Processing machine for electron beam lithography system

- Hitachi, Ltd.
Description

FIG. 1 is a front, top and right side elevational perspective view of a processing machine for electron beam lithography system showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left elevational view thereof;

FIG. 4 is a right elevational view thereof;

FIG. 5 is a top plan elevational view thereof;

FIG. 6 is a bottom plan elevational view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a rear, top and left side perspective view thereof.

Referenced Cited
U.S. Patent Documents
D179493 January 1957 Saekler
D185069 May 1959 Crowle
D210284 February 1968 Kerwin
D237209 October 1975 Faraco, Jr.
Patent History
Patent number: D352910
Type: Grant
Filed: Feb 8, 1993
Date of Patent: Nov 29, 1994
Assignee: Hitachi, Ltd. (Tokyo)
Inventors: Takashi Yamamoto (Kodaira), Tomoyuki Miyata (Kokubunji), Kazunori Hasimoto (Tachikawa), Mitsuru Ohnuma (Tokyo), Toshihiko Wada (Musashimurayama), Takashi Yamazaki (Katsuta), Hiroyuki Sakai (Ibaraki)
Primary Examiner: Alan P. Douglas
Assistant Examiner: Antoine D. Davis
Law Firm: Antonelli, Terry, Stout & Kraus
Application Number: 0/4,586