Exhaust wall liner for semiconductor manufacturing apparatus

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Description

FIG. 1 is a perspective view of an exhaust wall liner for a semiconductor manufacturing apparatus showing our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

The ornamental design for an exhaust wall liner for a semiconductor manufacturing apparatus, as shown and described.

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Foreign Patent Documents
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Patent History
Patent number: D1051081
Type: Grant
Filed: May 11, 2023
Date of Patent: Nov 12, 2024
Assignee: AP SYSTEMS INC.
Inventors: Chang Min Kwon (Hwaseong-si), Chang Kyo Kim (Hwaseong-si)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/891,976