Pedestal of heat insulating cylinder for manufacturing semiconductor wafers
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The broken lines are shown for illustrative purposes only and form no part of the claimed design.
Claims
The ornamental design for a pedestal of heat insulating cylinder for manufacturing semiconductor wafers, as shown and described.
| 4872554 | October 10, 1989 | Quernemoen |
| 5897311 | April 27, 1999 | Nishi |
| D409158 | May 4, 1999 | Shimazu |
| 6099645 | August 8, 2000 | Easley et al. |
| 6110285 | August 29, 2000 | Kitazawa et al. |
| 6488497 | December 3, 2002 | Buckley et al. |
| 7033168 | April 25, 2006 | Gupta et al. |
| 7484958 | February 3, 2009 | Kobayashi |
| 7501370 | March 10, 2009 | Narendar et al. |
Type: Grant
Filed: Sep 2, 2009
Date of Patent: May 25, 2010
Assignee: Tokyo Electron Limited (Minato-Ku)
Inventor: Izumi Sato (Oshu)
Primary Examiner: Selina Sikder
Attorney: Burr & Brown
Application Number: 29/342,858