Polishing pad

- JSR Corporation
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Description

FIG. 1 is a top plan view of a polishing pad showing our new design;

FIG. 2 is a front elevational view thereof, the rear elevation view, left and right side elevational views being a mirror image of the side shown;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a partial, enlarged view of portion 4—4 in FIG. 1;

FIG. 5 is a partial, enlarged sectional view taken along line 5—5 in FIG. 4

FIG. 6 is a partial, enlarged sectional view taken along line 6—6 in FIG. 4;

FIG. 7 is a partial, greatly enlarged sectional view of portion 7 in FIG. 5; and,

FIG. 8 is a partial, enlarged view of portion 8—8 in FIG. 1.

Claims

The ornamental design for a polishing pad, as shown and described.

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Patent History
Patent number: D559066
Type: Grant
Filed: Apr 26, 2005
Date of Patent: Jan 8, 2008
Assignee: JSR Corporation (Tokyo)
Inventors: Hiroyuki Tano (Chuo-ku), Hiroshi Shiho (Chuo-ku)
Primary Examiner: T. Chase Nelson
Attorney: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Application Number: 29/228,555
Classifications
Current U.S. Class: D8/70