Chamber wall liner for a semiconductor manufacturing apparatus
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Description
Claims
The ornamental design for a chamber wall liner for a semiconductor manufacturing apparatus, as shown and described.
Referenced Cited
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Foreign Patent Documents
Other references
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- Lam Research 715-030860-002 Chamber Liner,https://www.google.com/shopping/product/1?q=chamber+wall+liner+for+semiconductor+manufacturing&prds=epd:18238509179217739273,eto:18238509179217739273_0,pid:18238509179217739273&sa=X&ved=0ahUKEwjY38GBssyFAxVK6ckDHfOfBKkQ9pwGCAc, 2024. (Year: 2024).
Patent History
Patent number: D1034493
Type: Grant
Filed: May 11, 2023
Date of Patent: Jul 9, 2024
Assignee: AP SYSTEMS INC.
Inventors: Chang Min Kwon (Hwaseong-si), Chang Kyo Kim (Hwaseong-si)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/891,977
Type: Grant
Filed: May 11, 2023
Date of Patent: Jul 9, 2024
Assignee: AP SYSTEMS INC.
Inventors: Chang Min Kwon (Hwaseong-si), Chang Kyo Kim (Hwaseong-si)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/891,977
Classifications