Inner tube for use in a semiconductor wafer heat processing apparatus

- Tokyo Electron Limited
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Description

FIG. 1: a perspective view of a inner tube for use in a semiconductor wafer heat processing apparatus;

FIG. 2: a front elevational view thereof, the rear elevational view, the right side view and the left side view are identical with the front view;

FIG. 3: a top plan view thereof;

FIG. 4: a bottom plan view thereof; and,

FIG. 5: a cross sectional view thereof taken along line V-V in FIG. 3.

Referenced Cited
U.S. Patent Documents
4857689 August 15, 1989 Lee
5314574 May 24, 1994 Takahashi
5320218 June 14, 1994 Yamashita et al.
5752796 May 19, 1998 Muka
Patent History
Patent number: D405430
Type: Grant
Filed: Jul 24, 1997
Date of Patent: Feb 9, 1999
Assignee: Tokyo Electron Limited (Tokyo-To)
Inventor: Noriaki Matsushima (Kanagawa)
Primary Examiner: Brian N. Vinson
Law Firm: Ladas & Parry
Application Number: 0/74,301
Classifications
Current U.S. Class: Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)
International Classification: 1303;