Electrostatic chuck with improved spacing mask and workpiece detection device

- Applied Materials, Inc.
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Description

FIG. 1 is a top view of the electrostatic chuck with the improved spacing mask and workpiece detection device;

FIG. 2 is an elevation view of the electrostatic chuck when looking down along the y-axis of FIG. 1;

FIG. 3 is a detailed view of part of the electrostatic chuck seen in FIG. 2;

FIG. 4 is a bottom view of the electrostatic chuck;

FIG. 5 is an elevation view of the electrostatic chuck when looking up along the y-axis of FIG. 1;

FIG. 6 is an elevation view of the electrostatic chuck when looking to the left along the x-axis of FIG. 1; and,

FIG. 7 is an elevation view of the electrostatic chuck when looking to the right along the x-axis in FIG. 1.

Referenced Cited
U.S. Patent Documents
D406852 March 16, 1999 Burkhart et al.
5671116 September 23, 1997 Husain
5691876 November 25, 1997 Chen et al.
5745332 April 28, 1998 Burkhart et al.
Patent History
Patent number: D420023
Type: Grant
Filed: Jan 9, 1999
Date of Patent: Feb 1, 2000
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventors: Allen Flanigan (San Jose, CA), Steven Sansoni (Tracy, CA), Vincent E. Burkhart (San Jose, CA)
Primary Examiner: Antoine Duval Davis
Law Firm: Thomason, Moser & Patterson
Application Number: 0/98,986
Classifications
Current U.S. Class: Tool Or Work Holder (D15/140)
International Classification: 1509;