Methods Patents (Class 355/77)
  • Patent number: 10836098
    Abstract: A 3D printing method for binary stereolithography 3D printer includes following steps of: controlling a binary stereolithography 3D printer (20) to retrieve a plurality of gray-scale slice images (802,822,842); mapping a pixel value of each pixel of each gray-scale slice images (802,822,842) from a pixel value full range to an accumulation value range for obtaining a printing parameter of each pixel; selecting one of the gray-scale slice images (802,822,842) orderly; controlling a binary lighting module (204) of the binary stereolithography 3D printer (20) to irradiate for generating a layer of physical slice model (320,322,340,342) according to the printing parameter of each pixel of the selected gray-scale slice image (802,822,842); and repeatedly executing aforementioned steps to generate a physical 3D model (8?) constituted by a stack of multiple of the physical slice models (320,322,340,342).
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: November 17, 2020
    Assignees: XYZPRINTING, INC., KINPO ELECTRONICS, INC.
    Inventor: Peng-Yang Chen
  • Patent number: 10802397
    Abstract: Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.
    Type: Grant
    Filed: March 6, 2020
    Date of Patent: October 13, 2020
    Assignee: Molecular Imprints, Inc.
    Inventors: Vikramjit Singh, Kang Luo, Michael Nevin Miller, Shuqiang Yang, Frank Y. Xu
  • Patent number: 10802112
    Abstract: A chirped radio frequency signal is transmitted across an area of a potential threat. A reflected radio frequency return signal from an open barrel of a weapon at a location within the area of the potential threat is received at an incident angle through an aperture. An antenna at a position in an antenna array detects the reflected radio frequency return signal received at the incident angle through the aperture. The position of the antenna within the antenna array corresponds to a direction from which the reflected radio frequency return signal originates.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: October 13, 2020
    Assignee: United States of America as represented by the Secretary of the Navy
    Inventors: Paul David Swanson, Jia-Chi S. Chieh
  • Patent number: 10732455
    Abstract: The present invention is to provide a liquid crystal display device which is capable of suppressing reflected glare of a display screen on a windshield and the like, has excellent front contrast, and has excellent visibility of a display screen as viewed via polarized sunglasses. A liquid crystal display device includes, in order from a viewing side, a viewing side polarizer, a liquid crystal cell, a non-viewing side polarizer, and an anisotropic light absorption layer having an absorption axis in a thickness direction. The liquid crystal display device further includes at least one polarization control layer, in which the polarization control layer is arranged on a viewing side of the viewing side polarizer or on a non-viewing side of the non-viewing side polarizer.
    Type: Grant
    Filed: August 5, 2019
    Date of Patent: August 4, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Fumitake Mitobe, Naoya Nishimura, Jun Takeda
  • Patent number: 10733744
    Abstract: Methods and systems for aligning images for a specimen acquired with different modalities are provided. One method includes acquiring information for a specimen that includes at least first and second images for the specimen. The first image is acquired with a first modality different than a second modality used to acquire the second image. The method also includes inputting the information into a learning based model. The learning based model is included in one or more components executed by one or more computer systems. The learning based model is configured for transforming one or more of the at least first and second images to thereby render the at least the first and second images into a common space. In addition, the method includes aligning the at least the first and second images using results of the transforming. The method may also include generating an alignment metric using a classifier.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: August 4, 2020
    Assignee: KLA-Tencor Corp.
    Inventors: Thanh Huy Ha, Scott A. Young, Mohan Mahadevan
  • Patent number: 10705437
    Abstract: Disclosed is a method, and associated apparatuses, for measuring a parameter of interest relating to a structure having at least two layers. The method comprises illuminating the structure with measurement radiation and detecting scattered radiation having been scattered by said structure. The scattered radiation comprises normal and complementary higher diffraction orders. A scatterometry model which relates a scattered radiation parameter to at least a parameter of interest and an asymmetry model which relates the scattered radiation parameter to at least one asymmetry parameter are defined, the asymmetry parameter relating to one or more measurement system errors and/or an asymmetry in the target other than a misalignment between the two layers. A combination of the scatterometry model and asymmetry model is used to determine a system of equations, and the system of equations is then solved for the parameter of interest.
    Type: Grant
    Filed: October 9, 2018
    Date of Patent: July 7, 2020
    Assignee: ASML Netherlands B.V
    Inventors: Narjes Javaheri, Mohammadreza Hajiahmadi, Murat Bozkurt, Alberto Da Costa Assafrao, Marc Johannes Noot, Simon Gijsbert Josephus Mathijssen, Jin Lian
  • Patent number: 10698325
    Abstract: Alignment can be monitored by positioning at least one alignment verification location per alignment frame. The alignment verification location is a coordinate within the alignment frame. A distance between each of the alignment verification locations and a closest instance of an alignment target is determined. An alignment score can be determined based on the distance. The alignment score can include a number of the alignment frames between the alignment verification location and the alignment target. If the alignment score is below a threshold, then alignment setup can be performed.
    Type: Grant
    Filed: May 1, 2019
    Date of Patent: June 30, 2020
    Assignee: KLA-Tencor Corporation
    Inventor: Bjorn Brauer
  • Patent number: 10699875
    Abstract: Methods and systems for charged particle microscope confocal imaging are disclosed herein. An example method includes obtaining a plurality of probe images of a portion of a sample, each probe image of the plurality of probe images obtained at a different focal depth within the sample, applying a virtual aperture to each probe image of the plurality of probe images to form a respective plurality of confocal images, and forming a three-dimensional reconstruction of the sample based on the plurality of confocal images.
    Type: Grant
    Filed: November 13, 2018
    Date of Patent: June 30, 2020
    Assignee: FEI Company
    Inventors: Mark Williamson, Andrew Barnum, Dong Tang
  • Patent number: 10610972
    Abstract: The present disclosure discloses a laser cutting base and a laser cutting device. The laser cutting base includes a base body, a recess and a filling structure. The base body includes a first surface configured to fixedly mount an element to be cut. The recess is formed by recessed inwardly from the first surface and corresponds to a position of a cutting line. The filling structure is filled in the recess and is able to prevent debris in the recess during cutting process from rebounding to the element to be cut.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: April 7, 2020
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventor: Lu Liu
  • Patent number: 10606177
    Abstract: There is provided a substrate processing apparatus, including: a mounting table configured to mount a substrate with a pattern mask formed on the substrate inside a process container; a depressurization mechanism configured to perform a pressure-decreasing process of depressurizing an interior of the process container to have a pressure of 1 Pa or lower; a light irradiation mechanism configured to irradiate the substrate with a vacuum ultraviolet light after the interior of the process container is depressurized so that an internal pressure of the process container reaches a pressure of 1 Pa or lower; and a controller configured to output a control signal such that an average depressurization rate inside the process container performed by the depressurization mechanism becomes 250 Pa/sec or lower while the interior of the process container is depressurized from 10,000 Pa to 1 Pa.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: March 31, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tomohiro Iseki, Keiichi Tanaka
  • Patent number: 10599045
    Abstract: According to an embodiment, focus sensitivity information in which focus sensitivity expressing a relation between an aberration correction value set in an exposure device and a best focus when a pattern is formed on a first substrate by exposure of the exposure device using the aberration correction value, and the pattern are correlated is input. Moreover, on the basis of the focus sensitivity information and a surface height difference of a second substrate, the aberration correction value in which best focuses for a pattern group to be formed on the second substrate by exposure satisfy a first condition is calculated. In addition, the second substrate is exposed by the exposure device using the aberration correction value satisfying the first condition.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: March 24, 2020
    Assignee: Toshiba Memory Corporation
    Inventors: Yoshio Mizuta, Nobuhiro Komine
  • Patent number: 10558116
    Abstract: A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating two opposite surfaces of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring a birefringence distribution on the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable group or unacceptable group, based on the measured birefringence distribution.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: February 11, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hisashi Yagi, Daijitsu Harada, Masaki Takeuchi, Kazuo Shirota, Kazuhiko Aoki
  • Patent number: 10451564
    Abstract: A method for qualitatively detecting aberration and determine aberration types in a photolithography system is disclosed. The method includes using a digital micromirror device (DMD) pattern to project an optical signal on a reflective substrate, acquiring a return optical signal reflected from the substrate at different focus heights (ranging from above to below best focus), forming a through focus curve based off of the return optical signal at various focus heights, comparing the through focus curve to a predetermined curve—the predetermined curve being a function of focus, and determining if a lens aberration is present. By using the existing hardware of the photolithography system to determine if a lens aberration exists, costs are maintained at a minimum and the DMD pattern creates a through focus curve (TFC) image in less than five minutes allowing for quick correction.
    Type: Grant
    Filed: April 25, 2018
    Date of Patent: October 22, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Qin Zhong, Antoine P. Manens, Hwan J. Jeong
  • Patent number: 10394131
    Abstract: A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function of a stochastic variation of a characteristic of an aerial image or a resist image, or a function of a variable that is a function of the stochastic variation or that affects the stochastic variation, the stochastic variation being a function of a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied.
    Type: Grant
    Filed: February 9, 2016
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventor: Duan-Fu Stephen Hsu
  • Patent number: 10133195
    Abstract: An exposure apparatus exposes a substrate with illumination light via a projection optical system, and includes a frame member, a mark detection system that detects a mark of the substrate, a mask stage system having a first movable body to hold a mask, a first encoder system having first heads that each irradiate a first measurement beam to a first grating section, a substrate stage system having a second movable body to hold the substrate, a second encoder system having second heads that each irradiate a second measurement beam to a second grating section, and a controller that controls driving of the first movable body and of the second movable body, based on measurement information of the first and second encoder systems. In each of an exposure operation and a detection operation, the positional information of the second movable body is measured by the second encoder system.
    Type: Grant
    Filed: September 17, 2014
    Date of Patent: November 20, 2018
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10121709
    Abstract: A controller includes a memory that stores a first model corresponding to a first critical dimension of a substrate processed by a substrate processing system and a second model corresponding to a second critical dimension of the substrate. The second model includes a predicted relationship between the first critical dimension and the second critical dimension. A critical dimension prediction module calculates a first prediction of the first critical dimension of the substrate using the first model, provides the first prediction of the first critical dimension as an input to the second model, and calculates and outputs a second prediction of the second critical dimension of the substrate using the second model.
    Type: Grant
    Filed: January 24, 2017
    Date of Patent: November 6, 2018
    Assignee: LAM RESEARCH CORPORATION
    Inventor: Ramanapathy Veerasingam
  • Patent number: 10018904
    Abstract: An EUV mask according to an embodiment includes a substrate, a first line-shaped portion provided on the substrate, a second line-shaped portion provided on the substrate, a first sidewall disposed on a side surface of the first line-shaped portion, and a second sidewall disposed on a side surface of the second line-shaped portion. A first layer and a second layer are stacked in the first and second line-shaped portions. The first layer includes a first material. The second layer includes a second material. The first and second sidewalls include an oxide of the first material and cover a side surface of the first layer and a side surface of the second layer.
    Type: Grant
    Filed: March 14, 2016
    Date of Patent: July 10, 2018
    Assignee: Toshiba Memory Corporation
    Inventor: Kosuke Takai
  • Patent number: 9921488
    Abstract: A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
    Type: Grant
    Filed: February 3, 2015
    Date of Patent: March 20, 2018
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jun-Ho Sim, Jung-In Park, Ki-Beom Lee, Hi-Kuk Lee, Hyun-Seok Kim, Kab-Jong Seo, Sang-Hyun Yun, Sang-Hyun Lee, Jung-Chul Heo, Jong-Joo Kim, Chang-Hoon Kim
  • Patent number: 9921469
    Abstract: The present invention provides an imprint method comprising a deformation step of deforming a pattern surface of a mold so that the mold is gradually brought into contact with the imprint material outward from a central portion of the pattern surface, an obtaining step of obtaining a shift amount indicating how much a mark on the mold shifts in a direction parallel to a substrate surface due to deformation of the pattern surface, a detection step of detecting the mark on the mold and a mark on the substrate while the pattern surface is deformed, and obtaining relative positions of the mold and the substrate from a detection result, and an alignment step of aligning the mold and the substrate using the shift amount and the relative positions while the pattern surface is deformed.
    Type: Grant
    Filed: April 21, 2014
    Date of Patent: March 20, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hiroshi Sato
  • Patent number: 9921485
    Abstract: A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: March 20, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jun Ye, Yu Cao
  • Patent number: 9891531
    Abstract: In corner sections of first to fourth quadrants whose origin point is a center of an upper surface of a stage, three each of two-dimensional heads are provided. The three each of two-dimensional heads include one first head and two second heads. The stage is driven, while measuring a position of the stage using three first heads that face a two-dimensional grating of a scale plate provided above the stage from the four first heads, and during the driving, difference data of measurement values of the two second heads with respect to the first head in a measurement direction are taken in for head groups to which the three first heads belong, respectively, and using the difference data, grid errors are calibrated.
    Type: Grant
    Filed: May 3, 2017
    Date of Patent: February 13, 2018
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 9864271
    Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
    Type: Grant
    Filed: August 1, 2017
    Date of Patent: January 9, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Klaus Simon
  • Patent number: 9817392
    Abstract: Several embodiments of photolithography systems and associated methods of overlay error correction are disclosed herein. In one embodiment, a method for correcting overlay errors in a photolithography system includes measuring a plurality of first overlay errors that individually correspond to a microelectronic substrate in a first batch of microelectronic substrates. The method also includes determining a relationship between the first overlay errors and a first sequence of the microelectronic substrates in the first batch. The method further includes correcting a second overlay error of individual microelectronic substrates in a second batch based on a second sequence of the microelectronic substrates in the second batch and the determined relationship.
    Type: Grant
    Filed: November 19, 2015
    Date of Patent: November 14, 2017
    Assignee: Micron Technology, Inc.
    Inventor: Woong Jae Chung
  • Patent number: 9811003
    Abstract: A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and ?1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity values within each ROI are processed and compared between images, to obtain a measurement of asymmetry and hence overlay error. Separation zones are formed between the component gratings and design so as to provide dark regions in the image. In an embodiment, the ROIs are selected with their boundaries falling within the image regions corresponding to the separation zones. By this measure, the asymmetry measurement is made more tolerant of variations in the position of the ROI. The dark regions also assist in recognition of the target in the images.
    Type: Grant
    Filed: November 18, 2016
    Date of Patent: November 7, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Martin Jacobus Johan Jak, Armand Eugene Albert Koolen, Hendrik Jan Hidde Smilde
  • Patent number: 9811035
    Abstract: An image forming apparatus includes an image formation unit, a detection unit, a storage unit, and a control unit. When the detection unit outputs a second output value when a second recording material, which is different from a first recording material is detected, in a state where the storage unit stores a first output value output by the detection unit upon detection of the first recording material, the control unit controls an image forming condition based on at least the first output value if a differential value between the first output value and the second output value is smaller than a predetermined threshold value and controls the image forming condition based on the second output value without using the first output value if the differential value is greater than the predetermined threshold value.
    Type: Grant
    Filed: November 23, 2015
    Date of Patent: November 7, 2017
    Assignee: Canon Kabushiki Kaisha
    Inventors: Miki Naruse, Masafumi Monde, Tsutomu Ishida, Kosuke Ogino
  • Patent number: 9811002
    Abstract: A method of lithography in a lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate, the method including: determining a dose sensitivity of at least part of the pattern at a plurality of values of a dose, wherein the dose sensitivity is not a monotonically increasing or monotonically decreasing function of the dose. A computer product including a processor, a memory and a storage device, wherein the storage device at least stores values of, or a function describing, a dose sensitivity of at least part of a lithographic pattern at a plurality of values of dose, wherein the dose sensitivity is not a monotonically increasing or monotonically decreasing function of the dose.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: November 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Jozef Maria Finders
  • Patent number: 9798050
    Abstract: A substrate with a multilayer reflective film capable of facilitating the discovery of contaminants, scratches and other critical defects by inhibiting the detection of pseudo defects attributable to surface roughness of a substrate or film in a defect inspection using a highly sensitive defect inspection apparatus. The substrate with a multilayer reflective film has a multilayer reflective film obtained by alternately laminating a high refractive index layer and a low refractive index layer on a main surface of a mask blank substrate used in lithography, wherein an integrated value I of the power spectrum density (PSD) at a spatial frequency of 1 ?m?1 to 10 ?m?1 of the surface of the substrate with a multilayer reflective film, obtained by measuring a region measuring 3 ?m×3 ?m with an atomic force microscope, is not more than 180×10?3 nm3, and the maximum value of the power spectrum density (PSD) at a spatial frequency of 1 ?m?1 to 10 ?m?1 is not more than 50 nm4.
    Type: Grant
    Filed: September 25, 2014
    Date of Patent: October 24, 2017
    Assignee: HOYA CORPORATION
    Inventors: Kazuhiro Hamamoto, Toshihiko Orihara
  • Patent number: 9785094
    Abstract: An image forming apparatus includes a first image forming section, a second image forming section, and a transfer section. The first image forming section forms an image layer by a first developer. The second image forming section forms an auxiliary layer by a second developer. The transfer section transfers the image layer formed by the first image forming section and the auxiliary layer formed by the second image forming section sequentially to an object, as a transfer object, on which transfer is to be performed. The following expression is satisfied: 0.30?(E2/E1)?1.00, where E1 is a charge amount of the first developer, and E2 is a charge amount of the second developer.
    Type: Grant
    Filed: July 20, 2016
    Date of Patent: October 10, 2017
    Assignee: OKI DATA CORPORATION
    Inventor: Yuji Takino
  • Patent number: 9778563
    Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
    Type: Grant
    Filed: August 4, 2011
    Date of Patent: October 3, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Klaus Simon
  • Patent number: 9690216
    Abstract: A display manufacturing method comprises steps of: moving a first substrate and a second substrate by a conveying apparatus; and implementing a first exposure and a second exposure of the first substrate and a first exposure and a second exposure of the second substrate by at least one light emitting element when the conveying apparatus drives the first and second substrates to pass through the light source module. When the first exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite, or when the second exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite. A photo alignment process is also disclosed.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: June 27, 2017
    Assignee: INNOLUX CORPORATION
    Inventors: Ker-Yih Kao, Tsan-Jen Chen, Chien-Hsing Lee
  • Patent number: 9678433
    Abstract: In corner sections of first to fourth quadrants whose origin point is a center of an upper surface of a stage, three each of two-dimensional heads are provided. The three each of two-dimensional heads include one first head and two second heads. The stage is driven, while measuring a position of the stage using three first heads that face a two-dimensional grating of a scale plate provided above the stage from the four first heads, and during the driving, difference data of measurement values of the two second heads with respect to the first head in a measurement direction are taken in for head groups to which the three first heads belong, respectively, and using the difference data, grid errors are calibrated.
    Type: Grant
    Filed: October 2, 2013
    Date of Patent: June 13, 2017
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 9548183
    Abstract: Charged particle beam writing apparatus includes a first generation unit to generate a smallest deflection region layer in three or more deflection region layers each having deflection regions of a size different from those of other deflection region layers, for each of a plurality of figure types variably shapable using first and second shaping apertures, an assignment unit to assign each of a plurality of shot figure patterns to deflection regions of the smallest deflection region layer of a corresponding one of the plurality of figure types, a correction unit to correct, by shifting the position of each smallest deflection region layer, according to a variable shaping position of each figure type, and a writing unit to write each of the plurality of shot figure patterns on a target object, in a state where the position of each smallest deflection region layer has been corrected for each figure type.
    Type: Grant
    Filed: August 14, 2014
    Date of Patent: January 17, 2017
    Assignee: NuFlare Technology, Inc.
    Inventor: Jun Yashima
  • Patent number: 9543186
    Abstract: Embodiments of substrate supports are provided herein. In some embodiments, a substrate support may include a support plate having a support surface to support a substrate, a support ring to support a substrate at a perimeter of the support surface; and a plurality of first support elements disposed in the support ring, wherein an end portion of each of the first support elements is raised above an upper surface of the support ring to define a gap between the upper surface of the support ring and an imaginary plane disposed on the end portions of the plurality of first support elements.
    Type: Grant
    Filed: February 1, 2013
    Date of Patent: January 10, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Olkan Cuvalci, Joel M. Huston, Gwo-Chuan Tzu
  • Patent number: 9465302
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
    Type: Grant
    Filed: May 5, 2015
    Date of Patent: October 11, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Clemens Johannes Gerardus Van Den Dungen, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
  • Patent number: 9423702
    Abstract: An exposure apparatus and method exposes a substrate with an energy beam via a mask, and includes a substrate stage system that drives a movable body holding the substrate to move the substrate. A measurement system has an encoder system that irradiates a grating section with a beam and measures positional information of the movable body, and an interferometer system that measures positional information of the movable body. A control system controls a movement of the movable body based on measurement information of the measurement system. The positional information used for movement control of the movable body can be switched from the positional information of one of the encoder system and the interferometer system to the positional information of the other.
    Type: Grant
    Filed: October 7, 2010
    Date of Patent: August 23, 2016
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 9383654
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: July 5, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria Direcks, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Danny Maria Hubertus Philips, Michel Riepen, Clemens Johannes Gerardus Van Den Dungen, Adrianes Johannes Baeten, Fabrizio Evangelista
  • Patent number: 9360829
    Abstract: In an image processing apparatus, a control device controls a releasing member to release a release object onto a sheet to perform an image processing; controls a first rotating body to rotate to convey the sheet on which the releasing member has released the release object; controls a second rotating body to rotate to convey the sheet whose leading edge has passed through the first rotating body; determines whether a cover is in an open position or a close position relative to a housing of the image processing apparatus based on a signal outputted by a cover sensor; and restricts, when the cover is determined to be in the open position based on the signal, a rotation of the second rotating body while the first rotating body rotates.
    Type: Grant
    Filed: October 22, 2014
    Date of Patent: June 7, 2016
    Assignee: Brother Kogyo Kabushiki Kaisha
    Inventors: Masato Makino, Yohei Hashimoto
  • Patent number: 9300829
    Abstract: In conventional image reading in a large-sized scanner using plural CIS sensors, overall linearity of an original is poor, and a shift occurs particularly at connection portions of the CIS sensors in the read image. To solve this, an image reading apparatus in which CISs are arranged zigzag, and an original is read while conveying the original by a conveyance roller in a direction different from an arrayed direction of the reading elements of the CIS sensors performs following correction. That is, a shift from an image position in a calibration sheet corresponding to a rotation angle of the conveyance roller for at each position of the CIS sensors is detected from image data obtained by reading the calibration sheet while conveying the calibration sheet by the conveyance roller. The shift is corrected.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: March 29, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Yoshitsugu Sohara
  • Patent number: 9253367
    Abstract: An image forming apparatus includes an image carrying member, a charging device that uniformly charges the image carrying member, an exposure device that forms an electrostatic latent image on the image carrying member, a development device that applies a development bias voltage to form a visible image in which toner is adhered to the electrostatic latent image, a control portion that controls an exposure amount in the exposure device and the development bias voltage and a storage portion that stores an exposure condition and a development condition. The resolution of image data can be switched to at least two types, a standard resolution and a high resolution higher than the standard resolution, and when the resolution of the image data is set at the high resolution, the control portion controls the exposure amount in the exposure device to perform thinning processing on the image.
    Type: Grant
    Filed: March 12, 2015
    Date of Patent: February 2, 2016
    Assignee: KONICA MINOLTA, INC.
    Inventors: Mitsuru Obara, Tetsuya Sakai, Munenori Nakano, Hironori Akashi, Tomoyuki Saito
  • Patent number: 9233812
    Abstract: Apparatuses and methods for dispensing magnetic stripe cards, smart cards, other cards, and/or other items from kiosks and other structures are disclosed herein. In one embodiment, a card dispensing apparatus includes at least a first card hopper and a card transport assembly. The first card hopper is configured to hold a stack of cards that includes at least a first card stacked on a second card. The card transport assembly includes a card carrier configured to lift the first card off the second card and transfer the first card toward a card outlet. Methods are also disclosed for monitoring card stacks in a card dispensing apparatus and for prereading cards prior to sale to expedite dispensing operations. Devices are also disclosed for maintaining the alignment or levelness of top cards in stacks of cards having embossing or other raised features that cause uneven stacking.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: January 12, 2016
    Assignee: Outerwall Inc.
    Inventors: Douglas A. Martin, Gregory P. Winters
  • Patent number: 9235790
    Abstract: A recording material processing device, includes: an accumulation unit that is accumulated with a plurality of recording materials each of which is a recording material formed with an image by an image forming unit and inspected by an inspection unit, where the image forming unit that forms the image on the recording material based on original image data; and a processing unit that removes the recording material which was determined to have a defect which occurred in the image by the inspecting unit, among the plurality of recording materials and adds a new recording material on which a same image is formed by the image forming unit, to the plurality of recording materials, the same image being based on the original image data of the image formed on the defective recording material.
    Type: Grant
    Filed: October 16, 2013
    Date of Patent: January 12, 2016
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Takashi Hiramatsu, Kiyofumi Aikawa, Kazuya Fukunaga, Michio Kikuchi, Natsumi Miyazawa
  • Patent number: 9213217
    Abstract: Disclosed is an imaging apparatus provided with: a light irradiation unit which irradiates a target area with light; a differential image generation unit which generates a differential image between a first image which was taken in synchronization with the irradiation period during which the light irradiation unit irradiates the light and a second image which was taken outside the irradiation period; a transmittance estimation unit which estimates the light transmittance of an object in the target area; and a light exposure adjustment unit which adjusts the exposure based on the estimation result from the transmittance estimation unit. The transmittance estimation unit estimates the transmittance of the object from at least one of the first image, the second image, and the differential image.
    Type: Grant
    Filed: February 23, 2011
    Date of Patent: December 15, 2015
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Yasuhiro Mori, Hideki Kawahara, Mutsuhiro Yamanaka, Toshiharu Takenouchi, Eiji Nakamoto, Osamu Uesugi
  • Patent number: 9190310
    Abstract: Improved reduction of static charge in spin chucks is achieved by providing one or more pin assemblies which are formed from chemically inert material and which include an electrically conductive inlay.
    Type: Grant
    Filed: April 16, 2010
    Date of Patent: November 17, 2015
    Assignee: LAM RESEARCH AG
    Inventors: Michael Brugger, Otto Lach
  • Patent number: 9191544
    Abstract: A method and apparatus for configuring an image production device is disclosed. The method may include receiving a signal to scan a document containing one or more coded objects, scanning the object coded document, decoding the one or more coded objects from the scanned object coded document into feature identification data, matching the feature identification data to one or more corresponding image production device features, and enabling the one or more corresponding image production device features on the image production device.
    Type: Grant
    Filed: October 15, 2008
    Date of Patent: November 17, 2015
    Assignee: Xerox Corporation
    Inventor: Paul Siddle
  • Patent number: 9165215
    Abstract: Disclosed herein is a method of fast image matching that includes the steps as follows. A template image with a predetermined angular orientation is compared with template images in the range from 0 to 360 degrees to create an angle prediction table. Next, a testing image is acquired and compared with the template image with the predetermined angular orientation to record the similarity at each position, and a plurality of angles corresponding to the similarity is found from the angle prediction table. Afterwards, the template images of the plurality of angles are respectively compared with the testing image to obtain the highest similarity as a comparison result of the position.
    Type: Grant
    Filed: April 24, 2013
    Date of Patent: October 20, 2015
    Assignee: DELTA ELECTRONICS, INC.
    Inventor: Juang-Yu Wei
  • Patent number: 9140999
    Abstract: A reticle assembly for use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second target portion on a substrate, the reticle assembly being arranged to hold a first reticle having the first image field and a second reticle having the second image field such that a distance between the first and second image fields substantially corresponds to a distance between the first and the second target portions. Embodiments also relate to a lithographic apparatus including the reticle assembly, the use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second portion on a substrate, of a first reticle having the first image field and a second reticle having the second image field, wherein a distance between the first and second image fields substantially corresponds to a distance between the first and second target portions.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: September 22, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Paul Van Der Veen
  • Patent number: 9134625
    Abstract: A method produces at least one monitor wafer for a lithographic apparatus. The monitor wafer is for use in combination with a scanning control module to periodically retrieve measurements defining a baseline from the monitor wafer thereby determining parameter drift from the baseline. In doing this, allowance and/or correction can be to be made for the drift. The baseline is determined by initially exposing the monitor wafer(s) using the lithographic apparatus, such that the initial exposure is performed while using non-standard alignment model settings optimized for accuracy, such as those used for testing the apparatus. An associated lithographic apparatus is also disclosed.
    Type: Grant
    Filed: January 20, 2011
    Date of Patent: September 15, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Alexander Viktorovych Padiy, Boris Menchtchikov
  • Patent number: 9123583
    Abstract: The present disclosure relates to a method of monitoring wafer topography. A position and orientation of a plurality first alignment shapes disposed on a surface of a wafer are measured. Wafer topography as a function of wafer position is modeled by subjecting the wafer to an alignment which simultaneously minimizes misalignment between the wafer and a patterning apparatus and maximizes a focus of radiation on the surface. A non-correctable error is determined as a difference between the modeled wafer topography and a measured wafer topography. A maximum non-correctable error per field is determined for a wafer, and a mean variation in the maximum non-correctable error across each field within each wafer of a lot is determined, both within a layer and across layers. These values are then verified against a set of statistical process control rules to determine if they are within a specification limit of the manufacturing process.
    Type: Grant
    Filed: July 12, 2013
    Date of Patent: September 1, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chun-Hsien Lin, Kuo-Hung Chao, Yi-Ping Hsieh, Yen-Di Tsen, Jui-Chun Peng, Heng-Hsin Liu, Jong-I Mou
  • Patent number: 9093005
    Abstract: A display device includes a display area displaying information therein, an information storing unit storing therein a plurality of pieces of predetermined information displayable in the display area, an abbreviation storing unit storing therein an abbreviation corresponding to each of the predetermined information, an information detecting unit configured to detect first information of the predetermined information as a subject to be displayed in the display area, a judging unit judging whether the first information includes a plurality of pieces of information, and a first control unit configured to acquire each of the first information and an abbreviation thereof from the information storing unit and the abbreviation storing unit, respectively, and to display each of the first information and the abbreviation thereof in the display area, in case where it is judged that the first information includes a plurality of pieces of information.
    Type: Grant
    Filed: March 18, 2008
    Date of Patent: July 28, 2015
    Assignee: Brother Kogyo Kabushiki Kaisha
    Inventor: Wataru Mizumukai
  • Publication number: 20150146188
    Abstract: A method to determine the usefulness of an alignment mark of a first pattern in transferring a second pattern to a substrate relative to the first pattern already present on the substrate includes measuring the position of the alignment mark, modeling the position of the alignment mark, determining the model error between measured and modeled position, measuring a corresponding overlay error between first and second pattern and comparing the model error with the overlay error to determine the usefulness of the alignment mark. Subsequently this information can be used when processing next substrates thereby improving the overlay for these substrates. A lithographic apparatus and/or overlay measurement system may be operated in accordance with the method.
    Type: Application
    Filed: April 23, 2013
    Publication date: May 28, 2015
    Inventors: Irina Lyulina, Franciscus Godefridus Casper Bijnen, Remi Daniel Marie Edart, Antoine Gaston Marie Kiers, Michael Kubis