SEMICONDUCTOR PACKAGE AND METHOD FOR MAKING THE SAME
The present invention relates to a semiconductor package and a method for making the same. The method includes the steps of: (a) providing a base material; (b) forming a first metal layer on the base material, wherein the first metal layer comprises a first inductor and a first lower electrode; (c) forming a first dielectric layer and a first upper electrode on the first lower electrode, wherein the first dielectric layer is disposed between the first upper electrode and the first lower electrode, and the first upper electrode, the first dielectric layer and the first lower electrode form a first capacitor; and (d) forming a first protective layer, so as to encapsulate the first inductor and the first capacitor.
The present application is a divisional application of U.S. patent application Ser. No. 12/795,357 filed on Jun. 7, 2010, and is hereby incorporated by reference herein in its entirety.
BACKGROUND OF THE INVENTION1. Field of the Invention
The present invention relates to a semiconductor package and a method for making the same, and more particularly, to a semiconductor package with passive devices integrated therein and a method for making the same.
2. Description of the Related Art
The conventional semiconductor package I has following defects. Since the passive devices are first integrated in the packaged unit 12 by using a semiconductor process and the packaged unit 12 is then electrically connected to the substrate 11 by wire bonding or flip-chip bonding (not shown), thus causing a complicated process of integrating the passive devices in the packaged unit 12 and a high production cost.
Consequently, there is an existing need for a semiconductor package and a method for making the same that solves the above-mentioned problems.
SUMMARY OF THE INVENTIONThe present invention provides a method for making a semiconductor package. The method comprises the steps of: (a) providing a base material; (b) forming a first metal layer on the base material, wherein the first metal layer comprises a first inductor and a first lower electrode; (c) forming a first dielectric layer and a first upper electrode on the first lower electrode, wherein the first dielectric layer is disposed between the first upper electrode and the first lower electrode, and the first upper electrode, the first dielectric layer and the first lower electrode form a first capacitor; and (d) forming a first protective layer, so as to encapsulate the first inductor and the first capacitor.
Whereby, the first inductor and the first lower electrode of the first capacitor are formed simultaneously on the same layer, so as to achieve the effect of integrating plural passive devices and improve the production efficiency.
The present invention further provides a semiconductor package. The semiconductor package includes a base material, a first metal layer, a first dielectric layer, a first upper electrode and a first protective layer. The base material has a first surface and a second surface. The first metal layer is disposed on the first surface of the base material and includes a first inductor and a first lower electrode. The first dielectric layer is disposed on the first lower electrode. The first upper electrode is disposed on the first dielectric layer, and the first upper electrode, the first dielectric layer and the first lower electrode form a first capacitor. The first protective layer encapsulates the first inductor and the first capacitor.
The present invention further provides a semiconductor package. The semiconductor package includes a base material, a first dielectric layer, a first upper electrode and a first protective layer. The base material has a first surface, a second surface, at least one groove and at least one through via structure. The groove penetrates the first surface and the second surface. The through via structure is disposed in the groove and exposed on the first surface and the second surface. The first metal layer is disposed on the first surface of the base material and includes a first inductor and a first lower electrode. The first metal layer directly contacts the through via structure. The first dielectric layer is disposed on the first lower electrode, and the first upper electrode is disposed on the first dielectric layer. The first upper electrode, the first dielectric layer and the first lower electrode form a first lay capacitor. The first protective layer encapsulates the first inductor and the first capacitor.
Whereby, the first inductor and the first lower electrode of the first capacitor are disposed on the same layer, so that the thickness of the product is reduced.
In this embodiment, the base material 21 is made of non-insulation material such as silicon or germanium. The conductive via structure 217 comprises an outer insulation layer 2141, a conductor 2142 and an inner insulation layer 2143. The outer insulation layer 2141 is disposed on the side wall of the outer groove 213 to define a first central groove 2144, the conductor 2142 is disposed on the side wall of the first central groove 2144 so as to define a second central groove 2145, and the second central groove 2145 is filled with the inner insulation layer 2143. In other embodiments, the outer insulation layer 2141 can also be disposed on the bottom wall of the outer groove 213 (not shown). Since the base material 21 is made of non-insulation material, the outer insulation layer 2141 is used to insulate the base material 21 and the conductor 2142 to avoid the current which passes through the conductive via structure 217 being conducted to the base material 21 and reducing the electrical effects of the conductive via structure 217.
However, in other embodiments, as shown in
Then, a first metal layer 23 (
Then, a first dielectric layer 24 (FIG, 11) and a first upper electrode 25 (
Then, at least one first bump 28 (
As shown in
As shown in
As a result, the first inductor 231 and the first lower electrode 232 of the first capacitor 26 are formed simultaneously on the same layer, so the effect of integrating plural passive devices can be achieved and the production efficiency can be improved.
In this embodiment, the base material 21 is made of non-insulation material such as silicon or germanium. The through via structure 214 comprises an outer insulation layer 2141, a conductor 2142 and an inner insulation layer 2143. The outer insulation layer 2141 is disposed on the side wall of the outer groove 213 to define a first central groove 2144, the conductor 2142 is disposed on the side wall of the first central groove 2144 so as to define a second central groove 2145, and the second central groove 2145 is filled with the inner insulation layer 2143. Since the base material 21 is made of non-insulation material, the outer insulation layer 2141 is used to insulate the base material 21 and the conductor 2142 to avoid the current which passes through the through via structure 214 being conducted to the base material 21 to reduce the electrical effects of the through via structure 214.
However, in other embodiments, the through via structure 214 can only comprise an outer insulation layer 2141 and a conductor 2142 but does not comprise the inner insulation layer 2143. The outer insulation layer 2141 is disposed on the side wall of the outer groove 213 to define a first central groove 2144, and the first central groove 2144 is filled with the conductor 2142. In addition, the base material 21 can be made of insulation material such as glass or silica, and the through via structure 214 may not comprise the outer insulation layer 2141. Therefore, the through via structure 214 can only comprise a conductor 2142 and an inner insulation layer 2143, wherein the conductor 2142 is disposed on the side wall of the outer groove 213 to define a second central groove 2145, and the second central groove 2145 is filled with the inner insulation layer 2143. Alternatively, the through via structure 214 can only comprise a conductor 2142, and the outer groove 213 is tilled with the conductor 2142.
The first passivation layer 22 is formed on the first surface 211 of the base material 21 and has a first through hole 221, and the first through hole 221 exposes the through via structure 214. The second passivation layer 34 is disposed on the second surface 215 of the base material 21 and has a second through hole 341, and the second through hole 341 exposes the through via structure 214. The first metal layer 23 is formed on the first surface 211 of the base material 21. Preferably, the first metal layer 23 is formed on the first passivation layer 22, includes a first inductor 231 and a first lower electrode 232, and directly contacts the through via structure 214. The first dielectric layer 24 is disposed on the first lower electrode 232. In this embodiment, the first dielectric layer 24 is made of tantalum pentoxide (Ta2O5). The first upper electrode 25 is disposed on the first dielectric layer 24, and the first upper electrode 25, the first dielectric layer 24 and the first lower electrode 232 form a first capacitor 26. In this embodiment, the first upper electrode 25 is made of AlCu.
The first protective layer 27 encapsulates the first inductor 231 and the first capacitor 26. In this embodiment, the first protective layer 27 comprises at least one first opening 271, and the first opening 271 exposes part of the first metal layer 23 or part of the first upper electrode 25. The first bump 28 is disposed in the first opening 271 of the first protective layer 27. The electrical device is disposed on the second surface 215 of the base material 21. The electrical device is a second bump 31.
As a result, the first inductor 231 and the first lower electrode 232 of the first capacitor 26 are disposed on the same layer, so that the thickness of the product is reduced.
FIGS, 20-26 are schematic views of a method for making a semiconductor package according to the second embodiment of the present invention. As shown in
As shown in
While embodiments of the present invention have been illustrated and described, various modifications and improvements can be made by those skilled in the art. The embodiments of the present invention are therefore described in an illustrative but not restrictive sense. It is intended that the present invention is not limited to the particular forms illustrated, and that all modifications that maintain the spirit and scope of the present invention are within the scope defined in the appended claims.
Claims
1. A method for making a semiconductor package, comprising the steps of
- (a) providing a base material, wherein the base material comprises at least one groove, at least one conductive via structure, a first surface and a second surface, the groove penetrates the first surface and the second surface of the base material, and the conductive via structure is disposed in the groove and exposed on the first surface and the second surface so as to form a through via structure;
- (b) forming a first metal layer on the first surface of the base material, wherein the first metal layer comprises a first inductor and a first lower electrode, and directly contacts the through via structure;
- (c) forming a first dielectric layer and a first upper electrode on the first lower electrode, wherein the first dielectric layer is disposed between the first upper electrode and the first lower electrode, and the first upper electrode, the first dielectric layer and the first lower electrode form a first capacitor; and
- (d) forming a first protective layer, so as to encapsulate the first inductor and the first capacitor.
2. The method according to claim 1, further comprising a step of forming a first insulation layer on the first surface of the base material after step (a), wherein in step (b), the first metal layer is disposed on the first insulation layer.
3. The method according to claim 1, further comprising a step of forming at least one electrical device after step (b), wherein the at least one electrical device is disposed on the second surface of the base material.
4. The method according to claim 1, wherein step (b) comprises the following steps:
- (b1) forming a first seed layer on the base material;
- (b2) forming a first photoresist on the first seed layer, so as to cover part of the first seed layer and expose part of the first seed layer;
- (b3) forming a first plated layer on the exposed part of the first seed layer; and
- (b4) removing the first photoresist and the covered part of the first seed layer, wherein the first plated layer and part of the first seed layer form the first metal layer.
5. The method according to claim 1, wherein step (c) comprises the following steps:
- (c1) forming a second metal layer on the first lower electrode and anodizing the second metal layer, so as to form a first oxidation layer;
- (c2) forming a third metal layer on the first oxidation layer;
- (c3) forming a second photoresist on the third metal layer; and
- (c4) removing part of the first oxidation layer and part of the third metal layer, so as to form the first dielectric layer and the first upper electrode, respectively, and form the first capacitor; and
- (c5) removing the second photoresist.
6. The method according to claim 1, wherein in step (d), the first protective layer comprises at least one first opening, and the first opening exposes part of the first metal layer or part of the first upper electrode.
7. A method for making a semiconductor package, comprising the steps of:
- (a) providing a base material, wherein the base material comprises at least one groove, at least one conductive via structure, a first surface and a bottom surface, the groove opens at the first surface of the base material, and the conductive via structure is disposed in the groove and exposed on the first surface;
- (b) forming a first metal layer on the first surface of the base material, wherein the first metal layer comprises a first inductor and a first lower electrode, and directly contacts the conductive via structure;
- (c) forming a first dielectric layer and a first upper electrode on the first lower electrode, wherein the first dielectric layer is disposed between the first upper electrode and the first lower electrode, and the first upper electrode, the first dielectric layer and the first lower electrode form a first capacitor; and
- (d) forming a first protective layer, so as to encapsulate the first inductor and the first capacitor.
8. The method according to claim 7, further comprising a step of forming a first insulation layer on the first surface of the base material after step (a), wherein in step (b), the first metal layer is disposed on the first insulation layer.
9. The method according to claim 7, further comprising the following steps after step (d):
- (e) disposing the base material on a carrier, wherein the first surface of the base material faces the carrier;
- (f) removing part of the base material from the bottom surface, to form a second surface and to expose the conductive via structure on the second surface, so as to form a through via structure;
- (g) forming at least one electrical device on the second surface of the base material; and
- (h) removing the carrier.
10. The method according to claim 9, further comprising a step of forming at least one electrical device after step (h), wherein the at least one electrical device is disposed on the second surface of the base material.
11. The method according to claim 7, wherein step (b) comprises the following steps:
- (b1) forming a first seed layer on the base material;
- (b2) forming a first photoresist on the first seed layer, so as to cover part of the first seed layer and expose part of the first seed layer;
- (b3) forming a first plated layer on the exposed part of the first seed layer; and
- (b4) removing the first photoresist and the covered part of the first seed layer, wherein the first plated layer and part of the first seed layer form the first metal layer.
12. The method according to claim 7, wherein step (c) comprises the following steps:
- (c1) forming a second metal layer on the first lower electrode and anodizing the second metal layer, so as to form a first oxidation layer;
- (c2) forming a third metal layer on the first oxidation layer;
- (c3) forming a second photoresist on the third metal layer; and
- (c4) removing part of the first oxidation layer and part of the third metal layer, so as to form the first dielectric layer and the first upper electrode, respectively, and form the first capacitor; and
- (c5) removing the second photoresist.
13. The method according to claim 7, wherein in step (d), the first protective layer comprises at least one first opening, and the first opening exposes part of the first metal layer or part of the first upper electrode.
14. A method for making a semiconductor package, comprising the steps of:
- (a) providing a base material, wherein the base material comprises at least one groove, at least one conductive via structure, a top surface and a second surface, the groove opens at the second surface of the base material, and the conductive via structure is disposed in the groove and exposed on the second surface of the base material;
- (b) forming a first metal layer on the base material, wherein the first metal layer comprises a first inductor and a first lower electrode, and directly contacts the conductive via structure;
- (c) forming a first dielectric layer and a first upper electrode on the first lower electrode, wherein the first dielectric layer is disposed between the first upper electrode and the first lower electrode, and the first upper electrode, the first dielectric layer and the first lower electrode form a first capacitor; and
- (d) forming a first protective layer, so as to encapsulate the first inductor and the first capacitor.
15. The method according to claim 14, further comprising a step of forming a first insulation layer on the base material after step (a), wherein in step (b), the first metal layer is disposed on the first insulation layer.
16. The method according to claim 14, further comprising the following steps after step (a):
- (a1) forming at least one electrical device on the second surface of the base material;
- (a2) disposing the base material on a carrier, wherein the second surface of the base material faces the carrier; and
- (a3) removing part of the base material from the top surface, to form a first surface and to expose the conductive via structure on the first surface, so as to form a through via structure.
17. The method according to claim 16, wherein in step (b), the first metal layer is disposed on the first surface of the base material.
18. The method according to claim 14, wherein step (b) comprises the following steps:
- (b1) forming a first seed layer on the base material;
- (b2) forming a first photoresist on the first seed layer, so as to cover part of the first seed layer and expose part of the first seed layer;
- (b3) forming a first plated layer on the exposed part of the first seed layer; and
- (b4) removing the first photoresist and the covered part of the first seed layer, wherein the first plated layer and part of the first seed layer form the first metal layer.
19. The method according to claim 14, wherein step (c) comprises the following steps:
- (c1) forming a second metal layer on the first lower electrode and anodizing the second metal layer, so as to form a first oxidation layer;
- (c2) forming a third metal layer on the first oxidation layer;
- (c3) forming a second photoresist on the third metal layer; and
- (c4) removing part of the first oxidation layer and part of the third metal layer, so as to form the first dielectric layer and the first upper electrode, respectively, and form the first capacitor; and
- (c5) removing the second photoresist.
20. The method according to claim 14, wherein in step (d), the first protective layer comprises at least one first opening, and the first opening exposes part of the first metal layer or part of the first upper electrode.
Type: Application
Filed: Dec 12, 2012
Publication Date: Apr 25, 2013
Inventors: Chien-Hua Chen (Kaohsiung), Teck-Chong Lee (Kaohsiung)
Application Number: 13/712,410
International Classification: H01L 49/02 (20060101);