Apertured, nonwoven fabric

- Polymer Group, Inc.
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Description

The photograph is a top plan of an apertured nonwoven fabric showing our new design.

The nonwoven fabric has an indeterminate width and an indeterminate length.

Claims

The ornamental design for an apertured, nonwoven fabric, as shown and described.

Referenced Cited
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Patent History
Patent number: D524552
Type: Grant
Filed: Apr 7, 2005
Date of Patent: Jul 11, 2006
Assignee: Polymer Group, Inc. (North Charleston, SC)
Inventors: Andrew W. Delaney (East Windsor, NJ), Rick M. Augustine (Dunn, NC), Dianne Buske Ellis (Cary, NC)
Primary Examiner: Gary D. Watson
Assistant Examiner: T. Chase Nelson
Attorney: Wood, Phillips, Katz, Clark & Mortimer
Application Number: 29/227,253
Classifications
Current U.S. Class: D5/53; D5/56