Memorial mask memento

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Description

FIG. 1 is a perspective view showing the front, top, and right side of the memorial mask memento;

FIG. 2 is a front, bottom, and right side perspective view thereof;

FIG. 3 is a rear, top, and left side perspective view thereof;

FIG. 4 is a front view thereof;

FIG. 5 is a back view thereof;

FIG. 6 is a left side view thereof;

FIG. 7 is a right side view thereof; and,

FIG. 8 is a top view thereof.

The broken lines illustrate environment and form no part of the claimed design.

Claims

The ornamental design for a memorial mask memento as shown and described.

Referenced Cited
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Other references
  • Evan Yee Studio Facebook page, available Jan. 2, 2021, [online], [site visited Dec. 2, 2024]. Available from internet, URL: https://www.facebook.com/evandesmondyee (Year: 2021).
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Patent History
Patent number: D1081457
Type: Grant
Filed: Dec 2, 2021
Date of Patent: Jul 1, 2025
Assignee: CURIOSITY GARDENS LLC (Arlington, TX)
Inventor: Evan Yee (Brooklyn, NY)
Primary Examiner: W. A. Teddy Falloway
Application Number: 29/817,675
Classifications
Current U.S. Class: Simulative (D11/157); Mask (D24/110.1)