanguinetti
  • Patent number: 10989601
    Abstract: A method of applying a reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with reduced effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: April 27, 2021
    Assignee: J.A. WOOLLAM CO., INC.
    Inventors: Martin M. Liphardt, Jeffrey S. Hale, Ping He, Galen L. Pfeiffer, Craig M. Herzinger
  • Patent number: 10983246
    Abstract: The systems and methods provided herein relate to extracting maturity-based properties from input log data obtained by a downhole well logging tool. A maturity inversion is performed using the input log data, a log response model, and at least one maturity model to extract maturity-based properties from the input log data. The maturity-based properties are provided in an output log, such that subsequent down hole operation of the formation may account for the maturity-based properties.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: April 20, 2021
    Assignee: SCHLUMBERGER TECHNOLOGY CORPORATION
    Inventors: Laurent Mosse, Erik Rylander, Paul Craddock
  • Patent number: 10983441
    Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels. The spatial light modulator is useful for pixel blending by forming a plurality of partially overlapping images, at least one of the plurality of partially overlapping images having at least two pixels formed by a first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween. The spatial light modulator results in improved resolution, depth of focus, and pixel blending.
    Type: Grant
    Filed: August 5, 2019
    Date of Patent: April 20, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Thomas L. Laidig, Hwan J. Jeong
  • Patent number: 10969676
    Abstract: A photomask and an exposure method are provided. The photomask includes a photomask body including a first surface and a second surface opposite to each other; and a first light-transmissive region penetrating through the first surface and the second surface, wherein a light adjustment component is in the first light-transmissive region and configured to converge a first light beam incident onto the first surface to a second light beam emergent from the second surface, and a cross-sectional area of the first light beam sectioned by the first surface is larger than that of the second light beam sectioned by the second surface.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: April 6, 2021
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO..LTD.
    Inventors: Chengyong He, Yang Wang, Jun Yang, Xin Wang, Guanzheng Li, Jinxiang Li, Xingming Wang, Peng Cai, Xiaochen Cui, Junwei Zhang, Can Zhang, Chunjie Wang
  • Patent number: 10969569
    Abstract: A light source-integrated lens assembly includes a lens including first through hole at its center along optical axis, an internal light shielding member including second through hole at its center and first protrusion that protrudes from front surface of the lens, and a light emitting element configured to emit light to target object. The internal light shielding member is fitted into the first through hole and the light emitting element is fitted into the second through hole to form a single integrated unit. The lens receives light emitted from the light emitting element and diffused and reflected from inside the target object. When the internal light shielding member is brought into contact with surface of the target object, the internal light shielding member prevents light emitted from the light emitting element and directly reflected at the surface of the target object from being incident on the lens.
    Type: Grant
    Filed: March 5, 2020
    Date of Patent: April 6, 2021
    Assignee: WeTHE Lab Co., Ltd.
    Inventors: Dong Cheol Lim, Jungkeun Lee
  • Patent number: 10955750
    Abstract: A method includes generating a plasma that emits a first EUV radiation in a vessel at a first gas exhaust rate of the vessel; directing the first EUV radiation to a first substrate using a collector in the vessel; halting the generating of the first EUV radiation; and ejecting a gas past the collector at a second gas exhaust rate of the vessel, in which the second gas exhaust rate is greater than the first gas exhaust rate after the halting.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: March 23, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Wei-Chun Yen, Chi Yang, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10942456
    Abstract: An ultraviolet (UV) light source is provided. The device uses a high-uniformity diode array. A lens unit of collimated illumination lenses is used. A light source of UV light-emitting diode (UVLED) array is formed and passes through the lens unit to uniformly distribute the light source and obtain a collimated light. The present invention comprises a light source of UVLED array; a collimated illumination lens unit; and a substrate. The construction is simple. The present invention can be applied in the lithography of a semiconductor. The lithography forms contact lines of widths not greater than 3 microns (?m); soft-contact lines of widths of 3˜30 ?m; and short-spaced lines of widths of 30˜200 ?m. The present invention avoids the mask from contact wear-out for multiple uses, and further reduces the replacement rate.
    Type: Grant
    Filed: January 17, 2020
    Date of Patent: March 9, 2021
    Assignee: National Applied Research Laboratories
    Inventors: Jiun-Woei Huang, Min-Wei Hung, Kuo-Cheng Huang
  • Patent number: 10928733
    Abstract: An illumination optical unit for projection lithography illuminates an object field with illumination light along an illumination beam path. The arrangement of field facets of a field facet mirror and also of pupil facets of a pupil facet mirror is such that an illumination channel is guided over each of them. The field facet mirror images a light source image along in each case one illumination channel onto one of the pupil facets. The pupil facet mirror superimposedly images of the field facets into the object field. The illumination optical unit is designed for the settable specification of a spatial resolution of an illumination light illumination of an entrance pupil of a projection optical unit arranged downstream of the object field in the illumination light beam path. The result of this is an illumination optical unit with which illumination light can be used efficiently for high-contrast imaging of the structures to be projected.
    Type: Grant
    Filed: July 21, 2020
    Date of Patent: February 23, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Michael Patra
  • Patent number: 10918285
    Abstract: An optical coherence tomographic device configured to acquire a tomographic image of a subject by using an optical interferometry is provided. The optical coherence tomographic device include: a detector configured to detect interference light acquired by the optical interferometry, and to output an interference signal of the interference light; and a processor configured to calculate von Neumann entropy of noise components by using the noise components and signal intensities of the interference signals corresponding to at least one interference light detected by the detector.
    Type: Grant
    Filed: August 4, 2017
    Date of Patent: February 16, 2021
    Assignee: TOMEY CORPORATION
    Inventor: Masahiro Yamanari
  • Patent number: 10908336
    Abstract: The present invention provides an optical layered body having excellent blue light blocking properties without affecting the color tone of displayed images. Provided is an optical layered body having a structure including: a substrate; and one or two or more functional layers on at least one surface of the substrate, the optical layered body having a spectral transmittance at a wavelength of 380 nm of lower than 1%, a spectral transmittance at a wavelength of 410 nm of lower than 10%, and a spectral transmittance at a wavelength of 440 nm of 70% or higher.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: February 2, 2021
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Kana Yamamoto, Takanori Hamada, Masataka Nakashima, Takahisa Nomura
  • Patent number: 10908519
    Abstract: In an alignment mark of an embodiment, a first pattern includes a first portion and a second portion, a second pattern includes a third portion and a fourth portion, the first portion and the third portion partially overlap each other, the second portion and the fourth portion partially overlap each other, a pitch length of each structural periods of the first portion and the third portion are equal within 1.2 times, a pitch length of each structural periods of the second portion and the fourth portion are equal within 1.2 times, a duty ratio of each of the first and third portions is 1:1, and a duty ratio of the second portion is D:2, and D is an integer of two or more, the duty ratio being a ratio between a light-shielding portion and a light-transmitting portion.
    Type: Grant
    Filed: September 11, 2019
    Date of Patent: February 2, 2021
    Assignee: Toshiba Memory Corporation
    Inventor: Satoshi Mitsugi
  • Patent number: 10895803
    Abstract: A first illumination device includes a light source that emits light having directivity, and a uniform illumination optical system including a first fly-eye lens that includes a plurality of lenses two-dimensionally arranged and allows light based on emitted light from the light source to pass through the first fly-eye lens. An illumination target region has a planar shape having a side extending along a direction substantially parallel to a long-axis direction or a short-axis direction of an intensity distribution shape of emitted light from the light source, and a periodic direction of an array of the lenses in the first fly-eye lens is inclined with respect to the long-axis direction or the short-axis direction.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: January 19, 2021
    Assignee: Sony Corporation
    Inventor: Koji Miura
  • Patent number: 10875094
    Abstract: Aspects described herein relate to additive manufacturing systems and related methods. An additive manufacturing system may include two or more laser energy sources and associated optical fibers. An optics assembly may be constructed and arranged to form a rectangular laser energy pixel associated with each laser energy source. Each pixel may have a substantially uniform power density, and the pixels may be arranged to form a linear array of laser energy pixels on a build surface with no spacing between the pixels. Exposure of a portion of a layer of material on the build surface to the linear array of laser energy pixels may melt the portion of the layer.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: December 29, 2020
    Assignee: VulcanForms Inc.
    Inventors: Martin C. Feldmann, Jan Pawel Komsta, Matthew Sweetland
  • Patent number: 10877379
    Abstract: An illumination intensity correction device can specify an illumination intensity over an illumination field of a lithographic projection exposure apparatus. The correction device has a plurality of rod-shaped individual stops arranged next to one another. A displacement drive can displace at least some of the individual stops at least along their respective rod axis. Free ends of the individual stops are individually displaceable using the displacement drive into a specified displacement position to specify an intensity correction of an illumination of the illumination field. The intensity correction acts along a correction dimension transverse with respect to the rod axes.
    Type: Grant
    Filed: May 8, 2020
    Date of Patent: December 29, 2020
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Ramon Van Gorkom, Martin Endres
  • Patent number: 10877366
    Abstract: A droplet collection bucket includes a droplet collection tube, a level sensor positioned on the droplet collection tube, a gate valve configured to close a rear portion of the droplet collection tube, a gas supply configured to supply a gas into the rear portion of the droplet collection tube, a heating element wrapping around the droplet collection tube, and a drain tube connecting an interior of the droplet collection tube with an outside of the droplet collection tube.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: December 29, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi Yang, Hsin-Feng Chen, Li-Jui Chen
  • Patent number: 10866522
    Abstract: There is provided a reflective image-forming optical system which is applicable to an exposure apparatus using, for example, EUV light and which is capable of increasing numerical aperture while enabling optical path separation of light fluxes. In a reflective imaging optical system (6) forming an image of a first plane (4) onto a second plane (7), the numerical aperture on a side of the second plane with respect to a first direction (X direction) on the second plane is greater than 1.1 times a numerical aperture on the side of the second plane with respect to a second direction (Y direction) crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop (AS) defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction (X direction) is greater than 1.1 times that in a minor axis direction (Y direction).
    Type: Grant
    Filed: March 5, 2019
    Date of Patent: December 15, 2020
    Assignee: Nikon Corporation
    Inventor: Hideki Komatsuda
  • Patent number: 10859815
    Abstract: An optical correction arrangement includes a first and a second correction component arranged in succession along an optical axis. The first and the second correction components are provided with aspherical surface contours which at least approximately add up to zero overall in a zero position of the optical correction arrangement. The optical correction arrangement also includes a manipulator for displacing the first correction component in a first direction at a first speed and for displacing the second correction component in a second direction at a second speed. The first speed is greater than the second speed.
    Type: Grant
    Filed: March 6, 2018
    Date of Patent: December 8, 2020
    Inventor: Holger Walter
  • Patent number: 10859807
    Abstract: An inverted microscope includes a stage supporting a bottom member; an immersion objective disposed facing vertically upward such that a distal end thereof faces a bottom face of the bottom member; an alignment unit moving the stage or the immersion objective in an optical-axis direction of the immersion objective; a liquid injecting unit injecting liquid between the bottom face and the distal end; and a controller controlling the liquid injecting unit, in a state where the bottom face and the distal end are disposed with a gap therebetween, to inject the liquid onto the distal end to form a droplet, and controlling the alignment unit to bring the bottom member and the immersion objective closer to each other to bring the droplet into contact with the bottom face, thereby forming a liquid column, and moving the stage and the immersion objective relative to each other while maintaining the liquid column.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: December 8, 2020
    Assignee: OLYMPUS CORPORATION
    Inventor: Yoshihiro Shimada
  • Patent number: 10842011
    Abstract: An extreme ultraviolet light generation system includes: a first area including an optical path adjustment unit; a second area including a chamber having inside a plasma generating region; a first interlock switch disposed in the first area; a second interlock switch disposed in the second area; and a control unit capable of performing switching among a first setting state in which monitoring of a sensing signal output from the first interlock switch and a sensing signal output from the second interlock switch is activated, a second setting state in which monitoring of a sensing signal output from the first interlock switch and a sensing signal output from the second interlock switch is deactivated, and a third setting state in which monitoring of a sensing signal output from the first interlock switch is activated and monitoring of a sensing signal output from the second interlock switch is deactivated.
    Type: Grant
    Filed: October 10, 2019
    Date of Patent: November 17, 2020
    Assignee: Gigaphoton Inc.
    Inventor: Kengo Hayashi
  • Patent number: 10816891
    Abstract: A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.
    Type: Grant
    Filed: April 6, 2017
    Date of Patent: October 27, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hao-Ming Chang, Chien-Hung Lai, Cheng-Ming Lin, Hsuan-Wen Wang, Min-An Yang, S. C. Hsu, Shao-Chi Wei, Yuan-Chih Chu
  • Patent number: 10816794
    Abstract: A method for designing illumination system with freeform surface, the method comprising: presupposing a plurality of expected light spots; establishing an initial system, wherein the initial system comprises a plurality of collimated light sources, a plane lens and a target plane; designing a sphere lens to replace the plane lens, and obtaining a before-construction-iteration illumination system; selecting a plurality of feature rays and obtaining a plurality of target points; taking the before-construction-iteration illumination system as an initial construction-iteration system, and obtaining an after-construction-iteration illumination system with freeform surface by making multiple construction-iteration, wherein the illumination system with freeform surface is configured to form the plurality of expected light spots.
    Type: Grant
    Filed: September 30, 2017
    Date of Patent: October 27, 2020
    Assignees: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Jun Zhu, Xiao-Fei Wu, Guo-Fan Jin, Shou-Shan Fan
  • Patent number: 10809637
    Abstract: In one embodiment, a method for creating a forecasting model for a multiple-imaging unit DLT is disclosed. A stage of the DLT is positioned so that a set of alignment marks provided on a substrate are placed under a set of the DLT's eyes. For each alignment mark in the set, a first image is acquired using a camera coupled to the eye above it at a first time, and a first position of the alignment mark is obtained within the camera's FOV from the first image, to determine a first measured position. One or more additional images of the alignment mark are subsequently obtained at subsequent times, and one or more corresponding subsequent measured positions are determined. Differences between sequential ones of the measured positions are respectively calculated, a forecasting model to correct for eye center drift of the set of eyes is created, and corrections digitally applied.
    Type: Grant
    Filed: May 30, 2019
    Date of Patent: October 20, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventor: Tamer Coskun
  • Patent number: 10795264
    Abstract: A method for generating a radiation light in a lithography exposure system is provided. The method includes connecting a first nozzle assembly coupled to a support to an outlet of a storage member that receives a target fuel inside. The method further includes guiding the target fuel flowing through the first nozzle assembly and supplying a droplet of the target fuel into an excitation zone via the first nozzle assembly. The method also includes moving the support to connect a second nozzle assembly coupled to the support with the outlet. In addition, the method includes guiding the target fuel flowing through the second nozzle assembly and supplying a droplet of the target fuel into the excitation zone via the second nozzle assembly. The method further includes irradiating the droplet of the target fuel in the excitation zone with a laser pulse.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: October 6, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Hsin-Feng Chen, Han-Lung Chang, Li-Jui Chen, Bo-Tsun Liu
  • Patent number: 10788806
    Abstract: A method for initializing individual exposure field parameters of an overlay controller is disclosed including initializing a first control thread having a first context associated with a first product type, wherein a first layout of first exposure fields is defined for the first product type for processing in a stepper. The method further includes remapping a set of previous control state data for a set of control threads associated with other product types different than the first product type into the first layout. The other product types have layouts of second exposure fields different than the first layout. An initial set of control state data for the first control thread associated with the first product type is generated using the remapped previous control state data. The stepper is configured for processing a first substrate of the first product type using the initial set of control state data.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: September 29, 2020
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Richard P. Good, Eyup Cinar
  • Patent number: 10768531
    Abstract: A system that contains a semi-ellipsoidal SLM holder supporting a plurality of flat rectangular SLMs, which are placed onto the semi-ellipsoidal surface of the holder in the most surface-covering way. The system contains a coherent light source placed in the first focal point of the ellipsoid. The second focal point of the ellipsoid defines the area in which an image-receiving object is to be placed. All the SLMs are illuminated by a diverging light beam emitted from the coherent light source. In each SLM, the light is subjected to phase-amplitude modulation and is converted into an image-carrying beam, which convergently fells onto the object on which the target image is to be produced. Thus, a pattern is formed on the object by a maskless method in which a plurality of SLMs are combined into a common image-forming holographic unit.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: September 8, 2020
    Inventors: Vadim Rakhovsky, Vitaly Chernik, Mikhail Borisov, Aleksey Shamaev, Dmitry Chelyubeev
  • Patent number: 10732523
    Abstract: A detection device includes an illumination optical system configured to illuminate a first alignment mark for detecting a position of an object in a first direction and a second alignment mark for detecting a position of the object in a second direction and a detection optical system configured to detect light beams from the alignment marks. The illumination optical system includes an optical element disposed at a position optically conjugate to a surface to be illuminated, and the optical element includes a region configured to form an illumination light beam for illuminating a first portion of the surface to be illuminated with a first angular distribution and a region configured to form an illumination light beam for illuminating a second portion of the surface to be illuminated with a second angular distribution.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: August 4, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Takamitsu Komaki
  • Patent number: 10732498
    Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: August 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan De Groot, Gerard Frans Jozef Schasfoort, Maksym Yuriiovych Sladkov, Manfred Petrus Johannes Maria Dikkers, Jozef Maria Finders, Pieter-Jan Van Zwol, Johannes Jacobus Matheus Baselmans, Stefan Michael Bruno Baumer, Laurentius Cornelius De Winter, Wouter Joep Engelen, Marcus Adrianus Van De Kerkhof, Robbert Jan Voogd
  • Patent number: 10712670
    Abstract: A method comprises disposing a photosensitive film layer on a surface of a substrate layer and placing a variable neutral density (ND) filter such that a surface of the variable ND filter faces an exposure region of the photosensitive film layer. The variable ND filter is a thin film that has an attenuation profile that modulates transmittance of light passing through the variable ND filter to the exposure region to cancel out an uneven power distribution in an intermediate interference exposure pattern at the exposure region of the photosensitive film layer. The method further comprises arranging one or more laser generators such that at least two generated beams of light from the one or more laser generators intersect with each other and form the intermediate interference exposure pattern that is modulated by the variable ND filter to form a target interference exposure pattern at the exposure region.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: July 14, 2020
    Assignee: Facebook Technologies, LLC
    Inventors: Matthieu Charles Raoul Leibovici, Matthew E. Colburn