Abstract: An industrial process is conducted within a sealed chamber filled with dimethylformamide (DMF) saturated with CO2 under pressure which provides the carbon atoms for manufacturing graphene. A copper wire comprising an anode is reeled between two spaced reels on opposite sides of the sealed chamber, preferably above and below a container within the chamber. Electrical voltage is supplied to a graphite and Galinstan-Cerium electrode which acts as a cathode and during the process a chemical reaction is induced between the Galinstan-Cerium electrode and the CO2 saturated DMF liquid so that graphene is deposited on the copper wire which acts as an anode.

Abstract: Conducting coatings disposed on a metal member. The conducting coatings may have a desired texture and provide homoepitaxial or heteroepitaxial coating of an electrodeposited layer. A conducting coating may be formed by applying a shear force during deposition of the conducting coating. The conducting coatings may be used in anodes of various electrochemical devices. A conducting coating, which may be part of an electrochemical device, may have an electrochemically deposited layer disposed on at least a portion of a surface of the conducting coating. The electrochemically deposited layer may be reversibly electrochemically deposited.

Abstract: The invention relates to a catalyst for the hydrogen evolution reaction (HER) and methods for using the catalyst in a water-splitting process. The invention also provides a composition, a material and an electrode comprising the catalyst. In particular, the invention relates to a hydrogen evolution reaction (HER) catalyst comprising a catalytic metal species comprising an active catalyst species and a vanadium species; wherein the catalytic metal species and the vanadium species are interspersed within the HER catalyst.

Abstract: A transparent conductive film includes a metal chalcogenide compound doped with a halogen and having a sheet resistance at room temperature of less than or equal to about 60 ohm/sq.

Abstract: An anodized titanium material includes a titanium base material and an anodized titanium layer. The anodized titanium layer is provided on a surface of the titanium base material. The anodized titanium layer includes a porous first anodized titanium layer. The anodized titanium layer has a withstand voltage at 25° C. of 500 V or more, a Vickers hardness of 200 or more, a film thickness of 20 ?m or more and less than 80 ?m, an arithmetic average roughness Ra of a surface of less than 1.6 ?m, and a maximum height roughness Rz of the surface is less than 6.3 ?m. In both of a section perpendicular to a thickness direction of the first anodized titanium oxide layer and the surface, no pore sections having a shape capable of including a circle having a diameter of 0.5 ?m or more are observed.

Abstract: The present invention concerns a method for electrochemically depolluting an aqueous solution containing at least one heavy metal, said method comprising the following steps: a) a step of measuring the pH of the aqueous solution, optionally followed by a step of adapting said pH by adding a strong acid or a strong base, b) bringing said aqueous solution into contact with a reference electrode, a counter-electrode and a working electrode comprising a conductive substrate, c) applying a constant potential to the arrangement, as a result of which a film of at least one heavy metal oxide is formed on said working electrode, this step being capable of being repeated when the aqueous solution contains several heavy metals, and d) recovering a depolluted aqueous solution and said film.

Abstract: A method of forming a cathode for hydrogen evolution reaction includes: (1) providing a substrate; (2) forming a precursor layer covering the substrate; and (3) annealing the precursor layer to form an electrocatalyst layer covering the substrate.

Abstract: Disclosed are methods of anodizing a metal component. In the methods an anodization bath includes an organic acid.

Abstract: The slow speed of conventional selective electroplating and L-PED (and further requirement of a series of masks in the case of selective electroplating) necessary to generate a metallic three-dimensional object makes conventional selective electroplating and L-PED not viable for mass manufacturing metallic three-dimensional objects. The presently disclosed technology generally utilizes electroplating and L-PED technologies with a screen electroplating process. The screen electroplating process disclosed herein is capable of achieving a faster throughput and a lower workpiece temperature than traditional 3D printing processes can provide, particularly traditional metal 3D printing processes. As a result, the presently disclosed screen electroplating process is able to achieve much faster results in printing a complex three-dimensional metallic structure using electroplating.

Abstract: A head-mounted device may have optical modules that present images to a user's left and right eyes. Each optical module may have a lens barrel with a low-reflectance coating, a display coupled to the lens barrel that generates a visible-light image, a lens mounted to the lens barrel through which the image is viewable from an eye box, an infrared light-emitting diode that emits infrared light that illuminates an eye box at an infrared wavelength through the lens, and an infrared camera that captures an image from the eye box at the infrared wavelength. The low-reflectance coating may be a low-visible-reflectance-and-low-infrared-reflectance coating that exhibits low-reflectance for visible light from the display and for infrared light at the infrared wavelength that is generated by the light-emitting diode.

Abstract: In a method for passivating the surface of a tinplate using electrolytic deposition of a passivation layer containing chromium oxide/chromium hydroxide on the surface, the electrolytic deposition of the passivation layer is carried out at least partly from an electrolyte solution which contains a trivalent chromium compound, at least one salt for increasing the conductivity and at least one acid or one base for adjusting a desired pH value and is free from organic complexing agents and free from buffering agents. In order to increase the amount of chromium oxide in the passivation layer, after the electrolytic deposition of the passivation layer, the passivated tinplate is subjected to a thermal treatment in which the passivated tinplate is kept at a treatment temperature of 100° C. or more for a treatment time of at least 0.5 seconds.

Abstract: Provided are methods of forming active materials for electrochemical cells using low-temperature electrochemical deposition, e.g., at less than 200° C. Specifically, these processes allow precise control of the morphology, composition, and/or size of the deposited structures. For example, a deposited structure may be doped, alloyed, or surface treated during its formation using a combination of different precursors. In particular, a silicon structure may be prelithiated while being formed. Different working electrodes (e.g., with different surface sizes and properties) allow forming different types of structures, e.g., precipitating particles from the solution or specific types of films deposited on the working electrode. These processes require minimal energy and do not use volatile precursors. Furthermore, these processes produce a more confined waste stream, suitable for post-reaction recycling. Finally, low-temperature electrochemical deposition can be readily scaled up.

Abstract: Disclosed is an electrode for an energy storage rechargeable device, including a plurality of electrode material layers and a plurality of porous current collector layers, the electrode material layers and current collector layers being arranged in a specific manner, an energy storage rechargeable device including the electrode, and the uses of the electrode.

Abstract: The application discloses examples of a device housing of an electronic device including a magnesium-alloy substrate. The device housing further including a treatment layer applied over the magnesium-alloy substrate and a metallic coating layer applied over the treatment layer to provide a metallic luster. Further, a paint coating layer is disposed over a first portion of the metallic coating layer. Further, a top coating layer is applied over the paint coating layer and a visible second portion of the metallic coating layer.

Abstract: A wiring board according to the present disclosure has at least a structure in which a wiring conductor layer is layered on a surface of an insulating layer containing particles of silica, and some particles of silica among the particles of silica contained in the insulating layer are partially exposed on the surface of the insulating layer. The wiring conductor layer includes a seed layer in contact with the insulating layer and a plated conductor layer formed on a surface of the seed layer. At a contact surface between the exposed portions of the particles of silica and the seed layer, an amorphous layer of silica derived from the particles of silica and an amorphous layer of metal derived from metal forming the seed layer are present.

Abstract: Processes herein may be used to thermally crack various hydrocarbon feeds, and may eliminate the refinery altogether while making the crude to chemicals process very flexible in terms of crude. In embodiments herein, crude is progressively separated into at least light and heavy fractions. Depending on the quality of the light and heavy fractions, these are routed to one of three upgrading operations, including a fixed bed hydroconversion unit, a fluidized catalytic conversion unit, or a residue hydrocracking unit that may utilize an ebullated bed reactor. Products from the upgrading operations may be used as feed to a steam cracker.

Abstract: Conducting coatings disposed on a metal member. The conducting coatings may have a desired texture and provide homoepitaxial or heteroepitaxial coating of an electrodeposited layer. A conducting coating may be formed by applying a shear force during deposition of the conducting coating. The conducting coatings may be used in anodes of various electrochemical devices. A conducting coating, which may be part of an electrochemical device, may have an electrochemically deposited layer disposed on at least a portion of a surface of the conducting coating. The electrochemically deposited layer may be reversibly electrochemically deposited.

Abstract: In a method, an aluminum body is chemically treated with at least one of an alkaline solution and an acid solution. Anode-oxidization is performed on the chemically treated aluminum body to form an aluminum oxide layer. The aluminum oxide layer is treated with hot water at a temperature more than 75° C. or steam. The aluminum oxide layer after being treated with hot water or steam includes plural columnar grains, and an average width of the columnar grains is in a range from 10 nm to 100 nm.

Abstract: Embodiments of methods and apparatuses for forming the metal oxide nanostructure on surfaces are disclosed. In certain embodiments, the nanostructures can be formed on a substrate made of a nickel titanium alloy, resulting in a nanostructure that can include both titanium oxide and nickel oxide. The nanostructure can be formed on the surface(s) of an implantable medical device, such as a stent.

Abstract: A method for preparing an ammonium thiomolybdate-porous amorphous carbon composite superlubricity film is disclosed. First, a porous amorphous carbon film is prepared by an anode layer ion source assisted plasma chemical vapor deposition method and a reactive magnetron sputtering method on a substrate. The porous amorphous carbon film is then impregnated in an ammonium thiomolybdate solution, so that the ammonium thiomolybdate is adsorbed on the porous amorphous carbon film, and the impregnated porous amorphous carbon film is air dried.

Abstract: A method for managing the electrical energy passing through a metal-air battery comprising a cell and the associated cell comprising a negative electrode, a first positive electrode referred to as the air electrode, and a second positive electrode referred to as the power electrode. The cell further comprises a third positive electrode. In a first charging phase, a charging voltage is applied to the cell, this voltage causing current to travel between the negative electrode and the second positive electrode, the first and third positive electrodes being electrically inactive. In a second charging phase, the charging voltage causes current to travel between the negative electrode and said third positive electrode, the first and second positive electrode being electrically inactive.

Abstract: A one dimensional (1D) nanoarray of SnO nanostructures on a substrate is disclosed. The nanostructures of SnO have diameters of 200 nm-1 ?m and lengths of 500 nm-3 ?m, and are attached to and substantially perpendicular to the substrate. The one-dimensional nanoarray may have a nanostructure density of 220-300 nanostructures per 100 ?m2 substrate and a band gap energy of 2.36-2.46 eV. The one-dimensional nanoarray may be formed by anodization of Sn foil in an electrochemical cell subjected to a voltage of 15-25 V for 1-3 hours at room temperature. The formed one-dimensional nanoarray may be used for the photo-electrochemical decomposition of water into O2 and H2.

Abstract: A portable communication device according to various embodiments includes a housing that forms at least a portion of an external surface of the portable communication device, wherein at least a portion of an area of the housing comprises: an aluminum alloy substrate including 90.0 to 99.8 weight % (wt %) of aluminum (Al) and 0.2 to 1.

Abstract: The invention relates to a two-stage method for the anti-corrosive pretreatment of tinplate, in which an anti-corrosive primer coating is applied in a first step, in which the tinplate is anodically polarized in an electrolyte containing at least one inert water-soluble salt and is then in a second step, brought in contact with an acidic aqueous composition containing water-soluble inorganic compounds of the elements Zr, Ti, Hf, and/or Si.

Abstract: The invention relates to a method for the anti-corrosive pretreatment of tinplate, in which an anti-corrosive primer coating is applied in a single step, said primer coating effectively preventing the shiny metal surface of the pretreated tinplate from turning black when the pretreated tinplate of the invention that is provided with a topcoat is in contact with liquids releasing or containing sulfur compounds and with food containing protein. In the disclosed method, the tinplate is anodically polarized in an electrolyte containing silicates of formula M2O.nSiO2, where M is an alkali metal ion or quaternary ammonium ion and n is a natural number between 0.8 and 7. Tinplate pretreated according to the invention can be used in particular for the production of food-safe packaging such as beverage cans or tin cans.

Abstract: An etcher comprises a bath, a plurality of blades, and a tunnel. The bath includes a first electrode at a first end and a second electrode at a second end. The plurality of blades is configured to fit in the bath. At least one blade of the plurality of blades holds a wafer. At least one tunnel is configured to fit between adjacent blades of the plurality of blades in the bath.

Abstract: A graphite oxide and/or graphene preparation method includes providing a plasma electrolytic apparatus, wherein an electrolyte is provided and a graphite electrode is configured as a cathode of the plasma electrolytic apparatus; and providing a cathodic current so as to initiate a plasma electrolytic process at the graphite electrode to obtain graphite oxide and/or graphene. The graphite oxide and/or graphene can be synthesized through plasma electrolytic processing at relatively low temperature under atmospheric pressure within a very short period of time, without the need for concentrated acids or strong oxidizing agents. The present invention may prepare graphite oxide and/or graphene with plasma electrolytic process directly from graphite, without requiring any prior purification or pretreatment. This plasma electrolytic process of the present invention is quite promising and provided with advantages such as low cost, simple setup, high efficiency, and environmental friendliness.

Abstract: A method for coating a component for use in a semiconductor chamber for plasma etching includes providing a component for use in a semiconductor manufacturing chamber, loading the component into a deposition chamber, cold spray coating a metal powder onto the component to form a coating on the component, and anodizing the coating to form an anodization layer.

Abstract: The embodiments described herein relate to anodizing and anodized films. The methods described can be used to form opaque and white anodized films on a substrate. In some embodiments, the methods involve forming anodized films having branched pore structures. The branched pore structure provides a light scattering medium for incident visible light, imparting an opaque and white appearance to the anodized film. In some embodiments, the methods involve infusing metal complex ions within pores of an anodized. Once within the pores, the metal complex ions undergo a chemical change forming metal oxide particles. The metal oxide particles provide a light scattering medium for incident visible light, imparting an opaque and white appearance to the anodized film. In some embodiments, aspects of the methods for creating irregular or branched pores and methods for infusing metal complex ions within pores are combined.

Abstract: The embodiments described herein relate to anodizing and anodized films. The methods described can be used to form opaque and white anodized films on a substrate. In some embodiments, the methods involve forming anodized films having branched pore structures. The branched pore structure provides a light scattering medium for incident visible light, imparting an opaque and white appearance to the anodized film. In some embodiments, the methods involve infusing metal complex ions within pores of an anodized. Once within the pores, the metal complex ions undergo a chemical change forming metal oxide particles. The metal oxide particles provide a light scattering medium for incident visible light, imparting an opaque and white appearance to the anodized film. In some embodiments, aspects of the methods for creating irregular or branched pores and methods for infusing metal complex ions within pores are combined.

Abstract: A method of bonding a metal to a substrate involves forming a plurality of nano-features in a surface of the substrate, where each nano-feature is chosen from a nano-pore and/or a nano-crevice. In a molten state, the metal is over-cast onto the substrate surface, and penetrates the nano-features. Upon cooling, the metal is solidified inside the nano-features, where the solidification of the metal forms a mechanical interlock between the over-cast metal and the substrate.

Abstract: Plasma-chemical method for production of black oxide ceramic layers on aluminium, magnesium, titanium or alloys thereof and special materials containing these substances according to the process of anodic oxidation in aqueous electrolytes, wherein an electrolyte is used which contains iron and vanadium.

Abstract: A method of manufacturing a layered material stack that includes a plasmonic interface between a plasmonic material and optical waveguide material is disclosed. The method includes providing a substrate layer, disposing a layer of plasmonic material on the substrate layer, depositing a metal constituent of an optical waveguide material directly onto the layer of plasmonic material, and anodizing the metal constituent of the optical waveguide material to form an optically transparent oxide of the metal constituent configured to couple light into the layer of plasmonic material, with the optically transparent oxide of the metal constituent forming an optical waveguide structure.

Abstract: Disclosed are a method for forming a thermal barrier layer for a metallic component, which method involves forming a ceramic coat in which at least in part aluminum oxide and titanium oxide are disposed, the aluminum oxide and the titanium oxide being introduced by infiltration of aluminum-containing and titanium-containing particles or substances or by physical vapor deposition.

Abstract: A method for preparing an A-B-C2 or A2-(Dx,E1-x)-C4 absorber thin film for photovoltaic cells where 0?x?1, A is an element or mixture of elements selected within Group 11, B is an element or mixture of elements selected within Group 13, C is an element or mixture of elements selected within Group 16, D is an element or mixture of elements selected within Group 12, and E is an element or mixture of elements selected within Group 14. Said method includes: a step of electrochemically depositing oxide from elements selected from among Groups 11, 12, 13, and 14, a step of annealing in a reducing atmosphere, and a step of supplying an element from Group 16.

Abstract: A method is provided for protecting at least one metallic surface against discolorations under the action of heat. The method includes applying a lacquer to the metallic surfaces and then stoving the metallic surface while sealing the metallic surface against oxygen contact to form a permanently effective oxygen barrier.

Abstract: A jig for manufacturing a capacitor element is provided in which an immersion position of an anode body in a processing liquid can be controlled accurately, and a heat treatment can be performed without difficulty when heat treatment is required in the middle of manufacturing the capacitor element.

Abstract: An electrode for the determination of pH is made by depositing a phenolic compound on a conductive substrate, where the phenolic compound has a phenolic hydroxy group attached to a carbon atom on an aromatic ring and also has an oxygen atom connected through one other atom to an adjacent carbon atom of the aromatic ring such that this oxygen atom can form a hydrogen bond to the phenolic hydroxy group; and then electrochemically oxidising the immobilized phenolic compound in a one electron one proton oxidation so as to form a polymeric, water-insoluble, redox-active deposit on the conductive substrate. The electrode is useful for electrochemical determination of pH and is capable of measuring pH of an unbuffered aqueous liquid.

Abstract: A method for forming a film on a conductive substrate, comprising immersing a substrate having a conductive portion in a solution comprising a metal ion ceramic precursor for the film and a peroxide; applying a voltage potential to the conductive portion with respect to a counter electrode in the solution, sufficient to protect the conductive portion from corrosion by the solution, and drive formation of a film on the substrate, controlling a pH of the solution while limiting a production of hydrogen by electrolysis of the solution proximate to the conductive portion; and maintaining the voltage potential for a sufficient duration to produce a film on the conductive portion. An electrode may be formed over the film to produce an electrical device. The film may be, for example, insulating, dielectric, resistive, semiconductive, magnetic, or ferromagnetic.

Abstract: An anti-diffusion layer, a preparation method thereof, a thin-film transistor (TFT), an array substrate and a display device are provided, involve the display device manufacturing field and can resolve problem that a high atmosphere temperature is need in process of preparing a tantalum dioxide anti-diffusion layer by PVD or CVD, which causes the gate electrode to volatilize and affect the performance of a display device. The method for preparing the anti-diffusion layer comprises: placing a conductive base (1) and a cathode (4) in a tantalum sulfate solution (3), taking the conductive base (1) as an anode, and forming a tantalum dioxide anti-diffusion layer on the conductive base (1) after energizing.

Abstract: A method of bonding a metal to a substrate involves forming an oxide layer on a surface of the substrate, and in a molten state, over-casting the metal on the substrate surface. The over-casting drives a reaction at an interface between the over-cast metal and the oxide layer to form another oxide. The other oxide binds the metal to the substrate surface upon solidification of the over-cast metal.

Abstract: Disclosed is a method of producing metal oxides, comprising electrodepositing a metal oxide from an electrolyte solution onto a substrate to coat at least a portion of the substrate, whereby metal oxide seed particles are released into the solution, and precipitating metal oxide particles from the solution. The precipitated metal oxide particles have a maximum particle size of less than 1 micron.

Abstract: The present invention relates to a process for producing a coating on the surface of a substrate by plasma-electrolytic oxidation. Improved corrosion protection for lightweight metals, in particular for magnesium or magnesium alloys, is achieved by the process. Furthermore, biocompatible protective layers can also be produced on these materials, with the option of controlling degradation of the substrate. The layers are amorphous. They are produced by plasma-electrolytic oxidation in which the substrate is dipped as electrode together with a counterelectrode into an electrolyte liquid and a sufficient electric potential for generating spark discharges at the surface of the substrate is applied, wherein the electrolyte comprises clay particles dispersed therein. Substrates can therefore be any machine components, automobile components, railroad components, aircraft components, ships' components, etc.

Abstract: A coated overhead conductor having an assembly including one or more conductive wires, such that the assembly includes an outer surface coated with an electrochemical deposition coating forming an outer layer, wherein the electrochemical deposition coating includes a first metal oxide, such that the first metal oxide is not aluminum oxide. Methods for making the overhead conductor are also provided.

Abstract: In one embodiment, a coating is provided that includes a deposition surface, and a coating on the deposition surface. The coating may include particles of a metal chalcogenide comprising a fullerene-like geometry, a tubular-like geometry or a combination of fullerene-like geometries and tubular-like geometries. The metal chalcogenide composition has a molecular formula of MX2.

Abstract: A method for forming an oxide film by plasma electrolytic oxidation includes a first step of placing an anode, which is a substrate with a conductive nitride film, and a cathode into an electrolyte of which the temperature range is from 20° C. to 100° C., and a second step of applying a voltage ranging from 50 V to 1000 V to the anode and cathode to finally form an oxide film on a surface of the conductive nitride film of the anode. The oxide film can be formed more rapidly than the prior art and has excellent crystallinity.

Abstract: A method for forming a ZrO2 oxide film by plasma electrolytic oxidation includes a first step of placing an anode, which is a substrate with a ZrN film, and a cathode into an electrolyte of which the temperature range is from 65° C. to 75° C. Said electrolyte contains barium acetate or barium hydroxide ranging from 0.3 M to 0.7 M and sodium hydroxide or potassium hydroxide ranging from 1.5 M to 2.5 M. The method includes a second step of applying a voltage ranging from 50 V to 1000 V to the anode and cathode to finally form a ZrO2 film on a surface of the ZrN film of the anode. A DC power supply, an AC power supply, unipolar pulse power supply or bipolar pulse power supply is applied to said anode and cathode in constant-voltage mode or constant-current mode. The oxide film can be formed more rapidly than the prior art and has excellent crystallinity.

Abstract: An implant (5, 13) and/or a unit (9), e.g. spacer sleeve, belonging to said implant is/are intended to extend through a hole (4?) formed in a jaw bone (2) and through soft tissue (3) belonging to the jaw bone and to comprise one or more outer layers of principally titanium dioxide. Each layer consists of crystalline titanium dioxide which largely or completely assumes the anatase phase. The invention also relates to a method for production of such a dental implant (5, 13) and/or of a unit (9) belonging to it, which has one or more outer layers of titanium dioxide. The method is an anodic oxidation method in which the part or parts bearing the outer layer(s) is/are applied to electrolyte under voltage, e.g. comprising sulfuric acid and phosphoric acid, and the voltage (U) and the dwell time of the part or parts in the electrolyte are chosen such that titanium dioxide, largely or completely assuming the crystalline anatase phase, is formed.

Abstract: The invention relates to vacuum pump components without conversion layers that are made of valve metals and alloys thereof.

Abstract: An anodizing apparatus configured to perform an anodization on a metallic material to be processed provided with a projecting portion on a surface thereof, includes: an electrolysis tank configured to store electrolytic solution for anodization; a first electrode portion formed of a metal and electrically connected to the material in an immersed state immersed in the electrolytic solution in the electrolysis tank; a second electrode portion formed of a metal and opposing the material in the immersed state; an electrode apparatus configured to apply a predetermined voltage between the first and second electrode portions; a retaining device configured to retain and rotate the material in the immersed state; and a first injection device configured to inject the electrolytic solution toward a predetermined area deviated from the material in a storage space in the electrolysis tank so that the material is deviated from a line in the direction of injection.