Exhaust flow control ring for semiconductor deposition apparatus

- ASM IP Holding B.V.
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Description

FIG. 1 is a perspective view of an exhaust flow control ring for semiconductor deposition apparatus,

FIG. 2 is a front elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 3 is a rear elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 4 is a left side elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 5 is a right side elevational view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 6 is another view of the exhaust flow control ring for semiconductor deposition apparatus,

FIG. 7 is another view of the exhaust flow control ring for semiconductor deposition apparatus; and,

FIG. 8 is a rear perspective view of the exhaust flow control ring for semiconductor deposition apparatus.

Claims

The ornamental design for an exhaust flow control ring for semiconductor deposition apparatus, as shown and described.

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Patent History
Patent number: D876504
Type: Grant
Filed: May 15, 2017
Date of Patent: Feb 25, 2020
Assignee: ASM IP Holding B.V. (Almere)
Inventors: Julll Lee (Chungcheongnam-do), Sung Hoon Jun (Gyeonggi-do), Dong Rak Jung (Chungcheongnam-do), Seung Wook Kim (Gyeongsangnam-do)
Primary Examiner: Patricia A Palasik
Application Number: 29/604,101
Classifications
Current U.S. Class: Element Or Attachment (D15/138)