Chamber wall liner for a semiconductor manufacturing apparatus

- AP SYSTEMS INC.
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Description

FIG. 1 is a perspective view of a chamber wall liner for a semiconductor manufacturing apparatus, showing our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

The ornamental design for a chamber wall liner for a semiconductor manufacturing apparatus, as shown and described.

Referenced Cited
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Foreign Patent Documents
D215697 December 2021 TW
Other references
  • Lam Research 715-030860-002 Chamber Liner,https://www.google.com/shopping/product/1?q=chamber+wall+liner+for+semiconductor+manufacturing&prds=epd:18238509179217739273,eto:18238509179217739273_0,pid:18238509179217739273&sa=X&ved=0ahUKEwjY38GBssyFAxVK6ckDHfOfBKkQ9pwGCAc, 2024. (Year: 2024).
Patent History
Patent number: D1034493
Type: Grant
Filed: May 11, 2023
Date of Patent: Jul 9, 2024
Assignee: AP SYSTEMS INC.
Inventors: Chang Min Kwon (Hwaseong-si), Chang Kyo Kim (Hwaseong-si)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/891,977