Illumination Systems Or Details Patents (Class 355/67)
  • Patent number: 10768531
    Abstract: A system that contains a semi-ellipsoidal SLM holder supporting a plurality of flat rectangular SLMs, which are placed onto the semi-ellipsoidal surface of the holder in the most surface-covering way. The system contains a coherent light source placed in the first focal point of the ellipsoid. The second focal point of the ellipsoid defines the area in which an image-receiving object is to be placed. All the SLMs are illuminated by a diverging light beam emitted from the coherent light source. In each SLM, the light is subjected to phase-amplitude modulation and is converted into an image-carrying beam, which convergently fells onto the object on which the target image is to be produced. Thus, a pattern is formed on the object by a maskless method in which a plurality of SLMs are combined into a common image-forming holographic unit.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: September 8, 2020
    Inventors: Vadim Rakhovsky, Vitaly Chernik, Mikhail Borisov, Aleksey Shamaev, Dmitry Chelyubeev
  • Patent number: 10732523
    Abstract: A detection device includes an illumination optical system configured to illuminate a first alignment mark for detecting a position of an object in a first direction and a second alignment mark for detecting a position of the object in a second direction and a detection optical system configured to detect light beams from the alignment marks. The illumination optical system includes an optical element disposed at a position optically conjugate to a surface to be illuminated, and the optical element includes a region configured to form an illumination light beam for illuminating a first portion of the surface to be illuminated with a first angular distribution and a region configured to form an illumination light beam for illuminating a second portion of the surface to be illuminated with a second angular distribution.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: August 4, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Takamitsu Komaki
  • Patent number: 10732498
    Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: August 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Cristiaan De Groot, Gerard Frans Jozef Schasfoort, Maksym Yuriiovych Sladkov, Manfred Petrus Johannes Maria Dikkers, Jozef Maria Finders, Pieter-Jan Van Zwol, Johannes Jacobus Matheus Baselmans, Stefan Michael Bruno Baumer, Laurentius Cornelius De Winter, Wouter Joep Engelen, Marcus Adrianus Van De Kerkhof, Robbert Jan Voogd
  • Patent number: 10712546
    Abstract: An illumination system and a method for operating an illumination system is disclosed. The illumination system includes a generator spatial light modulator, first and second optical systems and a controller. The generator spatial light modulator is positioned to receive an incident light beam and adapted to generate first and second coherent light beams, each beam being characterized by a phase and a first light beam optical axis in a plane containing the first and second coherent light beams. The first optical system images light leaving the generator spatial light modulator on a modulator spatial light modulator that alters the phase of one of the first and second coherent light beams to generate a relative phase difference. The second optical system that images light leaving the modulator spatial light modulator onto a sample to be illuminated. The controller causes the relative phase difference to cycle through a plurality of different phase-difference values.
    Type: Grant
    Filed: October 16, 2017
    Date of Patent: July 14, 2020
    Assignee: Keysight Technologies, Inc.
    Inventor: Manuel Moertelmaier
  • Patent number: 10712670
    Abstract: A method comprises disposing a photosensitive film layer on a surface of a substrate layer and placing a variable neutral density (ND) filter such that a surface of the variable ND filter faces an exposure region of the photosensitive film layer. The variable ND filter is a thin film that has an attenuation profile that modulates transmittance of light passing through the variable ND filter to the exposure region to cancel out an uneven power distribution in an intermediate interference exposure pattern at the exposure region of the photosensitive film layer. The method further comprises arranging one or more laser generators such that at least two generated beams of light from the one or more laser generators intersect with each other and form the intermediate interference exposure pattern that is modulated by the variable ND filter to form a target interference exposure pattern at the exposure region.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: July 14, 2020
    Assignee: Facebook Technologies, LLC
    Inventors: Matthieu Charles Raoul Leibovici, Matthew E. Colburn
  • Patent number: 10705433
    Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
    Type: Grant
    Filed: October 9, 2019
    Date of Patent: July 7, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Joseph R. Johnson, Thomas L. Laidig, Christopher Dennis Bencher
  • Patent number: 10684560
    Abstract: A pellicle for a photomask, a reticle including the same, and an exposure apparatus for lithography are provided. The pellicle may include a pellicle membrane and a passivation member. The pellicle membrane may include a carbon-based material having defects. The passivation member may cover the defects of the carbon-based material. The passivation member may include an inorganic material. The passivation member may be disposed on one or two surfaces of the pellicle membrane. The pellicle for the photomask may be applied to extreme ultraviolet (EUV) lithography.
    Type: Grant
    Filed: March 12, 2018
    Date of Patent: June 16, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyeonjin Shin, Hyunjae Song, Minhyun Lee, Yeonchoo Cho
  • Patent number: 10684555
    Abstract: Embodiments of the present disclosure generally relate to an image projection system. The image projection system includes an active matrix solid state emitter (SSE) device. The active matrix solid state emitter includes a substrate, a silicon layer, and a emitter substrate. The silicon layer is deposited over the substrate having a plurality of transistors formed therein. The emitter substrate is positioned between the silicon layer and the substrate. The emitter substrate comprises a plurality of emitter arrays. Each emitter array defines a pixel, wherein one pixel comprises one or more transistors from the plurality of transistors. Each transistor is configured to receive a variable amount of current.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: June 16, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Joseph R. Johnson, Christopher Dennis Bencher
  • Patent number: 10684563
    Abstract: Metrology systems and methods are provided, which derive metrology target position on the wafer and possibly the target focus position during the movement of the wafer on the system's stage. The positioning data is derived before the target arrives its position (on-the-fly), sparing the time required in the prior art for the acquisition stage and increasing the throughput of the systems and methods. The collection channel may be split to provide for an additional moving-imaging channel comprising at least one TDI (time delay and integration) sensor with an associated analysis unit configured to derive wafer surface information, positioning and/or focusing information of the metrology targets with respect to the objective lens, during wafer positioning movements towards the metrology targets. Additional focusing-during-movement module and possibly feedbacking derived position and/or focus information to the stage may enhance the accuracy of the stopping of the stage.
    Type: Grant
    Filed: February 19, 2018
    Date of Patent: June 16, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Amnon Manassen, Andrew Hill, Nadav Gutman, Yossi Simon, Alexander Novikov, Eugene Maslovsky
  • Patent number: 10678151
    Abstract: A control device for an assembly having a plurality of sensors and/or actuators includes at least one first control unit which is designed to be vacuum-suitable, has a distributor for splitting and/or combining signals and has a converter for converting digital signals into analog signals and/or analog signals into digital signals.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: June 9, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Holz, Jan Horn, Klaus Syrowatka
  • Patent number: 10670968
    Abstract: A maskless exposure method includes spatially modulating a light output from a light source into a pattern beam having a mask pattern, condensing the modulated pattern beam into a first group of spot beams having a first focal position on a Z-axis substantially perpendicular to an exposure surface of an object layer, and into a second group of spot beams having a second focal position different from the first focal position, and scanning the object layer with the first and second groups of spot beams. The object layer has a first height and a second height different from the first height.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: June 2, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang-Min Lee, Sang-Hyun Park, Won-Don Joo
  • Patent number: 10670975
    Abstract: A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: June 2, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Robert John Socha, Arie Jeffrey Den Boef, Nitesh Pandey
  • Patent number: 10663867
    Abstract: An apparatus configured to expose a substrate to light includes an illumination optical system configured to illuminate a mask, a projection optical system configured to project a pattern of the mask onto the substrate, and a decentering mechanism configured to decenter at least one optical element of the illumination optical system with respect to an optical axis of the projection optical system, or to decenter at least one optical element of the projection optical system with respect to an optical axis of the illumination optical system, and rotational asymmetry distortion that occurs at a position defocused from a focus position of the projection optical system is changed by decentering the optical element by the decentering mechanism.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: May 26, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Masaki Mizutani
  • Patent number: 10663873
    Abstract: A mirror arrangement, in particular for a microlithographic projection exposure apparatus, includes at least one mirror element bearing a mirror surface provided for reflecting electromagnetic radiation, at least one carrier element including a head section, which is provided for receiving at least one mirror element, and also a seat section. The arrangement further includes a mount arrangement, for receiving the at least one carrier element. At least one insertion opening is in the mount arrangement. The seat section of the carrier element plunges into the insertion opening. In addition, the arrangement includes a channel device for guiding a heat transfer medium is formed in the mount arrangement in the region surrounding the seat section. A method for dissipating heat is provided.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: May 26, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Willi Heintel, Hermann Bieg
  • Patent number: 10656418
    Abstract: A display apparatus includes a light-emitting component, a controller, a digital micro-mirror device, a first projection assembly and a second projection assembly. The controller is configured to alternately output a first image signal and a second image signal to the digital micro-mirror device. The digital micro-mirror device is configured such that in response to receiving the first image signal, at least one micro-lens is rotated to a respective first preset position, and that in response to receiving the second image signal, at least one micro-lens is rotated to a respective second preset position. The first projection assembly is configured to receive light reflected by the at least one micro-lens located at the respective first preset position and output a first image. The second projection assembly is configured to receive light reflected by the at least one micro-lens located at the respective second preset position and output a second image.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: May 19, 2020
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventor: Sen Ma
  • Patent number: 10642163
    Abstract: A system and method for controlling an exposure dose of a light source are disclosed. The system includes an LED light source, a light homogenizer, an energy detection unit and an exposure dose control unit coupled to both the LED light source and the energy detection unit. The energy detection unit includes an energy detector corresponding to the LED light source or the light homogenizer and an energy spot sensor corresponding to a wafer. By using the LED light source capable of producing UV light in lieu of an existing mercury lamp, the system is less hazardous and safer by eliminating the risk of discharging hazardous mercury vapor into the environment when the mercury lamp is broken. Moreover, exposure illuminance of the LED light source can be adjusted and the LED light source can be turned on/off under the control of exposure dose control unit to expose the wafer with high dose control accuracy, without needing to use a variable attenuator or an exposure shutter.
    Type: Grant
    Filed: November 24, 2017
    Date of Patent: May 5, 2020
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Pingxin Li, Meng Li, Zhiyong Jiang, Pengchuan Ma
  • Patent number: 10627727
    Abstract: Embodiments described herein relate to a dynamically controlled lens used in lithography tools. Multiple regions of the dynamic lens can be used to transmit a radiation beam for lithography process. By allowing multiple regions to transmit the radiation beam, the dynamically controlled lens can have an extended life cycle compared to conventional fixed lens. The dynamically controlled lens can be replaced or exchanged at a lower frequency, thus, improving efficiency of the lithography tools and reducing production cost.
    Type: Grant
    Filed: June 13, 2018
    Date of Patent: April 21, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yueh Lin Yang, Chi-Hung Liao
  • Patent number: 10605435
    Abstract: A light distribution element for a light emitting device, including a plurality of first light deflecting portions and a plurality of second light deflecting portions, wherein a pattern formed by the plurality of first light deflecting portions is superposed with a pattern formed by the plurality of second light deflecting portions to form a final display pattern. The present invention also provides a light emitting device including the light distribution element. According to the light distribution element and the light emitting device provided by the present invention, it is possible to generate a personalized, three-dimensional, dynamic lighting effect.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: March 31, 2020
    Assignee: VALEO VISION
    Inventors: Ji Luo, Ciling Zhang, Long Wang, Pingwu Yang
  • Patent number: 10598863
    Abstract: A laser hazard at the time of non-connection can be prevented with a simple structure. A cylindrical connector exterior, and a block that is incorporated in one end side of the connector exterior and in which a light emitting portion or a light incident portion is mounted toward another end side are included. The light emitting portion or the light incident portion is mounted on the block such that an optical axis direction of the light emitting portion or the light incident portion is inclined with respect to a longitudinal direction of the connector exterior. For example, the connector exterior has a length at which at least a part of light emitted from the light emitting portion can be emitted to an inner side (inner wall) of the connector exterior.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: March 24, 2020
    Assignee: SONY CORPORATION
    Inventors: Kazuaki Toba, Masanari Yamamoto, Ryohei Takahashi, Hiroshi Morita
  • Patent number: 10591825
    Abstract: A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength ? from the extreme ultraviolet range. The projection lens includes a multiplicity of mirrors having mirror surfaces arranged in a projection beam path between the object plane and the image plane so that a pattern of a mask in the object plane is imagable into the image plane via the mirrors. A first imaging scale in a first direction running parallel to a scan direction is smaller in terms of absolute value than a second imaging scale in a second direction perpendicular to the first direction. The projection lens also includes a dynamic wavefront manipulation system for correcting astigmatic wavefront aberration portions caused by reticle displacement.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: March 17, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stephan Andre, Daniel Golde, Toralf Gruner, Johannes Ruoff, Norbert Wabra, Ricarda Schoemer, Sonja Schneider
  • Patent number: 10585048
    Abstract: Methods of determining a value of a parameter of interest are disclosed. In one arrangement, a symmetric component and an asymmetric component of a detected pupil representation from illuminating a target are derived. A first metric characterizing the symmetric component and a second metric characterizing the asymmetric component vary non-monotonically as a function of the parameter of interest over a reference range of values of the parameter of interest. A combination of the derived symmetric component and the derived asymmetric component are used to identify a correct value from a plurality of candidate values of the parameter of interest.
    Type: Grant
    Filed: April 16, 2019
    Date of Patent: March 10, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Samee Ur Rehman, Anagnostis Tsiatmas, Sergey Tarabrin, Joannes Jitse Venselaar, Alexandru Onose, Mariya Vyacheslavivna Medvedyeva
  • Patent number: 10585363
    Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.
    Type: Grant
    Filed: March 14, 2016
    Date of Patent: March 10, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Simon Gijsbert Josephus Mathijssen, Arie Jeffrey Den Boef, Alessandro Polo, Patricius Aloysius Jacobus Tinnemans, Adrianus Johannes Hendrikus Schellekens, Elahe Yeganegi Dastgerdi, Willem Marie Julia Marcel Coene, Erik Willem Bogaart, Simon Reinald Huisman
  • Patent number: 10578951
    Abstract: A variable-volume enclosure that enables the photographing, from outside the enclosure, of highly reflective, objects placed in the enclosure without the reflections of things in the environment surrounding the enclosure being seen in the objects includes: (a) a translucent, planar base, (b) a pliable, two-way mirror that is configured so that, when its opposing edges are brought towards one another, the mirror's central portion bends upward to create a temporary enclosed region of the enclosure, (c) an attachment mechanism for fixedly attaching said one of the mirror's edges to the base's top surface, (d) an adjustable attachment mechanism that temporarily and adjustably attaches the mirror's other edge to the base's top surface, (e) a translucent covering which is adjustably attached to a mirror end.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: March 3, 2020
    Inventor: Erik Espinosa
  • Patent number: 10571809
    Abstract: Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment of the system includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels temporally by grey tone shots and full tone shots of a multiplicity of shots, and the controller is configured to vary a second intensity of a light beam generated by a light source and vary a first intensity of the light beam generated by the light source of each image projection system at the full tone shots.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: February 25, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Christopher Dennis Bencher, Joseph R. Johnson, Thomas L. Laidig
  • Patent number: 10564380
    Abstract: An alignment mechanism to position and focus a lens assembly includes a housing and an eccentric shaft supported by the housing. The eccentric shaft is configured to rotate with respect to the housing. The alignment mechanism further includes a lens assembly having a bracket coupled to the eccentric shaft, and an actuator assembly, coupled to the bracket of the lens assembly and configured to rotate the lens assembly about the eccentric shaft. The alignment mechanism further includes at least one thrust drive nut mounted on the eccentric shaft, the at least one thrust drive nut being configured to move the eccentric shaft and the bracket of the lens assembly in a z-axis direction.
    Type: Grant
    Filed: July 5, 2016
    Date of Patent: February 18, 2020
    Assignee: RAYTHEON COMPANY
    Inventor: Li Chiao Po
  • Patent number: 10558026
    Abstract: A projection optical unit images an object field in an image field. The projection optical unit includes a plurality of mirrors guides imaging light from the object field to the image field. At least two of the mirrors are arranged directly behind one another in the beam path of the imaging light for grazing incidence with an angle of incidence of the imaging light which is greater than 60°. This results in an imaging optical unit that can exhibit a well-corrected imageable field with, at the same time, a high imaging light throughput.
    Type: Grant
    Filed: September 24, 2018
    Date of Patent: February 11, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Markus Schwab
  • Patent number: 10551746
    Abstract: A lithographic apparatus comprises a substrate table for holding a substrate and a projection system for projecting a radiation beam onto a target region of the substrate so as to form an image on the substrate. The projection system comprises a lens element arrangement having a first lens element. A first pressure sensor is arranged to measure at least one pressure value adjacent the first lens element. A controller determines a first change in a pressure difference over the first lens element and/or a further lens element based on a signal received from the pressure sensor, determines adjustments to a position of one of the substrate table and projection system based upon the determined first change, and causes actuators to make adjustments to the substrate table or the projection system.
    Type: Grant
    Filed: November 1, 2016
    Date of Patent: February 4, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Benjamin Cunnegonda Henricus Smeets, Mark Constant Johannes Baggen
  • Patent number: 10551747
    Abstract: The disclosure relates to a device for changing a shape of a surface of an optical element via electron irradiation. The device includes an electron irradiation unit for radiating electrons onto the surface with a locally resolved energy dose distribution for the purpose of producing local material densifications in the optical element. Furthermore, the device includes a control unit for determining a locally resolved energy dose distribution from a predefined desired change of a surface shape of the optical element by optimization via a minimization of a merit function, in such a way that a difference between the desired change and an actual change of the surface shape of the optical element, the actual change being brought about on account of the predefinition determined, is minimized.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: February 4, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Walter Pauls, Florian Ahles, Martin Weiser
  • Patent number: 10539770
    Abstract: Techniques are disclosed for magnification compensation and/or beam steering in optical systems. An optical system may include a lens system to receive first radiation associated with an object and direct second radiation associated with an image of the object toward an image plane. The lens system may include a set of lenses, and an actuator system to selectively adjust the set of lenses to adjust a magnification associated with the image symmetrically along a first and a second direction. The lens system may also include a beam steering lens to direct the first radiation to provide the second radiation. In some examples, the lens system may also include a second set of lenses, where the actuator system may also selectively adjust the second set of lenses to adjust the magnification along the first or the second direction. Related methods are also disclosed.
    Type: Grant
    Filed: June 18, 2018
    Date of Patent: January 21, 2020
    Assignee: SUSS MICROTEC PHOTONIC SYSTEMS INC.
    Inventors: Yanrong Yuan, John Bjorkman, Paul Ferrari, Jeff Hansen
  • Patent number: 10534153
    Abstract: Digital cameras, optical lens modules for such digital cameras and methods for assembling lens elements in such lens modules. In various embodiments, the digital cameras comprise an optical lens module including N?3 lens elements Li, each lens element comprising a respective front surface S2i?1 and a respective rear surface S2i. In various embodiments the first lens element toward the object side, L1 and its respective front surfaces S1 have optical and/or mechanical properties, such as a clear aperture, a clear height and a mechanical height that are larger than respective properties of following lens elements and surfaces. This is done to achieve a camera with large aperture stop, given a lens and/or camera height.
    Type: Grant
    Filed: January 20, 2019
    Date of Patent: January 14, 2020
    Assignee: Corephotonics Ltd.
    Inventors: Gal Shabtay, Ephraim Goldenberg, Michael Dror, Itay Yedid, Gil Bachar
  • Patent number: 10527832
    Abstract: An imaging optical unit for projection lithography has a plurality of mirrors for imaging an object field into an image field with imaging light guided along a path from the object field to the image field. The penultimate mirror in the path has no passage opening to pass the imaging light. The imaging optical unit has a stop to predefine an outer marginal contour of a pupil of the imaging optical unit. The stop is between the penultimate and last mirrors in the path. The imaging optical unit can have exactly one stop for predefining at least one section of the outer pupil marginal contour. An entrance pupil of the imaging optical unit can be upstream of the object field. The imaging optical unit can be well defined regarding its pupil and exhibit desirable properties for projection lithography.
    Type: Grant
    Filed: November 17, 2017
    Date of Patent: January 7, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Schwab, Hans-Juergen Rostalski
  • Patent number: 10520826
    Abstract: An optical element for transmitting radiation includes: a first surface region surrounding an optically used area of the optical element; and a second surface region that adjoins the first surface region. A circumferential edge is formed between the first and second surface regions. The optical element further includes a one-piece film which covers the first surface region, the edge and the second surface region. The film includes a hydrophobic material at least on its side facing away from the first and the second surface regions. An optical assembly includes at least one such optical element. A method produces such an optical element.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: December 31, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Roland Pilz, Thomas Petasch
  • Patent number: 10514606
    Abstract: A method for setting an illumination setting for illuminating an object field of a projection exposure apparatus includes taking into account the sensitivity of a performance variable for changes in the intensity of the illumination radiation in the illumination pupil.
    Type: Grant
    Filed: January 15, 2019
    Date of Patent: December 24, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Alexander Winkler, Daniel Lenz
  • Patent number: 10509324
    Abstract: A method for generating a radiation light in a lithography exposure system is provided. The method includes connecting a first nozzle assembly coupled to a support to an outlet of a storage member that receives a target fuel inside. The method further includes guiding the target fuel flowing through the first nozzle assembly and supplying a droplet of the target fuel into an excitation zone via the first nozzle assembly. The method also includes moving the support to connect a second nozzle assembly coupled to the support with the outlet. In addition, the method includes guiding the target fuel flowing through the second nozzle assembly and supplying a droplet of the target fuel into the excitation zone via the second nozzle assembly. The method further includes irradiating the droplet of the target fuel in the excitation zone with a laser pulse.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: December 17, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hsin-Feng Chen, Han-Lung Chang, Li-Jui Chen, Bo-Tsun Liu
  • Patent number: 10502938
    Abstract: A light outputting apparatus includes a light outputting section that outputs light, and the light outputting section includes a light source that emits light, a collimator lens for parallelizing the light emitted from the light source, and an optical element including a plurality of lenslets that widen the light having passed through the collimator lens in a direction perpendicular to the optical axis of the light source and corresponding to a first direction that is one of first and second directions perpendicular to each other.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: December 10, 2019
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Makoto Otani
  • Patent number: 10503076
    Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
    Type: Grant
    Filed: August 29, 2018
    Date of Patent: December 10, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Joseph R. Johnson, Thomas L. Laidig, Christopher Dennis Bencher
  • Patent number: 10488781
    Abstract: An exposing device according to an embodiment includes: a light emitter; a first light blocking member including first apertures; a first lens array including first lenses, wherein each of the first lenses converges the light passing through the corresponding first aperture; a second light blocking member including second apertures; and a second lens array including second lenses, wherein each of the second lenses converges the light passing through the corresponding second aperture. An optical axis of each of the first lenses and an optical axis of the corresponding one of the second lenses substantially coincide with each other. A first aperture center of each of the first apertures and a second aperture center of the corresponding second aperture are disposed at a predetermined distance from the optical axis of the corresponding first lens and the optical axis of the corresponding second lens in an array direction of the light emitter.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: November 26, 2019
    Assignee: Oki Data Corporation
    Inventor: Ren Nakamichi
  • Patent number: 10488567
    Abstract: A facet mirror for EUV projection lithography has a plurality of facets for reflecting EUV illumination light. At least some of the facets are in the form of alignment facets and have a reflection surface, the edge contour of which is aligned along two alignment coordinates of an overall facet arrangement. The reflection surface of at least one of the alignment facets has a surface shape that exhibits different curvatures along two axes of curvature. The axes of curvature are tilted about a finite axis tilt angle relative to the alignment coordinates of the overall facet arrangement. The result is a facet mirror with increased EUV throughput, particularly for prolonged operation of a projection exposure apparatus that is equipped therewith.
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: November 26, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Thomas Fischer, Sarina Wunderlich
  • Patent number: 10481500
    Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
    Type: Grant
    Filed: August 3, 2011
    Date of Patent: November 19, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hans-Juergen Mann, Wilhelm Ulrich, Erik Loopstra, David R. Shafer
  • Patent number: 10444637
    Abstract: An optical system comprising: an illumination system configured, to form a periodic illumination mode comprising radiation in a pupil plane of the optical system having a spatial intensity profile which is periodic in at least one direction, a measurement system configured to measure a dose of radiation which is received in an field plane of the optical system as a function of position in the field plane, and a controller configured to: select one or more spatial frequencies in the field plane at which variation in the received dose of radiation as a function of position is caused by speckle, and determine a measure of the variation of the received dose of radiation as a function of position at the selected one or more spatial frequencies, the measure of the variation in the received dose being indicative of speckle in the field plane.
    Type: Grant
    Filed: December 1, 2016
    Date of Patent: October 15, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Johannes Jacobus Matheus Baselmans
  • Patent number: 10444633
    Abstract: A sensor arrangement includes at least one position sensor apparatus for providing a position signal for a mirror and an evaluation apparatus for ascertaining the position of the mirror depending on the position signal.
    Type: Grant
    Filed: November 8, 2017
    Date of Patent: October 15, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jan Horn, Stefan Krone, Lars Berger
  • Patent number: 10437159
    Abstract: A measurement system is disclosed in which a first optical system splits an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies a modulation to at least one of the components independently of at least one other of the components. A second optical system illuminates a target with the plurality of components and directs radiation scattered by the target to a detection system. The detection system distinguishes between each of one or more components, or between each of one or more groups of components, of the radiation directed to the detection system based on the modulation applied to each component or each group of components by the modulator.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: October 8, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Teunis Willem Tukker, Gerbrand Van Der Zouw, Amandev Singh
  • Patent number: 10422691
    Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: September 24, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Willem Jakobus Cornelis Koppert, Han-Kwang Nienhuys, Ruud Martinus Van Der Horst
  • Patent number: 10416567
    Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.
    Type: Grant
    Filed: February 27, 2017
    Date of Patent: September 17, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Matheus Marie De Wit, Kim Gerard Feijen, Anko Jozef Cornelus Sijben, Martinus Maassen, Henricus Martinus Johannes Van De Groes
  • Patent number: 10400995
    Abstract: An illumination apparatus for providing light and for illuminating an illumination plane with a rectangular light distribution is provided. The illumination apparatus includes at least one light source configured to generate light, a collimation optical unit configured to collimate the light, a condenser optical unit configured to shape a rectangular angular distribution of the light coming from the collimation optical unit, and a freeform optical unit having at least one freeform area for modifying the angular distribution such that a rectangular light distribution is produced in an illumination plane that is optically connected downstream.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: September 3, 2019
    Assignee: OSRAM GMBH
    Inventor: Henning Rehn
  • Patent number: 10391490
    Abstract: A system and method for isolating and analyzing single cells, comprising: a substrate having a broad surface; a set of wells defined at the broad surface of the substrate, and a set of channels, defined by the wall, that fluidly couple each well to at least one adjacent well in the set of wells; and fluid delivery module defining an inlet and comprising a plate, removably coupled to the substrate, the plate defining a recessed region fluidly connected to the inlet and facing the broad surface of the substrate, the fluid delivery module comprising a cell capture mode.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: August 27, 2019
    Assignee: Celsee Diagnostics, Inc.
    Inventors: Kalyan Handique, Priyadarshini Gogoi, Saedeh Javdani Sepehri, Kyle Gleason
  • Patent number: 10386595
    Abstract: An optical mechanism is provided. The optical mechanism includes a fixed member, a movable member, an optical element, a first sensing magnet and a first sensing element, wherein the movable member is movably connected to the fixed member, and the optical element is disposed on the movable member. The first sensing magnet corresponds to the optical element and has a first magnetic polar direction. The first sensing element corresponds to the first sensing magnet for detecting the rotation of the first sensing magnet around a first axis direction relative to the fixed member, wherein the first axis is perpendicular to the first magnetic polar direction.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: August 20, 2019
    Assignee: TDK Taiwan Corp.
    Inventors: Fu-Yuan Wu, Yu-Shan Chou, Haruo Taguchi
  • Patent number: 10365566
    Abstract: A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: July 30, 2019
    Assignee: Eulitha A.G.
    Inventors: Francis Clube, Harun Solak
  • Patent number: 10353294
    Abstract: An illumination optical system includes a fly's-eye lens having a back focal plane arranged on a pupil plane of the illumination optical system or in a vicinity of the pupil plane; a first spatial light modulator which is arranged on an incident side of the fly's-eye lens and which includes a plurality of first mirror elements; a first optical system arranged in an optical path between the first spatial light modulator and the fly's-eye lens; a second spatial light modulator arranged in an optical path between the first optical system and the fly's-eye lens and which includes a plurality of second mirror elements; and a polarizing element arranged in the optical path between the first spatial light modulator and the fly's-eye lens.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: July 16, 2019
    Assignee: NIKON CORPORATION
    Inventors: Norio Miyake, Kinya Kato
  • Patent number: 10354959
    Abstract: A mark forming method includes: exposing a wafer with a mask image to form first and second resist marks that have different shapes than one another based on a portion of the mask image; applying a polymer layer that contains a block copolymer to the wafer by spin-coating; forming self-assembled regions in the applied polymer layer; selectively removing a portion of the self-assembled regions; and forming first and second wafer marks on the wafer using the first and second resist marks. This makes it possible to form the marks when forming circuit patterns using self-assembly of a block copolymer.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: July 16, 2019
    Assignee: NIKON CORPORATION
    Inventor: Yuji Shiba