Method for manufacturing color filter
A method for manufacturing a color filter includes the steps of: forming an organic black photoresist layer (304) on a transparent substrate (300); exposing the organic black photoresist layer using a photo-mask; developing the organic black photoresist layer to form an organic black matrix (3041) on the transparent substrate; forming a positive photoresist layer (306) on the transparent substrate thereby covering the organic black matrix with the positive photoresist layer; irradiating a surface of the transparent substrate facing away from the positive photoresist layer so as to expose the positive photoresist layer; developing the positive photoresist layer to form a plurality of banks (3061) on the organic black matrix; injecting ink into spaces defined by the banks and the organic black matrix using an ink-jet device; and solidifying the ink.
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1. Technical Invention
The present invention generally relates to color filters, and more particularly to a method for manufacturing a color filter.
2. Discussion of Related Art
At present, liquid crystal displays (LCDs) are used in various fields, such as for notebook PCs, mobile phones, desktop monitors, and digital cameras, because of their excellent characteristics, such as low weight, thinness, and low power consumption. The liquid crystal display includes a color filter for displaying color images. For the device to have color capability, each pixel is aligned with a color area, typically red, green, or blue, of a color filter array. Depending upon the image to be displayed, one or more of the pixel electrodes is energized during display operation to allow full light, no light, or partial light to be transmitted through the color filter area associated with that pixel. The image perceived by a user is a blend of colors formed by the transmission of light through adjacent color filter areas.
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In the conventional method for manufacturing a color filter, for transferring the pattern from the photo-mask to the black matrix 1021, firstly the pattern of the photo-mask is transferred to the first photoresist layer 104 to form the patterned photoresist layer 1041. Secondly the pattern of the patterned photoresist layer 1041 is transferred to the metallic material layer 102 to form the black matrix 1021. Therefore, the pattern precision of the black matrix 1021 may be reduced due to the two-step nature of the process of forming the black matrix 1021. The precision of the banks 1061 and the color layer 114, etc. may also be reduced too. Moreover chromium is harmful to the environment as it is a heavy metal and is toxic to living organisms.
What is needed, therefore, is a method for manufacturing a color filter with high pattern precision for the black matrix.
SUMMARYA method for manufacturing a color filter according to one preferred embodiment includes the steps of: forming an organic black photoresist layer on a transparent substrate; exposing the organic black photoresist layer using a photo-mask; developing the organic black photoresist layer to form an organic black matrix on the transparent substrate; forming a positive photoresist layer on the transparent substrate thereby covering the organic black matrix with the positive photoresist layer; irradiating a surface of the transparent substrate facing away from the positive photoresist layer so as to expose the positive photoresist layer; developing the positive photoresist layer to form a plurality of banks on the organic black matrix; injecting ink into spaces defined by the banks and the organic black matrix using an ink-jet device; and solidifying the ink.
A method for manufacturing a color filter according to another preferred embodiment includes the steps of: defining a plurality of grooves in a surface of a transparent substrate; applying a black organic material into the plurality of grooves to form an organic black matrix; forming a positive photoresist layer on the transparent substrate, thereby covering the organic black matrix with the positive photoresist layer; irradiating a surface of the transparent substrate facing away from the positive photoresist layer so as to expose the positive photoresist layer, developing the positive photoresist layer to form a plurality of banks on the organic black matrix; injecting ink into spaces defined by the banks and the organic black matrix using an ink-jet device; and solidifying the ink.
Compared with the conventional method for manufacturing a color filter, the present embodiments have the following advantages. The organic black matrix is formed directly using a photo-mask so the pattern precision of the organic black matrix is enhanced. Furthermore, the present material of the black matrix is a resin-based composition replacing the conventional chromium and is environmentally friendly.
Other advantages and novel features will become more apparent from the following detailed description of the present invention, when taken in conjunction with the accompanying drawings.
Many aspects of the present method can be better understood with reference to the following drawings. The components in the drawings are not necessarily drawn to scale, the emphasis instead being placed upon clearly illustrating the principles of the present invention. Moreover, in the drawings, like reference numerals designate corresponding parts throughout the several views.
Corresponding reference characters indicate corresponding parts throughout the drawings. The exemplifications set out herein illustrate at least one preferred embodiment of the present invention, in one form, and such exemplifications are not to be construed as limiting the scope of the invention in any manner.
DETAILED DESCRIPTION OF PREFERRED EMBODIMENTSReference will now be made to the drawings to describe preferred embodiments of the present methods for manufacturing a color filter, in detail.
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Compared with conventional methods for manufacturing a color filter, the organic black matrix 3041 is formed directly using a photo-mask so that the precision of the organic black matrix 3041 is enhanced. Furthermore, the present material of the black matrix is a resin-based composition, which is environmentally friendly, in absence of harmful chromium.
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The advantages of the method for the second preferred embodiment are the same as that of the method for manufacturing a color filter according with the first preferred embodiment. Moreover, because the ink in the spaces defined by the banks and the organic black matrix is totally separated by the banks, mixture and blurring of different colored ink is avoided even if pores existed in the organic black matrix 5041.
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More-detail steps and advantages of the method for manufacturing a color filter according to the third preferred embodiment is similar to those of the method for manufacturing a color filter according to the second preferred embodiment. Those skilled in the technical field can refer to the method for manufacturing a color filter according to the second preferred embodiment.
It is to be understood that the above-described embodiment is intended to illustrate rather than limit the invention. Variations may be made to the embodiment without departing from the spirit of the invention as claimed. The above-described embodiments are intended to illustrate the scope of the invention and not restrict the scope of the invention.
Claims
1. A method for manufacturing a color filter, comprising the steps of:
- defining a plurality of grooves in a surface of a transparent substrate;
- applying a black organic material into the plurality of grooves to form an organic black matrix;
- forming a positive photoresist layer on the transparent substrate thereby covering the organic black matrix with the positive photoresist layer;
- irradiating a surface of the transparent substrate facing away from the positive photoresist layer so as to expose the positive photoresist layer;
- developing the positive photoresist layer to form a plurality of banks on the organic black matrix;
- injecting ink into spaces defined by the banks and the organic black matrix using an ink-jet device; and
- solidifying the ink.
2. The method for manufacturing the color filter of claim 1, wherein the grooves are defined by using a process chosen from the group consisting of a laser process, a sand blasting process, and an etching process using a photo-mask.
3. The method for manufacturing the color filter of claim 1, wherein the grooves are defined by a laser process or a sand blasting process using an accurate positioning mechanism.
4. The method for manufacturing the color filter of claim 1, wherein the ink-jet device is a thermal bubble ink-jet device or a piezoelectrical ink-jet device.
5. The method for manufacturing the color filter of claim 1, wherein the ink is solidified by a heating device.
6. The method for manufacturing the color filter of claim 1, wherein the ink is solidified by a heating device and a vacuum-pumping device.
7. The method for manufacturing the color filter of claim 1, wherein the ink is solidified by a light-emitting device.
8. The method for manufacturing the color filter of claim 1, wherein the transparent substrate is a glass substrate.
9. The method for manufacturing the color filter of claim 1, wherein the organic material is a resin-based composition containing carbon black.
10. The method for manufacturing the color filter of claim 1, wherein the surface of the transparent substrate facing away from the positive photoresist layer is irradiated by an ultraviolet light-emitting device.
6468702 | October 22, 2002 | Yi et al. |
6887631 | May 3, 2005 | Kiguchi et al. |
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Type: Grant
Filed: May 12, 2006
Date of Patent: May 26, 2009
Patent Publication Number: 20060284956
Assignee: ICF Technology Co., Ltd. (Hsinchu)
Inventor: Ching-Yu Chou (Hsinchu)
Primary Examiner: John A. McPherson
Attorney: Frank R. Niranjan
Application Number: 11/432,969
International Classification: G02B 5/20 (20060101);