Reticle pattern for a gun scope
- Nikon
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Description
FIG. 1 is a front perspective view of reticle pattern for a gun scope showing our new design;
FIG. 2 is a front view, the rear side view being a mirror image of the front view thereof;
FIG. 3 is a top view, the bottom view being a mirror image of the top view thereof;
FIG. 4 is a left view, the right view being a mirror image of the left view thereof; and,
FIG. 5 is an enlarged sectional view of the reticle pattern for a gun scope taken along the lines 5—5 in FIG. 2.
The broken lines shown in all views are to illustrate environment only and form no part of the claimed design.
Claims
The ornamental design for the reticle pattern for a gun scope, as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
Other references
| 3540256 | November 1970 | Thompson |
| 5223650 | June 29, 1993 | Finn |
| 5491546 | February 13, 1996 | Wascher et al. |
| D397704 | September 1, 1998 | Reese |
| 6357158 | March 19, 2002 | Smith, III |
| D456057 | April 23, 2002 | Smith, III |
| 44-41868 | December 1973 | JP |
| 47-26183 | July 1975 | JP |
- Nikon Corporation, “Nikon: A better look at your world,” (2001), pp. 9 and 24.
Patent History
Patent number: D475758
Type: Grant
Filed: Jun 20, 2002
Date of Patent: Jun 10, 2003
Assignee: Nikon Corporation (Tokyo)
Inventor: Yasuaki Ishikawa (Tokyo)
Primary Examiner: Louis S. Zarfas
Assistant Examiner: Monica A. Weingart
Attorney, Agent or Law Firm: Oliff & Berridge, PLC
Application Number: 29/162,614
Type: Grant
Filed: Jun 20, 2002
Date of Patent: Jun 10, 2003
Assignee: Nikon Corporation (Tokyo)
Inventor: Yasuaki Ishikawa (Tokyo)
Primary Examiner: Louis S. Zarfas
Assistant Examiner: Monica A. Weingart
Attorney, Agent or Law Firm: Oliff & Berridge, PLC
Application Number: 29/162,614
Classifications
