Semiconductor wafer measuring instrument

- Tokyo Electron Limited
Description

FIG. 1 is a top, front and right side perspective view of a semiconductor wafer measuring instrument showing my new design;

FIG. 2 is a front elevational view;

FIG. 3 is a right side elevational view, the left side elevational view being a mirror image;

FIG. 4 is a top plan view;

FIG. 5 is a rear elevational view; and

FIG. 6 is a bottom plan view thereof.

Referenced Cited
U.S. Patent Documents
D188789 September 1960 Hannon
D223174 March 1972 Pettavel
D262950 February 9, 1982 Orr, II
D277979 March 12, 1985 Brown et al.
D307397 April 24, 1990 Lehtikoski
D314347 February 5, 1991 Garnish et al.
4530635 July 23, 1985 Engelbrecht et al.
4684113 August 4, 1987 Douglas et al.
4700488 October 20, 1987 Curti
4719705 January 19, 1988 Laganza et al.
4723766 February 9, 1988 Beeding
4907931 March 13, 1990 Mallory et al.
4938654 July 3, 1990 Schram
4941800 July 17, 1990 Koike et al.
4955590 September 11, 1990 Narushima et al.
Foreign Patent Documents
733184 January 1988 JPX
Patent History
Patent number: D323628
Type: Grant
Filed: Apr 25, 1989
Date of Patent: Feb 4, 1992
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Itaru Takao (Yamanashi)
Primary Examiner: Bruce W. Dunkins
Assistant Examiner: Antoine D. Davis
Law Firm: Oblon, Spivak, McClelland, Maier & Neustadt
Application Number: 7/343,124