Plasma inducing plate for semiconductor deposition apparatus

- ASM Genitech Korea Ltd.
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FIG. 1 is a perspective view of a plasma inducing plate that may be positioned in a reaction space of a chamber in a semiconductor deposition apparatus, showing our new design with a partial enlarged view of an edge portion of the plate and a partial cross-sectional view of another edge portion of the plate;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left-side view thereof;

FIG. 5 is a right-side view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof according to our new design.

The plasma inducing plate may be made of a metal. The four holes on the top surface of the plate are screw holes that do not penetrate the plate.

The ornamental design which is claimed is shown in solid lines in the drawings.


The ornamental design for a plasma inducing plate for semiconductor deposition apparatus, as shown and described.

Referenced Cited
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Other references
  • U.S. Appl. No. 29/322,630, filed Aug. 7, 2008, Aggarwal et al.
Patent History
Patent number: D606952
Type: Grant
Filed: Jan 16, 2009
Date of Patent: Dec 29, 2009
Assignee: ASM Genitech Korea Ltd. (Cheonan-Si)
Inventors: Jeong Ho Lee (Seoul), Sang Jin Jeong (Daejeon-si), Woo Chan Kim (Deajeon-si)
Primary Examiner: Selina Sikder
Attorney: Knobbe Martens Olson & Bear LLP
Application Number: 29/331,022