ANODIZED INSERTS FOR COULOMB DAMPING OR FRICTIONAL DAMPING
A method comprising providing an insert having a portion capable of being oxidized and electrochemically anodizing the portion capable of being oxidized to provide a layer comprising an oxidized material thereon.
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The field to which the disclosure generally relates to includes inserts for use in products requiring damping products including such inserts and methods of making and using the same.
BACKGROUNDA number of products are subject to unwanted vibration during operation. In some cases, such vibration produces unwanted noise.
SUMMARY OF SELECT EXAMPLES OF THE INVENTIONOne embodiment includes a method comprising providing an insert, inlay, or cast-in-place piece having a portion thereof capable of being oxidized, and electrochemically anodizing the portion capable of being oxidized to form a layer of oxide material thereon.
Select examples of embodiments of the invention will become more fully understood from the detailed description and the accompanying drawings, wherein:
Other exemplary embodiments of the invention will become apparent from the detailed description provided hereinafter. It should be understood that the detailed description and specific examples, while disclosing exemplary embodiments of the invention, are intended for purposes of illustration only and are not intended to limit the scope of the invention.
DETAILED DESCRIPTION OF SELECT EXAMPLES OF EMBODIMENTSThe following description of the embodiment(s) is merely illustrative in nature and is in no way intended to limit the invention, its application, or uses.
When the term “over,” “overlying,” “overlies,” “under,” “underlying,” or “underlies” is used herein to describe the relative position of a first layer or component with respect to a second layer or component such shall mean the first layer or component is directly on and in direct contact with the second layer or component or that additional layers or components may be interposed between the first layer or component and the second layer or component.
One embodiment of the invention includes a method for making an insert with a layer of oxide formed on a portion thereof including electrochemical anodization of a portion of the insert capable of being oxidized. The term insert as used herein includes any component in which a metal or alloy is cast around a portion thereof including inserts which are completely encased and enclosed by the casting material, partially enclosed by the casting material, or having a portion of the casting material extending there through. An insert may be provided having a body portion. The body portion may include a metal, ceramic, thermoplastic, thermoset, wood, or other simple material for providing a base body portion of an insert for casting a metal or alloy there around and to provide coulomb damping or frictional damping. A metal or alloy is cast around at least a portion of the insert and the portion of the insert with the oxide formed thereon prevents bonding of the cast material thereto. The portion of the insert having the oxide formed thereon also provides a frictional surface for movement against the cast portion to dissipate vibrations of a product containing the insert reducing such vibrations and sound by coulomb damping or frictional damping. In one embodiment, the base body portion of the insert may include any of a variety of oxide-forming metals or alloys, including materials such as Al, Ti, Ta, Si, and Zr. In another embodiment, a layer of oxide forming metal or alloy may be deposited, formed, or secured to at least a portion of the base body of the insert. For example, in one embodiment, the base body portion may be a metal or alloy which does not relatively easily form an oxide, and an oxide-forming metal or alloy may be provided on the base material, for example, but not limited to, electroplating, sputtering, chemical vapor deposition, plasma assisted metal deposition, thermal spray coating, ion implanting, nit riding the surface thereof, or adhering or depositing a metal or alloy foil thereto.
In one embodiment, the layer of oxide may have a thickness ranging from about 100 nm (nanometer) to about 10 μm (micrometers)
In one embodiment, an insert including an aluminum portion is electrochemically anodized in the presence of a solvent that readily provides oxygen upon electrochemical oxidation such as water, methanol, ethanol, glycol, or other alcohols to form an alumina layer comprising aluminum and oxygen. In one embodiment, the layer of alumina is porous. The thickness of the alumina layer, and pore parameters (diameter, length) may be determined largely by the anodization conditions, such as the applied DC voltage, pH of the acid, or time of anodization. For example, in one embodiment, a layer of alumina may be deposited on a portion of an insert capable of being oxidized by anodizing the portion including aluminum for 30 minutes under 60V.
In another embodiment, a portion of an insert including titanium may be anodized in the presence of HF to produce a layer of TiO2 on the portion of the insert capable of being oxidized. In one embodiment, the layer includes titanium oxide (titania) tubes. In one embodiment, the layer of titanium oxide tubes may be formed by anodizing pure titanium foils secured to a base body portion of the insert. In one embodiment, titanium foils are anodized in 0.5 wt % HF solution.
Another embodiment of the invention may include providing a base body portion of an insert comprising tantalum or a base body portion of the insert having a layer, or foil including tantalum thereon and electrochemically anodizing the tantalum to Ta2O5. In one embodiment, the anodation is accomplished in 1M H2SO4+2 wt % HF.
Another embodiment of the invention includes a method which may including providing a base body portion of an insert including silicon, or a base body portion of an insert having a layer or foil thereon including silicon and anodizing the silicon in hydrochloric acid solution to form silicon oxide (silica).
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Another embodiment of the invention includes a machine such as a stamping machine, band saw, drill or the like which includes a wall comprising a metal which is vibrated during operation of the machine, and wherein the wall includes a friction damping means including but not limited to an insert, as described above.
Claims
1. A method comprising;
- providing an insert having a portion capable of being oxidized and electrochemically anodizing the portion capable of being oxidized to provide a layer comprising an oxidized material thereon.
2. The method of claim 1 wherein the layer may have a thickness ranging from about 100 nanometers to about 10 microns.
3. The method of claim 1 wherein the layer is porous.
4. The method of claim 1 wherein the insert comprises aluminum and is electrochemically anodized in the presence of water to form a layer of Al2O3.
5. The method of claim 1 wherein the insert comprises silicon and is electrochemically anodized in the presence of a hydrochloric acid solution.
6. The method of claim 1 wherein the insert comprises titanium and is electrochemically anodized in the presence of HF to form a layer of TiO2.
7. The method of claim 6 wherein the layer comprises titanium oxide tubes.
8. The method of claim 1 wherein the oxide forming material comprises tantalum.
9. A method comprising;
- providing an insert comprising a base body portion comprising a metal or silicon, and electrochemical anodizing the metal or silicon to provide a layer of oxide, on the base body portion, and casting a product with the insert as a portion thereof comprising flowing molten metal against the layer of oxide and wherein the thickness and properties of the layer of oxide are such that the molten metal does not bond to the layer of oxide and cooling the molten metal to provide a product having the insert received to provide coulomb damping of the product.
10. The method of claim 9 wherein the insert comprises aluminum and is electrochemically anodized in the presence of a solvent to form a layer of alumina comprising aluminum and oxygen.
11. The method of claim 9 wherein the layer is porous.
12. The method of claim 9 wherein the insert comprises silicon and is electrochemically anodized in the presence of a hydrochloric acid solution.
13. The method of claim 9 wherein the insert comprises titanium and is electrochemically anodized in the presence of HF to form a layer of titania.
14. The method of claim 13 wherein the layer comprises titanium oxide tubes.
15. A method comprising;
- providing an insert having a portion not easily capable of forming an oxide; providing an oxide forming material on the portion not easily capable of forming an oxide by electroplating, sputtering, chemical vapor deposition, plasma assisted metal deposition, thermal spray coating, ion implanting, nitriding the surface thereof, or adhering or depositing a metal or alloy foil thereto or the like; and electrochemical anodizing the portion capable of oxidizing to provide a layer comprising an oxidized material thereon.
16. The method of claim 15 wherein the oxide forming material comprises aluminum and is electrochemically anodized in the presence of water to form a layer of alumina comprising alumina and oxygen.
17. The method of claim 15 wherein the oxide forming material comprises silicon and is electrochemically anodized in the presence of a hydrochloric acid solution.
18. The method of claim 15 wherein the layer is porous.
19. The method of claim 15 wherein the oxide forming material comprises titanium and is electrochemically anodized in the presence of HF to form a layer of titania.
20. The method of claim 19 wherein the layer comprises titanium oxide tubes.
21. The method of claim 15 where the oxide forming material comprises tantalum.
22. The method of claim 21 wherein the oxide forming material is electrochemically anodized in 1M H2SO4+2 wt % HF.
23. The method of claim 9 wherein the product is an automobile component.
24. The method of claim 9 wherein the insert is constructed and arrange to physically support itself inside of a metal casting mold.
Type: Application
Filed: Mar 30, 2012
Publication Date: Oct 3, 2013
Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC (DETROIT, MI)
Inventors: James G. Schroth (Troy, MI), Mark W. Verbrugge (Troy, MI)
Application Number: 13/435,593
International Classification: C25D 11/04 (20060101); C25D 11/02 (20060101); C23C 28/00 (20060101); C25D 11/00 (20060101); B22D 19/00 (20060101);